2012 - Fellow of the Materials Research Society
2009 - Davisson–Germer Prize in Atomic or Surface Physics, American Physical Society
1996 - Fellow of American Physical Society (APS) Citation For pioneering development of highresolution infrared spectroscopy for adsorbate structure and dynamics on surfaces
Yves J. Chabal mainly investigates Infrared spectroscopy, Silicon, Analytical chemistry, Oxide and Hydrogen. His research integrates issues of Inorganic chemistry, Crystallography, Adsorption, Physical chemistry and Molecular physics in his study of Infrared spectroscopy. Yves J. Chabal has researched Silicon in several fields, including Luminescence, Silicon oxide and Layer, Isotropic etching, Etching.
His studies in Analytical chemistry integrate themes in fields like Spectroscopy, Porous silicon and Infrared. The Oxide study combines topics in areas such as Equivalent oxide thickness, Amorphous solid, Annealing and Chemical engineering, Graphene. His work in Hydrogen covers topics such as Passivation which are related to areas like Crystallographic defect and Ion implantation.
Infrared spectroscopy, Silicon, Analytical chemistry, Chemical engineering and Inorganic chemistry are his primary areas of study. The concepts of his Infrared spectroscopy study are interwoven with issues in Spectroscopy, Infrared, Molecular physics, Molecule and Absorption spectroscopy. As a part of the same scientific study, he usually deals with the Silicon, concentrating on Nanotechnology and frequently concerns with Surface modification.
His Analytical chemistry research integrates issues from Fourier transform infrared spectroscopy, Optoelectronics, Annealing and Isotropic etching. His study looks at the relationship between Chemical engineering and fields such as Oxide, as well as how they intersect with chemical problems. His research in Inorganic chemistry intersects with topics in Metal, Adsorption and Atomic layer deposition.
His primary areas of study are Chemical engineering, Nanotechnology, Inorganic chemistry, Adsorption and Metal-organic framework. Yves J. Chabal combines subjects such as Layer, Oxide and Photocatalysis, Catalysis with his study of Chemical engineering. Yves J. Chabal has researched Nanotechnology in several fields, including Surface modification, Lithography and Silicon.
His Silicon research is multidisciplinary, relying on both Monolayer, Substrate, Passivation and Hydrogen. As a member of one scientific family, Yves J. Chabal mostly works in the field of Metal-organic framework, focusing on Molecule and, on occasion, Ab initio, Infrared spectroscopy and Density functional theory. His Infrared spectroscopy study incorporates themes from Spectroscopy and Photochemistry.
Yves J. Chabal mainly focuses on Inorganic chemistry, Chemical engineering, Nanotechnology, Adsorption and Metal-organic framework. His Inorganic chemistry research includes elements of Fluorescence, Physical chemistry, Metal, Oxygen and Catalysis. His Chemical engineering study combines topics in areas such as Alloy, Oxide and Aluminium.
His Nanotechnology research incorporates elements of Chemical physics, Silicon and Surface modification. His Molecule study integrates concerns from other disciplines, such as Ab initio, Density functional theory and Infrared spectroscopy. His research on Infrared spectroscopy concerns the broader Analytical chemistry.
This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.
Ideal hydrogen termination of the Si (111) surface
G. S. Higashi;Y. J. Chabal;G. W. Trucks;Krishnan Raghavachari.
Applied Physics Letters (1990)
Structural evolution during the reduction of chemically derived graphene oxide
Akbar Bagri;Cecilia Mattevi;Cecilia Mattevi;Muge Acik;Yves J. Chabal.
Nature Chemistry (2010)
Surface infrared spectroscopy
Surface Science Reports (1988)
Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology
Y. J. Chabal;G. S. Higashi;K. Raghavachari;V. A. Burrows.
Journal of Vacuum Science and Technology (1989)
Hydrothermal synthesis of graphene-TiO 2 nanotube composites with enhanced photocatalytic activity
Sanjaya D. Perera;Ruperto G. Mariano;Khiem Vu;Nijem Nour.
ACS Catalysis (2012)
Comparison of Si(111) surfaces prepared using aqueous solutions of NH4F versus HF
G. S. Higashi;R. S. Becker;Y. J. Chabal;A. J. Becker.
Applied Physics Letters (1991)
The Role of Oxygen during Thermal Reduction of Graphene Oxide Studied by Infrared Absorption Spectroscopy
Muge Acik;Geunsik Lee;Cecilia Mattevi;Adam Pirkle.
Journal of Physical Chemistry C (2011)
Unusual infrared-absorption mechanism in thermally reduced graphene oxide
M. Acik;G. Lee;C. Mattevi;C. Mattevi;M. Chhowalla;M. Chhowalla.
Nature Materials (2010)
Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphology
Veronica Burrows;Y. J. Chabal;G. S. Higashi;K. Raghavachari.
Applied Physics Letters (1988)
Mechanism of HF etching of silicon surfaces: A theoretical understanding of hydrogen passivation.
G. W. Trucks;Krishnan Raghavachari;G. S. Higashi;Y. J. Chabal.
Physical Review Letters (1990)
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