The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Arthur F. Hebard sits on this spectrum.
This scientist: 369 publications — 73rd percentile
73% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Arthur F. Hebard sits on this spectrum.
This scientist: 68 D-Index — 63rd percentile
63% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Arthur F. Hebard is affiliated with the University of Florida in the United States. Their research spans several areas within materials science and physics, with extensive contributions to understanding magnetic and electronic properties of molecular and nanoscale systems.
The main fields of study associated with Hebard's work include Materials Science and Physics and Astronomy. Their work further delves into specific subfields such as Materials Chemistry, Atomic and Molecular Physics and Optics, Electronic, Optical and Magnetic Materials, and Electrical and Electronic Engineering.
The core research topics prominently featured in their work encompass:
Hebard has authored several peer-reviewed papers including the following recent contributions:
Frequent publication venues for Hebard's work include:
Hebard often collaborates with other researchers, with frequent co-authors being:
Their contributions have been recognized with memberships and fellowships, including:
A.F. Hebard;M.J. Rosseinsky;R.C. Haddon;D.W. Murphy
Zhuangchun Wu;Zhihong Chen;Xu Du;Jonathan M. Logan
R. C. Haddon;A. F. Hebard;M. J. Rosseinsky;D. W. Murphy
S. J. Pearton;C. R. Abernathy;M. E. Overberg;G. T. Thaler
Xiaochang Miao;Sefaattin Tongay;Maureen K. Petterson;Kara Berke
M. J. Rosseinsky;A. P. Ramirez;S. H. Glarum;D. W. Murphy
Y. Iwasa;T. Arima;R. M. Fleming;T. Siegrist
R. C. Haddon;A. S. Perel;R.C. Morris;Thom T.M. Palstra
Ming Zhang;Bin Gao;Sima Saeidi Varnoosfaderani;Arthur F. Hebard
A. F. Hebard;M. A. Paalanen
S.J. Pearton;C.R. Abernathy;D.P. Norton;A.F. Hebard
D. P. Norton;S. J. Pearton;A. F. Hebard;N. Theodoropoulou
A. F. Hebard;R. C. Haddon;R. M. Fleming;A. R. Kortan
Mark E. Overberg;Cammy R. Abernathy;Stephen J. Pearton;Nikoleta A. Theodoropoulou
S. Tongay;M. Lemaitre;X. Miao;B. Gila
N. Theodoropoulou;A. F. Hebard;M. E. Overberg;C. R. Abernathy
Sefaattin Tongay;Sefaattin Tongay;Sima S. Varnoosfaderani;Bill R. Appleton;Junqiao Wu
A.T. Fiory;A.F. Hebard;P.M. Mankiewich;R.E. Howard
A. T. Fiory;A. F. Hebard;W. I. Glaberson
N. Theodoropoulou;A. F. Hebard;M. E. Overberg;C. R. Abernathy
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