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Materials Science
USA
2026

D-Index & Metrics

Materials Science

D-Index
158
Citations
118947
World Ranking
113
National Ranking
50

Physics

D-Index
156
Citations
118427
World Ranking
232
National Ranking
139

Phaedon Avouris publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Phaedon Avouris sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 577 publications — 91st percentile

91% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Phaedon Avouris D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Phaedon Avouris sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 158 D-Index — 99th percentile

99% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2026 - Research.com Materials Science in United States Leader Award
  • 2025 - Research.com Materials Science in United States Leader Award
  • 2022 - Research.com Materials Science in United States Leader Award
  • 2017 - Member of the National Academy of Sciences
  • 2012 - Fellow of the Materials Research Society
  • 2011 - David Turnbull Lectureship, Materials Research Society
  • 2003 - Irving Langmuir Award, American Chemical Society (ACS)
  • 2003 - Fellow of the American Academy of Arts and Sciences
  • 1996 - Fellow of the American Association for the Advancement of Science (AAAS)

Overview

Phaedon Avouris is a researcher affiliated with IBM in the United States. Their work primarily spans the intersection of materials science, engineering, and physics and astronomy, with a focus on atomic and molecular physics, optics, biomedical engineering, materials chemistry, and electronic, optical, and magnetic materials.

The scientist's research topics include plasmonic and surface plasmon research, 2D materials and applications, mechanical and optical resonators, thermal radiation and cooling technologies, metamaterials and metasurfaces applications, quantum mechanics and non-Hermitian physics, and gold and silver nanoparticles synthesis and applications.

They have authored a number of papers with notable recent publications including:

  • Bandgap engineering of two-dimensional semiconductor materials (2020) published in npj 2D Materials and Applications
  • Nanophotonic biosensors harnessing van der Waals materials (2021) published in Nature Communications
  • Planar hyperbolic polaritons in 2D van der Waals materials (2024) published in Nature Communications
  • Twisted Two-Dimensional Material Stacks for Polarization Optics (2022) published in Physical Review Letters
  • Accessing the Exceptional Points in a Graphene Plasmon-Vibrational Mode Coupled System (2021) published in ACS Photonics

Frequent co-authors in their publications include Tony Low, Sang-Hyun Oh, Michael S. Strano, L. Martín-Moreno, and Steven J. Koester.

Avouris has contributed to several respected publication venues across their career. The most frequent publication venues include Advanced Electronic Materials, Nature Communications, Physical Review Letters, arXiv (Cornell University), and npj 2D Materials and Applications.

Over the course of their career, Phaedon Avouris has been recognized with a series of awards and honors. These include election as a Member of the National Academy of Sciences (2017), Fellowships with the Materials Research Society (2012), American Academy of Arts and Sciences (2003), and the American Association for the Advancement of Science (1996). They have also received the David Turnbull Lectureship from the Materials Research Society (2011) and the Irving Langmuir Award from the American Chemical Society (2003).

Best Publications

  • Single- and multi-wall carbon nanotube field-effect transistors

    R. Martel;T. Schmidt;H. R. Shea;T. Hertel

  • Photodetectors based on graphene, other two-dimensional materials and hybrid systems

    F. H. L. Koppens;T. Mueller;Ph. Avouris;A. C. Ferrari

  • Ultrafast graphene photodetector

    Fengnian Xia;Thomas Mueller;Yu-ming Lin;Alberto Valdes-Garcia

  • 100-GHz Transistors from Wafer-Scale Epitaxial Graphene

    Y.-M. Lin;C. Dimitrakopoulos;K. A. Jenkins;D. B. Farmer

  • Graphene photodetectors for high-speed optical communications

    Thomas Mueller;Fengnian Xia;Phaedon Avouris

  • Engineering Carbon Nanotubes and Nanotube Circuits Using Electrical Breakdown

    Philip G. Collins;Michael S. Arnold;Phaedon Avouris

  • Carbon-based electronics.

    Phaedon Avouris;Zhihong Chen;Vasili Perebeinos

  • Graphene nano-ribbon electronics

    Zhihong Chen;Yu-Ming Lin;Michael J. Rooks;Phaedon Avouris

  • Graphene: electronic and photonic properties and devices.

    Phaedon Avouris

  • Carbon nanotubes as schottky barrier transistors.

    S. Heinze;J. Tersoff;R. Martel;V. Derycke

  • Carbon Nanotube Inter- and Intramolecular Logic Gates

    V. Derycke;R. Martel;J. Appenzeller;Ph. Avouris

  • Graphene field-effect transistors with high on/off current ratio and large transport band gap at room temperature.

    Fengnian Xia;Damon B. Farmer;Yu-ming Lin;Phaedon Avouris

  • Graphene plasmonics for terahertz to mid-infrared applications

    Tony Low;Phaedon Avouris

  • Nanotubes for electronics.

    Philip G. Collins;Phaedon Avouris

  • Field-Effect Transistors Based on Single Semiconducting Oxide Nanobelts

    Michael S. Arnold;Phaedon Avouris;Zheng Wei Pan;Zhong L. Wang

  • Carbon-nanotube photonics and optoelectronics

    Phaedon Avouris;Marcus Freitag;Vasili Perebeinos

  • Tunable infrared plasmonic devices using graphene/insulator stacks

    Hugen Yan;Xuesong Li;Bhupesh Chandra;George Tulevski

  • Operation of Graphene Transistors at Gigahertz Frequencies

    Yu-Ming Lin;Keith A. Jenkins;Alberto Valdes-Garcia;Joshua P. Small

  • Operation of Graphene Transistors at GHz Frequencies

    Yu-Ming Lin;Keith A. Jenkins;Alberto Valdes-Garcia;Joshua P. Small

  • Molecular Electronics with Carbon Nanotubes

    Phaedon Avouris

  • Carbon nanotube electronics

    P. Avouris;J. Appenzeller;R. Martel;S.J. Wind

Frequent Co-Authors

Yu-Ming Lin
Yu-Ming Lin Taiwan Semiconductor Manufacturing Company (Taiwan)
Richard Martel
Richard Martel University of Montreal
Joerg Appenzeller
Joerg Appenzeller Purdue University West Lafayette
Damon B. Farmer
Damon B. Farmer IBM (United States)
Vasili Perebeinos
Vasili Perebeinos University at Buffalo, State University of New York
Fengnian Xia
Fengnian Xia Yale University
Marcus Freitag
Marcus Freitag IBM (United States)
Tony Low
Tony Low University of Minnesota
Wenjuan Zhu
Wenjuan Zhu University of Illinois at Urbana-Champaign
Zhihong Chen
Zhihong Chen Purdue University West Lafayette

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