World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
37
Citations
5343
World Ranking
5157
National Ranking
757

Overview

Hei Wong is affiliated with the City University of Hong Kong in China and has a research portfolio focused primarily on engineering, particularly within the fields of electrical and electronic engineering, materials chemistry, atomic and molecular physics, optics, biomedical engineering, and electronic, optical, and magnetic materials.

Their main research topics include semiconductor materials and devices, advancements in semiconductor devices and circuit design, advanced memory and neural computing, semiconductor materials and interfaces, nanowire synthesis and applications, electronic and structural properties of oxides, and copper interconnects and reliability.

Recent papers by Hei Wong include:

  • On the Vertically Stacked Gate-All-Around Nanosheet and Nanowire Transistor Scaling beyond the 5 nm Technology Node, 2022, Nanomaterials
  • Contacts at the Nanoscale and for Nanomaterials, 2024, Nanomaterials
  • Effects of silicon surface defects on the graphene/silicon Schottky characteristics, 2021, Results in Physics
  • Characteristic Variabilities of Subnanometer EOT La2O3 Gate Dielectric Film of Nano CMOS Devices, 2021, Nanomaterials
  • Abridging CMOS Technology, 2022, Nanomaterials

The frequent coauthors collaborating with Hei Wong include Jieqiong Zhang, Shurong Dong, Kuniyuki Kakushima, Muhammad Abid Anwar, and Wenhan Bao.

Major publication venues where Hei Wong's work has appeared are:

  • Nanomaterials (9 publications)
  • ACS Applied Materials & Interfaces
  • Results in Physics
  • Journal of Circuits Systems and Computers
  • ACS Applied Energy Materials

The research contributions span multiple subfields, with particular emphasis on electrical and electronic engineering. This includes exploration of nanoscale transistors, semiconductor interfaces, and materials relevant to the development of advanced CMOS technologies.

Best Publications

  • On the scaling issues and high-κ replacement of ultrathin gate dielectrics for nanoscale MOS transistors

    Hei Wong;Hei Wong;Hiroshi Iwai

  • Low-frequency noise study in electron devices: review and update

    Hei Wong

  • Electronic structure and charge transport properties of amorphous Ta2O5 films

    V.A. Shvets;V.Sh. Aliev;D.V. Gritsenko;S.S. Shaimeev

  • Conduction mechanisms in MOS gate dielectric films

    Bing-Liang Yang;P. T. Lai;Hei Wong

  • Electronic structure of α-Al 2 O 3 : Ab initio simulations and comparison with experiment

    T. V. Perevalov;A. V. Shaposhnikov;V. A. Gritsenko;H. Wong

  • Defects in silicon oxynitride gate dielectric films

    Hei Wong;V.A. Gritsenko

  • Atomic and electronic structure of amorphous and crystalline hafnium oxide: X-ray photoelectron spectroscopy and density functional calculations

    T. V. Perevalov;V. A. Gritsenko;S. B. Erenburg;A. M. Badalyan

  • XPS Study of the Thermal Instability of HfO2 Prepared by Hf Sputtering in Oxygen with RTA

    Nian Zhan;M. C. Poon;C. W. Kok;K. L. Ng

  • The road to miniaturization

    Hei Wong;Hiroshi Iwai

  • Short-range order in non-stoichiometric amorphous silicon oxynitride and silicon-rich nitride

    V.A. Gritsenko;R.W.M. Kwok;Hei Wong;J.B. Xu

  • Gettering of gold and copper with implanted carbon in silicon

    H. Wong;N. W. Cheung;P. K. Chu

  • Recent developments in silicon optoelectronic devices

    Hei Wong

  • Interface bonding structure of hafnium oxide prepared by direct sputtering of hafnium in oxygen

    Hei Wong;K. L. Ng;Nian Zhan;M. C. Poon

  • Silicon dots/clusters in silicon nitride: photoluminescence and electron spin resonance

    V.A. Gritsenko;K.S. Zhuravlev;A.D. Milov;Hei Wong

  • X-ray photoelectron spectroscopy study of high-k CeO2/La2O3 stacked dielectrics

    Jieqiong Zhang;Hei Wong;Hei Wong;Danqun Yu;Kuniyuki Kakushima

  • Luminescence of intrinsic and extrinsic defects in hafnium oxide films

    A. A. Rastorguev;V. I. Belyi;T. P. Smirnova;L. V. Yakovkina

  • Material properties of interfacial silicate layer and its influence on the electrical characteristics of MOS devices using hafnia as the gate dielectric

    Hei Wong;B. Sen;V. Filip;M.C. Poon

  • Interface and oxide traps in high-κ hafnium oxide films

    H. Wong;N. Zhan;K.L. Ng;M.C. Poon

  • Nanometer CMOS

    Frank Schwierz;Hei Wong;Juin J. Liou

  • On the scaling of subnanometer EOT gate dielectrics for ultimate nano CMOS technology

    Hei Wong;Hiroshi Iwai

  • Preparation of Thin Dielectric Film for Nonvolatile Memory by Thermal Oxidation of Si-Rich LPCVD Nitride

    Hei Wong;M. C. Poon;Yong Gao;Ted C. W. Kok

  • Effects of low temperature annealing on the ultrathin La2O3 gate dielectric; comparison of post deposition annealing and post metallization annealing

    J. A. Ng;Y. Kuroki;N. Sugii;K. Kakushima

  • Trapping characteristics of lanthanum oxide gate dielectric film explored from temperature dependent current-voltage and capacitance-voltage measurements

    Banani Sen;Hei Wong;J. Molina;H. Iwai

  • Approximation of the length of velocity saturation region in MOSFET's

    H. Wong;M.C. Poon

Frequent Co-Authors

Hiroshi Iwai
Hiroshi Iwai Tokyo Institute of Technology
Shurong Dong
Shurong Dong Zhejiang University
Mansun Chan
Mansun Chan Hong Kong University of Science and Technology
Juin J. Liou
Juin J. Liou Shenzhen University
Paul K. Chu
Paul K. Chu City University of Hong Kong
Jianbin Xu
Jianbin Xu Chinese University of Hong Kong
Yang Xu
Yang Xu Zhejiang University
Xun-Li Wang
Xun-Li Wang City University of Hong Kong
Nathan W. Cheung
Nathan W. Cheung University of California, Berkeley
Man Wong
Man Wong Hong Kong University of Science and Technology

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Related Online Degrees & Career Pathways

For those interested in expanding their expertise beyond traditional electrical and electronics engineering roles, online degrees offer flexible pathways tailored to diverse career goals. Programs such as the best online master's for teaching allow professionals to transition into educational roles, perfect for those looking to share their knowledge in academic or corporate environments.

Competency-based learning is gaining traction, enabling students to advance based on skills rather than time spent in class. This approach, detailed in competency based masters degrees, is ideal for working engineers who want a flexible, self-paced study plan that recognizes prior experience.

Military spouses and dependents often face unique educational challenges. Resources such as the best online college for military spouses provide tailored support, ensuring access to quality programs that accommodate frequent relocations and demanding schedules.

Additionally, many institutions now offer online colleges with weekly start dates, granting prospective students greater flexibility to begin their studies promptly, a vital feature for those balancing work, family, and education.

Best Scientists Citing Hei Wong

Trending Scientists

Recently Published Articles