World's Best Scientists 2026 revealed!
Sung-Nee G. Chu

Sung-Nee G. Chu

D-Index & Metrics

Materials Science

D-Index
41
Citations
6645
World Ranking
12710
National Ranking
2914

Research.com Recognitions

  • 2006 - Fellow of American Physical Society (APS) Citation For contributions to the development of lasers and photodiodes for optical fiber communication systems

Overview

Sung-Nee G. Chu is affiliated with AXT in the United States. Their research spans several fields of study, predominantly within Engineering and Medicine. The primary subfields of study include Electrical and Electronic Engineering, Mechanical Engineering, Materials Chemistry, Inorganic Chemistry, and Electrochemistry.

Their work addresses a variety of scientific topics such as:

  • Metal-Organic Frameworks: Synthesis and Applications
  • Electrochemical Analysis and Applications
  • Advanced battery technologies research
  • Drug-Induced Ocular Toxicity
  • Pituitary Gland Disorders and Treatments
  • Chronic Lymphocytic Leukemia Research
  • Advanced machining processes and optimization

Sung-Nee G. Chu has published across multiple peer-reviewed journals, notably:

  • Coordination Chemistry Reviews
  • American Journal of Ophthalmology Case Reports
  • The International Journal of Advanced Manufacturing Technology
  • Electrochimica Acta

Their recent publications include:

  • "Intrinsic metal organic frameworks as electro-catalysts for water splitting" (2025), Coordination Chemistry Reviews
  • "Reversible bilateral central scotoma under scotopic conditions associated with oral semaglutide" (2024), American Journal of Ophthalmology Case Reports
  • "A novel approach for assessing the wear status of a milling cutter flank based on the entropy generation of friction and thermal conduction" (2025), The International Journal of Advanced Manufacturing Technology
  • "Micro-pompon-like metal organic chalcogenides of [Fe2(6mna)2] as electrocatalyst for Cu-neocuproine mediated dye-sensitized solar cells" (2025), Electrochimica Acta

The scientist frequently collaborates with a set of co-authors, including:

  • Chih-Jung Cheng
  • Chun-Ting Li
  • Bo-Yu Han
  • Y.J. Lee
  • Ryan Yeh-Yung Lin

In 2006, Sung-Nee G. Chu was recognized as a Fellow of the American Physical Society (APS) for contributions to the development of lasers and photodiodes for optical fiber communication systems.

Best Publications

  • High power mid‐infrared (λ∼5 μm) quantum cascade lasers operating above room temperature

    Jérôme Faist;Federico Capasso;Carlo Sirtori;Deborah L. Sivco

  • Ga2O3 films for electronic and optoelectronic applications

    M. Passlack;E. F. Schubert;W. S. Hobson;M. Hong

  • Impression creep; a new creep test

    S. N. G. Chu;J. C. M. Li

  • Properties of high κ gate dielectrics Gd2O3 and Y2O3 for Si

    J. Kwo;M. Hong;A. R. Kortan;K. L. Queeney

  • Short wavelength (λ∼3.4 μm) quantum cascade laser based on strained compensated InGaAs/AlInAs

    Jérôme Faist;Federico Capasso;Deborah L. Sivco;Albert L. Hutchinson

  • GaAs metal–oxide–semiconductor field-effect transistor with nanometer-thin dielectric grown by atomic layer deposition

    P. D. Ye;G. D. Wilk;B. Yang;J. Kwo

  • Low‐temperature photoluminescence from InGaAs/InP quantum wires and boxes

    H. Temkin;G. J. Dolan;M. B. Panish;S. N. G. Chu

  • Observation of an electronic bound state above a potential well

    Federico Capasso;Carlo Sirtori;Jerome Faist;Deborah L. Sivco

  • Inhomogeneous spatial distribution of reverse bias leakage in GaN Schottky diodes

    J. W. P. Hsu;M. J. Manfra;D. V. Lang;S. Richter

  • Magnetic and structural properties of Mn-implanted GaN

    N. Theodoropoulou;A. F. Hebard;M. E. Overberg;C. R. Abernathy

  • GaAs MOSFET with oxide gate dielectric grown by atomic layer deposition

    P.D. Ye;G.D. Wilk;J. Kwo;B. Yang

  • Effect of temperature on Ga2O3(Gd2O3)/GaN metal–oxide–semiconductor field-effect transistors

    F. Ren;M. Hong;S. N. G. Chu;M. A. Marcus

  • HIGH QUALITY GAN GROWN ON SI(111) BY GAS SOURCE MOLECULAR BEAM EPITAXY WITH AMMONIA

    S. A. Nikishin;N. N. Faleev;V. G. Antipov;S. Francoeur

  • Unconventional carrier-mediated ferromagnetism above room temperature in ion-implanted (Ga, Mn)P:C.

