His primary scientific interests are in Atomic layer deposition, Nanotechnology, Inorganic chemistry, Optoelectronics and Thin film. He interconnects Nucleation, Chemical engineering, Surface modification and Analytical chemistry in the investigation of issues within Atomic layer deposition. His study in the fields of Graphene under the domain of Nanotechnology overlaps with other disciplines such as Ionic bonding.
His Inorganic chemistry research is multidisciplinary, incorporating elements of Nanoparticle, Catalysis, Sulfur and X-ray photoelectron spectroscopy. His Optoelectronics research incorporates themes from Transistor, Crystal structure, Electrical resistivity and conductivity and Diffraction. His Thin film research is multidisciplinary, incorporating perspectives in Molecular beam epitaxy, Annealing and Ferroelectricity.
His scientific interests lie mostly in Atomic layer deposition, Optoelectronics, Thin film, Analytical chemistry and Nanotechnology. His work investigates the relationship between Atomic layer deposition and topics such as Inorganic chemistry that intersect with problems in Passivation. He studied Optoelectronics and Capacitor that intersect with Dram.
As part of the same scientific family, Jiyoung Kim usually focuses on Thin film, concentrating on Ferroelectricity and intersecting with Annealing and Tin. A large part of his Analytical chemistry studies is devoted to X-ray photoelectron spectroscopy. His Nanotechnology research integrates issues from Deposition and Surface modification.
The scientist’s investigation covers issues in Optoelectronics, Atomic layer deposition, Thin film, Analytical chemistry and Ferroelectricity. His research integrates issues of Field-effect transistor, Transistor, Monolayer, Graphene and Contact resistance in his study of Optoelectronics. His work carried out in the field of Atomic layer deposition brings together such families of science as Silicon nitride, Fourier transform infrared spectroscopy, Chemical engineering, Oxygen and Dielectric.
His Thin film study incorporates themes from Chemical vapor deposition, Molecular beam epitaxy, Ozone, Substrate and Grain size. His Analytical chemistry study focuses on X-ray photoelectron spectroscopy in particular. Jiyoung Kim has researched X-ray photoelectron spectroscopy in several fields, including Nanotechnology, Transition metal and Raman spectroscopy.
Jiyoung Kim spends much of his time researching Optoelectronics, Thin film, Analytical chemistry, X-ray photoelectron spectroscopy and Atomic layer deposition. His Optoelectronics study integrates concerns from other disciplines, such as Field-effect transistor, Transistor, Amorphous solid and Ohmic contact. His Thin film research includes elements of Doping, Resist, Molecular beam epitaxy, Dielectric and Grain size.
Jiyoung Kim has included themes like Topological insulator, Chemical substance, Impurity, Layer and Scanning tunneling microscope in his Analytical chemistry study. The concepts of his X-ray photoelectron spectroscopy study are interwoven with issues in Chalcogen, Nanotechnology, Transition metal, Raman spectroscopy and Forming gas. His Atomic layer deposition research includes themes of Silicon nitride, Ferroelectricity, Annealing, Tin and Monoclinic crystal system.
This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.
GaAs interfacial self-cleaning by atomic layer deposition
Christopher L Hinkle;A. M. Sonnet;E. M. Vogel;Stephen J Mcdonnell.
Applied Physics Letters (2008)
Template-Directed Synthesis of Oxide Nanotubes: Fabrication, Characterization, and Applications†
Changdeuck Bae;Hyunjun Yoo;Sihyeong Kim;Kyungeun Lee.
Chemistry of Materials (2008)
Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics
Bongki Lee;Seong-Yong Park;Hyun-Chul Kim;KyeongJae Cho.
Applied Physics Letters (2008)
Formation of TiO2 and ZrO2 Nanotubes Using Atomic Layer Deposition with Ultraprecise Control of the Wall Thickness
Hyunjung Shin;Dae Kyun Jeong;Jaegab Lee;Myung Mo Sung.
Advanced Materials (2004)
HfO2 on MoS2 by Atomic Layer Deposition: Adsorption Mechanisms and Thickness Scalability
Stephen McDonnell;Barry Brennan;Angelica Azcatl;Ning Lu.
ACS Nano (2013)
Metal contacts on physical vapor deposited monolayer MoS2
Cheng Gong;Chunming Huang;Justin Miller;Lanxia Cheng.
ACS Nano (2013)
HfSe2 Thin Films: 2D Transition Metal Dichalcogenides Grown by Molecular Beam Epitaxy
Ruoyu Yue;Adam T. Barton;Hui Zhu;Angelica Azcatl.
ACS Nano (2015)
Half-cycle atomic layer deposition reaction studies of Al2O3 on In0.2Ga0.8As (100) surfaces
M. Milojevic;F. S. Aguirre-Tostado;C. L. Hinkle;H. C. Kim.
Applied Physics Letters (2008)
Covalent Nitrogen Doping and Compressive Strain in MoS2 by Remote N2 Plasma Exposure.
Angelica Azcatl;Xiaoye Qin;Abhijith Prakash;Chenxi Zhang.
Nano Letters (2016)
Ozone Adsorption on Graphene: Ab Initio Study and Experimental Validation
Geunsik Lee;Bongki Lee;Jiyoung Kim;Kyeongjae Cho.
Journal of Physical Chemistry C (2009)
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