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R. Stanley Williams

R. Stanley Williams

D-Index & Metrics

Materials Science

D-Index
113
Citations
70173
World Ranking
621
National Ranking
218

R. Stanley Williams publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where R. Stanley Williams sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 621 publications — 93rd percentile

93% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

R. Stanley Williams D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where R. Stanley Williams sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 113 D-Index — 95th percentile

95% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

R. Stanley Williams is affiliated with Texas A&M University in the United States and has focused their research on the field of Engineering, with particular emphasis on Electrical and Electronic Engineering. Their work spans several subfields including Cellular and Molecular Neuroscience, Materials Chemistry, Polymers and Plastics, and Cognitive Neuroscience.

The primary research topics explored by Williams include Advanced Memory and Neural Computing, Ferroelectric and Negative Capacitance Devices, Neuroscience and Neural Engineering, Neural dynamics and brain function, Photoreceptor and optogenetics research, Transition Metal Oxide Nanomaterials, and Neural Networks and Reservoir Computing.

Williams has contributed to a number of recent papers, notable examples include:

  • Third-order nanocircuit elements for neuromorphic engineering, 2020, Nature
  • Decision trees within a molecular memristor, 2021, Nature
  • Charge disproportionate molecular redox for discrete memristive and memcapacitive switching, 2020, Nature Nanotechnology
  • Activity-difference training of deep neural networks using memristor crossbars, 2022, Nature Electronics
  • Physics-based compact modeling of electro-thermal memristors: Negative differential resistance, local activity, and non-local dynamical bifurcations, 2022, Applied Physics Reviews

Their frequent co-authors comprise a team of researchers consistently collaborating across multiple projects. The most common co-authors include:

  • Suhas Kumar
  • Sreebrata Goswami
  • T. Venkatesan
  • Sreetosh Goswami
  • Su-in Yi

Williams has published extensively in several venues, with repeated contributions to:

  • Advanced Materials
  • Nature
  • Advanced Electronic Materials
  • 2022 IEEE International Symposium on Circuits and Systems (ISCAS)
  • The Cambridge Structural Database

Their body of work predominantly centers on developing novel approaches to memory and neural computing systems, including neuromorphic engineering and molecular memristors. Additionally, contributions investigating the physics of memristors suggest an interdisciplinary approach that intersects materials science, electronics, and neuroscience.

Best Publications

  • The missing memristor found

    Dmitri B. Strukov;Gregory S. Snider;Duncan R. Stewart;R. Stanley Williams

  • Memristive switching mechanism for metal/oxide/metal nanodevices.

    J. Joshua Yang;Matthew D. Pickett;Xuema Li;Douglas A. A. Ohlberg

  • Electronically Configurable Molecular-Based Logic Gates

    C. P. Collier;E. W. Wong;M. Belohradský;F. M. Raymo

  • Memristors with diffusive dynamics as synaptic emulators for neuromorphic computing

    Zhongrui Wang;Saumil Joshi;Sergey E. Savel’ev;Hao Jiang

  • ‘Memristive’ switches enable ‘stateful’ logic operations via material implication

    Julien Borghetti;Gregory S. Snider;Philip J. Kuekes;J. Joshua Yang

  • Analogue signal and image processing with large memristor crossbars

    Can Li;Miao Hu;Miao Hu;Yunning Li;Hao Jiang

  • A scalable neuristor built with Mott memristors

    Matthew D. Pickett;Gilberto Medeiros-Ribeiro;R. Stanley Williams

  • The mechanism of electroforming of metal oxide memristive switches

    J Joshua Yang;Feng Miao;Matthew D Pickett;Douglas A A Ohlberg

  • Shape Transition of Germanium Nanocrystals on a Silicon (001) Surface from Pyramids to Domes

    Gilberto Medeiros-Ribeiro;Alexander M. Bratkovski;Theodore I. Kamins;Douglas A. A. Ohlberg

  • Sequence-Specific Label-Free DNA Sensors Based on Silicon Nanowires

    Z. Li;Y. Chen;X. Li;T. I. Kamins

  • Nanoscale molecular-switch crossbar circuits

    Yong Chen;Gun Young Jung;Douglas A A Ohlberg;Xuema Li

  • Switching dynamics in titanium dioxide memristive devices

    Matthew D. Pickett;Dmitri B. Strukov;Julien L. Borghetti;J. Joshua Yang

  • Efficient and self-adaptive in-situ learning in multilayer memristor neural networks

    Can Li;Daniel Belkin;Daniel Belkin;Yunning Li;Peng Yan;Peng Yan

  • Sub-nanosecond switching of a tantalum oxide memristor

    Antonio C Torrezan;John Paul Strachan;Gilberto Medeiros-Ribeiro;R Stanley Williams

  • Memristor―CMOS Hybrid Integrated Circuits for Reconfigurable Logic

    Qiangfei Xia;Warren Robinett;Michael W. Cumbie;Neel Banerjee

  • High switching endurance in TaOx memristive devices

    J. Joshua Yang;M.-X. Zhang;John Paul Strachan;Feng Miao

  • Memristor-Based Analog Computation and Neural Network Classification with a Dot Product Engine.

    Miao Hu;Catherine E. Graves;Can Li;Yunning Li

  • Dot-product engine for neuromorphic computing: programming 1T1M crossbar to accelerate matrix-vector multiplication

    Miao Hu;John Paul Strachan;Zhiyong Li;Emmanuelle M. Grafals

  • Exponential ionic drift: fast switching and low volatility of thin-film memristors

    Dmitri B. Strukov;R. Stanley Williams

  • Nano/CMOS architectures using a field-programmable nanowire interconnect

    Gregory S Snider;R Stanley Williams

  • Erratum: The missing memristor found

    Dmitri B. Strukov;Gregory S. Snider;Duncan R. Stewart;R. Stanley Williams

Frequent Co-Authors

J. Joshua Yang
J. Joshua Yang University of Southern California
Zhiyong Li
Zhiyong Li Chinese Academy of Sciences
John Paul Strachan
John Paul Strachan Hewlett-Packard (United States)
Wei Wu
Wei Wu Wuhan University
Theodore I. Kamins
Theodore I. Kamins Stanford University
Gilberto Medeiros-Ribeiro
Gilberto Medeiros-Ribeiro Universidade Federal de Minas Gerais
Philip J. Kuekes
Philip J. Kuekes Hewlett-Packard (United States)
Matthew D. Pickett
Matthew D. Pickett Hewlett-Packard (United States)
Yong Chen
Yong Chen University of California, Los Angeles
Feng Miao
Feng Miao Nanjing University

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