World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
64
Citations
10755
World Ranking
6016
National Ranking
1533

Morton B. Panish publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Morton B. Panish sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 215 publications — 36th percentile

36% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Morton B. Panish D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Morton B. Panish sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 64 D-Index — 55th percentile

55% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 1987 - Member of the National Academy of Sciences
  • 1986 - Member of the National Academy of Engineering For contributions to the conceptualization and fabrication of heterojunction semiconductor lasers.
  • 1972 - Fellow of American Physical Society (APS)

Overview

Morton B. Panish is affiliated with Nokia in the United States. Throughout their career, they have contributed to the development of semiconductor laser technology, particularly focusing on heterojunction semiconductor lasers.

The scientist has been recognized with several awards acknowledging their contributions to the field. These include being named a Fellow of the American Physical Society (APS) in 1972. In 1986, they were elected as a Member of the National Academy of Engineering for contributions to the conceptualization and fabrication of heterojunction semiconductor lasers. The following year, in 1987, they became a Member of the National Academy of Sciences.

Morton B. Panish's research has primarily been situated within the broader scope of semiconductor physics and optoelectronics, as evidenced by their work on heterojunction lasers, which play a significant role in optical communication technologies.

Best Publications

  • Low‐temperature photoluminescence from InGaAs/InP quantum wires and boxes

    H. Temkin;G. J. Dolan;M. B. Panish;S. N. G. Chu

  • Phase equilibria in ternary III–V systems

    M.B. Panish;M. Ilegems

  • Subpicosecond InP/InGaAs heterostructure bipolar transistors

    Y.-K. Chen;R.N. Nottenburg;M.B. Panish;R.A. Hamm

  • Temperature Dependence of the Energy Gap in GaAs and GaP

    Unknown

  • Refractive index of AlxGa1−xAs between 1.2 and 1.8 eV

    Unknown

  • Molecular Beam Epitaxy of GaAs and InP with Gas Sources for As and P

    Unknown

  • GaAs–AlxGa1−xAs Double Heterostructure Injection Lasers

    Unknown

  • Effects of two‐dimensional confinement on the optical properties of InGaAs/InP quantum wire structures

    D. Gershoni;H. Temkin;G. J. Dolan;J. Dunsmuir

  • Measurement of heterojunction band offsets by admittance spectroscopy: InP/Ga0.47In0.53As

    D. V. Lang;M. B. Panish;F. Capasso;J. Allam

  • InGaAs/InP long wavelength quantum well infrared photodetectors

    S. D. Gunapala;B. F. Levine;D. Ritter;R. Hamm

  • Kinetic surface roughening in molecular beam epitaxy of InP.

    M. A. Cotta;R. A. Hamm;T. W. Staley;S. N. G. Chu

  • Molecular-beam epitaxy

    Morton B. Panish

  • Gas source MBE of InP and GaxIn1−xPyAs1−y : Materials properties and heterostructure lasers

    M. B. Panish;H. Temkin;S. Sumski

  • Phase equilibria in III–V quaternary systems—application to Al-Ga-P-As

    M. Ilegems;M.B. Panish

  • Implant‐induced high‐resistivity regions in InP and InGaAs

    S. J. Pearton;C. R. Abernathy;M. B. Panish;R. A. Hamm

  • Gas-Source Molecular Beam Epitaxy

    Morton B. Panish;Henryk Temkin

  • High-resolution x-ray diffraction studies of InGaAs(P)/InP superlattices grown by gas-source molecular-beam epitaxy

    J. M. Vandenberg;R. A. Hamm;M. B. Panish;H. Temkin

  • Reflection noise in index-guided InGaAsP lasers

    H. Temkin;N. Olsson;J. Abeles;R. Logan

  • Control of lattice parameters and dislocations in the system Ga1−xAlxAs1−yPy/GaAs

    G.A. Rozgonyi;P.M. Petroff;M.B. Panish

  • Composition Dependence of the Ga1−xAlxAs Direct and Indirect Energy Gaps

    Unknown

  • Optical properties of very thin GaInAs(P)/InP quantum wells grown by gas source molecular beam epitaxy

    M. B. Panish;H. Temkin;R. A. Hamm;S. N. G. Chu

  • Ga-Al-As: Phase, thermodynamic and optical properties

    M.B Panish;S Sumski

  • GaInAs(P)/InP quantum well structures grown by gas source molecular beam epitaxy

    H. Temkin;M. B. Panish;P. M. Petroff;R. A. Hamm

  • Hot-electron InGaAs/InP heterostructure bipolar transistors with f/sub T/ of 110 GHz

    R.N. Nottenburg;Y.K. Chen;M.B. Panish;D.A. Humphrey

  • Critical layer thickness in strained Ga1−xInxAs/InP quantum wells

    H. Temkin;D. G. Gershoni;S. N. G. Chu;J. M. Vandenberg

  • Admittance spectroscopy measurement of band offsets in strained layers of InxGa1−xAs grown on InP

    R. E. Cavicchi;D. V. Lang;D. Gershoni;A. M. Sergent

Frequent Co-Authors

Henryk Temkin
Henryk Temkin Texas Tech University
Dan Ritter
Dan Ritter Technion – Israel Institute of Technology
Young-Kai Chen
Young-Kai Chen Princeton University
A. F. J. Levi
A. F. J. Levi University of Southern California
Alfred Y. Cho
Alfred Y. Cho Nokia (United States)
Federico Capasso
Federico Capasso Harvard University
Peter H. Beton
Peter H. Beton University of Nottingham
Marc Ilegems
Marc Ilegems École Polytechnique Fédérale de Lausanne
Igal Brener
Igal Brener Sandia National Laboratories

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