World's Best Scientists 2026 revealed!

D-Index & Metrics

Chemistry

D-Index
72
Citations
17742
World Ranking
5279
National Ranking
1645

Eric Garfunkel publication distribution in Chemistry in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Chemistry in 2026. The highlighted bar marks where Eric Garfunkel sits on this spectrum.

61–80 publications: 66 scientists 81–100 publications: 302 scientists 101–120 publications: 623 scientists 121–140 publications: 918 scientists 141–160 publications: 1,218 scientists 161–180 publications: 1,350 scientists 181–200 publications: 1,344 scientists 201–220 publications: 1,281 scientists 221–240 publications: 1,216 scientists 241–260 publications: 1,100 scientists 261–280 publications: 979 scientists 281–300 publications: 939 scientists 301–320 publications: 764 scientists 321–340 publications: 643 scientists 341–360 publications: 628 scientists 361–380 publications: 522 scientists 381–400 publications: 459 scientists 401–420 publications: 397 scientists 421–440 publications: 327 scientists 441–460 publications: 270 scientists 461–480 publications: 265 scientists 481–500 publications: 252 scientists 501–520 publications: 201 scientists 521–540 publications: 185 scientists 541–560 publications: 148 scientists 561–580 publications: 148 scientists 581–600 publications: 132 scientists 601–620 publications: 114 scientists 621–640 publications: 104 scientists 641–660 publications: 91 scientists 661–680 publications: 92 scientists 681–700 publications: 73 scientists 701–720 publications: 57 scientists 721–740 publications: 54 scientists 741–760 publications: 67 scientists 761–780 publications: 45 scientists 781–800 publications: 46 scientists 801–820 publications: 39 scientists 821–840 publications: 32 scientists 841–860 publications: 36 scientists 861–880 publications: 29 scientists 881–900 publications: 26 scientists 901–920 publications: 24 scientists 921–940 publications: 14 scientists 941–960 publications: 23 scientists 961–980 publications: 28 scientists 981–1,000 publications: 15 scientists 1,001–1,020 publications: 29 scientists 1,021–1,040 publications: 12 scientists 1,041–1,060 publications: 19 scientists 1,061–1,080 publications: 12 scientists 1,081–1,100 publications: 6 scientists 1,101–1,120 publications: 8 scientists 1,121–1,140 publications: 12 scientists 1,141–1,160 publications: 5 scientists 1,161–1,180 publications: 6 scientists 1,181–1,200 publications: 14 scientists 1,201–1,220 publications: 7 scientists 1,221–1,240 publications: 2 scientists 1,241–1,260 publications: 6 scientists 1,261–1,280 publications: 4 scientists 1,281–1,294 publications: 6 scientists 1,295+ publications: 100 scientists
61 publications 1,295+

This scientist: 227 publications — 42nd percentile

42% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,295 publications or more.

Eric Garfunkel D-index placement in Chemistry in 2026

The chart shows the D-index (discipline H-index) distribution of Chemistry scientists ranked by Research.com in 2026. The highlighted bar marks where Eric Garfunkel sits on this spectrum.

40–41 D-Index: 289 scientists 42–43 D-Index: 612 scientists 44–45 D-Index: 808 scientists 46–47 D-Index: 776 scientists 48–49 D-Index: 835 scientists 50–51 D-Index: 861 scientists 52–53 D-Index: 872 scientists 54–55 D-Index: 933 scientists 56–57 D-Index: 1,051 scientists 58–59 D-Index: 930 scientists 60–61 D-Index: 882 scientists 62–63 D-Index: 834 scientists 64–65 D-Index: 731 scientists 66–67 D-Index: 775 scientists 68–69 D-Index: 683 scientists 70–71 D-Index: 646 scientists 72–73 D-Index: 561 scientists 74–75 D-Index: 501 scientists 76–77 D-Index: 437 scientists 78–79 D-Index: 388 scientists 80–81 D-Index: 354 scientists 82–83 D-Index: 292 scientists 84–85 D-Index: 275 scientists 86–87 D-Index: 254 scientists 88–89 D-Index: 235 scientists 90–91 D-Index: 185 scientists 92–93 D-Index: 192 scientists 94–95 D-Index: 155 scientists 96–97 D-Index: 163 scientists 98–99 D-Index: 125 scientists 100–101 D-Index: 105 scientists 102–103 D-Index: 105 scientists 104–105 D-Index: 112 scientists 106–107 D-Index: 88 scientists 108–109 D-Index: 68 scientists 110–111 D-Index: 69 scientists 112–113 D-Index: 65 scientists 114–115 D-Index: 79 scientists 116–117 D-Index: 61 scientists 118–119 D-Index: 44 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 40 scientists 124–125 D-Index: 33 scientists 126–127 D-Index: 26 scientists 128–129 D-Index: 34 scientists 130–131 D-Index: 35 scientists 132–133 D-Index: 25 scientists 134–135 D-Index: 27 scientists 136–137 D-Index: 17 scientists 138–139 D-Index: 16 scientists 140–141 D-Index: 20 scientists 142–143 D-Index: 20 scientists 144–145 D-Index: 15 scientists 146–147 D-Index: 9 scientists 148–149 D-Index: 9 scientists 150–151 D-Index: 16 scientists 152–153 D-Index: 11 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 3 scientists 158 D-Index: 3 scientists 159+ D-Index: 98 scientists
40 D-Index 159+

