World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
117
Citations
50555
World Ranking
550
National Ranking
198

Chemistry

D-Index
117
Citations
50356
World Ranking
566
National Ranking
239

Yves J. Chabal publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Yves J. Chabal sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 593 publications — 92nd percentile

92% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Yves J. Chabal D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Yves J. Chabal sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 117 D-Index — 96th percentile

96% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2012 - Fellow of the Materials Research Society
  • 2009 - Davisson–Germer Prize in Atomic or Surface Physics, American Physical Society
  • 1996 - Fellow of American Physical Society (APS) Citation For pioneering development of highresolution infrared spectroscopy for adsorbate structure and dynamics on surfaces

Overview

Yves J. Chabal is affiliated with The University of Texas at Dallas in the United States. Their research primarily focuses on materials science and engineering, with significant contributions in materials chemistry and electrical and electronic engineering. The scientist's work also touches on specialized subfields such as electronic, optical and magnetic materials, renewable energy, and organic chemistry.

Their research topics include crystallization and solubility studies, X-ray diffraction in crystallography, supercapacitor materials and fabrication, advancements in battery materials, advanced battery technologies research, catalytic processes in materials science, and MXene and MAX phase materials.

Yves J. Chabal has authored several recent papers across various scientific journals and repositories. These include:

  • Yttrium Oxide-Catalyzed Formation of Electrically Conductive Carbon for Supercapacitors, 2021, ACS Applied Energy Materials
  • Role of Surface Oxygen Vacancies in Intermediate Formation on Mullite-type Oxides upon NO Adsorption, 2020, The Journal of Physical Chemistry C
  • Reorganization of a photosensitive carbo-benzene layer in a triptych nanocatalyst with enhancement of the photocatalytic hydrogen production from water, 2020, International Journal of Hydrogen Energy
  • CCDC 1557153: Experimental Crystal Structure Determination: catena-[tris(mu-[1,1'-biphenyl]-3,3',5,5'-tetracarboxylato)-tetrakis(mu-hydroxo)-tetrakis(mu-oxo)-hexa-zirconium], 2020, King Abdullah University of Science and Technology Repository (King Abdullah University of Science and Technology)
  • CCDC 1557155: Experimental Crystal Structure Determination: catena-(tetrakis(mu-5,5'-(diazene-1,2-diyl)bis(benzene-1,3-dicarboxylato))-octakis(mu-hydroxo)-octakis(mu-oxo)-octa-aqua-octahydroxy-dodeca-zirconium), 2020, King Abdullah University of Science and Technology Repository (King Abdullah University of Science and Technology)

The frequent publication venues for their work include:

  • King Abdullah University of Science and Technology Repository (King Abdullah University of Science and Technology)
  • ACS Applied Energy Materials
  • The Journal of Physical Chemistry C
  • International Journal of Hydrogen Energy

Frequent collaborators in their research include Jérémy Cure, Xinglong Dong, Junzhong Lin, Simon J. Teat, and Stephanie Jensen.

Awards received by Yves J. Chabal include:

  • Fellow of the Materials Research Society, 2012
  • Davisson-Germer Prize in Atomic or Surface Physics, American Physical Society, 2009
  • Fellow of American Physical Society (APS), 1996, with citation for pioneering development of high-resolution infrared spectroscopy for adsorbate structure and dynamics on surfaces

Best Publications

  • Structural evolution during the reduction of chemically derived graphene oxide

    Akbar Bagri;Cecilia Mattevi;Cecilia Mattevi;Muge Acik;Yves J. Chabal

  • Ideal hydrogen termination of the Si (111) surface

    G. S. Higashi;Y. J. Chabal;G. W. Trucks;Krishnan Raghavachari

  • Surface infrared spectroscopy

    Y.J. Chabal

  • The Role of Oxygen during Thermal Reduction of Graphene Oxide Studied by Infrared Absorption Spectroscopy

