World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
67
Citations
13210
World Ranking
1110
National Ranking
465

Marty R. Shaneyfelt publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Marty R. Shaneyfelt sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 249 publications — 44th percentile

44% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Marty R. Shaneyfelt D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Marty R. Shaneyfelt sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 67 D-Index — 85th percentile

85% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Research.com Recognitions

  • 2002 - IEEE Fellow For contributions to the understanding of radiation effects in semiconductor devices and to the development of radiation-hardened technologies.

Overview

What is he best known for?

The fields of study he is best known for:

  • Electron
  • Semiconductor
  • Electrical engineering

The scientist’s investigation covers issues in Optoelectronics, Irradiation, Electrical engineering, Silicon on insulator and Electronic engineering. The Optoelectronics study combines topics in areas such as Transistor, Gate oxide and Capacitor. His Irradiation research includes elements of Molecular physics, Atomic physics, MOSFET, Radiation and Electron.

His work deals with themes such as Electronic circuit, Single event upset, Transient, Threshold voltage and Proton, which intersect with Silicon on insulator. His Electronic engineering research focuses on subjects like Integrated circuit, which are linked to Ion implantation, Shallow trench isolation, Temperature cycling and Space charge. His studies deal with areas such as Radiation hardening, Scaling and Static random-access memory as well as CMOS.

His most cited work include:

  • Radiation Effects in MOS Oxides (439 citations)
  • Effects of oxide traps, interface traps, and ‘‘border traps’’ on metal‐oxide‐semiconductor devices (368 citations)
  • Radiation effects in SOI technologies (315 citations)

What are the main themes of his work throughout his whole career to date?

Marty R. Shaneyfelt mostly deals with Optoelectronics, Irradiation, Electronic engineering, Electrical engineering and Transistor. His biological study spans a wide range of topics, including Radiation hardening, Radiation and MOSFET. His work carried out in the field of Irradiation brings together such families of science as Analytical chemistry, Molecular physics, Dielectric, Atomic physics and Proton.

He has researched Electronic engineering in several fields, including Stress and Wafer. His work on Capacitor and Voltage as part of general Electrical engineering research is often related to Upset, thus linking different fields of science. His Transistor study combines topics from a wide range of disciplines, such as Impact ionization and Leakage.

He most often published in these fields:

  • Optoelectronics (51.27%)
  • Irradiation (30.08%)
  • Electronic engineering (23.31%)

What were the highlights of his more recent work (between 2010-2019)?

  • Optoelectronics (51.27%)
  • Atomic physics (11.86%)
  • Electronic engineering (23.31%)

In recent papers he was focusing on the following fields of study:

His main research concerns Optoelectronics, Atomic physics, Electronic engineering, Irradiation and Silicon on insulator. His Optoelectronics research is mostly focused on the topic Diode. His Atomic physics research is multidisciplinary, incorporating perspectives in Threshold voltage, Ionization, Proton and Non-volatile memory.

Marty R. Shaneyfelt combines subjects such as Radiation hardening, Heavy ion and Integrated circuit with his study of Electronic engineering. The concepts of his Irradiation study are interwoven with issues in Thermal conduction and Nanotechnology. His Silicon on insulator research incorporates themes from Single event upset, Static random-access memory and Laser.

Between 2010 and 2019, his most popular works were:

  • Radiation Hardness Assurance Testing of Microelectronic Devices and Integrated Circuits: Radiation Environments, Physical Mechanisms, and Foundations for Hardness Assurance (106 citations)
  • Initial Assessment of the Effects of Radiation on the Electrical Characteristics of ${ m TaO}_{ m x}$ Memristive Memories (55 citations)
  • Radiation Hardness Assurance Testing of Microelectronic Devices and Integrated Circuits: Test Guideline for Proton and Heavy Ion Single-Event Effects (47 citations)

In his most recent research, the most cited papers focused on:

  • Electron
  • Semiconductor
  • Integrated circuit

Marty R. Shaneyfelt spends much of his time researching Atomic physics, Upset, Radiation hardening, Irradiation and Radiation. His study looks at the relationship between Atomic physics and topics such as Proton, which overlap with Silicon on insulator, Ionization and Electronic circuit. His Radiation hardening study combines topics in areas such as Integrated circuit, Microelectronics, Dielectric strength, MOSFET and Electronic engineering.

His research integrates issues of Nanotechnology, Optoelectronics, Doping, Logic gate and Threshold voltage in his study of Irradiation. His research in Optoelectronics intersects with topics in Power MOSFET, Failure rate, Space technology, Electrical engineering and Gate oxide. His work deals with themes such as Thermal conduction and Transistor, which intersect with Static random-access memory.

