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Materials Science

D-Index
45
Citations
9427
World Ranking
11649
National Ranking
2723

Overview

Robert L. Opila is affiliated with the University of Delaware in the United States. Their research spans across several fields of study, primarily focused on Engineering and Materials Science. Within these broad areas, their work delves into subfields such as Electrical and Electronic Engineering, Materials Chemistry, Renewable Energy, Sustainability and the Environment, Atomic and Molecular Physics and Optics, and Surfaces, Coatings and Films.

The main topics of Robert L. Opila's research include advanced photocatalysis techniques, silicon and solar cell technologies, semiconductor materials and interfaces, MXene and MAX phase materials, electron and x-ray spectroscopy techniques, machine learning applications in materials science, and x-ray spectroscopy and fluorescence analysis.

Their research outputs are published in a variety of scientific venues. Frequent publication outlets for Robert L. Opila include:

  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • The Journal of Physical Chemistry Letters
  • JACS Au
  • Solar Energy Materials and Solar Cells
  • Applied Surface Science

Notable recent papers authored or coauthored by Robert L. Opila are:

  • "Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)," 2023, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • "Interface Catalysts of Ni3Fe1 Layered Double Hydroxide and Titanium Carbide for High-Performance Water Oxidation in Alkaline and Natural Conditions," 2023, The Journal of Physical Chemistry Letters
  • "In operando x-ray photoelectron spectroscopy study of mechanism of atomic layer etching of cobalt," 2020, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • "Determining limitations of capacitance-voltage measurements of built-in voltage as an alternative to surface photovoltage for a-Si:H/c-Si heterojunctions," 2020, Solar Energy Materials and Solar Cells
  • "Imidazolium-Based Sulfonating Agent to Control the Degree of Sulfonation of Aromatic Polymers and Enable Plastics-to-Electronics Upgrading," 2024, JACS Au

Robert L. Opila has collaborated with several frequent coauthors, including Shaun Debow, Haley Fisher, Jesse B. Brown, Yanqing Su, and Zachary Zander, each of whom has coauthored three publications with Opila.

Best Publications

  • Nucleation and Growth of CdSe on ZnS Quantum Crystallite Seeds and Vice Versa, in Inverse Micelle Media

    A. R. Kortan;R. Hull;R. L. Opila;M. G. Bawendi

  • Promising thermoelectric properties of commercial PEDOT:PSS materials and their bi2Te3 powder composites.

    B. Zhang;J. Sun;H. E. Katz;F. Fang

  • Properties of high κ gate dielectrics Gd2O3 and Y2O3 for Si

    J. Kwo;M. Hong;A. R. Kortan;K. L. Queeney

  • Infrared spectroscopic analysis of the Si/SiO2 interface structure of thermally oxidized silicon

    K. T. Queeney;M. K. Weldon;J. P. Chang;Y. J. Chabal

  • Aluminum Substitution in Ba2YCu3O7

    Theo Siegrist;Lynn Schneemeyer;Joseph V. Waszczak;N. P. Singh

  • Dielectric properties of electron‐beam deposited Ga2O3 films

    M. Passlack;N. E. J. Hunt;E. F. Schubert;G. J. Zydzik

  • Bond insertion, complexation, and penetration pathways of vapor-deposited aluminum atoms with HO- and CH3O-terminated organic monolayers

    Gregory L. Fisher;Amy V. Walker;Andrew E. Hooper;Timothy B. Tighe

  • The Role of Carbonyl Groups in the Photoluminescence of Poly(p-phenylenevinylene)

    F. Papadimitrakopoulos;K. Konstadinidis;T. M. Miller;R. Opila

  • Low D/sub it/, thermodynamically stable Ga/sub 2/O/sub 3/-GaAs interfaces: fabrication, characterization, and modeling

    M. Passlack;M. Hong;J.P. Mannaerts;R.L. Opila

  • The interaction of vapor-deposited Al atoms with CO2H groups at the surface of a self-assembled alkanethiolate monolayer on gold

    G. L. Fisher;A. E. Hooper;R. L. Opila;D. L. Allara

  • Chemical Effects of Methyl and Methyl Ester Groups on the Nucleation and Growth of Vapor-Deposited Aluminum Films

    A. Hooper;G. L. Fisher;K. Konstadinidis;D. Jung

  • Profiling nitrogen in ultrathin silicon oxynitrides with angle-resolved x-ray photoelectron spectroscopy

    J. P. Chang;J. P. Chang;M. L. Green;V. M. Donnelly;R. L. Opila

  • Growth and structural characterization of superconducting Ba1–xKxBiO3 single crystals

    Lynn Schneemeyer;J. K. Thomas;J. K. Thomas;T. Siegrist;B. Batlogg

  • Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2

    Donald R. Baer;Mark H. Engelhard;Alan S. Lea;Ponnusamy Nachimuthu

  • An in-situ X-ray photoelectron study of the interaction between vapor-deposited Ti atoms and functional groups at the surfaces of self-assembled monolayers

    K. Konstadinidis;P. Zhang;R.L. Opila;D.L. Allara

  • Gate quality doped high K films for CMOS beyond 100 nm: 3-10 nm Al/sub 2/O/sub 3/ with low leakage and low interface states

    L. Manchanda;W.H. Lee;J.E. Bower;F.H. Baumann

  • Photoemission study of Zr- and Hf-silicates for use as high-κ oxides: Role of second nearest neighbors and interface charge

    R. L. Opila;G. D. Wilk;M. A. Alam;R. B. van Dover

  • Thermal desorption of Xe from the W(110) plane

    R. Opila;R. Gomer

  • Thin films and interfaces in microelectronics: composition and chemistry as function of depth

    Robert L Opila;Joseph Eng

  • Epitaxial growth and magnetic behavior of NiFe2O4 thin films

    S. Venzke;R. B. van Dover;Julia M. Phillips;E. M. Gyorgy

Frequent Co-Authors

Ian T. Ferguson
Ian T. Ferguson Kennesaw State University
Yves J. Chabal
Yves J. Chabal The University of Texas at Dallas
Minghwei Hong
Minghwei Hong National Taiwan University
Jane P. Chang
Jane P. Chang University of California, Los Angeles
Theo Siegrist
Theo Siegrist Florida A&M University - Florida State University College of Engineering
Joseph Petrus Mannaerts
Joseph Petrus Mannaerts National Tsing Hua University
David L. Allara
David L. Allara Pennsylvania State University
Robert Gomer
Robert Gomer University of Chicago
J. Kwo
J. Kwo National Tsing Hua University
David A. Muller
David A. Muller Cornell University

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