What is he best known for?
The fields of study he is best known for:
- Semiconductor
- Electrical engineering
- Optoelectronics
His primary scientific interests are in Optoelectronics, Layer, Semiconductor device, Electronic engineering and Substrate.
The various areas that Ruilong Xie examines in his Optoelectronics study include Fin, Transistor, Gate oxide and Electrical engineering.
Ruilong Xie works mostly in the field of Layer, limiting it down to topics relating to Semiconductor materials and, in certain cases, Isolation.
In his study, which falls under the umbrella issue of Semiconductor device, Insulation layer and Mechanical engineering is strongly linked to Structural engineering.
His Electronic engineering study also includes fields such as
- Etching, which have a strong connection to Fin,
- Integrated circuit together with Parasitic capacitance.
His work investigates the relationship between Substrate and topics such as Etching that intersect with problems in Engineering drawing and Conductive materials.
His most cited work include:
- Methods of forming a semiconductor device with low-k spacers and the resulting device (159 citations)
- Integrated circuits and methods for fabricating integrated circuits with reduced parasitic capacitance (140 citations)
- Silicide protection during contact metallization and resulting semiconductor structures (127 citations)
What are the main themes of his work throughout his whole career to date?
His main research concerns Optoelectronics, Layer, Transistor, Semiconductor device and Dielectric.
His Optoelectronics research integrates issues from Fin, Substrate, Electronic engineering and Substrate.
His study in Layer is interdisciplinary in nature, drawing from both Electrical conductor and Fin.
His work carried out in the field of Transistor brings together such families of science as Nanosheet, Epitaxy and Integrated circuit.
The Semiconductor device study combines topics in areas such as Semiconductor materials, Structural engineering, Dielectric layer and Etching.
His Gate oxide study results in a more complete grasp of Electrical engineering.
He most often published in these fields:
- Optoelectronics (86.98%)
- Layer (44.12%)
- Transistor (34.00%)
What were the highlights of his more recent work (between 2019-2021)?
- Optoelectronics (86.98%)
- Transistor (34.00%)
- Layer (44.12%)
In recent papers he was focusing on the following fields of study:
Ruilong Xie spends much of his time researching Optoelectronics, Transistor, Layer, Dielectric and Semiconductor.
A large part of his Optoelectronics studies is devoted to Integrated circuit.
His Transistor research includes themes of Fin, Pillar, Substrate and Epitaxy.
Many of his studies on Layer involve topics that are commonly interrelated, such as Electrical conductor.
His Dielectric study combines topics in areas such as Parasitic capacitance, Trench and Composite material.
His research investigates the link between Semiconductor and topics such as Insulator that cross with problems in Perpendicular.
Between 2019 and 2021, his most popular works were:
- Nanosheet transistor with dual inner airgap spacers (4 citations)
- Wrap-around contact surrounding epitaxial regions of integrated circuit structures and method of forming same (3 citations)
- Forming self-aligned gate and source/drain contacts using sacrificial gate cap spacer and resulting devices (3 citations)
In his most recent research, the most cited papers focused on:
- Semiconductor
- Transistor
- Electrical engineering
Ruilong Xie mainly focuses on Optoelectronics, Layer, Transistor, Semiconductor device and Nanosheet.
His Optoelectronics research incorporates themes from Field-effect transistor, Trench and Self-aligned gate.
Metal gate, Semiconductor structure and Substrate are the primary areas of interest in his Layer study.
His Transistor study integrates concerns from other disciplines, such as AND gate and Air gap.
His study looks at the relationship between AND gate and fields such as Integrated circuit, as well as how they intersect with chemical problems.
The study incorporates disciplines such as Electrical conductor, Fin, Etching and Base in addition to Semiconductor device.
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