D-Index & Metrics Best Publications
Christophe Detavernier

Christophe Detavernier

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 60 Citations 13,487 603 World Ranking 4304 National Ranking 43

Overview

What is he best known for?

The fields of study he is best known for:

  • Oxygen
  • Organic chemistry
  • Semiconductor

Atomic layer deposition, Thin film, Analytical chemistry, Nanotechnology and Chemical engineering are his primary areas of study. His Atomic layer deposition study integrates concerns from other disciplines, such as Deposition, Platinum, Diffusion barrier, Nanoporous and Coating. His Thin film study combines topics in areas such as X-ray crystallography, Sheet resistance, Texture and Optics.

Christophe Detavernier interconnects Crystallization, Oxygen, Electrical resistivity and conductivity, Schottky barrier and Metallurgy in the investigation of issues within Analytical chemistry. His work on Nanoparticle as part of general Nanotechnology research is frequently linked to Particle, thereby connecting diverse disciplines of science. Christophe Detavernier has included themes like Carbon dioxide reforming, Syngas, Catalysis, Mesoporous material and Annealing in his Chemical engineering study.

His most cited work include:

  • Towards implementation of a nickel silicide process for CMOS technologies (347 citations)
  • Tailoring nanoporous materials by atomic layer deposition. (246 citations)
  • Three-dimensional observation of the conductive filament in nanoscaled resistive memory devices. (222 citations)

What are the main themes of his work throughout his whole career to date?

Christophe Detavernier mainly investigates Atomic layer deposition, Thin film, Chemical engineering, Analytical chemistry and Nanotechnology. His Atomic layer deposition study also includes

  • Inorganic chemistry together with Catalysis,
  • Passivation most often made with reference to Optoelectronics. The concepts of his Thin film study are interwoven with issues in Crystallization, Silicide, Amorphous solid, Crystallography and Annealing.

His Crystallography research focuses on subjects like Epitaxy, which are linked to Crystallite. His work deals with themes such as Sintering, Mesoporous material and Lithium, which intersect with Chemical engineering. His Analytical chemistry study combines topics from a wide range of disciplines, such as In situ, Germanium, Sputtering and Nucleation.

He most often published in these fields:

  • Atomic layer deposition (35.78%)
  • Thin film (31.86%)
  • Chemical engineering (22.66%)

What were the highlights of his more recent work (between 2017-2021)?

  • Atomic layer deposition (35.78%)
  • Chemical engineering (22.66%)
  • Thin film (31.86%)

In recent papers he was focusing on the following fields of study:

Christophe Detavernier spends much of his time researching Atomic layer deposition, Chemical engineering, Thin film, Optoelectronics and Catalysis. His Atomic layer deposition study is related to the wider topic of Nanotechnology. His Nanotechnology research integrates issues from Photocatalysis and Porous silicon.

His biological study spans a wide range of topics, including Oxide, Nucleation, Sintering, Layer and Lithium. Christophe Detavernier focuses mostly in the field of Thin film, narrowing it down to matters related to Annealing and, in some cases, Epitaxy. His studies examine the connections between Catalysis and genetics, as well as such issues in Inorganic chemistry, with regards to Hydrogen.

Between 2017 and 2021, his most popular works were:

  • Red Mn4+-Doped Fluoride Phosphors: Why Purity Matters. (33 citations)
  • Effect of composition and preparation of supported MoO3 catalysts for anisole hydrodeoxygenation (30 citations)
  • Effect of Annealing Ferroelectric HfO2 Thin Films: In Situ, High Temperature X‐Ray Diffraction (27 citations)

In his most recent research, the most cited papers focused on:

  • Organic chemistry
  • Oxygen
  • Semiconductor

Christophe Detavernier mainly investigates Atomic layer deposition, Chemical engineering, Optoelectronics, Thin film and Nanoparticle. The various areas that Christophe Detavernier examines in his Atomic layer deposition study include Oxide, Anode, Oxygen evolution and X-ray photoelectron spectroscopy. His Oxide research includes themes of Chemical vapor deposition, Deposition, Inorganic chemistry, Spinel and Substrate.

His Chemical engineering research incorporates themes from Bifunctional catalyst, Adsorption, Layer, Catalysis and Lithium. His work deals with themes such as Phase transition, Crystallization, Doping, Annealing and Electrode, which intersect with Thin film. His Nanoparticle study introduces a deeper knowledge of Nanotechnology.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Towards implementation of a nickel silicide process for CMOS technologies

C. Lavoie;F. M. d'Heurle;C. Detavernier;C. Cabral.
Microelectronic Engineering (2003)

469 Citations

Tailoring nanoporous materials by atomic layer deposition.

Christophe Detavernier;Jolien Dendooven;Sreeprasanth Pulinthanathu Sree;Karl F. Ludwig.
Chemical Society Reviews (2011)

347 Citations

Three-dimensional observation of the conductive filament in nanoscaled resistive memory devices.

Umberto Celano;Ludovic Goux;Attilio Belmonte;Karl Opsomer.
Nano Letters (2014)

310 Citations

Super-dry reforming of methane intensifies CO2 utilization via Le Chatelier’s principle

Lukas C. Buelens;Vladimir V. Galvita;Hilde Poelman;Christophe Detavernier.
Science (2016)

292 Citations

High-k dielectrics for future generation memory devices (Invited Paper)

J. A. Kittl;K. Opsomer;M. Popovici;N. Menou.
Microelectronic Engineering (2009)

285 Citations

Atomic layer deposition of TiO2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O

Qi Xie;Yu-Long Jiang;Christophe Detavernier;Davy Deduytsche.
Journal of Applied Physics (2007)

283 Citations

Barrier height inhomogeneities of epitaxial CoSi2 Schottky contacts on n-Si (100) and (111)

Shiyang Zhu;R.L. Van Meirhaeghe;C. Detavernier;F. Cardon.
Solid-state Electronics (2000)

280 Citations

Thin film reaction of transition metals with germanium

S Gaudet;Christophe Detavernier;Aj Kellock;P Desjardins.
Journal of Vacuum Science and Technology (2006)

260 Citations

An off-normal fibre-like texture in thin films on single-crystal substrates

Christophe Detavernier;Christophe Detavernier;As Ozcan;J Jordan-Sweet;Ea Stach.
Nature (2003)

231 Citations

Plasma-Enhanced ALD of Platinum with O2, N2 and NH3 Plasmas

D. Longrie;K. Devloo-Casier;D. Deduytsche;S. Van den Berghe.
ECS Journal of Solid State Science and Technology (2012)

222 Citations

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