World's Best Scientists 2026 revealed!
Christophe Detavernier

Christophe Detavernier

D-Index & Metrics

Materials Science

D-Index
72
Citations
19421
World Ranking
4029
National Ranking
40

Christophe Detavernier publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Christophe Detavernier sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 667 publications — 94th percentile

94% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Christophe Detavernier D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Christophe Detavernier sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 72 D-Index — 69th percentile

69% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Christophe Detavernier is affiliated with Ghent University in Belgium and has an extensive publication record in the fields of Engineering and Materials Science. Their research focuses primarily on subfields such as Electrical and Electronic Engineering, Materials Chemistry, and Catalysis, with notable contributions to Atomic and Molecular Physics, and Biomedical Engineering.

The scientist has published extensively on topics related to semiconductor materials and devices, catalytic processes in materials science, and the electronic and structural properties of oxides. Other prominent research areas include advancements in battery materials, catalysis and oxidation reactions, semiconductor materials and interfaces, and quantum dots synthesis and properties.

Frequent coauthors collaborating with Christophe Detavernier include Jolien Dendooven, Matthias Minjauw, Lowie Henderick, Hilde Poelman, and Eduardo Solano.

Notable publication venues where Detavernier's work appears include:

  • ECS Meeting Abstracts
  • Chemistry of Materials
  • Dalton Transactions
  • The Journal of Physical Chemistry C
  • SSRN Electronic Journal

Key recent papers authored or co-authored by Christophe Detavernier include:

  • Plasmonic gold-embedded TiO2 thin films as photocatalytic self-cleaning coatings, 2020, Applied Catalysis B: Environmental
  • Colloidal III-V Quantum Dot Photodiodes for Short-Wave Infrared Photodetection, 2022, Advanced Science
  • Ovonic Threshold-Switching GexSey Chalcogenide Materials: Stoichiometry, Trap Nature, and Material Relaxation from First Principles, 2020, physica status solidi (RRL) - Rapid Research Letters
  • Effect of Rh in Ni-based catalysts on sulfur impurities during methane reforming, 2020, Applied Catalysis B: Environmental
  • Acid-Base Mediated Ligand Exchange on Near-Infrared Absorbing, Indium-Based III-V Colloidal Quantum Dots, 2021, Journal of the American Chemical Society

Best Publications

  • Super-dry reforming of methane intensifies CO2 utilization via Le Chatelier’s principle

    Lukas C. Buelens;Vladimir V. Galvita;Hilde Poelman;Christophe Detavernier

  • Towards implementation of a nickel silicide process for CMOS technologies

    C. Lavoie;F. M. d'Heurle;C. Detavernier;C. Cabral

  • Tailoring nanoporous materials by atomic layer deposition.

    Christophe Detavernier;Jolien Dendooven;Sreeprasanth Pulinthanathu Sree;Karl F. Ludwig

  • Three-dimensional observation of the conductive filament in nanoscaled resistive memory devices.

    Umberto Celano;Ludovic Goux;Attilio Belmonte;Karl Opsomer

  • High-k dielectrics for future generation memory devices (Invited Paper)

    J. A. Kittl;K. Opsomer;M. Popovici;N. Menou

  • Atomic layer deposition of TiO2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O

    Qi Xie;Yu-Long Jiang;Christophe Detavernier;Davy Deduytsche

  • Barrier height inhomogeneities of epitaxial CoSi2 Schottky contacts on n-Si (100) and (111)

    Shiyang Zhu;R.L. Van Meirhaeghe;C. Detavernier;F. Cardon

  • Thin film reaction of transition metals with germanium

    S Gaudet;Christophe Detavernier;Aj Kellock;P Desjardins

  • An off-normal fibre-like texture in thin films on single-crystal substrates

    Christophe Detavernier;Christophe Detavernier;As Ozcan;J Jordan-Sweet;Ea Stach

  • Plasma-Enhanced ALD of Platinum with O2, N2 and NH3 Plasmas

    D. Longrie;K. Devloo-Casier;D. Deduytsche;S. Van den Berghe

  • Germanium surface passivation and atomic layer deposition of high-k dielectrics—a tutorial review on Ge-based MOS capacitors

    Qi Xie;Shaoren Deng;Marc Schaekers;Dennis Lin

  • Atomic layer deposition of titanium nitride from TDMAT precursor

    J. Musschoot;Q. Xie;D. Deduytsche;S. Van den Berghe

  • CeO2-modified Fe2O3 for CO2 utilization via chemical looping

    Vladimir V. Galvita;Hilde Poelman;Vitaliy Bliznuk;Christophe Detavernier

  • In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon

    W. Knaepen;C. Detavernier;R.L. Van Meirhaeghe;J. Jordan Sweet

  • Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition

    Qi Xie;Jan Musschoot;Davy Deduytsche;Roland L. Van Meirhaeghe

  • High-temperature degradation of NiSi films: Agglomeration versus NiSi2 nucleation

    D. Deduytsche;C. Detavernier;R. L. Van Meirhaeghe;C. Lavoie

  • Te-based chalcogenide materials for selector applications.

    A Velea;K Opsomer;Wouter Devulder;Jan Dumortier

  • Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films

    C. Lavoie;C. Detavernier;C. Cabral;F. M. d'Heurle

  • Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth

    F. Iacopi;Philippe Vereecken;M. Schaekers;M. Caymax

  • Plasma enhanced atomic layer deposition of Ga2O3 thin films

    Ranjith Karuparambil Ramachandran;Jolien Dendooven;Jonas Botterman;Sreeprasanth Pulinthanathu Sree

  • Delivering a Modifying Element to Metal Nanoparticles via Support: Pt–Ga Alloying during the Reduction of Pt/Mg(Al,Ga)Ox Catalysts and Its Effects on Propane Dehydrogenation

    Evgeniy A. Redekop;Vladimir V. Galvita;Hilde Poelman;Vitaliy Bliznuk

Frequent Co-Authors

Christian Lavoie
Christian Lavoie IBM (United States)
Hilde Poelman
Hilde Poelman Ghent University
Vladimir Galvita
Vladimir Galvita Ghent University
Zeger Hens
Zeger Hens Ghent University
Karen Maex
Karen Maex University of Amsterdam
Sara Bals
Sara Bals University of Antwerp

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