Albert Chin is affiliated with National Yang Ming Chiao Tung University in Taiwan, where their research primarily spans various engineering and materials science disciplines. Their work is situated at the intersection of semiconductor technology, thin-film transistors, and memory devices.
The scientist's main fields of study include:
Within these areas, Chin's subfields of expertise focus on:
Their research topics cover a range of advanced semiconductor and device technologies, including:
Albert Chin has contributed to various scholarly publications, particularly in the following venues:
Some of their recent papers include:
Albert Chin has collaborated frequently with several researchers, including:
Recognition of their professional achievements includes the IEEE Fellow award granted in 2011, awarded for contributions to high-K dielectrics and metal gate electrodes for complementary metal-oxide semiconductor technologies.
Shiyang Zhu;Jingde Chen;M.-F. Li;M.-F. Li;S.J. Lee
M.F. Chang;P.T. Lee;S.P. McAlister;A. Chin
Y.H. Wu;M.Y. Yang;A. Chin;W.J. Chen
S.B. Chen;C.H. Lai;A. Chin;J.C. Hsieh
Nan Wu;Qingchun Zhang;Chunxiang Zhu;Chia Chin Yeo
A. Chin;Y.H. Wu;S.B. Chen;C.C. Liao
Xiongfei Yu;Chunxiang Zhu;Hang Hu;A. Chin
Nan Wu;Qingchun Zhang;Chunxiang Zhu;D. S.H. Chan
Chun Hu Cheng;Fon Shan Yeh;Albert Chin
Nan Wu;Qingchun Zhang;Chunxiang Zhu;D.S.H. Chan
Chun Hu Cheng;Albert Chin
Sun Jung Kim;Byung Jin Cho;Ming-Fu Li;Shi-Jin Ding
Chun-Hu Cheng;Albert Chin
K.C. Chiang;Ching-Chien Huang;G.L. Chen;Wen Jauh Chen
Shiyang Zhu;Rui Li;S.J. Lee;M.F. Li
N.C. Su;S.J. Wang;A. Chin
A. Chin;C.C. Liao;C.H. Lu;W.J. Chen
Ç Kurdak;A. M. Chang;Albert Chin;T. Y. Chang
Shiyang Zhu;H.Y. Yu;S.J. Whang;J.H. Chen
W-P. Hong;S. Dhar;P. K. Bhattacharya;A. Chin
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