World's Best Scientists 2026 revealed!
Christopher V. Jahnes

Christopher V. Jahnes

D-Index & Metrics

Materials Science

D-Index
53
Citations
9060
World Ranking
9301
National Ranking
2251

Engineering and Technology

D-Index
50
Citations
7396
World Ranking
4177
National Ranking
1194

Christopher V. Jahnes publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Christopher V. Jahnes sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 184 publications — 41st percentile

41% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Christopher V. Jahnes D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Christopher V. Jahnes sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 50 D-Index — 59th percentile

59% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

What is he best known for?

The fields of study he is best known for:

  • Electrical engineering
  • Semiconductor
  • Composite material

His primary areas of study are Optoelectronics, Integrated circuit, Dielectric, Interconnection and Electrical engineering. His research on Optoelectronics frequently links to adjacent areas such as Transformer. Christopher V. Jahnes focuses mostly in the field of Integrated circuit, narrowing it down to matters related to Electromagnetic coil and, in some cases, Ferromagnetism.

His Dielectric research includes elements of Carbon, Electronic engineering, Nanotechnology and Composite material. His Tribometer study in the realm of Composite material connects with subjects such as Relative humidity. His research investigates the connection between Interconnection and topics such as Substrate that intersect with issues in Electrical conductor, Etching, Dielectric matrix and Stripping.

His most cited work include:

  • Hydrogenated oxidized silicon carbon material (346 citations)
  • Multilayer interconnect structure containing air gaps and method for making (254 citations)
  • Chip interconnect wiring structure with low dielectric constant insulator and methods for fabricating the same (230 citations)

What are the main themes of his work throughout his whole career to date?

Optoelectronics, Composite material, Microelectromechanical systems, Electronic engineering and Dielectric are his primary areas of study. His Optoelectronics study combines topics in areas such as Substrate and Electrical engineering. His work deals with themes such as Thin film and Metallurgy, Metal, which intersect with Composite material.

His Microelectromechanical systems study also includes fields such as

  • Beam together with Actuator,
  • Insulator and related Fluorine. As part of the same scientific family, Christopher V. Jahnes usually focuses on Dielectric, concentrating on Carbon and intersecting with Plasma-enhanced chemical vapor deposition. He interconnects STRIPS, Transformer, Chip and Electromagnetic coil in the investigation of issues within Integrated circuit.

He most often published in these fields:

  • Optoelectronics (43.84%)
  • Composite material (19.63%)
  • Microelectromechanical systems (18.26%)

What were the highlights of his more recent work (between 2010-2017)?

  • Optoelectronics (43.84%)
  • Microelectromechanical systems (18.26%)
  • CMOS (10.05%)

In recent papers he was focusing on the following fields of study:

His primary areas of study are Optoelectronics, Microelectromechanical systems, CMOS, Electronic engineering and Silicon. His Optoelectronics research is multidisciplinary, incorporating perspectives in Layer, Optical fiber and Transceiver. His Microelectromechanical systems research integrates issues from Mechanical system, Substrate, Beam, Actuator and Insulator.

His biological study spans a wide range of topics, including Photonics, Silicon photonics, Bandwidth and Optical switch. His research on Electronic engineering also deals with topics like

  • Semiconductor which intersects with area such as Flip chip, Dielectric, Buffer and Hybrid silicon laser,
  • Semiconductor device which is related to area like Through-silicon via and Conductive materials. Christopher V. Jahnes has included themes like Molecule, Lab-on-a-chip and Nanofluidics in his Silicon study.

Between 2010 and 2017, his most popular works were:

  • Non-Blocking 4x4 Electro-Optic Silicon Switch for On-Chip Photonic Networks (131 citations)
  • 2.5D and 3D technology challenges and test vehicle demonstrations (82 citations)
  • Multichannel High-Bandwidth Coupling of Ultradense Silicon Photonic Waveguide Array to Standard-Pitch Fiber Array (64 citations)

In his most recent research, the most cited papers focused on:

  • Electrical engineering
  • Semiconductor
  • Composite material

His main research concerns Optoelectronics, CMOS, Layer, Microelectromechanical systems and Transceiver. His research integrates issues of Etching and Nanotechnology in his study of Optoelectronics. His CMOS study combines topics from a wide range of disciplines, such as Crossover switch and Optical switch.

His Layer research is multidisciplinary, incorporating elements of Line and Electrode material. The study incorporates disciplines such as Mechanical system, Beam, Structural engineering, Capacitor and Bumping in addition to Microelectromechanical systems. His Transceiver research incorporates elements of Vertical-cavity surface-emitting laser and Photodiode.

