D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Electronics and Electrical Engineering D-index 30 Citations 5,287 600 World Ranking 4684 National Ranking 1737

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Optoelectronics
  • Electrical engineering

The scientist’s investigation covers issues in Optoelectronics, Semiconductor, Electrical engineering, Electronic engineering and Epitaxy. His biological study focuses on CMOS. His Semiconductor study combines topics from a wide range of disciplines, such as Fin and Wafer bonding.

His studies deal with areas such as Etching and Silicon on insulator as well as Electrical engineering. The Electronic engineering study combines topics in areas such as Annealing, Doping and Silicon. His Epitaxy research is multidisciplinary, incorporating perspectives in Semiconductor materials and Fin.

His most cited work include:

  • Extremely thin SOI (ETSOI) CMOS with record low variability for low power system-on-chip applications (160 citations)
  • Planar substrate with selected semiconductor crystal orientations formed by localized amorphzation and recrystallization of stacked template layers (141 citations)
  • CMOS on hybrid substrate with different crystal orientations using silicon-to-silicon direct wafer bonding (104 citations)

What are the main themes of his work throughout his whole career to date?

His scientific interests lie mostly in Optoelectronics, Semiconductor, Layer, Epitaxy and Substrate. The study incorporates disciplines such as Semiconductor device, Field-effect transistor, Transistor, Electronic engineering and Electrical engineering in addition to Optoelectronics. His study looks at the relationship between Electronic engineering and fields such as Germanium, as well as how they intersect with chemical problems.

His Semiconductor study combines topics in areas such as Fin, Fin and Insulator. His Layer research incorporates elements of Metal and Dielectric. Alexander Reznicek interconnects Trench and Doping in the investigation of issues within Epitaxy.

He most often published in these fields:

  • Optoelectronics (82.68%)
  • Semiconductor (32.08%)
  • Layer (31.63%)

What were the highlights of his more recent work (between 2018-2021)?

  • Optoelectronics (82.68%)
  • Layer (31.63%)
  • Transistor (19.13%)

In recent papers he was focusing on the following fields of study:

His primary scientific interests are in Optoelectronics, Layer, Transistor, Semiconductor and Nanosheet. His work deals with themes such as Field-effect transistor, Substrate, Semiconductor device and Epitaxy, which intersect with Optoelectronics. His studies in Layer integrate themes in fields like Metal, Bipolar junction transistor, Resistive random-access memory and Memory cell.

The study incorporates disciplines such as Fin, Composite material and Annealing in addition to Transistor. His research in Semiconductor intersects with topics in Nanowire, Doping and Integrated circuit. His Nanosheet research incorporates themes from Semiconductor structure, Amorphous solid, Leakage, CMOS and Gate stack.

Between 2018 and 2021, his most popular works were:

  • Full air-gap spacers for gate-all-around nanosheet field effect transistors (8 citations)
  • Formation of self-limited inner spacer for gate-all-around nanosheet FET (7 citations)
  • Vertically stacked nFET and pFET with dual work function (5 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Transistor
  • Optoelectronics

Alexander Reznicek mainly focuses on Optoelectronics, Nanosheet, Transistor, Semiconductor and Semiconductor device. He combines subjects such as Field-effect transistor and Layer, Substrate, Epitaxy with his study of Optoelectronics. His Nanosheet research incorporates elements of Semiconductor materials, Semiconductor structure, Doping and Gate stack.

The concepts of his Transistor study are interwoven with issues in Annealing, Terminal and Composite material. His research integrates issues of Fin, Gate dielectric and Resistor in his study of Semiconductor. The Semiconductor device study which covers Low voltage that intersects with Memory cell and EEPROM.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Planar substrate with blended orientations and its forming method

Alexander Reznicek.
(2009)

179 Citations

Extremely thin SOI (ETSOI) CMOS with record low variability for low power system-on-chip applications

K. Cheng;A. Khakifirooz;P. Kulkarni;S. Ponoth.
international electron devices meeting (2009)

165 Citations

Extremely thin SOI (ETSOI) CMOS with record low variability for low power system-on-chip applications

K. Cheng;A. Khakifirooz;P. Kulkarni;S. Ponoth.
international electron devices meeting (2009)

165 Citations

CMOS on hybrid substrate with different crystal orientations using silicon-to-silicon direct wafer bonding

Meikei Ieong;Alexander Reznicek;Min Yang.
(2003)

139 Citations

CMOS on hybrid substrate with different crystal orientations using silicon-to-silicon direct wafer bonding

Meikei Ieong;Alexander Reznicek;Min Yang.
(2003)

139 Citations

Method for manufacturing strain silicon mixing underlay and silicon mixing underlay

Meikei Ieong;Shreesh Narasimha;Alexander Reznicek;Kern Rim.
(2006)

119 Citations

Method for manufacturing strain silicon mixing underlay and silicon mixing underlay

Meikei Ieong;Shreesh Narasimha;Alexander Reznicek;Kern Rim.
(2006)

119 Citations

Ion implantation combined with in situ or ex situ heat treatment for improved field effect transistors

Stephen W. Bedell;Joel P. Desouza;Zhibin Ren;Alexander Reznicek.
(2007)

114 Citations

Ion implantation combined with in situ or ex situ heat treatment for improved field effect transistors

Stephen W. Bedell;Joel P. Desouza;Zhibin Ren;Alexander Reznicek.
(2007)

114 Citations

Finfet structures having silicon germanium and silicon fins

Kangguo Cheng;Bruce B. Doris;Ali Khakifirooz;Alexander Reznicek.
(2015)

111 Citations

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