Best Publications

  • Effects of oxide traps, interface traps, and ‘‘border traps’’ on metal‐oxide‐semiconductor devices

    D. M. Fleetwood;P. S. Winokur;R. A. Reber;T. L. Meisenheimer

  • Radiation effects in SOI technologies

    J.R. Schwank;V. Ferlet-Cavrois;M.R. Shaneyfelt;P. Paillet

  • Production and propagation of single-event transients in high-speed digital logic ICs

    P.E. Dodd;M.R. Shaneyfelt;J.A. Felix;J.R. Schwank

  • Current and Future Challenges in Radiation Effects on CMOS Electronics

    P E Dodd;M R Shaneyfelt;J R Schwank;J A Felix

  • Challenges in hardening technologies using shallow-trench isolation

    M.R. Shaneyfelt;P.E. Dodd;B.L. Draper;R.S. Flores

  • Charge yield for cobalt-60 and 10-keV X-ray irradiations of MOS devices

    M.R. Shaneyfelt;D.M. Fleetwood;J.R. Schwank;K.L. Hughes

  • Border traps: issues for MOS radiation response and long-term reliability

    D.M. Fleetwood;M.R. Shaneyfelt;W.L. Warren;J.R. Schwank

  • Radiation Hardness Assurance Testing of Microelectronic Devices and Integrated Circuits: Radiation Environments, Physical Mechanisms, and Foundations for Hardness Assurance

    J. R. Schwank;M. R. Shaneyfelt;P. E. Dodd

  • Non-volatile memory device based on mobile protons in SiO 2 thin films

    K. Vanheusden;W. L. Warren;R. A. B. Devine;D. M. Fleetwood

  • Statistical Analysis of the Charge Collected in SOI and Bulk Devices Under Heavy lon and Proton Irradiation—Implications for Digital SETs

    V. Ferlet-Cavrois;P. Paillet;M. Gaillardin;D. Lambert

  • Single-Event Upsets and Multiple-Bit Upsets on a 45 nm SOI SRAM

    D.F. Heidel;P.W. Marshall;J.A. Pellish;K.P. Rodbell

  • Field dependence of interface-trap buildup in polysilicon and metal gate MOS devices

    M.R. Shaneyfelt;J.R. Schwank;D.M. Fleetwood;P.S. Winokur

  • Mechanisms for radiation dose-rate sensitivity of bipolar transistors

    H.P. Hjalmarson;R.L. Pease;S.C. Witczak;M.R. Shaneyfelt

  • Impact of technology trends on SEU in CMOS SRAMs

    P.E. Dodd;F.W. Sexton;G.L. Hash;M.R. Shaneyfelt

  • Worst-case bias during total dose irradiation of SOI transistors

    V. Ferlet-Cavrois;T. Colladant;P. Paillet;J.L. Leray

  • Low Energy Proton Single-Event-Upset Test Results on 65 nm SOI SRAM

    D.F. Heidel;P.W. Marshall;K.A. LaBel;J.R. Schwank

  • New Insights Into Single Event Transient Propagation in Chains of Inverters—Evidence for Propagation-Induced Pulse Broadening

    V. Ferlet-Cavrois;P. Paillet;D. McMorrow;N. Fel

  • Microscopic nature of border traps in MOS oxides

    W.L. Warren;M.R. Shaneyfelt;D.M. Fleetwood;J.R. Schwank

  • New insights into radiation-induced oxide-trap charge through thermally-stimulated-current measurement and analysis (MOS capacitors)

    D.M. Fleetwood;S.L. Miller;R.A. Reber;P.J. McWhorter

  • Impact of Ion Energy and Species on Single Event Effects Analysis

    R.A. Reed;R.A. Weller;M.H. Mendenhall;J.-M. Lauenstein

  • Effects of interface traps and border traps on MOS postirradiation annealing response

    D.M. Fleetwood;W.L. Warren;J.R. Schwank;P.S. Winokur

Frequent Co-Authors

J.R. Schwank
J.R. Schwank Sandia National Laboratories
Paul E. Dodd
Paul E. Dodd Sandia National Laboratories
Daniel M. Fleetwood
Daniel M. Fleetwood Vanderbilt University
P.S. Winokur
P.S. Winokur Sandia National Laboratories
P. Paillet
P. Paillet French Alternative Energies and Atomic Energy Commission (CEA)
William L. Warren
William L. Warren Sanofi Pasteur
Ronald D. Schrimpf
Ronald D. Schrimpf Vanderbilt University
F.W. Sexton
F.W. Sexton Sandia National Laboratories
R.L. Pease
R.L. Pease Independent Scientist / Consultant, US
Robert A. Reed
Robert A. Reed Vanderbilt University

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