The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Paul K. Hurley sits on this spectrum.
This scientist: 327 publications — 63rd percentile
63% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Paul K. Hurley sits on this spectrum.
This scientist: 33 D-Index — 14th percentile
14% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Paul K. Hurley is affiliated with the Tyndall National Institute in Ireland. Their primary research spans the fields of Engineering and Materials Science with specific concentration in Materials Chemistry and Electrical and Electronic Engineering. The scope of their work also covers areas in Atomic and Molecular Physics, and Optics, as well as Biomedical Engineering and Electronic, Optical and Magnetic Materials.
The scientist's research focuses on several key topics including 2D Materials and Applications, Semiconductor materials and devices, and Advanced Memory and Neural Computing. Additional interests include MXene and MAX Phase Materials, Graphene research and applications, Semiconductor materials and interfaces, and Chalcogenide Semiconductor Thin Films.
Paul K. Hurley has contributed to multiple research papers with significant citations across various specialized journals. Recent publications include:
Their frequent coauthors include Farzan Gity, Lida Ansari, Scott Monaghan, K. Cherkaoui, and Niall McEvoy, reflecting ongoing collaborations within their research network.
In terms of publication venues, Paul K. Hurley most commonly publishes in ECS Meeting Abstracts, Solid-State Electronics, Scientific Reports, ACS Applied Nano Materials, and Advanced Electronic Materials.
Andrew G. Scheuermann;John P. Lawrence;Kyle W. Kemp;T. Ito;T. Ito
Jun-Ying Zhang;Ian W. Boyd;B.J. O'Sullivan;P.K. Hurley
Gioele Mirabelli;Conor McGeough;Michael Schmidt;Eoin K. McCarthy
Chanyoung Yim;Niall McEvoy;Sarah Riazimehr;Sarah Riazimehr;Daniel S. Schneider
Olof Engström;Bahman Raeissi;S. Hall;Octavian Buiu
S. Monaghan;P.K. Hurley;K. Cherkaoui;M.A. Negara
Éamon O'Connor;Scott Monaghan;Rathnait D. Long;Aileen O'Mahony
Éamon O'Connor;B. Brennan;Vladimir Djara;Karim Cherkaoui
Lida Ansari;Scott Monaghan;Niall McEvoy;Cormac Ó Coileáin
Peng Zhao;Ava Khosravi;Angelica Azcatl;Pavel Bolshakov
B. J. O'Sullivan;Paul K. Hurley;C. Leveugle;J. H. Das
Alessandro Grillo;Enver Faella;Aniello Pelella;Filippo Giubileo
Éamon O'Connor;Rathnait D. Long;Karim Cherkaoui;Kevin K. Thomas
Q. Fang;J.-Y. Zhang;J.-Y. Zhang;Z.M. Wang;J.X. Wu
V. Djara;K. Cherkaoui;M. Schmidt;S. Monaghan
Pavel Bolshakov;Peng Zhao;Angelica Azcatl;Paul K. Hurley
Q. Fang;J.-Y. Zhang;Z. Wang;M. Modreanu
Jun Lin;Yuri Y. Gomeniuk;Scott Monaghan;Ian M. Povey
P. K. Hurley;K. Cherkaoui;E. O'Connor;Max C. Lemme
Karim Cherkaoui;Scott Monaghan;Muhammad A. Negara;Mircea Modreanu
Aileen O'Mahony;Scott Monaghan;G. Provenzano;Ian M. Povey
Pavel Bolshakov;Ava Khosravi;Peng Zhao;Paul K. Hurley
Alessandro Grillo;Enver Faella;Aniello Pelella;Filippo Giubileo
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