Best Publications

  • Method of forming an integrated circuit toroidal inductor

    Burghartz Joachim Norbert;Edelstein Daniel Charles;Jahnes Christopher Vincent;Uzoh Cyprian Emeka

  • Microstructured magnetic tunnel junctions (invited)

    W. J. Gallagher;S. S. P. Parkin;Yu Lu;X. P. Bian

  • Hydrogenated oxidized silicon carbon material

    Alfred Grill;Christopher Vincent Jahnes;Vishnubhai Vitthalbhai Patel;Laurent Claude Perraud

  • Chip interconnect wiring structure with low dielectric constant insulator and methods for fabricating the same

    Leena P. Buchwalter;Alessandro Cesare Callegari;Stephan Alan Cohen;Teresita Ordonez Graham

  • Production of electroless Co(P) with designed coercivity

    Milan Paunovic;Christopher Jahnes

  • Dual damascene processing for semiconductor chip interconnects

    Alfred Grill;John Patrick Hummel;Christopher Vincent Jahnes;Vishnubhai Vitthalbhai Patel

  • Multilayer interconnect structure containing air gaps and method for making

    Katherina E. Babich;Roy Arthur Carruthers;Timothy Joseph Dalton;Alfred Grill

  • Low temperature Bi-CMOS compatible process for MEMS RF resonators and filters

    Leena Paivikki Buchwalter;Kevin Kok Chan;Timothy Joseph Dalton;Christopher Vincent Jahnes

  • Integrated circuit inductor

    Joachim Norbert Burghartz;Daniel Charles Edelstein;Christopher Vincent Jahnes;Cyprian Emeka Uzoh

  • Tasin oxygen diffusion barrier in multilayer structures

    Paul David Agnello;Cyril Cabral;Alfred Grill;Christopher Vincent Jahnes

  • Non-Blocking 4x4 Electro-Optic Silicon Switch for On-Chip Photonic Networks

    Min Yang;William M. J. Green;Solomon Assefa;Joris Van Campenhout

  • On the Pitting Resistance of Sputter‐Deposited Aluminum Alloys

    G. S. Frankel;R. C. Newman;C. V. Jahnes;M. A. Russak

  • The respective role of oxygen and water vapor on the tribology of hydrogenated diamond-like carbon coatings

    C. Donnet;T. Le Mogne;L. Ponsonnet;M. Belin

  • Method of forming multilevel interconnect structure containing air gaps including utilizing both sacrificial and placeholder material

    Alfred Grill;Jeffrey Curtis Hedrick;Christopher Vincent Jahnes;Satyanarayana Venkata Nitta

  • Parallel optical transceiver module

    Fuad E. Doany;Christopher V. Jahnes;Clint L. Schow;Mehmet Soyuer

  • Methods for fabricating contacts to pillar structures in integrated circuits

    Solomon Assefa;Gregory Costrini;Christopher Vincent Jahnes;Michael J. Rooks

  • Si-based packaging with integrated passive components

    Michael Cotte John;Paul Gaucher Brian;Janusz Grzyb;Deneke Hoivik Nils

  • 2.5D and 3D technology challenges and test vehicle demonstrations

    J. U. Knickerbocker;P. S. Andry;E. Colgan;B. Dang

  • Planar mems structures, fabrication methods thereof and reducing variation of a silicon layer of planar mems structures

    Dang Dinh;Doan Thai;Dunbar Iii George A;He Zhong-Xiang

  • Methods for encapsulating microelectromechanical (MEM) devices on a wafer scale

    Evan G. Colgan;Bruce K. Furman;Christopher V. Jahnes

Frequent Co-Authors

Anthony K. Stamper
Anthony K. Stamper GlobalFoundries (United States)
Vishnubhai Vitthalbhai Patel
Vishnubhai Vitthalbhai Patel IBM (United States)
Clint L. Schow
Clint L. Schow University of California, Santa Barbara
Fuad E. Doany
Fuad E. Doany IBM (United States)
Alfred Grill
Alfred Grill IBM (United States)
Alexander V. Rylyakov
Alexander V. Rylyakov Nokia (United States)
Katherine L. Saenger
Katherine L. Saenger Auburn University
Gerald S. Frankel
Gerald S. Frankel The Ohio State University
Solomon Assefa
Solomon Assefa IBM (United States)
Yurii A. Vlasov
Yurii A. Vlasov University of Illinois at Urbana-Champaign

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