World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
38
Citations
7561
World Ranking
4838
National Ranking
1693

Overview

Min Yang is affiliated with Sterne, Kessler, Goldstein & Fox in the United States. Their research primarily centers on environmental science with a significant focus on materials chemistry, electrical and electronic engineering, molecular biology, pollution, and health, toxicology, and mutagenesis.

The scientist's work addresses multiple topics including pharmaceutical and antibiotic environmental impacts, water treatment and disinfection, advanced battery technologies research, advanced battery materials and technologies, antibiotic resistance in bacteria, catalytic processes in materials science, and advanced photocatalysis techniques.

Min Yang has contributed to several notable publications in scientific journals. Some recent papers include:

  • "Graphene aerogel-based NiAl-LDH/g-C3N4 with ultratight sheet-sheet heterojunction for excellent visible-light photocatalytic activity of CO2 reduction" (2022, Applied Catalysis B: Environmental)
  • "A Binary Hydrate-Melt Electrolyte with Acetate-Oriented Cross-Linking Solvation Shells for Stable Zinc Anodes" (2022, Advanced Materials)

Additional influential papers involving related fields associated with Min Yang's research include:

  • "A review on the characteristics of microplastics in wastewater treatment plants: A source for toxic chemicals" (2021, Journal of Cleaner Production)
  • "An Ultralow Temperature Aqueous Battery with Proton Chemistry" (2021, Angewandte Chemie International Edition)
  • "Microplastic sampling techniques in freshwaters and sediments: a review" (2021, Environmental Chemistry Letters)

The scientist frequently publishes in a variety of journals, with the highest number of contributions in:

  • Water Research
  • The Science of The Total Environment
  • Chemosphere
  • Journal of Environmental Sciences
  • Environmental Science & Technology

Min Yang collaborates with multiple coauthors, including Yu Zhang, Jianwei Yu, Ziming Han, Zhe Tian, and Zhiqiang Niu, among others. These collaborations reflect the interdisciplinary nature of their research.

Best Publications

  • Silicon Device Scaling to the Sub-10-nm Regime

    Meikei Ieong;Bruce Doris;Jakub Kedzierski;Ken Rim

  • Benchmarking Organic Micropollutants in Wastewater, Recycled Water and Drinking Water with In Vitro Bioassays

    Beate I. Escher;Mayumi Allinson;Mayumi Allinson;Rolf Altenburger;Peter A. Bain

  • High performance CMOS fabricated on hybrid substrate with different crystal orientations

    M. Yang;M. Ieong;L. Shi;K. Chan

  • Write Strategies for 2 and 4-bit Multi-Level Phase-Change Memory

    T. Nirschl;J.B. Phipp;T.D. Happ;G.W. Burr

  • A 90nm CMOS integrated Nano-Photonics technology for 25Gbps WDM optical communications applications

    Solomon Assefa;Steven Shank;William Green;Marwan Khater

  • CMOS circuit performance enhancement by surface orientation optimization

    Leland Chang;Meikei Ieong;Min Yang

  • Hybrid planar and FinFET CMOS devices

    Bruce B. Doris;Diane C. Boyd;Meikei Ieong;Thomas S. Kanarsky

  • Hybrid-orientation technology (HOT): opportunities and challenges

    Min Yang;V.W.C. Chan;K.K. Chan;L. Shi

  • Non-Blocking 4x4 Electro-Optic Silicon Switch for On-Chip Photonic Networks

    Min Yang;William M. J. Green;Solomon Assefa;Joris Van Campenhout

  • High-performance cmos soi device on hybrid crystal-oriented substrates

    Bruce B. Doris;Kathryn W. Guarini;Meikei Ieong;Shreesh Narasimha

  • Study of the Raman peak shift and the linewidth of light‐emitting porous silicon

    Min Yang;Daming Huang;Pinghai Hao;Fulong Zhang

  • A 25 Gbps silicon microring modulator based on an interleaved junction

    J. C. Rosenberg;W. M.J. Green;S. Assefa;D. M. Gill

  • Performance dependence of CMOS on silicon substrate orientation for ultrathin oxynitride and HfO 2 gate dielectrics

    Min Yang;E.P. Gusev;Meikei Ieong;O. Gluschenkov

  • Ultra thin body fully-depleted soi mosfets

    Bruce B. Doris;Meikei Ieong;Zhibin Ren;Paul M. Solomon

  • Strained insulated silicon

    Meikei Ieong;Min Yang

  • Novel Lithography-Independent Pore Phase Change Memory

    M. Breitwisch;T. Nirschl;C.F. Chen;Y. Zhu

  • CMOS on hybrid substrate with different crystal orientations using silicon-to-silicon direct wafer bonding

    Meikei Ieong;Alexander Reznicek;Min Yang

  • Strained Si CMOS (SS CMOS) technology: Opportunities and challenges

    K. Rim;R. Anderson;D. Boyd;F. Cardone

  • HYBRID SUBSTRATE FOR HIGH-MOBILITY PLANAR AND MULTIPLE-GATE MOSFETS, SUBSTRATE STRUCTURE, AND METHOD OF FORMING SAID SUBSTRATE

    Doris Bruce B;Yun Mei Kei;Novak Edward J;Yang Min

  • Method for manufacturing strain silicon mixing underlay and silicon mixing underlay

    Meikei Ieong;Shreesh Narasimha;Alexander Reznicek;Kern Rim

  • Mixed orientation and mixed material semiconductor-on-insulator wafer

    Guy M. Cohen;Alexander Reznicek;Katherine L. Saenger;Min Yang

Frequent Co-Authors

Meikei Ieong
Meikei Ieong Simbury Limited
Solomon Assefa
Solomon Assefa IBM (United States)
Yurii A. Vlasov
Yurii A. Vlasov University of Illinois at Urbana-Champaign
Kevin K. Chan
Kevin K. Chan IBM (United States)
Bruce B. Doris
Bruce B. Doris IBM (United States)
Clint L. Schow
Clint L. Schow University of California, Santa Barbara
Alexander Reznicek
Alexander Reznicek IBM (United States)
Fuad E. Doany
Fuad E. Doany IBM (United States)
Christopher V. Jahnes
Christopher V. Jahnes IBM (United States)
William M. J. Green
William M. J. Green IBM (United States)

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Related Online Degrees & Career Pathways

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Many of these programs incorporate innovative learning models such as competency based masters degrees, which focus on demonstrating skills and mastery rather than time spent in class. This approach appeals to those looking to build practical expertise in a targeted timeframe.

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