C. R. Abernathy is affiliated with the University of Florida in the United States. Their research primarily addresses topics related to materials science and engineering, with a focus on semiconductor materials and the development of compound semiconductor technologies.
Their work spans multiple specialized fields, including electronic, optical, and magnetic materials; materials chemistry; and electrical and electronic engineering. Key research topics covered in their publications include Ga2O3 and related materials, semiconductor materials and devices, ZnO doping and properties, as well as the electronic and structural properties of oxides.
Among their recent publications are two papers published in 2022 in the Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. These papers are titled "Growth and characterization of (Sc2O3)x(Ga2O3)1−x by molecular beam epitaxy" and "Growth of (SmxGa1−x)2O3 by molecular beam epitaxy."
C. R. Abernathy has frequently collaborated with several researchers, including F. Ren, S. J. Pearton, M. Hlad, and A. D. Stewart. The collaboration with F. Ren is the most frequent, with at least three joint publications.
The Journal of Vacuum Science & Technology A Vacuum Surfaces and Films has been a common venue for their research dissemination, accounting for multiple publications.
In recognition of their contributions to materials research, Abernathy was named a Fellow of the American Association for the Advancement of Science (AAAS) in 2014. The following year, in 2015, they were honored as a Fellow of the Materials Research Society for their work on the development of compound semiconductor materials growth using chemical beam epitaxy methods.
S. J. Pearton;C. R. Abernathy;M. E. Overberg;G. T. Thaler
S.J. Pearton;C.R. Abernathy;D.P. Norton;A.F. Hebard
G. T. Thaler;M. E. Overberg;B. Gila;R. Frazier
S J Pearton;B S Kang;Suku Kim;F Ren
Mark E. Overberg;Cammy R. Abernathy;Stephen J. Pearton;Nikoleta A. Theodoropoulou
S. R. Lee;A. M. West;A. A. Allerman;K. E. Waldrip
N. Theodoropoulou;A. F. Hebard;M. E. Overberg;C. R. Abernathy
F. Ren;M. Hong;S. N. G. Chu;M. A. Marcus
N. Theodoropoulou;A. F. Hebard;M. E. Overberg;C. R. Abernathy
R. G. Wilson;R. N. Schwartz;C. R. Abernathy;S. J. Pearton
C. R. Abernathy;S. J. Pearton;R. Caruso;F. Ren
J. R. Mileham;S. J. Pearton;C. R. Abernathy;J. D. MacKenzie
S. J. Pearton;C. R. Abernathy;F. Ren
B. Luo;J. W. Johnson;J. Kim;R. M. Mehandru
SJ Pearton;CR Abernathy;GT Thaler;RM Frazier
R. J. Shul;G. B. McClellan;R. D. Briggs;D. J. Rieger
R. Mehandru;B. Luo;J. Kim;F. Ren
C. R. Abernathy;J. D. MacKenzie;S. J. Pearton;W. S. Hobson
R. J. Shul;S. P. Kilcoyne;M. Hagerott Crawford;J. E. Parmeter
B. S. Kang;S. Kim;F. Ren;J. W. Johnson
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