World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
81
Citations
48171
World Ranking
476
National Ranking
217

Materials Science

D-Index
83
Citations
48589
World Ranking
2308
National Ranking
664

Fengnian Xia publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Fengnian Xia sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 238 publications — 41st percentile

41% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Fengnian Xia D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Fengnian Xia sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 81 D-Index — 93rd percentile

93% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Fengnian Xia is affiliated with Yale University in the United States. Their research spans multiple fields and subfields within engineering and materials science, focusing on areas such as materials chemistry, electrical and electronic engineering, atomic and molecular physics and optics, electronic, optical and magnetic materials, and biomedical engineering.

Their published work includes research in main topics such as:

  • 2D Materials and Applications
  • Metamaterials and Metasurfaces Applications
  • Plasmonic and Surface Plasmon Research
  • Photonic and Optical Devices
  • Graphene Research and Applications
  • Topological Materials and Phenomena
  • Thermal Radiation and Cooling Technologies

Fengnian Xia has contributed to publications in several venues, including:

  • arXiv (Cornell University)
  • Nature Photonics
  • Optics Express
  • Nature Materials
  • Nano Letters

Among their recent papers are:

  • "A wavelength-scale black phosphorus spectrometer," 2021, Nature Photonics
  • "Intelligent infrared sensing enabled by tunable moiré quantum geometry," 2022, Nature
  • "Strong mid-infrared photoresponse in small-twist-angle bilayer graphene," 2020, Nature Photonics
  • "Widely tunable mid-infrared light emission in thin-film black phosphorus," 2020, Science Advances
  • "Geometric deep optical sensing," 2023, Science

The scientist collaborates frequently with a set of coauthors, including:

  • Kenji Watanabe
  • Takashi Taniguchi
  • Qiushi Guo
  • Shaofan Yuan
  • Matthieu Fortin-Deschênes

Best Publications

  • Rediscovering black phosphorus as an anisotropic layered material for optoelectronics and electronics

    Fengnian Xia;Han Wang;Yichen Jia

  • Ultrafast graphene photodetector

    Fengnian Xia;Thomas Mueller;Yu-ming Lin;Alberto Valdes-Garcia

  • Two-dimensional material nanophotonics

    Fengnian Xia;Han Wang;Di Xiao;Madan Dubey

  • Graphene photodetectors for high-speed optical communications

    Thomas Mueller;Fengnian Xia;Phaedon Avouris

  • Recent Advances in Two-Dimensional Materials beyond Graphene

    Ganesh R. Bhimanapati;Zhenqiu Lin;Vincent Meunier;Vincent Meunier;Yeonwoong Jung

  • Graphene field-effect transistors with high on/off current ratio and large transport band gap at room temperature.

    Fengnian Xia;Damon B. Farmer;Yu-ming Lin;Phaedon Avouris

  • The renaissance of black phosphorus

    Xi Ling;Han Wang;Shengxi Huang;Fengnian Xia

  • Highly anisotropic and robust excitons in monolayer black phosphorus.

    Xiaomu Wang;Aaron M. Jones;Kyle L. Seyler;Vy Tran

  • Ultracompact optical buffers on a silicon chip

    Fengnian Xia;Lidija Sekaric;Yurii Vlasov

  • Tunable infrared plasmonic devices using graphene/insulator stacks

    Hugen Yan;Xuesong Li;Bhupesh Chandra;George Tulevski

  • Strong light-matter coupling in two-dimensional atomic crystals

    Xiaoze Liu;Xiaoze Liu;Tal Galfsky;Tal Galfsky;Zheng Sun;Zheng Sun;Fengnian Xia

  • High-frequency, scaled graphene transistors on diamond-like carbon

    Yanqing Wu;Yu-ming Lin;Ageeth A. Bol;Keith A. Jenkins

  • Damping pathways of mid-infrared plasmons in graphene nanostructures

    Hugen Yan;Tony Low;Wenjuan Zhu;Yanqing Wu

  • The origins and limits of metal–graphene junction resistance

    Fengnian Xia;Vasili Perebeinos;Yu-ming Lin;Yanqing Wu

  • Black Phosphorus Mid-Infrared Photodetectors with High Gain

    Qiushi Guo;Andreas Pospischil;Maruf Bhuiyan;Hao Jiang

  • Tunable optical properties of multilayer black phosphorus thin films

    Tony Low;Tony Low;Tony Low;A. S. Rodin;A. Carvalho;Yongjin Jiang

  • Photocurrent imaging and efficient photon detection in a graphene transistor

    Fengnian Xia;Thomas Mueller;Roksana Golizadeh-Mojarad;Marcus Freitag

  • Reinventing germanium avalanche photodetector for nanophotonic on-chip optical interconnects

    Solomon Assefa;Fengnian Xia;Yurii A. Vlasov

  • Plasmons and Screening in Monolayer and Multilayer Black Phosphorus

    Tony Low;Rafael Roldán;Han Wang;Fengnian Xia

  • Photoconductivity of biased graphene

    Marcus Freitag;Tony Low;Fengnian Xia;Phaedon Avouris

  • High-throughput silicon nanophotonic wavelength-insensitive switch for on-chip optical networks

    Yurii Vlasov;William M. J. Green;Fengnian Xia

Frequent Co-Authors

Phaedon Avouris
Phaedon Avouris IBM (United States)
Yurii A. Vlasov
Yurii A. Vlasov University of Illinois at Urbana-Champaign
Solomon Assefa
Solomon Assefa IBM (United States)
Han Wang
Han Wang University of Southern California
William M. J. Green
William M. J. Green IBM (United States)
Stephen R. Forrest
Stephen R. Forrest University of Michigan–Ann Arbor
Kenji Watanabe
Kenji Watanabe National Institute for Materials Science
Yu-Ming Lin
Yu-Ming Lin Taiwan Semiconductor Manufacturing Company (Taiwan)
Takashi Taniguchi
Takashi Taniguchi National Institute for Materials Science
Tony Low
Tony Low University of Minnesota

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Related Online Degrees & Career Pathways

Exploring online degree options can be a strategic step for those pursuing Electronics and Electrical Engineering careers in the USA. Many students benefit from competency based masters degrees, which focus on practical skills and allow learners to progress at their own speed, making education more flexible and career-oriented.

For military spouses and dependents, finding the right program can be challenging due to frequent relocations. Online institutions recognized as the colleges for military spouses offer tailored support and adaptable schedules, helping this community balance education with changing circumstances.

Additionally, some programs offer online colleges with frequent start dates, enabling students to begin their studies at multiple points throughout the year. This flexibility is ideal for working professionals and those seeking to quickly integrate education into their lives.

For those looking to quickly enhance their qualifications, 6-month certificate programs that pay well can provide specialized training in high-demand areas, offering a fast track to better job prospects within the electronics and electrical fields.

Best Scientists Citing Fengnian Xia

Trending Scientists

Recently Published Articles