World's Best Scientists 2026 revealed!
Soo-Hyun Kim

Soo-Hyun Kim

D-Index & Metrics

Materials Science

D-Index
46
Citations
7966
World Ranking
11448
National Ranking
508

Overview

Soo-Hyun Kim is affiliated with Yeungnam University in South Korea and has contributed extensively to the fields of Engineering and Materials Science. Their research focuses primarily on Electrical and Electronic Engineering, Materials Chemistry, and specialization areas such as Electronic, Optical and Magnetic Materials, Renewable Energy, Sustainability and the Environment, and Biomedical Engineering.

The scientist's main research topics cover a range of advanced material science and energy-related fields including:

  • Semiconductor materials and devices
  • Electrocatalysts for Energy Conversion
  • Copper Interconnects and Reliability
  • Supercapacitor Materials and Fabrication
  • MXene and MAX Phase Materials
  • Advancements in Battery Materials
  • Advanced battery technologies research

Soo-Hyun Kim has published numerous papers, with recent notable titles including:

  • "A review on metal-organic frameworks for the removal of hazardous environmental contaminants" (2022), published in Separation and Purification Technology
  • "Fundamentals and recent progress of Sn-based electrode materials for supercapacitors: A comprehensive review" (2022), published in Journal of Energy Storage
  • "Atomically dispersed iridium catalysts on silicon photoanode for efficient photoelectrochemical water splitting" (2023), published in Nature Communications
  • "Atomic Layer Deposition-A Versatile Toolbox for Designing/Engineering Electrodes for Advanced Supercapacitors" (2023), published in Advanced Science
  • "Atomic Layer Deposition of Ru for Replacing Cu-Interconnects" (2021), published in Chemistry of Materials

The scientist frequently publishes in several well-regarded journals, including:

  • Applied Surface Science
  • Advanced Science
  • Chemistry of Materials
  • The Cambridge Structural Database
  • SSRN Electronic Journal

Collaboration is a noticeable aspect of their work, with frequent coauthors being:

  • Mohd Zahid Ansari
  • Dip K. Nandi
  • Debananda Mohapatra
  • Taehoon Cheon
  • Rahul Ramesh

The collective body of work reflects a broad engagement with advancing material applications and energy technologies, especially focusing on electrode materials, interconnect reliability, and environmental contaminant removal strategies. Soo-Hyun Kim's expertise contributes to diversified areas within engineering and materials science, marking a consistent presence in contemporary scientific literature.

Best Publications

  • Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition

    Jeong Gyu Song;Jusang Park;Wonseon Lee;Taejin Choi

  • Structural and Electrical Properties of Atomic Layer Deposited Al-Doped ZnO Films

    Do Joong Lee;Hyun Mi Kim;Jang Yeon Kwon;Hyoji Choi

  • Synthesis, Structure, and Ethanol Gas Sensing Properties of In2O3 Nanorods Decorated with Bi2O3 Nanoparticles.

    Sunghoon Park;Soohyun Kim;Gun-Joo Sun;Chongmu Lee

  • Acetone sensing of Au and Pd-decorated WO3 nanorod sensors

    Soohyun Kim;Sunghoon Park;Suyoung Park;Chongmu Lee

  • Remarkable progress in thin-film silicon solar cells using high-efficiency triple-junction technology

    Soohyun Kim;Jin-Won Chung;Hyun Lee;Jinhee Park

  • Wafer-scale growth of MoS2 thin films by atomic layer deposition

    Jung Joon Pyeon;Jung Joon Pyeon;Soo Hyun Kim;Doo Seok Jeong;Doo Seok Jeong;Seung Hyub Baek;Seung Hyub Baek

  • Synthesis of carbon nanotube–nickel nanocomposites using atomic layer deposition for high-performance non-enzymatic glucose sensing

    Taejin Choi;Soo Hyeon Kim;Chang Wan Lee;Hangil Kim

  • Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate

    Seung-Chul Ha;Eunsuk Choi;Soo-Hyun Kim;Jae Sung Roh

  • Role of the Interfaces in Multiple Networked One-Dimensional Core–Shell Nanostructured Gas Sensors

    Sunghoon Park;Hyunsung Ko;Soohyun Kim;Chongmu Lee

  • Oxidizing gas sensing properties of the n-ZnO/p-Co3O4 composite nanoparticle network sensor

    Sunghoon Park;Soohyun Kim;Hyejoon Kheel;Chongmu Lee

  • Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition

    Yujin Jang;Seungmin Yeo;Han Bo Ram Lee;Hyungjun Kim

  • Dual Functional Sensing Mechanism in SnO2–ZnO Core–Shell Nanowires

    Sun-Woo Choi;Akash Katoch;Gun-Joo Sun;Jae-Hun Kim

  • Highly Uniform Atomic Layer-Deposited MoS2@3D-Ni-Foam: A Novel Approach To Prepare an Electrode for Supercapacitors

    Dip K. Nandi;Sumanta Sahoo;Soumyadeep Sinha;Seungmin Yeo

  • Influence of deposition conditions on the microstructure and mechanical properties of Ti–Si–N films by DC reactive magnetron sputtering

    Unknown

  • Layer-modulated synthesis of uniform tungsten disulfide nanosheet using gas-phase precursors

    Jusang Park;Wonseon Lee;Taejin Choi;Sung Hwan Hwang

  • Enhanced H2S gas sensing performance of networked CuO-ZnO composite nanoparticle sensor

    Sunghoon Park;Soohyun Kim;Hyejoon Kheel;Soong Keun Hyun

  • Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition

    Sung-Soo Yim;Do-Joong Lee;Ki-Su Kim;Soo-Hyun Kim

  • Enhanced activity of highly conformal and layered tin sulfide (SnS x ) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode

    Mohd Zahid Ansari;Nazish Parveen;Dip K. Nandi;Rahul Ramesh

  • Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O2

    Tae Kwang Eom;Windu Sari;Kyu Jeong Choi;Woong Chul Shin

  • Atomic-layer-deposited WNxCy thin films as diffusion barrier for copper metallization

    Soo-Hyun Kim;Su Suk Oh;Ki-Bum Kim;Dae-Hwan Kang

  • Chemiresistive sensing behavior of SnO2 (n)-Cu2O (p) core-shell nanowires.

    Jae-Hun Kim;Akash Katoch;Soo-Hyun Kim;Sang Sub Kim

  • Atomic layer deposited molybdenum disulfide on Si photocathodes for highly efficient photoelectrochemical water reduction reaction

    Seungtaeg Oh;Jun Beom Kim;Jun Tae Song;Jihun Oh

  • Characterization of Atomic Layer Deposited WN x C y Thin Film as a Diffusion Barrier for Copper Metallization

    Soo-Hyun Kim;Su Suk Oh;Hyun-Mi Kim;Dae-Hwan Kang

Frequent Co-Authors

Chongmu Lee
Chongmu Lee Inha University
Ki-Bum Kim
Ki-Bum Kim Seoul National University
Jihun Oh
Jihun Oh Korea Advanced Institute of Science and Technology
Jang-Yeon Kwon
Jang-Yeon Kwon Yonsei University
Jae Min Myoung
Jae Min Myoung Yonsei University
Wan In Lee
Wan In Lee Inha University
Ki Tae Nam
Ki Tae Nam Seoul National University
Jimmy Xu
Jimmy Xu Brown University
Seongil Im
Seongil Im Yonsei University
Hyungjun Kim
Hyungjun Kim Yonsei University

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Best Scientists Citing Soo-Hyun Kim

Trending Scientists