2026 Mikko Ritala: Materials Science Researcher – H-Index, Publications & Awards

Discipline name	D-Index	World Ranking	Current World Ranking	National Ranking	Current National Ranking	Publications	Citations
Materials Science	111	687	655	2	2	650	44450

Discipline name

D-Index

World Ranking

Current World Ranking

National Ranking

Current National Ranking

Publications

Citations

Materials Science

111

687

655

650

44450

Research.com Recognitions

2026 - Research.com Materials Science in Finland Leader Award
2025 - Research.com Materials Science in Finland Leader Award
2023 - Research.com Materials Science in Finland Leader Award
2022 - Research.com Materials Science in Finland Leader Award

Overview

Mikko Ritala is affiliated with the University of Helsinki in Finland and works primarily in the fields of Materials Science and Engineering. Their research focuses extensively on materials chemistry, electrical and electronic engineering, and sustainability-related topics within renewable energy and environmental applications.

The main topics of Mikko Ritala's research include semiconductor materials and devices, electronic and structural properties of oxides, doping and properties of ZnO, advanced photocatalysis techniques, catalytic processes in materials science, copper interconnects and reliability, and advanced memory and neural computing.

Frequent publication venues for Ritala's work include:

Chemistry of Materials
Advanced Materials Interfaces
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Dalton Transactions
ACS Omega

Ritala has collaborated repeatedly with several co-authors, highlighting joint research work with:

Markku Leskelä
Kenichiro Mizohata
Mykhailo Chundak
Marko Vehkamäki
Mikko Heikkilä

Significant recent papers authored or co-authored by Mikko Ritala include:

Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond, 2021, Advanced Materials Interfaces
Sonophotocatalytic degradation of sulfadiazine by integration of microfibrillated carboxymethyl cellulose with Zn-Cu-Mg mixed metal hydroxide/g-C3N4 composite, 2020, Separation and Purification Technology
Role of ALD Al₂O₃ Surface Passivation on the Performance of p-Type Cu₂O Thin Film Transistors, 2021, ACS Applied Materials & Interfaces
Oxygen and nitrogen plasma modifications of ZnCuCo LDH-graphene nanocomposites for photocatalytic hydrogen production and antibiotic degradation, 2023, Separation and Purification Technology
Template-free hierarchical trimetallic oxide photocatalyst derived from organically modified ZnCuCo layered double hydroxide, 2022, Journal of Cleaner Production

Best Publications

Atomic layer deposition (ALD): from precursors to thin film structures

Markku Leskelä;Mikko Ritala

1771
Citations
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

Ville Miikkulainen;Markku Leskelä;Mikko Ritala;Riikka L. Puurunen

1678
Citations
Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges†

Markku Leskelä;Mikko Ritala

1389
Citations
Atomic layer deposition

Mikko Ritala;Markku Leskelä

797
Citations
Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources

Mikko Ritala;Kaupo Kukli;Antti Rahtu;Petri I. Räisänen

666
Citations
Atomic Layer Deposition of Platinum Thin Films

Titta Aaltonen;Mikko Ritala;Timo Sajavaara;Juhani Keinonen

520
Citations
Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

Mikko Ritala;Markku Leskelä;Jan-Pieter Dekker;Cees Mutsaers

459
Citations
Thin Film Deposition Methods for CuInSe2Solar Cells

Marianna Kemell;Mikko Ritala;Markku Leskelä

423
Citations
Growth of titanium dioxide thin films by atomic layer epitaxy

Mikko Ritala;Markku Leskelä;Erja Nykänen;Pekka Soininen

423
Citations
Synthesis of oxide thin films and overlayers by atomic layer epitaxy for advanced applications

Lauri Niinistö;Mikko Ritala;Markku Leskelä

413
Citations
Atomic layer epitaxy—a valuable tool for nanotechnology?

Mikko Ritala;Markku Leskelä

413
Citations
Atomic Layer Deposition of Noble Metals and Their Oxides

Jani Hämäläinen;Mikko Ritala;Markku Leskelä

407
Citations
Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films

Mikko Ritala;Markku Leskela;Lauri Niinisto;Pekka Haussalo

403
Citations
X-ray ptychographic computed tomography at 16 nm isotropic 3D resolution

M. Holler;A. Diaz;M. Guizar-Sicairos;P. Karvinen

386
Citations
Ruthenium Thin Films Grown by Atomic Layer Deposition

Titta Aaltonen;Petra Alen;Mikko Ritala;Markku Leskelä

381
Citations
Tailoring the dielectric properties of HfO2–Ta2O5 nanolaminates

Kaupo Kukli;Jarkko Ihanus;Mikko Ritala;Markku Leskela

365
Citations
Atomic Layer Epitaxy Growth of Tantalum Oxide Thin Films from Ta ( OC 2 H 5 ) 5 and H 2 O

Kaupo Kukli;Mikko Ritala;Markku Leskelä

358
Citations
Effect of water dose on the atomic layer deposition rate of oxide thin films

Raija Matero;Antti Rahtu;Mikko Ritala;Markku Leskelä

353
Citations
Atomic Layer Epitaxy Growth of TiN Thin Films

Mikko Ritala;Markku Leskelä;Eero Rauhala;Pekka Haussalo

344
Citations
Method for growing thin oxide films

Mikko Ritala;Antti Rahtu;Markku Leskela;Kaupo Kukli

337
Citations