D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 56 Citations 10,070 297 World Ranking 4172 National Ranking 1194

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Oxygen
  • Organic chemistry

His primary scientific interests are in Atomic layer deposition, Nanotechnology, Inorganic chemistry, Optoelectronics and Thin film. He interconnects Nucleation, Chemical engineering, Surface modification and Analytical chemistry in the investigation of issues within Atomic layer deposition. His study in the fields of Graphene under the domain of Nanotechnology overlaps with other disciplines such as Ionic bonding.

His Inorganic chemistry research is multidisciplinary, incorporating elements of Nanoparticle, Catalysis, Sulfur and X-ray photoelectron spectroscopy. His Optoelectronics research incorporates themes from Transistor, Crystal structure, Electrical resistivity and conductivity and Diffraction. His Thin film research is multidisciplinary, incorporating perspectives in Molecular beam epitaxy, Annealing and Ferroelectricity.

His most cited work include:

  • GaAs interfacial self-cleaning by atomic layer deposition (334 citations)
  • Template-Directed Synthesis of Oxide Nanotubes: Fabrication, Characterization, and Applications† (255 citations)
  • Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics (242 citations)

What are the main themes of his work throughout his whole career to date?

His scientific interests lie mostly in Atomic layer deposition, Optoelectronics, Thin film, Analytical chemistry and Nanotechnology. His work investigates the relationship between Atomic layer deposition and topics such as Inorganic chemistry that intersect with problems in Passivation. He studied Optoelectronics and Capacitor that intersect with Dram.

As part of the same scientific family, Jiyoung Kim usually focuses on Thin film, concentrating on Ferroelectricity and intersecting with Annealing and Tin. A large part of his Analytical chemistry studies is devoted to X-ray photoelectron spectroscopy. His Nanotechnology research integrates issues from Deposition and Surface modification.

He most often published in these fields:

  • Atomic layer deposition (30.00%)
  • Optoelectronics (27.18%)
  • Thin film (23.85%)

What were the highlights of his more recent work (between 2015-2021)?

  • Optoelectronics (27.18%)
  • Atomic layer deposition (30.00%)
  • Thin film (23.85%)

In recent papers he was focusing on the following fields of study:

The scientist’s investigation covers issues in Optoelectronics, Atomic layer deposition, Thin film, Analytical chemistry and Ferroelectricity. His research integrates issues of Field-effect transistor, Transistor, Monolayer, Graphene and Contact resistance in his study of Optoelectronics. His work carried out in the field of Atomic layer deposition brings together such families of science as Silicon nitride, Fourier transform infrared spectroscopy, Chemical engineering, Oxygen and Dielectric.

His Thin film study incorporates themes from Chemical vapor deposition, Molecular beam epitaxy, Ozone, Substrate and Grain size. His Analytical chemistry study focuses on X-ray photoelectron spectroscopy in particular. Jiyoung Kim has researched X-ray photoelectron spectroscopy in several fields, including Nanotechnology, Transition metal and Raman spectroscopy.

Between 2015 and 2021, his most popular works were:

  • Covalent Nitrogen Doping and Compressive Strain in MoS2 by Remote N2 Plasma Exposure. (170 citations)
  • Comparative transcriptome profiling of the human and mouse dorsal root ganglia: an RNA-seq–based resource for pain and sensory neuroscience research (119 citations)
  • Remote Plasma Oxidation and Atomic Layer Etching of MoS2 (84 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Oxygen
  • Organic chemistry

Jiyoung Kim spends much of his time researching Optoelectronics, Thin film, Analytical chemistry, X-ray photoelectron spectroscopy and Atomic layer deposition. His Optoelectronics study integrates concerns from other disciplines, such as Field-effect transistor, Transistor, Amorphous solid and Ohmic contact. His Thin film research includes elements of Doping, Resist, Molecular beam epitaxy, Dielectric and Grain size.

Jiyoung Kim has included themes like Topological insulator, Chemical substance, Impurity, Layer and Scanning tunneling microscope in his Analytical chemistry study. The concepts of his X-ray photoelectron spectroscopy study are interwoven with issues in Chalcogen, Nanotechnology, Transition metal, Raman spectroscopy and Forming gas. His Atomic layer deposition research includes themes of Silicon nitride, Ferroelectricity, Annealing, Tin and Monoclinic crystal system.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

GaAs interfacial self-cleaning by atomic layer deposition

Christopher L Hinkle;A. M. Sonnet;E. M. Vogel;Stephen J Mcdonnell.
Applied Physics Letters (2008)

469 Citations

Template-Directed Synthesis of Oxide Nanotubes: Fabrication, Characterization, and Applications†

Changdeuck Bae;Hyunjun Yoo;Sihyeong Kim;Kyungeun Lee.
Chemistry of Materials (2008)

348 Citations

Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics

Bongki Lee;Seong-Yong Park;Hyun-Chul Kim;KyeongJae Cho.
Applied Physics Letters (2008)

335 Citations

Formation of TiO2 and ZrO2 Nanotubes Using Atomic Layer Deposition with Ultraprecise Control of the Wall Thickness

Hyunjung Shin;Dae Kyun Jeong;Jaegab Lee;Myung Mo Sung.
Advanced Materials (2004)

328 Citations

HfO2 on MoS2 by Atomic Layer Deposition: Adsorption Mechanisms and Thickness Scalability

Stephen McDonnell;Barry Brennan;Angelica Azcatl;Ning Lu.
ACS Nano (2013)

256 Citations

Metal contacts on physical vapor deposited monolayer MoS2

Cheng Gong;Chunming Huang;Justin Miller;Lanxia Cheng.
ACS Nano (2013)

224 Citations

HfSe2 Thin Films: 2D Transition Metal Dichalcogenides Grown by Molecular Beam Epitaxy

Ruoyu Yue;Adam T. Barton;Hui Zhu;Angelica Azcatl.
ACS Nano (2015)

196 Citations

Half-cycle atomic layer deposition reaction studies of Al2O3 on In0.2Ga0.8As (100) surfaces

M. Milojevic;F. S. Aguirre-Tostado;C. L. Hinkle;H. C. Kim.
Applied Physics Letters (2008)

191 Citations

Covalent Nitrogen Doping and Compressive Strain in MoS2 by Remote N2 Plasma Exposure.

Angelica Azcatl;Xiaoye Qin;Abhijith Prakash;Chenxi Zhang.
Nano Letters (2016)

188 Citations

Ozone Adsorption on Graphene: Ab Initio Study and Experimental Validation

Geunsik Lee;Bongki Lee;Jiyoung Kim;Kyeongjae Cho.
Journal of Physical Chemistry C (2009)

183 Citations

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