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Materials Science

D-Index
117
Citations
50555
World Ranking
550
National Ranking
199

Chemistry

D-Index
117
Citations
50356
World Ranking
566
National Ranking
240

Research.com Recognitions

  • 2012 - Fellow of the Materials Research Society
  • 2009 - Davisson–Germer Prize in Atomic or Surface Physics, American Physical Society
  • 1996 - Fellow of American Physical Society (APS) Citation For pioneering development of highresolution infrared spectroscopy for adsorbate structure and dynamics on surfaces

Overview

Yves J. Chabal is affiliated with The University of Texas at Dallas in the United States. Their research primarily focuses on materials science and engineering, with significant contributions in materials chemistry and electrical and electronic engineering. The scientist's work also touches on specialized subfields such as electronic, optical and magnetic materials, renewable energy, and organic chemistry.

Their research topics include crystallization and solubility studies, X-ray diffraction in crystallography, supercapacitor materials and fabrication, advancements in battery materials, advanced battery technologies research, catalytic processes in materials science, and MXene and MAX phase materials.

Yves J. Chabal has authored several recent papers across various scientific journals and repositories. These include:

  • Yttrium Oxide-Catalyzed Formation of Electrically Conductive Carbon for Supercapacitors, 2021, ACS Applied Energy Materials
  • Role of Surface Oxygen Vacancies in Intermediate Formation on Mullite-type Oxides upon NO Adsorption, 2020, The Journal of Physical Chemistry C
  • Reorganization of a photosensitive carbo-benzene layer in a triptych nanocatalyst with enhancement of the photocatalytic hydrogen production from water, 2020, International Journal of Hydrogen Energy
  • CCDC 1557153: Experimental Crystal Structure Determination: catena-[tris(mu-[1,1'-biphenyl]-3,3',5,5'-tetracarboxylato)-tetrakis(mu-hydroxo)-tetrakis(mu-oxo)-hexa-zirconium], 2020, King Abdullah University of Science and Technology Repository (King Abdullah University of Science and Technology)
  • CCDC 1557155: Experimental Crystal Structure Determination: catena-(tetrakis(mu-5,5'-(diazene-1,2-diyl)bis(benzene-1,3-dicarboxylato))-octakis(mu-hydroxo)-octakis(mu-oxo)-octa-aqua-octahydroxy-dodeca-zirconium), 2020, King Abdullah University of Science and Technology Repository (King Abdullah University of Science and Technology)

The frequent publication venues for their work include:

  • King Abdullah University of Science and Technology Repository (King Abdullah University of Science and Technology)
  • ACS Applied Energy Materials
  • The Journal of Physical Chemistry C
  • International Journal of Hydrogen Energy

Frequent collaborators in their research include Jérémy Cure, Xinglong Dong, Junzhong Lin, Simon J. Teat, and Stephanie Jensen.

Awards received by Yves J. Chabal include:

  • Fellow of the Materials Research Society, 2012
  • Davisson-Germer Prize in Atomic or Surface Physics, American Physical Society, 2009
  • Fellow of American Physical Society (APS), 1996, with citation for pioneering development of high-resolution infrared spectroscopy for adsorbate structure and dynamics on surfaces

Best Publications

  • Structural evolution during the reduction of chemically derived graphene oxide

    Akbar Bagri;Cecilia Mattevi;Cecilia Mattevi;Muge Acik;Yves J. Chabal

  • Ideal hydrogen termination of the Si (111) surface

    G. S. Higashi;Y. J. Chabal;G. W. Trucks;Krishnan Raghavachari

  • Surface infrared spectroscopy

    Y.J. Chabal

  • The Role of Oxygen during Thermal Reduction of Graphene Oxide Studied by Infrared Absorption Spectroscopy

    Muge Acik;Geunsik Lee;Cecilia Mattevi;Adam Pirkle

  • Hydrothermal synthesis of graphene-TiO 2 nanotube composites with enhanced photocatalytic activity

    Sanjaya D. Perera;Ruperto G. Mariano;Khiem Vu;Nijem Nour

  • Unusual infrared-absorption mechanism in thermally reduced graphene oxide

    M. Acik;G. Lee;C. Mattevi;C. Mattevi;M. Chhowalla;M. Chhowalla

  • Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology

    Y. J. Chabal;G. S. Higashi;K. Raghavachari;V. A. Burrows

  • Comparison of Si(111) surfaces prepared using aqueous solutions of NH4F versus HF

    G. S. Higashi;R. S. Becker;Y. J. Chabal;A. J. Becker

  • Probing the catalytic activity of porous graphene oxide and the origin of this behaviour

    Chenliang Su;Muge Acik;Kazuyuki Takai;Jiong Lu

  • Room-temperature metastability of multilayer graphene oxide films

    Suenne Kim;Si Zhou;Yike Hu;Muge Acik

  • Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphology

    Veronica Burrows;Y. J. Chabal;G. S. Higashi;K. Raghavachari

  • Mechanism of HF etching of silicon surfaces: A theoretical understanding of hydrogen passivation.

    G. W. Trucks;Krishnan Raghavachari;G. S. Higashi;Y. J. Chabal

  • Attachment of 3-(Aminopropyl)triethoxysilane on Silicon Oxide Surfaces: Dependence on Solution Temperature

    Robert M. Pasternack;Sandrine Rivillon Amy;Yves J. Chabal

  • Enhanced binding affinity, remarkable selectivity, and high capacity of CO 2 by dual functionalization of a rht-type metal-organic framework

    Baiyan Li;Zhijuan Zhang;Yi Li;Kexin Yao

  • The role of intercalated water in multilayered graphene oxide.

    Muge Acik;Cecilia Mattevi;Cheng Gong;Geunsik Lee

  • Atomic-scale conversion of clean Si(111):H-1×1 to Si(111)-2×1 by electron-stimulated desorption

    R. S. Becker;G. S. Higashi;Y. J. Chabal;A. J. Becker

  • Stability and Hydrolyzation of Metal Organic Frameworks with Paddle-Wheel SBUs upon Hydration

    Kui Tan;Nour Nijem;Pieremanuele Canepa;Qihan Gong

  • HfO2 and Al2O3 gate dielectrics on GaAs grown by atomic layer deposition

    Martin M. Frank;Glen D. Wilk;Dmitri Starodub;Torgny Gustafsson

  • Size, shape, and composition of luminescent species in oxidized Si nanocrystals and H-passivated porous Si

    S. Schuppler;S. L. Friedman;M. A. Marcus;D. L. Adler

  • Properties of high κ gate dielectrics Gd2O3 and Y2O3 for Si

    J. Kwo;M. Hong;A. R. Kortan;K. L. Queeney

  • High ε gate dielectrics Gd2O3 and Y2O3 for silicon

    J. Kwo;M. Hong;A. R. Kortan;K. T. Queeney

Frequent Co-Authors

Jing Li
Jing Li Rutgers, The State University of New Jersey
Kyeongjae Cho
Kyeongjae Cho The University of Texas at Dallas
Robert M. Wallace
Robert M. Wallace The University of Texas at Dallas
Carole Rossi
Carole Rossi Laboratory for Analysis and Architecture of Systems
Stephen McDonnell
Stephen McDonnell University of Virginia
Kenneth J. Balkus
Kenneth J. Balkus The University of Texas at Dallas
Pieremanuele Canepa
Pieremanuele Canepa National University of Singapore
Eric Garfunkel
Eric Garfunkel Rutgers, The State University of New Jersey
Robert L. Opila
Robert L. Opila University of Delaware
Eric M. Vogel
Eric M. Vogel Georgia Institute of Technology

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