World's Best Scientists 2026 revealed!

Overview

Wenjuan Zhu is affiliated with the University of Illinois at Urbana-Champaign in the United States. Their research contributions span the fields of engineering and materials science, with significant focus on materials chemistry, electrical and electronic engineering, atomic and molecular physics and optics, biomedical engineering, and electronic, optical and magnetic materials.

Their work extensively covers topics including 2D materials and applications, advanced memory and neural computing, perovskite materials and applications, ferroelectric and negative capacitance devices, luminescence properties of advanced materials, semiconductor materials and devices, and graphene research and applications.

Wenjuan Zhu has published research in notable scientific venues. Frequent publication outlets include Applied Physics Letters, ACS Applied Materials & Interfaces, arXiv (Cornell University), Nanoscale, and Laser & Photonics Review.

Among recent papers connected to their research are:

  • Low-dose real-time X-ray imaging with nontoxic double perovskite scintillators (2020, Light Science & Applications)
  • Transistors based on two-dimensional materials for future integrated circuits (2021, Nature Electronics)
  • Thermally activated delayed fluorescence (TADF) organic molecules for efficient X-ray scintillation and imaging (2021, Nature Materials)
  • Highly Resolved and Robust Dynamic X-Ray Imaging Using Perovskite Glass-Ceramic Scintillator with Reduced Light Scattering (2021, Advanced Science)
  • Deep Learning Enabled Strain Mapping of Single-Atom Defects in Two-Dimensional Transition Metal Dichalcogenides with Sub-Picometer Precision (2020, Nano Letters)

Frequent co-authors collaborating with Wenjuan Zhu include Junzhe Kang, Zijing Zhao, Hanwool Lee, Kai Xu, and Hojoon Ryu.

Best Publications

  • Tunable infrared plasmonic devices using graphene/insulator stacks

    Hugen Yan;Xuesong Li;Bhupesh Chandra;George Tulevski

  • Damping pathways of mid-infrared plasmons in graphene nanostructures

    Hugen Yan;Tony Low;Wenjuan Zhu;Yanqing Wu

  • Transistors based on two-dimensional materials for future integrated circuits

    Saptarshi Das;Amritanand Sebastian;Eric Pop;Connor J. McClellan

  • Structure and Electronic Transport in Graphene Wrinkles

    Wenjuan Zhu;Tony Low;Vasili Perebeinos;Ageeth A. Bol

  • State-of-the-art graphene high-frequency electronics.

    Yanqing Wu;Keith A. Jenkins;Alberto Valdes-Garcia;Damon B. Farmer

  • Electronic transport and device prospects of monolayer molybdenum disulphide grown by chemical vapour deposition

    Wenjuan Zhu;Tony Low;Yi Hsien Lee;Han Wang

  • Current transport in metal/hafnium oxide/silicon structure

    W.J. Zhu;Tso-Ping Ma;T. Tamagawa;J. Kim

  • Photocurrent in graphene harnessed by tunable intrinsic plasmons

    Marcus Freitag;Tony Low;Wenjuan Zhu;Hugen Yan

  • Effect of Al inclusion in HfO 2 on the physical and electrical properties of the dielectrics

    W.J. Zhu;T. Tamagawa;M. Gibson;T. Furukawa

  • Mobility measurement and degradation mechanisms of MOSFETs made with ultrathin high-k dielectrics

    Wenjuan Zhu;Jin-Ping Han;T.P. Ma

  • Magnetic field tuning of terahertz Dirac plasmons in graphene

    Hugen Yan;Zhiqiang Li;Xuesong Li;Wenjuan Zhu

  • Infrared Spectroscopy of Tunable Dirac Terahertz Magneto-Plasmons in Graphene

    Hugen Yan;Zhiqiang Li;Xuesong Li;Wenjuan Zhu

  • Infrared spectroscopy of wafer-scale graphene.

    Hugen Yan;Fengnian Xia;Wenjuan Zhu;Marcus Freitag

  • Three-terminal graphene negative differential resistance devices.

    Yanqing Wu;Damon B. Farmer;Wenjuan Zhu;Shu Jen Han

  • Charge trapping in ultrathin hafnium oxide

    W.J. Zhu;T.P. Ma;S. Zafar;T. Tamagawa

  • Silicon nitride gate dielectrics and band gap engineering in graphene layers.

    Wenjuan Zhu;Deborah Neumayer;Vasili Perebeinos;Phaedon Avouris

  • Silicon nitride gate dielectrics and bandgap engineering in graphene layers

    Wenjuan Zhu;Deborah Neumayer;Vasili Perebeinos;Phaedon Avouris

  • HfO/sub 2/ and HfAlO for CMOS: thermal stability and current transport

    W. Zhu;T.P. Ma;T. Tamagawa;Y. Di

  • Ferroelectric Tunneling Junctions Based on Aluminum Oxide/ Zirconium-Doped Hafnium Oxide for Neuromorphic Computing.

    Hojoon Ryu;Haonan Wu;Fubo Rao;Wenjuan Zhu

  • Temperature dependence of channel mobility in HfO/sub 2/-gated NMOSFETs

    W.J. Zhu;T.P. Ma

Frequent Co-Authors

Phaedon Avouris
Phaedon Avouris IBM (United States)
Fengnian Xia
Fengnian Xia Yale University
Kai Xu
Kai Xu National Center for Nanoscience and Technology
Tony Low
Tony Low University of Minnesota
Marcus Freitag
Marcus Freitag IBM (United States)
Tso-Ping Ma
Tso-Ping Ma Yale University
Yanqing Wu
Yanqing Wu Peking University
Damon B. Farmer
Damon B. Farmer IBM (United States)
Christos D. Dimitrakopoulos
Christos D. Dimitrakopoulos University of Massachusetts Amherst
Yu-Ming Lin
Yu-Ming Lin Taiwan Semiconductor Manufacturing Company (Taiwan)

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Related Online Degrees & Career Pathways

For those interested in Electronics and Electrical Engineering, exploring related online degrees offers flexibility and accessibility. Many students benefit from programs offered by military spouse friendly online colleges, which provide tailored support and adaptable schedules for those balancing family commitments.

Another advantage is enrolling in universities known for online universities with multiple start dates, allowing learners to begin their studies frequently throughout the year. This flexibility is key for working professionals aiming to enhance their skills without interrupting their careers.

For quicker entry into the workforce, consider 6 month certificate programs that pay well. These concise certifications focus on practical skills and industry demands, making them attractive for those seeking specialized knowledge in a shorter time frame.

Additionally, many roles in electrical and electronics fields suit different personality types. If you prefer minimal social interaction, there are best jobs for introverts that align well with technical expertise, enabling you to thrive in your career while leveraging your unique strengths.

Best Scientists Citing Wenjuan Zhu

Trending Scientists

Recently Published Articles