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D-Index & Metrics

Materials Science

D-Index
64
Citations
20809
World Ranking
5782
National Ranking
15

Niall McEvoy publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Niall McEvoy sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 176 publications — 22nd percentile

22% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Niall McEvoy D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Niall McEvoy sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 64 D-Index — 55th percentile

55% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Niall McEvoy is affiliated with Trinity College Dublin in Ireland and has contributed extensively to the fields of materials science and engineering. Their research primarily focuses on materials chemistry and electrical and electronic engineering, with a notable subfield presence also in biomedical engineering, electronic, optical and magnetic materials, and atomic and molecular physics and optics.

Their work covers a range of topics including:

  • 2D materials and applications
  • Graphene research and applications
  • MXene and MAX phase materials
  • Quantum dots synthesis and properties
  • Chalcogenide semiconductor thin films
  • Advanced memory and neural computing
  • Molecular junctions and nanostructures

Among their recent publications are:

  • "Demonstrating the source of inherent instability in NiFe LDH-based OER electrocatalysts," published in 2023 in the Journal of Materials Chemistry A
  • "Two-Photon Absorption in Monolayer MXenes," published in 2020 in Advanced Optical Materials
  • "Coexistence of Negative and Positive Photoconductivity in Few-Layer PtSe 2 Field-Effect Transistors," published in 2021 in Advanced Functional Materials
  • "Insights into Multilevel Resistive Switching in Monolayer MoS2," published in 2020 in ACS Applied Materials & Interfaces
  • "Layered PtSe2 for Sensing, Photonic, and (Opto-)Electronic Applications," published in 2020 in Advanced Materials

Frequent co-authors working alongside McEvoy include:

  • Georg S. Duesberg
  • Cormac Ó Coileáin
  • Conor P. Cullen
  • Lisanne Peters
  • Oliver Hartwig

The scientist has published in various venues, with multiple publications appearing in:

  • arXiv (Cornell University)
  • ECS Meeting Abstracts
  • Advanced Functional Materials
  • ACS Applied Materials & Interfaces
  • npj 2D Materials and Applications

Best Publications

  • Scalable production of large quantities of defect-free few-layer graphene by shear exfoliation in liquids

    Keith R. Paton;Eswaraiah Varrla;Claudia Backes;Ronan J. Smith

  • Oxidation Stability of Colloidal Two-Dimensional Titanium Carbides (MXenes)

    Chuanfang John Zhang;Sergio Pinilla;Sergio Pinilla;Niall McEvoy;Conor P. Cullen

  • Transparent, Flexible, and Conductive 2D Titanium Carbide (MXene) Films with High Volumetric Capacitance.

    Chuanfang John Zhang;Babak Anasori;Andrés Seral-Ascaso;Sang-Hoon Park

  • Liquid exfoliation of solvent-stabilized few-layer black phosphorus for applications beyond electronics

    Damien Hanlon;Claudia Backes;Evie Doherty;Clotilde S Cucinotta

  • Additive-free MXene inks and direct printing of micro-supercapacitors

    Chuanfang John Zhang;Lorcan McKeon;Matthias P Kremer;Sang-Hoon Park

  • Stamping of Flexible, Coplanar Micro‐Supercapacitors Using MXene Inks

    Chuanfang John Zhang;Matthias P. Kremer;Andrés Seral-Ascaso;Sang-Hoon Park

  • Edge and confinement effects allow in situ measurement of size and thickness of liquid-exfoliated nanosheets

    Claudia Backes;Ronan J. Smith;Niall McEvoy;Nina C. Berner

  • High‐Performance Sensors Based on Molybdenum Disulfide Thin Films

    Kangho Lee;Riley Gatensby;Niall McEvoy;Toby Hallam

  • A Commercial Conducting Polymer as Both Binder and Conductive Additive for Silicon Nanoparticle-Based Lithium-Ion Battery Negative Electrodes.

    Thomas M Higgins;Sang-Hoon Park;Paul J King;Paul J King;Chuanfang John Zhang

  • High areal capacity battery electrodes enabled by segregated nanotube networks

    Sang-Hoon Park;Paul J. King;Paul J. King;Ruiyuan Tian;Conor S. Boland

  • Direct Observation of Degenerate Two-Photon Absorption and Its Saturation in WS2 and MoS2 Monolayer and Few-Layer Films.

    Saifeng Zhang;Ningning Dong;Niall McEvoy;Maria O’Brien

  • High-Performance Hybrid Electronic Devices from Layered PtSe2 Films Grown at Low Temperature.

    Chanyoung Yim;Kangho Lee;Niall McEvoy;Maria O’Brien

  • Basal-Plane Functionalization of Chemically Exfoliated Molybdenum Disulfide by Diazonium Salts

    Kathrin C. Knirsch;Nina C. Berner;Hannah C. Nerl;Clotilde S. Cucinotta

  • Investigation of the optical properties of MoS2 thin films using spectroscopic ellipsometry

    Chanyoung Yim;Maria O'Brien;Niall McEvoy;Sinéad Winters

  • High capacity silicon anodes enabled by MXene viscous aqueous ink

    Chuanfang John Zhang;Sang-Hoon Park;Andrés Seral-Ascaso;Sebastian Barwich

  • Production of Molybdenum Trioxide Nanosheets by Liquid Exfoliation and Their Application in High-Performance Supercapacitors

    Damien Hanlon;Claudia Backes;Thomas M. Higgins;Marguerite Hughes

  • A Robust, Freestanding MXene‐Sulfur Conductive Paper for Long‐Lifetime Li–S Batteries

    Huan Tang;Wenlong Li;Limei Pan;Kejun Tu

  • In Situ Formed Protective Barrier Enabled by Sulfur@Titanium Carbide (MXene) Ink for Achieving High-Capacity, Long Lifetime Li-S Batteries.

    Huan Tang;Wenlong Li;Limei Pan;Conor P Cullen

  • Electrochemical ascorbic acid sensor based on DMF-exfoliated graphene

    Gareth P. Keeley;Arlene O'Neill;Niall McEvoy;Nikos Peltekis

  • Preparation of Gallium Sulfide Nanosheets by Liquid Exfoliation and Their Application As Hydrogen Evolution Catalysts

    Andrew Harvey;Claudia Backes;Zahra Gholamvand;Damien Hanlon

  • Plasma-assisted simultaneous reduction and nitrogen doping of graphene oxide nanosheets

    Nanjundan Ashok Kumar;Hugo Nolan;Niall McEvoy;Ehsan Rezvani

Frequent Co-Authors

Georg S. Duesberg
Georg S. Duesberg Bundeswehr University Munich
Jonathan N. Coleman
Jonathan N. Coleman Trinity College Dublin
Valeria Nicolosi
Valeria Nicolosi Trinity College Dublin
Claudia Backes
Claudia Backes Heidelberg University
Paul K. Hurley
Paul K. Hurley Tyndall National Institute
Max C. Lemme
Max C. Lemme RWTH Aachen University
Werner J. Blau
Werner J. Blau Trinity College Dublin
Hongzhou Zhang
Hongzhou Zhang Trinity College Dublin
Jani Kotakoski
Jani Kotakoski University of Vienna
Martin Pumera
Martin Pumera Brno University of Technology

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