World's Best Scientists 2026 revealed!
Soo-Hyun Kim

Soo-Hyun Kim

D-Index & Metrics

Materials Science

D-Index
46
Citations
7966
World Ranking
11446
National Ranking
508

Soo-Hyun Kim publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Soo-Hyun Kim sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 250 publications — 47th percentile

47% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Soo-Hyun Kim D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Soo-Hyun Kim sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 46 D-Index — 12th percentile

12% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Soo-Hyun Kim is affiliated with Yeungnam University in South Korea and has contributed extensively to the fields of Engineering and Materials Science. Their research focuses primarily on Electrical and Electronic Engineering, Materials Chemistry, and specialization areas such as Electronic, Optical and Magnetic Materials, Renewable Energy, Sustainability and the Environment, and Biomedical Engineering.

The scientist's main research topics cover a range of advanced material science and energy-related fields including:

  • Semiconductor materials and devices
  • Electrocatalysts for Energy Conversion
  • Copper Interconnects and Reliability
  • Supercapacitor Materials and Fabrication
  • MXene and MAX Phase Materials
  • Advancements in Battery Materials
  • Advanced battery technologies research

Soo-Hyun Kim has published numerous papers, with recent notable titles including:

  • "A review on metal-organic frameworks for the removal of hazardous environmental contaminants" (2022), published in Separation and Purification Technology
  • "Fundamentals and recent progress of Sn-based electrode materials for supercapacitors: A comprehensive review" (2022), published in Journal of Energy Storage
  • "Atomically dispersed iridium catalysts on silicon photoanode for efficient photoelectrochemical water splitting" (2023), published in Nature Communications
  • "Atomic Layer Deposition-A Versatile Toolbox for Designing/Engineering Electrodes for Advanced Supercapacitors" (2023), published in Advanced Science
  • "Atomic Layer Deposition of Ru for Replacing Cu-Interconnects" (2021), published in Chemistry of Materials

The scientist frequently publishes in several well-regarded journals, including:

  • Applied Surface Science
  • Advanced Science
  • Chemistry of Materials
  • The Cambridge Structural Database
  • SSRN Electronic Journal

Collaboration is a noticeable aspect of their work, with frequent coauthors being:

  • Mohd Zahid Ansari
  • Dip K. Nandi
  • Debananda Mohapatra
  • Taehoon Cheon
  • Rahul Ramesh

The collective body of work reflects a broad engagement with advancing material applications and energy technologies, especially focusing on electrode materials, interconnect reliability, and environmental contaminant removal strategies. Soo-Hyun Kim's expertise contributes to diversified areas within engineering and materials science, marking a consistent presence in contemporary scientific literature.

Best Publications

  • Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition

    Jeong Gyu Song;Jusang Park;Wonseon Lee;Taejin Choi

  • Structural and Electrical Properties of Atomic Layer Deposited Al-Doped ZnO Films

    Do Joong Lee;Hyun Mi Kim;Jang Yeon Kwon;Hyoji Choi

  • Synthesis, Structure, and Ethanol Gas Sensing Properties of In2O3 Nanorods Decorated with Bi2O3 Nanoparticles.

    Sunghoon Park;Soohyun Kim;Gun-Joo Sun;Chongmu Lee

  • Acetone sensing of Au and Pd-decorated WO3 nanorod sensors

    Soohyun Kim;Sunghoon Park;Suyoung Park;Chongmu Lee

  • Remarkable progress in thin-film silicon solar cells using high-efficiency triple-junction technology

    Soohyun Kim;Jin-Won Chung;Hyun Lee;Jinhee Park

  • Wafer-scale growth of MoS2 thin films by atomic layer deposition

    Jung Joon Pyeon;Jung Joon Pyeon;Soo Hyun Kim;Doo Seok Jeong;Doo Seok Jeong;Seung Hyub Baek;Seung Hyub Baek