This scientist: 72 D-Index — 71st percentile

71% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 159 D-Index or more.

Overview

Eric Garfunkel is affiliated with Rutgers, The State University of New Jersey in the United States. Their research spans multiple areas within engineering and materials science, particularly focusing on electrical and electronic engineering, materials chemistry, renewable energy, sustainability, and biomedical engineering.

The scientist has contributed extensively to several specialized subfields, including:

  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Renewable Energy, Sustainability and the Environment
  • Biomedical Engineering
  • Electronic, Optical and Magnetic Materials

Garfunkel's work covers a range of main topics such as:

  • Nanowire Synthesis and Applications
  • Advanced Photocatalysis Techniques
  • Electrocatalysts for Energy Conversion
  • Advanced Electron Microscopy Techniques and Applications
  • Semiconductor materials and devices
  • Perovskite Materials and Applications
  • Electron and X-Ray Spectroscopy Techniques

The scientist has published regularly in a number of academic venues, with frequent appearances in:

  • Physical Review B
  • Microscopy and Microanalysis
  • arXiv (Cornell University)
  • The Cambridge Structural Database
  • Nature Energy

Key recently published papers include:

  • "Electrolyte design for LiF-rich solid-electrolyte interfaces to enable high-performance microsized alloy anodes for batteries," 2020, Nature Energy
  • "Enhancing interfacial charge transfer in a WO3/BiVO4 photoanode heterojunction through gallium and tungsten co-doping and a sulfur modified Bi2O3 interfacial layer," 2021, Journal of Materials Chemistry A
  • "Two-Dimensional Copper Iodide-Based Inorganic-Organic Hybrid Semiconductors: Synthesis, Structures, and Optical and Transport Properties," 2021, Chemistry of Materials
  • "CO2 electro-reduction on Cu3P: Role of Cu(I) oxidation state and surface facet structure in C1-formate production and H2 selectivity," 2021, Electrochimica Acta
  • "TiO2/TiN Interface Enables Integration of Ni5P4 Electrocatalyst with a III-V Tandem Photoabsorber for Stable Unassisted Solar-Driven Water Splitting," 2024, ACS Energy Letters

Frequent co-authors associated with Garfunkel's research include:

  • Hongbin Yang
  • Philip E. Batson
  • Hengfei Gu
  • Shinjae Hwang
  • Anders B. Laursen

Best Publications

  • Evolution of Electrical, Chemical, and Structural Properties of Transparent and Conducting Chemically Derived Graphene Thin Films

    Cecilia Mattevi;Goki Eda;Stefano Agnoli;Steve Miller

  • Electrolyte design for LiF-rich solid–electrolyte interfaces to enable high-performance microsized alloy anodes for batteries

    Ji Chen;Xiulin Fan;Qin Li;Hongbin Yang

  • Photochemical Water Oxidation by Crystalline Polymorphs of Manganese Oxides: Structural Requirements for Catalysis

    David M. Robinson;Yong Bok Go;Michelle Mui;Graeme Gardner

  • Effect of nitrogen on band alignment in HfSiON gate dielectrics

    S. Sayan;N. V. Nguyen;J. Ehrstein;J. J. Chambers

  • HfO2 and Al2O3 gate dielectrics on GaAs grown by atomic layer deposition

    Martin M. Frank;Glen D. Wilk;Dmitri Starodub;Torgny Gustafsson

  • Intermixing at the tantalum oxide/silicon interface in gate dielectric structures

    G. B. Alers;D. J. Werder;Y. Chabal;H. C. Lu

  • P-Doped Porous Carbon as Metal Free Catalysts for Selective Aerobic Oxidation with an Unexpected Mechanism.