    N. Theodoropoulou;A. F. Hebard;M. E. Overberg;C. R. Abernathy

  • Misfit stress in InGaAs/InP heteroepitaxial structures grown by vapor‐phase epitaxy

    S. N. G. Chu;A. T. Macrander;K. E. Strege;W. D. Johnston

  • Low D/sub it/, thermodynamically stable Ga/sub 2/O/sub 3/-GaAs interfaces: fabrication, characterization, and modeling

    M. Passlack;M. Hong;J.P. Mannaerts;R.L. Opila

  • Low interface state density oxide‐GaAs structures fabricated by in situ molecular beam epitaxy

    M. Hong;M. Passlack;J. P. Mannaerts;J. Kwo

  • High reflectivity and broad bandwidth AlN/GaN distributed Bragg reflectors grown by molecular-beam epitaxy

    H. M. Ng;T. D. Moustakas;S. N. G. Chu

  • Optical transitions in quantum wires with strain-induced lateral confinement.

    D. Gershoni;J. S. Weiner;S. N. G. Chu;G. A. Baraff

  • Scattering-controlled transmission resonances and negative differential conductance by field-induced localization in superlattices.

    Fabio Beltram;Federico Capasso;Deborah L. Sivco;Albert L. Hutchinson

  • Demonstration of enhancement-mode p- and n-channel GaAs MOSFETS with Ga2O3(Gd2O3) As gate oxide

    F. Ren;M. Hong;W.S. Hobson;J.M. Kuo

  • Excellent uniformity and very low (<50 A/cm2) threshold current density strained InGaAs quantum well diode lasers on GaAs substrate

    Naresh Chand;E. E. Becker;J. P. van der Ziel;S. N. G. Chu

  • Effects of two‐dimensional confinement on the optical properties of InGaAs/InP quantum wire structures

    D. Gershoni;H. Temkin;G. J. Dolan;J. Dunsmuir

  • Kinetic surface roughening in molecular beam epitaxy of InP.

    M. A. Cotta;R. A. Hamm;T. W. Staley;S. N. G. Chu

  • Surface layer spinodal decomposition in In1−xGaxAsyP1−y and In1−xGaxAs grown by hydride transport vapor‐phase epitaxy

    S. N. G. Chu;S. Nakahara;K. E. Strege;W. D. Johnston

  • Optical properties of very thin GaInAs(P)/InP quantum wells grown by gas source molecular beam epitaxy

    M. B. Panish;H. Temkin;R. A. Hamm;S. N. G. Chu

  • Critical layer thickness in strained Ga1−xInxAs/InP quantum wells

    H. Temkin;D. G. Gershoni;S. N. G. Chu;J. M. Vandenberg

  • Admittance spectroscopy measurement of band offsets in strained layers of InxGa1−xAs grown on InP

    R. E. Cavicchi;D. V. Lang;D. Gershoni;A. M. Sergent

  • Semiconductor distributed feedback lasers with quantum well or superlattice gratings for index or gain‐coupled optical feedback

    W. T. Tsang;F. S. Choa;M. C. Wu;Y. K. Chen

  • Monolithically integrated semiconductor optical amplifier and electroabsorption modulator with dual-waveguide spot-size converter input

    J.E. Johnson;L.J.-P. Ketelsen;J.A. Grenko;S.K. Sputz

  • Thermal stability of InGaAs/InP quantum well structures grown by gas source molecular beam epitaxy

    H. Temkin;S. N. G. Chu;M. B. Panish;R. A. Logan

  • Very low threshold InGaAs/InGaAsP graded index separate confinement heterostructure quantum well lasers grown by atmospheric pressure metalorganic vapor phase epitaxy

    T. Tanbun‐Ek;R. A. Logan;H. Temkin;K. Berthold

  • Electrical and optical characteristics of AlAsSb/GaAsSb distributed Bragg reflectors for surface emitting lasers

    O. Blum;M. J. Hafich;J. F. Klem;K. L. Lear

  • Type-I to type-II superlattice transition in strained layers of InxGa

    D. Gershoni;H. Temkin;J. M. Vandenberg;S. N. G. Chu

  • Chemical ordering in AlGaN alloys grown by molecular beam epitaxy

    E. Iliopoulos;K. F. Ludwig;T. D. Moustakas;S. N. G. Chu

Frequent Co-Authors

Stephen J. Pearton
Stephen J. Pearton University of Florida
Fan Ren
Fan Ren University of Florida
Minghwei Hong
Minghwei Hong National Taiwan University
Joseph Petrus Mannaerts
Joseph Petrus Mannaerts National Tsing Hua University
Alfred Y. Cho
Alfred Y. Cho Nokia (United States)
Federico Capasso
Federico Capasso Harvard University
Henryk Temkin
Henryk Temkin Texas Tech University
Morton B. Panish
Morton B. Panish Nokia (United States)
Albert L. Hutchinson
Albert L. Hutchinson Nokia (United States)
Jérôme Faist
Jérôme Faist ETH Zurich

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