The scientist’s investigation covers issues in Optoelectronics, Electrical engineering, MOSFET, Dielectric and Silicon. His Optoelectronics research is multidisciplinary, incorporating elements of Equivalent oxide thickness, Electrode, Gate dielectric, Threshold voltage and Electronic engineering. His Gate dielectric research includes themes of High-κ dielectric, Metal gate and Passivation.
Voltage and Transistor are among the areas of Electrical engineering where Ming-Fu Li concentrates his study. Ming-Fu Li interconnects Electron mobility, CMOS and Gate oxide in the investigation of issues within MOSFET. His biological study spans a wide range of topics, including Capacitance, Wafer and Capacitor.
Ming-Fu Li mostly deals with Optoelectronics, MOSFET, Electrical engineering, Condensed matter physics and Dielectric. Ming-Fu Li combines subjects such as Transistor, Gate dielectric, Metal gate and Electronic engineering with his study of Optoelectronics. His MOSFET research also works with subjects such as
His Electrical engineering study integrates concerns from other disciplines, such as Substrate and Silicon. In his research, Quantization is intimately related to Effective mass, which falls under the overarching field of Condensed matter physics. He focuses mostly in the field of Dielectric, narrowing it down to topics relating to Capacitor and, in certain cases, Capacitance and Insulator.
His primary scientific interests are in Optoelectronics, Electrical engineering, Dielectric, MOSFET and Gate dielectric. He has researched Optoelectronics in several fields, including Field-effect transistor, Transistor and Logic gate. His Electrical engineering research incorporates themes from Stress, Acceptor, Electrode and Gallium arsenide.
His biological study spans a wide range of topics, including Leakage, Voltage, Capacitor and Microelectronics. His MOSFET research incorporates elements of Threshold voltage, High-κ dielectric and Atomic physics. His Gate dielectric research includes elements of Molecular physics, Phase and Gate oxide.
His scientific interests lie mostly in Electrical engineering, Optoelectronics, Resistive random-access memory, Stress and Electrode. His research on Electrical engineering focuses in particular on Transistor. Ming-Fu Li combines subjects such as Field-effect transistor and Voltage with his study of Optoelectronics.
He works mostly in the field of Resistive random-access memory, limiting it down to concerns involving Resistive switching and, occasionally, CMOS. His work deals with themes such as Acceptor, Gate dielectric, Band gap and Transconductance, which intersect with Stress. His studies deal with areas such as Molecular physics, Gallium arsenide and MOSFET as well as Band gap.
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N-type Schottky barrier source/drain MOSFET using ytterbium silicide
Shiyang Zhu;Jingde Chen;M.-F. Li;M.-F. Li;S.J. Lee.
IEEE Electron Device Letters (2004)
Dynamic NBTI of p-MOS transistors and its impact on MOSFET scaling
G. Chen;M.F. Li;C.H. Ang;J.Z. Zheng.
IEEE Electron Device Letters (2002)
Dynamic NBTI of PMOS transistors and its impact on device lifetime
G. Chen;K.Y. Chuah;M.F. Li;D.S.H. Chan.
international reliability physics symposium (2003)
Modulation of the Ni FUSI workfunction by Yb doping: from midgap to n-type band-edge
H.Y. Yu;J.D. Chen;M.F. Li;S.J. Lee.
international electron devices meeting (2005)
A high performance MIM capacitor using HfO 2 dielectrics
Hang Hu;Chunxiang Zhu;Y.F. Lu;M.F. Li.
IEEE Electron Device Letters (2002)
Electronic properties of zinc‐blende GaN, AlN, and their alloys Ga1−xAlxN
W. J. Fan;M. F. Li;T. C. Chong;J. B. Xia.
Journal of Applied Physics (1996)
Fermi pinning-induced thermal instability of metal-gate work functions
H.Y. Yu;C. Ren;Yee-Chia Yeo;J.F. Kang.
IEEE Electron Device Letters (2004)
Alternative surface passivation on germanium for metal-oxide-semiconductor applications with high-k gate dielectric
Nan Wu;Qingchun Zhang;Chunxiang Zhu;D. S.H. Chan.
Applied Physics Letters (2004)
An analysis of temperature dependent photoluminescence line shapes in InGaN
K. L. Teo;J. S. Colton;P. Y. Yu;E. R. Weber.
Applied Physics Letters (1998)
Enhanced performance in 50 nm N-MOSFETs with silicon-carbon source/drain regions
Kah Wee Ang;King Jien Chui;V. Bliznetsov;Anyan Du.
international electron devices meeting (2004)
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