World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
55
Citations
15370
World Ranking
2142
National Ranking
841

Tahir Ghani publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Tahir Ghani sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 181 publications — 23rd percentile

23% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Tahir Ghani D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Tahir Ghani sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 55 D-Index — 69th percentile

69% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Research.com Recognitions

  • 2015 - Member of the National Academy of Engineering For development of transistor technologies for logic products.
  • 2012 - IEEE Jun-ichi Nishizawa Medal “For sustained leadership in developing innovative transistor technologies for advanced logic products.”
  • 2009 - IEEE Fellow For contributions to deep submicron metal oxide semiconductor transistor development for microprocessors

Overview

Tahir Ghani is affiliated with Intel in the United States and has contributed to multiple research fields, primarily focused on engineering and medicine. Their work spans several areas including electrical and electronic engineering, public health, environmental and occupational health, renewable energy, sustainability and the environment, anesthesiology and pain medicine, and materials chemistry.

The scientist's research topics cover a diverse range of subjects. These include advancements in semiconductor devices and circuit design, semiconductor materials and devices, advanced memory and neural computing, reproductive health and contraception, anesthesia and sedative agents, pregnancy and medication impact, and TiO2 photocatalysis and solar cells.

Recent publications by Tahir Ghani include:

  • The future transistors, 2023, Nature
  • Entropy and Correlation Coefficients of Neutrosophic and Interval-Valued Neutrosophic Hypersoft Set with application of Multi-Attributive Problems, 2022, DOAJ (DOAJ: Directory of Open Access Journals)
  • Comparison of Pregnancy Outcomes between Ongoing Pregnancies after Accidental Misoprostol Use and Normal Pregnancies: A Case-control Study, 2023, International Journal of Infertility & Fetal Medicine
  • Publisher Correction: The future transistors, 2023, Nature
  • Silver nanoparticles decorated open-ended anodized titania nanotubes via pulse current deposition: Plasmonic boost for dye sensitized solar cells applications, 2025, Materials Chemistry and Physics

The scientist has collaborated frequently with several co-authors, including Wei Cao, Huiming Bu, M. Vinet, Min Cao, and Shinichi Takagi.

Publications appear frequently in journals such as Nature, DOAJ (Directory of Open Access Journals), International Journal of Infertility & Fetal Medicine, and Materials Chemistry and Physics.

Awards received by Tahir Ghani include membership in the National Academy of Engineering awarded in 2015 for the development of transistor technologies for logic products. In 2012, they received the IEEE Jun-ichi Nishizawa Medal for sustained leadership in developing innovative transistor technologies for advanced logic products. Additionally, Ghani was named an IEEE Fellow in 2009 for contributions to deep submicron metal oxide semiconductor transistor development for microprocessors.

Best Publications

  • A 45nm Logic Technology with High-k+Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging

    K. Mistry;C. Allen;C. Auth;B. Beattie

  • A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS transistors

    T. Ghani;M. Armstrong;C. Auth;M. Bost

  • A 22nm high performance and low-power CMOS technology featuring fully-depleted tri-gate transistors, self-aligned contacts and high density MIM capacitors

    C. Auth;C. Allen;A. Blattner;D. Bergstrom

  • A 90-nm logic technology featuring strained-silicon

    S.E. Thompson;M. Armstrong;C. Auth;M. Alavi

  • A logic nanotechnology featuring strained-silicon

    S.E. Thompson;M. Armstrong;C. Auth;S. Cea

  • Semiconductor transistor having a stressed channel

    Anand Murthy;Robert S. Chau;Tahir Ghani;Kaizad R. Mistry

  • A 14nm logic technology featuring 2 nd -generation FinFET, air-gapped interconnects, self-aligned double patterning and a 0.0588 µm 2 SRAM cell size

    S. Natarajan;M. Agostinelli;S. Akbar;M. Bost

  • The High-k Solution

    M.T. Bohr;R.S. Chau;T. Ghani;K. Mistry

  • 45nm High-k + metal gate strain-enhanced transistors

    C. Auth;A. Cappellani;J.-S. Chun;A. Dalis

  • METHOD AND DEVICE FOR IMPROVING SALICIDE RESISTANCE ON POLYCRYSTAL SILICON GATE

    Jan Chia-Hong;Tsai Julie A;Yang Simon;Ghani Tahir

  • The future transistors

    Unknown

  • A 90 nm logic technology featuring 50 nm strained silicon channel transistors, 7 layers of Cu interconnects, low k ILD, and 1 /spl mu/m/sup 2/ SRAM cell

    S. Thompson;N. Anand;M. Armstrong;C. Auth

  • High performance 32nm logic technology featuring 2 nd generation high-k + metal gate transistors

    P. Packan;S. Akbar;M. Armstrong;D. Bergstrom

  • A 32nm logic technology featuring 2 nd -generation high-k + metal-gate transistors, enhanced channel strain and 0.171μm 2 SRAM cell size in a 291Mb array

    S. Natarajan;M. Armstrong;M. Bost;R. Brain

  • Transistor and manufacturing method thereof

    ティー. ボーア,マーク;T Bohr Mark;ガーニ,タヒル;Tahir Ghani

  • In search of "Forever," continued transistor scaling one new material at a time

    S.E. Thompson;R.S. Chau;T. Ghani;K. Mistry

  • Semiconductor device having doped epitaxial region and its methods of fabrication

    Anand S. Murthy;Daniel Bourne Aubertine;Tahir Ghani;Abhijit Jayant Pethe

  • Scaling challenges and device design requirements for high performance sub-50 nm gate length planar CMOS transistors

    T. Ghani;K. Mistry;P. Packan;S. Thompson

  • Effectiveness of reverse body bias for leakage control in scaled dual Vt CMOS ICs

    A. Keshavarzi;S. Ma;S. Narendra;B. Bloechel

  • OPTIMIZATION OF MECHANICAL STRAIN IN CHANNELS OF P-MOS AND N-MOS TRANSISTORS

    Bohr Mark;Ghani Tahir;Cea Stephen;Mistry Kaizad

  • III-V SEMICONDUCTOR DEVICE HAVING III-V SEMICONDUCTOR MATERIAL LAYER

    Glass Glenn A;Murthy Anand S;Ghani Tahir

Frequent Co-Authors

Anand S. Murthy
Anand S. Murthy Intel (United States)
Mark T. Bohr
Mark T. Bohr Intel (United States)
Scott E. Thompson
Scott E. Thompson University of Florida
Dmitri E. Nikonov
Dmitri E. Nikonov Intel (United States)
Fatih Hamzaoglu
Fatih Hamzaoglu Intel (United States)
Brian S. Doyle
Brian S. Doyle Intel (United States)
Ian A. Young
Ian A. Young Intel (United States)
Kevin Zhang
Kevin Zhang Taiwan Semiconductor Manufacturing Company (Taiwan)
Mark L. Doczy
Mark L. Doczy Intel (United States)
Sasikanth Manipatruni
Sasikanth Manipatruni Intel (United States)

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Related Online Degrees & Career Pathways

For those interested in Electronics and Electrical Engineering, exploring flexible and accelerated learning options can be a game-changer. Many students today prefer programs with online colleges with flexible start dates, allowing them to begin studies without waiting for traditional semester schedules. This flexibility is ideal for working professionals or those balancing other commitments.

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For those aspiring to leadership positions, accelerated degrees such as online project management degree accelerated programs are excellent pathways. They equip engineers with the project and team management skills needed to advance in highly technical environments efficiently.

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