    Muge Acik;Geunsik Lee;Cecilia Mattevi;Adam Pirkle

  • Hydrothermal synthesis of graphene-TiO 2 nanotube composites with enhanced photocatalytic activity

    Sanjaya D. Perera;Ruperto G. Mariano;Khiem Vu;Nijem Nour

  • Unusual infrared-absorption mechanism in thermally reduced graphene oxide

    M. Acik;G. Lee;C. Mattevi;C. Mattevi;M. Chhowalla;M. Chhowalla

  • Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology

    Y. J. Chabal;G. S. Higashi;K. Raghavachari;V. A. Burrows

  • Comparison of Si(111) surfaces prepared using aqueous solutions of NH4F versus HF

    G. S. Higashi;R. S. Becker;Y. J. Chabal;A. J. Becker

  • Probing the catalytic activity of porous graphene oxide and the origin of this behaviour

    Chenliang Su;Muge Acik;Kazuyuki Takai;Jiong Lu

  • Room-temperature metastability of multilayer graphene oxide films

    Suenne Kim;Si Zhou;Yike Hu;Muge Acik

  • Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphology

    Veronica Burrows;Y. J. Chabal;G. S. Higashi;K. Raghavachari

  • Mechanism of HF etching of silicon surfaces: A theoretical understanding of hydrogen passivation.

    G. W. Trucks;Krishnan Raghavachari;G. S. Higashi;Y. J. Chabal

  • Attachment of 3-(Aminopropyl)triethoxysilane on Silicon Oxide Surfaces: Dependence on Solution Temperature

    Robert M. Pasternack;Sandrine Rivillon Amy;Yves J. Chabal

  • Enhanced binding affinity, remarkable selectivity, and high capacity of CO 2 by dual functionalization of a rht-type metal-organic framework

    Baiyan Li;Zhijuan Zhang;Yi Li;Kexin Yao

  • The role of intercalated water in multilayered graphene oxide.

    Muge Acik;Cecilia Mattevi;Cheng Gong;Geunsik Lee

  • Atomic-scale conversion of clean Si(111):H-1×1 to Si(111)-2×1 by electron-stimulated desorption

    R. S. Becker;G. S. Higashi;Y. J. Chabal;A. J. Becker

  • Stability and Hydrolyzation of Metal Organic Frameworks with Paddle-Wheel SBUs upon Hydration

    Kui Tan;Nour Nijem;Pieremanuele Canepa;Qihan Gong

  • HfO2 and Al2O3 gate dielectrics on GaAs grown by atomic layer deposition

    Martin M. Frank;Glen D. Wilk;Dmitri Starodub;Torgny Gustafsson

  • Size, shape, and composition of luminescent species in oxidized Si nanocrystals and H-passivated porous Si

    S. Schuppler;S. L. Friedman;M. A. Marcus;D. L. Adler

  • Properties of high κ gate dielectrics Gd2O3 and Y2O3 for Si

    J. Kwo;M. Hong;A. R. Kortan;K. L. Queeney

  • High ε gate dielectrics Gd2O3 and Y2O3 for silicon

    J. Kwo;M. Hong;A. R. Kortan;K. T. Queeney

Frequent Co-Authors

Jing Li
Jing Li Rutgers, The State University of New Jersey
Kyeongjae Cho
Kyeongjae Cho The University of Texas at Dallas
Robert M. Wallace
Robert M. Wallace The University of Texas at Dallas
Carole Rossi
Carole Rossi Laboratory for Analysis and Architecture of Systems
Stephen McDonnell
Stephen McDonnell University of Virginia
Kenneth J. Balkus
Kenneth J. Balkus The University of Texas at Dallas
Pieremanuele Canepa
Pieremanuele Canepa National University of Singapore
Eric Garfunkel
Eric Garfunkel Rutgers, The State University of New Jersey
Robert L. Opila
Robert L. Opila University of Delaware
Eric M. Vogel
Eric M. Vogel Georgia Institute of Technology

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