World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
59
Citations
16701
World Ranking
1712
National Ranking
687

Yu-Hwa Lo publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Yu-Hwa Lo sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 437 publications — 79th percentile

79% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Yu-Hwa Lo D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Yu-Hwa Lo sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 59 D-Index — 75th percentile

75% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Research.com Recognitions

  • 2006 - IEEE Fellow For contributions to integrated optoelectronics materials processing.
  • 2005 - OSA Fellows For contributions to integrated optoelectronics and compound semiconductor materials processing

Overview

Yu-Hwa Lo is affiliated with the University of California, San Diego in the United States. Their research primarily focuses on engineering and materials science, with a significant number of publications in electrical and electronic engineering, materials chemistry, and biomedical engineering. The scientist also has contributions in biophysics and the study of electronic, optical, and magnetic materials.

Their work covers key topics including perovskite materials and applications, quantum dots synthesis and properties, microfluidic and bio-sensing technologies, single-cell and spatial transcriptomics, cell image analysis techniques, advanced optical sensing technologies, and plasmonic and surface plasmon research.

Yu-Hwa Lo has coauthored papers frequently with several researchers:

  • Yimu Chen
  • Yusheng Lei
  • Yuheng Li
  • Yue Gu
  • Kesong Yang

Their publications have appeared in various reputable scientific journals. Frequent publication venues include:

  • Nature
  • Scientific Reports
  • Nature Physics
  • Nanophotonics
  • Proceedings of the National Academy of Sciences

Notable recent papers by Yu-Hwa Lo include:

  • Strain engineering and epitaxial stabilization of halide perovskites, 2020, Nature
  • A fabrication process for flexible single-crystal perovskite devices, 2020, Nature
  • Symmetry-breaking-induced plasmonic exceptional points and nanoscale sensing, 2020, Nature Physics
  • Perovskite superlattices with efficient carrier dynamics, 2022, Nature
  • Differentiating and quantifying exosome secretion from a single cell using quasi-bound states in the continuum, 2020, Nanophotonics

The scientist has been recognized with professional honors including the IEEE Fellow award in 2006 for contributions to integrated optoelectronics materials processing, and the OSA Fellow award in 2005 for contributions to integrated optoelectronics and compound semiconductor materials processing.

Best Publications

  • ZnO Nanowire UV Photodetectors with High Internal Gain

    C. Soci;A. Zhang;B. Xiang;S. A. Dayeh

  • Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask

    K. O. Hill;B. Malo;F. Bilodeau;D. C. Johnson

  • Strain engineering and epitaxial stabilization of halide perovskites.

    Yimu Chen;Yusheng Lei;Yuheng Li;Yugang Yu

  • Self-ordered pore structure of anodized aluminum on silicon and pattern transfer

    D. Crouse;Yu-Hwa Lo;A. E. Miller;M. Crouse

  • A fabrication process for flexible single-crystal perovskite devices

    Yusheng Lei;Yimu Chen;Ruiqi Zhang;Yuheng Li

  • UV/ozone modification of poly(dimethylsiloxane) microfluidic channels

    Yevgeny Berdichevsky;Julia Khandurina;András Guttman;Y.-H. Lo

  • New approach to grow pseudomorphic structures over the critical thickness

    Y. H. Lo

  • Symmetry-breaking-induced plasmonic exceptional points and nanoscale sensing

    Jun-Hee Park;Jun-Hee Park;Abdoulaye Ndao;Abdoulaye Ndao;Wei Cai;Liyi Hsu;Liyi Hsu

  • Review: imaging technologies for flow cytometry

    Yuanyuan Han;Yi Gu;Alex Ce Zhang;Yu-Hwa Lo

  • Bonding by atomic rearrangement of InP/InGaAsP 1.5 μm wavelength lasers on GaAs substrates

    Y. H. Lo;R. Bhat;D. M. Hwang;M. A. Koza

  • Microfluidics and photonics for Bio-System-on-a-Chip: a review of advancements in technology towards a microfluidic flow cytometry chip.

    Jessica Godin;Chun-Hao Chen;Sung Hwan Cho;Wen Qiao;Wen Qiao

  • Wireless power mechanisms for lab-on-a-chip devices

    Yu-hwa Lo;Wen Qiao

  • Human mammalian cell sorting using a highly integrated micro-fabricated fluorescence-activated cell sorter (μFACS)

    Sung Hwan Cho;Chun H. Chen;Frank S. Tsai;Jessica M. Godin

  • Lattice engineered compliant substrate for defect-free heteroepitaxial growth

    F. E. Ejeckam;Y. H. Lo;S. Subramanian;H. Q. Hou

  • Review Article: Recent advancements in optofluidic flow cytometer

    Sung Hwan Cho;Jessica M. Godin;Chun-Hao Chen;Wen Qiao

  • SURFACE MICROMACHINED FABRY-PEROT TUNABLE FILTER

    A. T. T. D. Tran;Y. H. Lo;Z. H. Zhu;D. Haronian

  • Ultrahigh Responsivity Visible and Infrared Detection Using Silicon Nanowire Phototransistors

    Arthur Zhang;Hongkwon Kim;James Cheng;Yu-Hwa Lo

  • Dark count probability and quantum efficiency of avalanche photodiodes for single-photon detection

    Y. Kang;H. X. Lu;Y.-H. Lo;D. S. Bethune

  • Wafer bonding technology and its applications in optoelectronic devices and materials

    Z.-H. Zhu;F.E. Ejeckam;Y. Qian;Jizhi Zhang

  • Heteroepitaxial growth with thermal expansion and lattice mismatch

    Yu-Hwa Lo;Felix E. Ejeckam;Zuhua Zhu

  • Semiconductor lasers on Si substrates using the technology of bonding by atomic rearrangement

    Y. H. Lo;R. Bhat;D. M. Hwang;C. Chua

Frequent Co-Authors

Rajaram Bhat
Rajaram Bhat Corning (United States)
Gert Cauwenberghs
Gert Cauwenberghs University of California, San Diego
Diana L. Huffaker
Diana L. Huffaker The University of Texas at Arlington
Dennis G. Deppe
Dennis G. Deppe University of Central Florida
William R. Freeman
William R. Freeman University of California, San Diego
Paul K. L. Yu
Paul K. L. Yu University of California, San Diego
Deli Wang
Deli Wang University of California, San Diego
Sheng Xu
Sheng Xu University of California, San Diego
Noel C. MacDonald
Noel C. MacDonald University of California, Santa Barbara
Cesare Soci
Cesare Soci Nanyang Technological University

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