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Materials Science

D-Index
60
Citations
15739
World Ranking
6956
National Ranking
1752

Overview

Eric M. Vogel is affiliated with the Georgia Institute of Technology in the United States. Their research spans the fields of Engineering and Materials Science, with a significant focus on Electrical and Electronic Engineering and Materials Chemistry. Additional subfields in their work include Cellular and Molecular Neuroscience, Biomedical Engineering, and Bioengineering.

Their research topics encompass a variety of specialized areas, including:

  • Ferroelectric and Negative Capacitance Devices
  • Advanced Memory and Neural Computing
  • Neuroscience and Neural Engineering
  • Semiconductor Materials and Devices
  • MXene and MAX Phase Materials
  • Molecular Junctions and Nanostructures
  • Analytical Chemistry and Sensors

Frequent co-authors collaborating with Vogel include Fabia F. Athena, Matthew P. West, Decarle S. Jin, Samuel Graham, and Eleanor L. Brightbill.

Their recent publications illustrate contributions to diverse areas within materials and electronic device research. Selected papers include:

  • "Synthetic Engineering of Morphology and Electronic Band Gap in Lateral Heterostructures of Monolayer Transition Metal Dichalcogenides," 2020, ACS Nano
  • "Towards a better understanding of the forming and resistive switching behavior of Ti-doped HfOx RRAM," 2022, Journal of Materials Chemistry C
  • "Graphene synthesized by chemical vapor deposition as a hydrogen isotope permeation barrier," 2021, Carbon
  • "Asymmetric Resistive Switching of Bilayer HfOx/AlOy and AlOy/HfOx Memristors: The Oxide Layer Characteristics and Performance Optimization for Digital Set and Analog Reset Switching," 2023, ACS Applied Electronic Materials
  • "Impact of titanium doping and pulsing conditions on the analog temporal response of hafnium oxide based memristor synapses," 2022, Journal of Applied Physics

Vogel frequently publishes in a selection of journals, with multiple contributions to:

  • Journal of Applied Physics
  • ECS Meeting Abstracts
  • Applied Physics Letters
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • ACS Applied Electronic Materials

In addition to journal articles, Vogel authored a book published by Apress eBooks titled Beginning Entity Framework Core 5 in 2021.

Best Publications

  • Large-Area Graphene Single Crystals Grown by Low-Pressure Chemical Vapor Deposition of Methane on Copper

    Xuesong Li;Carl W. Magnuson;Archana Venugopal;Rudolf M. Tromp

  • Graphene films with large domain size by a two-step chemical vapor deposition process.

    Xuesong Li;Carl W. Magnuson;Archana Venugopal;Jinho An

  • The effect of chemical residues on the physical and electrical properties of chemical vapor deposited graphene transferred to SiO2

    A. Pirkle;J. Chan;A. Venugopal;D. Hinojos

  • GaAs interfacial self-cleaning by atomic layer deposition

    Christopher L Hinkle;A. M. Sonnet;E. M. Vogel;Stephen J Mcdonnell

  • First-principles study of metal–graphene interfaces

    Cheng Gong;Geunsik Lee;Bin Shan;Eric M. Vogel

  • Contact resistance in few and multilayer graphene devices

    A. Venugopal;L. Colombo;E. M. Vogel

  • Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics

    Bongki Lee;Seong-Yong Park;Hyun-Chul Kim;KyeongJae Cho

  • Detection of Ga suboxides and their impact on III-V passivation and Fermi-level pinning

    C. L. Hinkle;M. Milojevic;Barry Brennan;A. M. Sonnet

  • Reducing extrinsic performance-limiting factors in graphene grown by chemical vapor deposition.

    Jack Chan;Archana Venugopal;Adam Pirkle;Stephen McDonnell

  • Technology and metrology of new electronic materials and devices.

    Eric M. Vogel;Eric M. Vogel

  • Controlled Doping of Large‐Area Trilayer MoS2 with Molecular Reductants and Oxidants

    Alexey Tarasov;Siyuan Zhang;Meng-Yen Tsai;Philip M. Campbell

  • Modeled tunnel currents for high dielectric constant dielectrics

    E.M. Vogel;K.Z. Ahmed;B. Hornung;W.K. Henson

  • Estimating oxide thickness of tunnel oxides down to 1.4 nm using conventional capacitance-voltage measurements on MOS capacitors

    W.K. Henson;K.Z. Ahmed;E.M. Vogel;J.R. Hauser

  • Half-cycle atomic layer deposition reaction studies of Al2O3 on In0.2Ga0.8As (100) surfaces

    M. Milojevic;F. S. Aguirre-Tostado;C. L. Hinkle;H. C. Kim

  • Silicon nanowires as enhancement-mode Schottky barrier field-effect transistors

    Sang-Mo Koo;Monica D Edelstein;Qiliang Li;Curt A Richter

  • Enhanced channel modulation in dual-gated silicon nanowire transistors.

    Sang-Mo Koo;Qiliang Li;Monica D. Edelstein;Curt A. Richter

  • Hebbian Learning in Spiking Neural Networks With Nanocrystalline Silicon TFTs and Memristive Synapses

    K. D. Cantley;A. Subramaniam;H. J. Stiegler;R. A. Chapman

  • Effective mobility of single-layer graphene transistors as a function of channel dimensions

    Archana Venugopal;Jack Chan;Xuesong Li;Carl W. Magnuson

  • Flexible MoS2 Field-Effect Transistors for Gate-Tunable Piezoresistive Strain Sensors.

    Meng-Yen Tsai;Alexey Tarasov;Zohreh R. Hesabi;Hossein Taghinejad

  • Interfacial chemistry of oxides on InxGa(1-x)As and implications for MOSFET applications

    C. L. Hinkle;E. M. Vogel;Peide D. Ye;R. M. Wallace

Frequent Co-Authors

Christopher L. Hinkle
Christopher L. Hinkle University of Notre Dame
Robert M. Wallace
Robert M. Wallace The University of Texas at Dallas
John S. Suehle
John S. Suehle National Institute of Standards and Technology
Curt A. Richter
Curt A. Richter National Institute of Standards and Technology
Luigi Colombo
Luigi Colombo The University of Texas at Dallas
Jiyoung Kim
Jiyoung Kim The University of Texas at Dallas
Gennadi Bersuker
Gennadi Bersuker The Aerospace Corporation
Yves J. Chabal
Yves J. Chabal The University of Texas at Dallas
Veena Misra
Veena Misra North Carolina State University
Jay Hauser
Jay Hauser University of California, Los Angeles

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