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Materials Science

D-Index
60
Citations
17358
World Ranking
6940
National Ranking
371

Overview

Hiroshi Funakubo is affiliated with the Tokyo Institute of Technology in Japan and conducts research primarily in the fields of Engineering and Materials Science. Their work spans a significant number of publications, with major concentrations in Materials Chemistry and Electrical and Electronic Engineering as notable subfields of study.

The research topics covered by Funakubo's work include a focus on Ferroelectric and Piezoelectric Materials, Acoustic Wave Resonator Technologies, and Ferroelectric and Negative Capacitance Devices. Other relevant topics in their portfolio are Semiconductor Materials and Devices, Multiferroics and Related Materials, Force Microscopy Techniques and Applications, and MXene and MAX Phase Materials.

Frequent co-authors in Funakubo's research include Takao Shimizu, K. Okamoto, Takahisa Shiraishi, Sergei V. Kalinin, and Takanori Mimura, reflecting collaborative efforts across various studies.

Funakubo has published regularly in several academic venues. The most frequent publication outlets include:

  • Japanese Journal of Applied Physics
  • Journal of the Ceramic Society of Japan
  • arXiv (Cornell University)
  • Applied Physics Letters
  • Journal of Applied Physics

Among the recent papers authored under Funakubo's work are:

  • "Effects of deposition conditions on the ferroelectric properties of (Al1−xScx)N thin films" (2020, Journal of Applied Physics)
  • "Roadmap on ferroelectric hafnia- and zirconia-based materials and devices" (2023, APL Materials)
  • "Experimental discovery of structure-property relationships in ferroelectric materials via active learning" (2022, Nature Machine Intelligence)
  • "Effect of Film Microstructure on Domain Nucleation and Intrinsic Switching in Ferroelectric Y:HfO2 Thin Film Capacitors" (2021, Advanced Functional Materials)
  • "Thickness scaling of (Al0.8Sc0.2)N films with remanent polarization beyond 100 μC cm−2 around 10 nm in thickness" (2021, Applied Physics Express)

Best Publications

  • Dimensionality-controlled insulator-metal transition and correlated metallic state in 5d transition metal oxides Sr n+1Ir nO3n+1 (n=1, 2, and infinity)

    S. J. Moon;H. Jin;Kyung Wan Kim;W. S. Choi

  • Stabilizing the ferroelectric phase in doped hafnium oxide

    M. Hoffmann;U. Schroeder;T. Schenk;T. Shimizu

  • Large remanent polarization of (Bi, Nd)4Ti3O12 epitaxial thin films grown by metalorganic chemical vapor deposition

    Takashi Kojima;Tomohiro Sakai;Takayuki Watanabe;Hiroshi Funakubo

  • Crystal structure and ferroelectric properties of rare-earth substituted BiFeO3 thin films

    Hiroshi Uchida;Risako Ueno;Hiroshi Funakubo;Seiichiro Koda

  • Origin of giant negative piezoelectricity in a layered van der Waals ferroelectric

    Lu You;Lu You;Yang Zhang;Shuang Zhou;Shuang Zhou;Apoorva Chaturvedi

  • Impact of mechanical stress on ferroelectricity in (Hf0.5Zr0.5)O2 thin films

    Takahisa Shiraishi;Takahisa Shiraishi;Kiliha Katayama;Tatsuhiko Yokouchi;Takao Shimizu

  • Effect of cosubstitution of La and V in Bi4Ti3O12 thin films on the low-temperature deposition

    Takayuki Watanabe;Hiroshi Funakubo;Minoru Osada;Yuji Noguchi

  • High-κ Dielectric Nanofilms Fabricated from Titania Nanosheets

    Minoru Osada;Yasuo Ebina;Hiroshi Funakubo;Shintaro Yokoyama

  • The demonstration of significant ferroelectricity in epitaxial Y-doped HfO2 film

    Takao Shimizu;Kiliha Katayama;Takanori Kiguchi;Akihiro Akama

  • Effects of deposition conditions on the ferroelectric properties of (Al1−xScx)N thin films

    Shinnosuke Yasuoka;Takao Shimizu;Takao Shimizu;Akinori Tateyama;Masato Uehara

  • Approach for enhanced polarization of polycrystalline bismuth titanate films by Nd3+/V5+ cosubstitution

    Hiroshi Uchida;Hiroki Yoshikawa;Isao Okada;Hirofumi Matsuda

  • Cation Distribution and Structural Instability in Bi4-xLaxTi3O12

    Minoru Osada;Masaru Tada;Masato Kakihana;Takayuki Watanabe

  • Robust high-κ response in molecularly thin perovskite nanosheets.

    Minoru Osada;Kosho Akatsuka;Yasuo Ebina;Hiroshi Funakubo

  • Engineered interfaces of artificial perovskite oxide superlattices via nanosheet deposition process.

    Bao Wen Li;Minoru Osada;Tadashi C. Ozawa;Yasuo Ebina

  • Epitaxial BiFeO3 thin films fabricated by chemical solution deposition

    S. K. Singh;Y. K. Kim;H. Funakubo;H. Ishiwara

  • Growth of epitaxial orthorhombic YO1.5-substituted HfO2 thin film

    Takao Shimizu;Kiliha Katayama;Takanori Kiguchi;Akihiro Akama

  • Dependence of electrical properties of epitaxial Pb(Zr,Ti)O3 thick films on crystal orientation and Zr∕(Zr+Ti) ratio

    Shintaro Yokoyama;Yoshihisa Honda;Hitoshi Morioka;Shoji Okamoto

  • Preparation and characterization of a- and b-axis-oriented epitaxially grown Bi4Ti3O12-based thin films with long-range lattice matching

    Takayuki Watanabe;Hiroshi Funakubo;Keisuke Saito;Toshimasa Suzuki

  • Highly-conducting indiumtin-oxide transparent films fabricated by spray CVD using ethanol solution of indium (III) chloride and tin (II) chloride

    Yutaka Sawada;Chikako Kobayashi;Shigeyuki Seki;Hiroshi Funakubo

  • Large remanent polarization of Bi4Ti3O12-based thin films modified by the site engineering technique

    Takayuki Watanabe;Takashi Kojima;Tomohiro Sakai;Hiroshi Funakubo

Frequent Co-Authors

Takao Shimizu
Takao Shimizu University of Tokyo
Takayuki Watanabe
Takayuki Watanabe Kyushu University
Osami Sakata
Osami Sakata Japan Synchrotron Radiation Research Institute
Minoru Kurosawa
Minoru Kurosawa Tokyo Institute of Technology
Nobuyasu Mizutani
Nobuyasu Mizutani Tokyo Institute of Technology
Minoru Osada
Minoru Osada Nagoya University
Hiroshi Ishiwara
Hiroshi Ishiwara Tokyo Institute of Technology
Nava Setter
Nava Setter École Polytechnique Fédérale de Lausanne
Stephen Jesse
Stephen Jesse Oak Ridge National Laboratory
Sergei V. Kalinin
Sergei V. Kalinin University of Tennessee at Knoxville

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