World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
72
Citations
19479
World Ranking
4029
National Ranking
44

Overview

Minghwei Hong is affiliated with National Taiwan University in Taiwan and specializes in fields spanning Engineering and Physics and Astronomy. Their research primarily focuses on Electrical and Electronic Engineering as well as Atomic and Molecular Physics and Optics, with additional work in Materials Chemistry, Surfaces, Coatings and Films, and Electronic, Optical and Magnetic Materials.

The core topics of their scientific work include:

  • Semiconductor materials and devices
  • Advancements in Semiconductor Devices and Circuit Design
  • Semiconductor materials and interfaces
  • Surface and Thin Film Phenomena
  • Silicon Nanostructures and Photoluminescence
  • Ga2O3 and related materials
  • Quantum and electron transport phenomena

Hong has published extensively, with notable papers including:

  • "Low-Temperature-Grown Single-Crystal Si Epitaxially on Ge, Followed by Direct Deposition of High-κ Dielectrics-Attainment of Low Interfacial Traps and Highly Reliable Ge MOS," 2021, ACS Applied Electronic Materials
  • "Low-temperature grown single-crystal Si on epi Ge(001)-2 × 1 and its oxidation: electronic structure study via synchrotron radiation photoemission," 2020, Applied Physics Express
  • "In situ Y2O3 on p-In0.53Ga0.47As-Attainment of low interfacial trap density and thermal stability at high temperatures," 2021, Applied Physics Letters
  • "Attainment of low subthreshold slope in planar inversion-channel InGaAs MOSFET with in situ deposited Al 2O3/Y2O3 as a gate dielectric," 2021, Japanese Journal of Applied Physics
  • "Surface electronic structure of Si1−xGex(001)-2 × 1: a synchrotron radiation photoemission study," 2020, Applied Physics Express

The frequent coauthors collaborating with Minghwei Hong include:

  • J. Kwo
  • Hsien-Wen Wan
  • Yi-Ting Cheng
  • Y.H. Lin
  • L. Young

Hong's research appears regularly in several scientific journals. The prominent publication venues they contribute to are:

  • ACS Applied Electronic Materials
  • Japanese Journal of Applied Physics
  • Journal of Applied Physics
  • Applied Physics Express
  • Nanomaterials

Best Publications

  • Ga2O3 films for electronic and optoelectronic applications

    M. Passlack;E. F. Schubert;W. S. Hobson;M. Hong

  • Epitaxial cubic gadolinium oxide as a dielectric for gallium arsenide passivation

    M. Hong;J. Kwo;A. R. Kortan;J. P. Mannaerts

  • Observation of a Magnetic Antiphase Domain Structure with Long-Range Order in a Synthetic Gd-Y Superlattice

    C. F. Majkrzak;J. W. Cable;J. Kwo;M. Hong

  • Surface passivation of III-V compound semiconductors using atomic-layer-deposition-grown Al2O3

    M. L. Huang;Y. C. Chang;C. H. Chang;Y. J. Lee

  • Properties of high κ gate dielectrics Gd2O3 and Y2O3 for Si

    J. Kwo;M. Hong;A. R. Kortan;K. L. Queeney

  • High ε gate dielectrics Gd2O3 and Y2O3 for silicon

    J. Kwo;M. Hong;A. R. Kortan;K. T. Queeney

  • GaAs metal–oxide–semiconductor field-effect transistor with nanometer-thin dielectric grown by atomic layer deposition

    P. D. Ye;G. D. Wilk;B. Yang;J. Kwo

  • Crystal structure of the 80 K superconductor YBa2Cu4O8

    P. Marsh;R. M. Fleming;M. L. Mandich;A. M. DeSantolo

  • Evidence for weak link and anisotropy limitations on the transport critical current in bulk polycrystalline Y1Ba2Cu3Ox

    J. W. Ekin;A. I. Braginski;A. J. Panson;M. A. Janocko

  • GaAs MOSFET with oxide gate dielectric grown by atomic layer deposition

    P.D. Ye;G.D. Wilk;J. Kwo;B. Yang

  • Effect of temperature on Ga2O3(Gd2O3)/GaN metal–oxide–semiconductor field-effect transistors

    F. Ren;M. Hong;S. N. G. Chu;M. A. Marcus

  • Quasistatic and high frequency capacitance–voltage characterization of Ga2O3–GaAs structures fabricated by in situ molecular beam epitaxy

    M. Passlack;M. Hong;J. P. Mannaerts

  • Optical properties of gallium oxide thin films

    M. Rebien;W. Henrion;M. Hong;J. P. Mannaerts

  • Structural and superconducting properties of orientation-ordered Y1Ba2Cu3O7-x films prepared by molecular-beam epitaxy.

    J. Kwo;T.C. Hsieh;R.M. Fleming;M. Hong

  • III–V compound semiconductor transistors—from planar to nanowire structures

    Heike Riel;Lars-Erik Wernersson;Minghwei Hong;Jesús A. del Alamo

  • Magnetic and structural properties of single-crystal rare-earth Gd-Y superlattices.

    J. Kwo;E. M. Gyorgy;D. B. McWhan;M. Hong

  • Dielectric properties of electron‐beam deposited Ga2O3 films

    M. Passlack;N. E. J. Hunt;E. F. Schubert;G. J. Zydzik

  • Magnetic rare earth superlattices

    C.F. Majkrzak;J. Kwo;M. Hong;Y. Yafet

  • Energy-band parameters of atomic-layer-deposition Al2O3/InGaAs heterostructure

    M. L. Huang;Y. C. Chang;C. H. Chang;T. D. Lin

  • Superconducting Y‐Ba‐Cu‐O oxide films by sputtering

    M. Hong;Sy_Hwang Liou;J. Kwo;B.A. Davidson

  • Surface passivation of III-V compound semiconductors using atomic-layer-deposition grown Al2O3

    M.L. Huang;M. Hong;Y.C. Chang;C.H. Chang

Frequent Co-Authors

J. Kwo
J. Kwo National Tsing Hua University
Joseph Petrus Mannaerts
Joseph Petrus Mannaerts National Tsing Hua University
Fan Ren
Fan Ren University of Florida
Alfred Y. Cho
Alfred Y. Cho Nokia (United States)
Kent D. Choquette
Kent D. Choquette University of Illinois at Urbana-Champaign
Robert L. Opila
Robert L. Opila University of Delaware
Yeong-Her Wang
Yeong-Her Wang National Cheng Kung University
Peide D. Ye
Peide D. Ye Purdue University West Lafayette
Yu-Hwa Lo
Yu-Hwa Lo University of California, San Diego

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