Christophe Detavernier

Overview

Best Publications

• Super-dry reforming of methane intensifies CO2 utilization via Le Chatelier’s principle

  Lukas C. Buelens;Vladimir V. Galvita;Hilde Poelman;Christophe Detavernier

  499
  Citations

• Towards implementation of a nickel silicide process for CMOS technologies

  C. Lavoie;F. M. d'Heurle;C. Detavernier;C. Cabral

  496
  Citations

• Tailoring nanoporous materials by atomic layer deposition.

  Christophe Detavernier;Jolien Dendooven;Sreeprasanth Pulinthanathu Sree;Karl F. Ludwig

  407
  Citations

• Three-dimensional observation of the conductive filament in nanoscaled resistive memory devices.

  Umberto Celano;Ludovic Goux;Attilio Belmonte;Karl Opsomer

  378
  Citations

• High-k dielectrics for future generation memory devices (Invited Paper)

  J. A. Kittl;K. Opsomer;M. Popovici;N. Menou

  326
  Citations

• Atomic layer deposition of TiO2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O

  Qi Xie;Yu-Long Jiang;Christophe Detavernier;Davy Deduytsche

  314
  Citations

• Barrier height inhomogeneities of epitaxial CoSi2 Schottky contacts on n-Si (100) and (111)

  Shiyang Zhu;R.L. Van Meirhaeghe;C. Detavernier;F. Cardon

  297
  Citations

• Thin film reaction of transition metals with germanium

  S Gaudet;Christophe Detavernier;Aj Kellock;P Desjardins

  278
  Citations

• An off-normal fibre-like texture in thin films on single-crystal substrates

  Christophe Detavernier;Christophe Detavernier;As Ozcan;J Jordan-Sweet;Ea Stach

  238
  Citations

• Plasma-Enhanced ALD of Platinum with O2, N2 and NH3 Plasmas

  D. Longrie;K. Devloo-Casier;D. Deduytsche;S. Van den Berghe

  230
  Citations

• Germanium surface passivation and atomic layer deposition of high-k dielectrics—a tutorial review on Ge-based MOS capacitors

  Qi Xie;Shaoren Deng;Marc Schaekers;Dennis Lin

  204
  Citations

• Atomic layer deposition of titanium nitride from TDMAT precursor

  J. Musschoot;Q. Xie;D. Deduytsche;S. Van den Berghe

  201
  Citations

• CeO2-modified Fe2O3 for CO2 utilization via chemical looping

  Vladimir V. Galvita;Hilde Poelman;Vitaliy Bliznuk;Christophe Detavernier

  199
  Citations

• In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon

  W. Knaepen;C. Detavernier;R.L. Van Meirhaeghe;J. Jordan Sweet

  196
  Citations

• Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition

  Qi Xie;Jan Musschoot;Davy Deduytsche;Roland L. Van Meirhaeghe

  169
  Citations

• High-temperature degradation of NiSi films: Agglomeration versus NiSi2 nucleation

  D. Deduytsche;C. Detavernier;R. L. Van Meirhaeghe;C. Lavoie

  163
  Citations

• Te-based chalcogenide materials for selector applications.

  A Velea;K Opsomer;Wouter Devulder;Jan Dumortier

  162
  Citations

• Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films

  C. Lavoie;C. Detavernier;C. Cabral;F. M. d'Heurle

  159
  Citations

• Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth

  F. Iacopi;Philippe Vereecken;M. Schaekers;M. Caymax

  152
  Citations

• Plasma enhanced atomic layer deposition of Ga2O3 thin films

  Ranjith Karuparambil Ramachandran;Jolien Dendooven;Jonas Botterman;Sreeprasanth Pulinthanathu Sree

  144
  Citations

• Delivering a Modifying Element to Metal Nanoparticles via Support: Pt–Ga Alloying during the Reduction of Pt/Mg(Al,Ga)Ox Catalysts and Its Effects on Propane Dehydrogenation

  Evgeniy A. Redekop;Vladimir V. Galvita;Hilde Poelman;Vitaliy Bliznuk

  138
  Citations