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Lauri Niinistö

Lauri Niinistö

D-Index & Metrics

Materials Science

D-Index
72
Citations
16825
World Ranking
4097
National Ranking
16

Chemistry

D-Index
72
Citations
17908
World Ranking
5273
National Ranking
19

Overview

Lauri Niinistö is affiliated with Aalto University in Finland. Their academic work is associated with this institution, contributing to research and education within the university's framework.

There are no recorded recent papers, co-authors, or frequent publication venues listed for Lauri Niinistö. Similarly, no book publications or detailed information on main fields of study, subfields, or specific research topics are provided.

No awards or honors have been documented for this researcher. The available data does not indicate any additional professional distinctions or recognitions.

This profile reflects the current available information without further elaboration on research themes or contributions due to the limited data provided.

Best Publications

  • Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition

    Mato Knez;Kornelius Nielsch;Kornelius Nielsch;Lauri Niinisto

  • Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectrics and other oxide materials

    Lauri Niinistö;Jani Päiväsaari;Jaakko Niinistö;Matti Putkonen

  • Growth of titanium dioxide thin films by atomic layer epitaxy

    Mikko Ritala;Markku Leskelä;Erja Nykänen;Pekka Soininen

  • Synthesis of oxide thin films and overlayers by atomic layer epitaxy for advanced applications

    Lauri Niinistö;Mikko Ritala;Markku Leskelä

  • Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films

    Mikko Ritala;Markku Leskela;Lauri Niinisto;Pekka Haussalo

  • Formation and stability of lanthanum oxide thin films deposited from β-diketonate precursor

    Minna Nieminen;Matti Putkonen;Lauri Niinistö

  • Determination of the hydroxyl group content in silica by thermogravimetry and a comparison with 1H MAS NMR results

    Satu Ek;Andrew Root;Marko Peussa;Lauri Niinistö

  • Studies of metallic thin film growth in an atomic layer epitaxy reactor using M(acac)2 (M = Ni, cu, Pt) precursors

    Mikko Utriainen;Minna Kröger-Laukkanen;Leena-Sisko Johansson;Lauri Niinistö

  • Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxy

    Mikko Ritala;Markku Leskelä;Lauri Niinistö;Thomas Prohaska

  • A comparative study on lanthanide oxide thin films grown by atomic layer deposition

    Jani Päiväsaari;Matti Putkonen;Lauri Niinistö

  • Effects of intermediate zinc pulses on properties of TiN and NbN films deposited by atomic layer epitaxy

    Mikko Ritala;Timo Asikainen;Markku Leskelä;Janne Jokinen

  • Effect of annealing in processing of strontium titanate thin films by ALD

    Anne Kosola;Matti Putkonen;Leena-Sisko Johansson;Lauri Niinistö

  • MULTICOMPONENT POLYANIONS PART 6, THE MOLECULAR AND CRYSTAL STRUCTURE OF NA4H2MO5P2O23(H2O)10, A COMPOUND CONTAINING SODIUM-COORDINATED DIHYDROGENPENTAMOLYBDODIPHOSPHATE ANIONS

    Rolf Strandberg;Lauri Niinistö;Jørgen Møller;Gustav Schroll

  • Minor and Trace Elements in Human Milk from Guatemala, Hungary, Nigeria, Philippines, Sweden, and Zaire Results from a WHO/IAEA Joint Project

    Robert R.M. Parr;Edouard E.M. DeMaeyer;Venkatesh V.G. Iyengar;Anthony A.R. Byrne

  • Stabilization of porous silicon surface by thermal decomposition of acetylene

    Jarno Salonen;M. Björkqvist;E. Laine;Lauri Niinistö

  • Atomic force microscopy study of titanium dioxide thin films grown by atomic layer epitaxy

    Mikko Ritala;Markku Leskelä;Leena-Sisko Johansson;Lauri Niinistö

  • Nitrides of titanium, niobium, tantalum and molybdenum grown as thin films by the atomic layer epitaxy method☆

    L. Hiltunen;M. Leskelä;M. Mäkelä;L. Niinistö

  • Synthesis, vibrational spectra and X-ray structures of copper(I) thiourea complexes

    Petra Bombicz;Ilpo Mutikainen;Malle Krunks;Tuula Leskelä

  • Low-temperature ALE deposition of Y2O3 thin films from β-diketonate precursors

    Matti Putkonen;Timo Sajavaara;Leena-Sisko Johansson;Lauri Niinistö

  • Surface roughness reduction in atomic layer epitaxy growth of titanium dioxide thin films

    Mikko Ritala;Markku Leskelä;Lauri Niinistö;Thomas Prohaska

  • Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition

    Mato Knez;Kornelius Nielsch;Lauri Niinistoe

Frequent Co-Authors

Markku Leskelä
Markku Leskelä University of Helsinki
Matti Putkonen
Matti Putkonen University of Helsinki
Maarit Karppinen
Maarit Karppinen Aalto University
Stenbjörn Styring
Stenbjörn Styring Uppsala University
Mikko Ritala
Mikko Ritala University of Helsinki
Kaupo Kukli
Kaupo Kukli University of Tartu
Timo Sajavaara
Timo Sajavaara University of Jyväskylä
Francesco Salvatore
Francesco Salvatore University of Naples Federico II
Leena-Sisko Johansson
Leena-Sisko Johansson Aalto University
Aline Auroux
Aline Auroux Claude Bernard University Lyon 1

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