    Mehulkumar A. Patel;Feixiang Luo;M. Reza Khoshi;Emann Rabie

  • Band offsets of ultrathin high- κ oxide films with Si

    Eric Bersch;Sylvie Rangan;Robert Allen Bartynski;Eric Garfunkel

  • TITANIUM AND REDUCED TITANIA OVERLAYERS ON TITANIUM DIOXIDE (110)

    J.T. Mayer;U. Diebold;T.E. Madey;E. Garfunkel

  • Instability, intermixing and electronic structure at the epitaxial LaAlO3/SrTiO3(001) heterojunction

    Scott A. Chambers;Mark H. Engelhard;V. Shutthanandan;Zihua Zhu

  • High temperature stability in lanthanum and zirconia-based gate dielectrics

    J.-P. Maria;D. Wicaksana;A. I. Kingon;B. Busch

  • Growth and characterization of ultrathin nitrided silicon oxide films

    E. P. Gusev;H.-C. Lu;E. L. Garfunkel;T. Gustafsson

  • The coadsorption of potassium and co on the pt(111) crystal surface: A TDS, HREELS and UPS study

    J. E. Crowell;Eric Garfunkel;G. A. Somorjai

  • Growth mechanism of thin silicon oxide films on Si(100) studied by medium-energy ion scattering.

    E. P. Gusev;H. C. Lu;T. Gustafsson;Eric Garfunkel

  • Metallic Contact Formation for Molecular Electronics : Interactions between Vapor-Deposited Metals and Self-Assembled Monolayers of Conjugated Mono- and Dithiols

    Bert de Boer;Bert de Boer;Martin M. Frank;Martin M. Frank;Yves J. Chabal;Weirong Jiang

  • Production of graphene sheets by direct dispersion with aromatic healing agents.

    Ming Zhang;Rishi R. Parajuli;Daniel Mastrogiovanni;Boya Dai

  • Climbing the Volcano of Electrocatalytic Activity while Avoiding Catalyst Corrosion: Ni3P, a Hydrogen Evolution Electrocatalyst Stable in Both Acid and Alkali

    Anders B. Laursen;Robert B. Wexler;Marianna J. Whitaker;Edward J. Izett

  • Selective CO2 reduction to C3 and C4 oxyhydrocarbons on nickel phosphides at overpotentials as low as 10 mV

    Karin U. D. Calvinho;Anders B. Laursen;Kyra M. K. Yap;Timothy A. Goetjen

  • Soft x-ray photoemission studies of the HfO2/SiO2/Si system

    S. Sayan;E. Garfunkel;S. Suzer

  • Versatile fluorescence resonance energy transfer-based mesoporous silica nanoparticles for real-time monitoring of drug release.

    Jinping Lai;Birju P. Shah;Eric Garfunkel;Ki Bum Lee

  • The strong influence of potassium on the adsorption of carbon monoxide on platinum surfaces: a TDS and HREELS study

    Eric Garfunkel;J. E. Crowell;G. A. Somorjai

  • Ga-doped ZnO single-crystal nanotips grown on fused silica by metalorganic chemical vapor deposition

    J. Zhong;S. Muthukumar;Y. Chen;Y. Lu

Frequent Co-Authors

Leonard C. Feldman
Leonard C. Feldman Rutgers, The State University of New Jersey
Huixin He
Huixin He Rutgers, The State University of New Jersey
Yves J. Chabal
Yves J. Chabal The University of Texas at Dallas
Martin L. Green
Martin L. Green National Institute of Standards and Technology
Zhenan Bao
Zhenan Bao Stanford University
Richard Mendelsohn
Richard Mendelsohn Rutgers, The State University of New Jersey
Martha Greenblatt
Martha Greenblatt Rutgers, The State University of New Jersey
Theodore E. Madey
Theodore E. Madey Rutgers, The State University of New Jersey
Vitaly Podzorov
Vitaly Podzorov Rutgers, The State University of New Jersey
Gennadi Bersuker
Gennadi Bersuker The Aerospace Corporation

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