  • Synthesis of carbon nanotube–nickel nanocomposites using atomic layer deposition for high-performance non-enzymatic glucose sensing

    Taejin Choi;Soo Hyeon Kim;Chang Wan Lee;Hangil Kim

  • Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate

    Seung-Chul Ha;Eunsuk Choi;Soo-Hyun Kim;Jae Sung Roh

  • Role of the Interfaces in Multiple Networked One-Dimensional Core–Shell Nanostructured Gas Sensors

    Sunghoon Park;Hyunsung Ko;Soohyun Kim;Chongmu Lee

  • Oxidizing gas sensing properties of the n-ZnO/p-Co3O4 composite nanoparticle network sensor

    Sunghoon Park;Soohyun Kim;Hyejoon Kheel;Chongmu Lee

  • Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition

    Yujin Jang;Seungmin Yeo;Han Bo Ram Lee;Hyungjun Kim

  • Dual Functional Sensing Mechanism in SnO2–ZnO Core–Shell Nanowires

    Sun-Woo Choi;Akash Katoch;Gun-Joo Sun;Jae-Hun Kim

  • Highly Uniform Atomic Layer-Deposited MoS2@3D-Ni-Foam: A Novel Approach To Prepare an Electrode for Supercapacitors

    Dip K. Nandi;Sumanta Sahoo;Soumyadeep Sinha;Seungmin Yeo

  • Influence of deposition conditions on the microstructure and mechanical properties of Ti–Si–N films by DC reactive magnetron sputtering

    Unknown

  • Layer-modulated synthesis of uniform tungsten disulfide nanosheet using gas-phase precursors

    Jusang Park;Wonseon Lee;Taejin Choi;Sung Hwan Hwang

  • Enhanced H2S gas sensing performance of networked CuO-ZnO composite nanoparticle sensor

    Sunghoon Park;Soohyun Kim;Hyejoon Kheel;Soong Keun Hyun

  • Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition

    Sung-Soo Yim;Do-Joong Lee;Ki-Su Kim;Soo-Hyun Kim

  • Enhanced activity of highly conformal and layered tin sulfide (SnS x ) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode

    Mohd Zahid Ansari;Nazish Parveen;Dip K. Nandi;Rahul Ramesh

  • Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O2

    Tae Kwang Eom;Windu Sari;Kyu Jeong Choi;Woong Chul Shin

  • Atomic-layer-deposited WNxCy thin films as diffusion barrier for copper metallization

    Soo-Hyun Kim;Su Suk Oh;Ki-Bum Kim;Dae-Hwan Kang

  • Chemiresistive sensing behavior of SnO2 (n)-Cu2O (p) core-shell nanowires.

    Jae-Hun Kim;Akash Katoch;Soo-Hyun Kim;Sang Sub Kim

  • Atomic layer deposited molybdenum disulfide on Si photocathodes for highly efficient photoelectrochemical water reduction reaction

    Seungtaeg Oh;Jun Beom Kim;Jun Tae Song;Jihun Oh

  • Characterization of Atomic Layer Deposited WN x C y Thin Film as a Diffusion Barrier for Copper Metallization

    Soo-Hyun Kim;Su Suk Oh;Hyun-Mi Kim;Dae-Hwan Kang

Frequent Co-Authors

Chongmu Lee
Chongmu Lee Inha University
Ki-Bum Kim
Ki-Bum Kim Seoul National University
Jihun Oh
Jihun Oh Korea Advanced Institute of Science and Technology
Jang-Yeon Kwon
Jang-Yeon Kwon Yonsei University
Jae Min Myoung
Jae Min Myoung Yonsei University
Wan In Lee
Wan In Lee Inha University
Ki Tae Nam
Ki Tae Nam Seoul National University
Jimmy Xu
Jimmy Xu Brown University
Seongil Im
Seongil Im Yonsei University
Hyungjun Kim
Hyungjun Kim Yonsei University

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