World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
71
Citations
23710
World Ranking
4174
National Ranking
1117

Tony Low publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Tony Low sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 280 publications — 55th percentile

55% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Tony Low D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Tony Low sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 71 D-Index — 68th percentile

68% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Tony Low is affiliated with the University of Minnesota in the United States. Their research spans several interconnected fields, primarily focusing on Materials Science, Physics and Astronomy, and Engineering. Within these domains, they have a significant body of work covering the subfields of Atomic and Molecular Physics, and Optics; Materials Chemistry; Electronic, Optical and Magnetic Materials; Biomedical Engineering; and Electrical and Electronic Engineering.

Their research topics demonstrate a concentrated interest in 2D materials and applications, plasmonic and surface plasmon research, graphene research and applications, topological materials and phenomena, metamaterials and metasurfaces applications, quantum and electron transport phenomena, and the magnetic properties of thin films.

Frequent co-authors who have collaborated with Tony Low include:

  • D. J. P. de Sousa
  • Seungjun Lee
  • Jian-Ping Wang
  • Wei Jiang
  • Hongsheng Chen

The primary venues where Tony Low has published are diverse, with a preference for journals and platforms related to physics and nanotechnology. These venues include:

  • arXiv (Cornell University)
  • Physical Review B
  • Nano Letters
  • Nature Communications
  • Physical Review Letters

Recent publications authored or co-authored by Tony Low span important topics in materials science and nanotechnology. Selected papers include:

  • "Bandgap engineering of two-dimensional semiconductor materials," 2020, npj 2D Materials and Applications
  • "Strain-engineered high-responsivity MoTe2 photodetector for silicon photonic integrated circuits," 2020, Nature Photonics
  • "Nanophotonic biosensors harnessing van der Waals materials," 2021, Nature Communications
  • "Mid-infrared Polarized Emission from Black Phosphorus Light-Emitting Diodes," 2020, Nano Letters
  • "Complete Complex Amplitude Modulation with Electronically Tunable Graphene Plasmonic Metamolecules," 2020, ACS Nano

Best Publications

  • Graphene plasmonics for terahertz to mid-infrared applications

    Tony Low;Phaedon Avouris

  • Multi-terminal transport measurements of MoS2 using a van der Waals heterostructure device platform.

    Xu Cui;Gwan-Hyoung Lee;Young Duck Kim;Ghidewon Arefe

  • Polaritons in layered two-dimensional materials

    Tony Low;Andrey Chaves;Joshua D. Caldwell;Anshuman Kumar;Anshuman Kumar

  • Bandgap engineering of two-dimensional semiconductor materials

    A. Chaves;J. G. Azadani;Hussain Alsalman;Hussain Alsalman;D. R. da Costa

  • Damping pathways of mid-infrared plasmons in graphene nanostructures

    Hugen Yan;Tony Low;Wenjuan Zhu;Yanqing Wu

  • Polaritons in layered 2D materials

    Tony Low;Andrey Chaves;Joshua D. Caldwell;Anshuman Kumar

  • Tunable optical properties of multilayer black phosphorus thin films

    Tony Low;Tony Low;Tony Low;A. S. Rodin;A. Carvalho;Yongjin Jiang

  • Structure and Electronic Transport in Graphene Wrinkles

    Wenjuan Zhu;Tony Low;Vasili Perebeinos;Ageeth A. Bol

  • Plasmons and Screening in Monolayer and Multilayer Black Phosphorus

    Tony Low;Rafael Roldán;Han Wang;Fengnian Xia

  • Photoconductivity of biased graphene

    Marcus Freitag;Tony Low;Fengnian Xia;Phaedon Avouris

  • Band alignment of two-dimensional semiconductors for designing heterostructures with momentum space matching

    V. Ongun Özçelik;Javad G. Azadani;Ce Yang;Steven J. Koester

  • Electronic transport and device prospects of monolayer molybdenum disulphide grown by chemical vapour deposition

    Wenjuan Zhu;Tony Low;Yi Hsien Lee;Han Wang

  • Room-temperature high spin-orbit torque due to quantum confinement in sputtered BixSe(1-x) films.

    Mahendra Dc;Roberto Grassi;Jun-Yang Chen;Mahdi Jamali

  • Photocurrent in graphene harnessed by tunable intrinsic plasmons

    Marcus Freitag;Tony Low;Wenjuan Zhu;Hugen Yan

  • Strain-induced pseudomagnetic field for novel graphene electronics

    Tony Low;F. Guinea

  • Tunable Light–Matter Interaction and the Role of Hyperbolicity in Graphene–hBN System

    Anshuman Kumar;Tony Low;Kin Hung Fung;Phaedon Avouris

  • Infrared fingerprints of few-layer black phosphorus.

    Guowei Zhang;Shenyang Huang;Andrey Chaves;Andrey Chaves;Chaoyu Song

  • Strain-engineered high-responsivity MoTe2 photodetector for silicon photonic integrated circuits

    R. Maiti;C. Patil;M. A. S. R. Saadi;T. Xie

  • Anisotropic 2D materials for tunable hyperbolic plasmonics

    Andrei Nemilentsau;Tony Low;George Hanson

  • Strain-induced pseudo-magnetic field for novel graphene electronics

    Tony Low;F. Guinea

  • Gate-controlled guiding of electrons in graphene.

    J. R. Williams;J. R. Williams;Tony Low;M. S. Lundstrom;C. M. Marcus;C. M. Marcus

Frequent Co-Authors

Phaedon Avouris
Phaedon Avouris IBM (United States)
Francisco Guinea
Francisco Guinea IMDEA Nanoscience Institute
Fengnian Xia
Fengnian Xia Yale University
Mark Lundstrom
Mark Lundstrom Purdue University West Lafayette
Sang Hyun Oh
Sang Hyun Oh University of Minnesota
Wenjuan Zhu
Wenjuan Zhu University of Illinois at Urbana-Champaign
Dim-Lee Kwong
Dim-Lee Kwong National University of Singapore
Jian-Ping Wang
Jian-Ping Wang University of Minnesota
Ming-Fu Li
Ming-Fu Li Fudan University
Marcus Freitag
Marcus Freitag IBM (United States)

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