World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
30
Citations
4594
World Ranking
9759
National Ranking
2785

Anthony K. Stamper publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Anthony K. Stamper sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 282 publications — 72nd percentile

72% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Anthony K. Stamper D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Anthony K. Stamper sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 30 D-Index — 1st percentile

1% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Anthony K. Stamper is affiliated with GlobalFoundries in the United States. Their professional activities are based within the United States.

Currently, no records of recent published papers, co-authors, or frequent publication venues are available for Anthony K. Stamper. Similarly, there are no listed book publications or specific fields of study associated with their research profile.

This absence of detailed publication data and specific research topics limits the ability to outline the scientist's contributions across particular domains or areas of expertise in academic literature.

No awards or honors have been documented for Anthony K. Stamper in the accessible data.

Additional information regarding the scientist's research focus, including subfields of study or principal topics of work, is not available from the provided information.

Best Publications

  • Damascene copper wiring optical image sensor

    James W. Adkisson;Jeffrey P. Gambino;Mark D. Jaffe;Robert K. Leidy

  • Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits

    D. R. Cote;S. V. Nguyen;A. K. Stamper;D. S. Armbrust

  • Double-sided integrated circuit chips

    Kerry Bernstein;Timothy Joseph Dalton;Jeffrey Peter Gambino;Mark David Jaffe

  • Reduced Cu interface diffusion by CoWP surface coating

    C.-K. Hu;L. Gignac;R. Rosenberg;E. Liniger

  • Methods for forming a bonded semiconductor substrate including a cooling mechanism

    Jeffrey P. Gambino;Anthony K. Stamper

  • Planar mems structures, fabrication methods thereof and reducing variation of a silicon layer of planar mems structures

    Dang Dinh;Doan Thai;Dunbar Iii George A;He Zhong-Xiang

  • Low resistance and inductance backside through vias and methods of fabricating same

    Mete Erturk;Robert A. Groves;Jeffrey Bowman Johnson;Alvin Jose Joseph

  • Exposed pore sealing post patterning

    Edward C. Cooney;John A. Fitzsimmons;Jeffrey P. Gambino;Stephen E. Luce

  • Device and methodology for reducing effective diel

    Edelstein Daniel C;Colburn Matthew E;Cooney Edward C;Dalton Timothy J

  • Cmos imager of eliminating high reflectivity interfaces

    James W Adkisson;Jeffrey P Gambino;Mark D Jaffe;Robert K Leidy

  • Post-fuse blow corrosion prevention structure for copper fuses

    Timothy H. Daubenspeck;Daniel C. Edelstein;Robert M. Geffken;William T. Motsiff

  • METHOD OF MANUFACTURING ELECTRONIC STRUCTURE

    Adams Charlotte;Stamper Anthony

  • Passive components in the back end of integrated circuits

    Anil K. Chinthakindi;Douglas D. Coolbaugh;Ebenezer E. Eshun;Zhong-Xiang He

  • Through wafer vias and method of making same

    Hanyi Ding;Alvin Jose Joseph;Anthony Kendall Stamper

  • Through wafer via and method of making same

    Hanyi Ding;Alvin Jose Joseph;Anthony Kendall Stamper

  • Line edge roughness and spacing effect on low-k TDDB characteristics

    F. Chen;J.R. Lloyd;K. Chanda;R. Achanta

  • Recessed bond pad

    Anthony K. Stamper;Sally J. Yankee

  • Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM

    D. R. Cote;S. V. Nguyen;W. J. Cote;S. L. Pennington

  • Damascene etchback for low ε dielectric

    Anthony K. Stamper;Vincent J. McGahay

  • Characterization of yttria-stabilized zirconium oxide buffer layers for high-temperature superconductor thin films

    J‐W. Lee;T. E. Schlesinger;A. K. Stamper;M. Migliuolo

  • Metallic capacitor and its formation method

    M Jeffken Robert;Anthony K Stamper;アンソニー・ケイ・スタンパー;ロバート・エム・ジェフケン

  • Interconnect structures on substrate and its manufacture method

    Fitzsimmons John A;Stamper Anthony K;Dalton Timothy J;Cooney Iii Edward C

  • SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD AS WELL AS FORMING METHOD OF POLYSILICON FUSE AT THE SMALL PITCH IN SEMICONDUCTOR

    Anthony K Stamper

  • Method of integration of a MIM capacitor with a lower plate of metal gate material formed on an STI region or a silicide region formed in or on the surface of a doped well with a high K dielectric material

    Anil Kumar Chinthakindi;Douglas Duane Coolbaugh;Keith Edward Downes;Ebenezer E. Eshun

  • Dual wired integrated circuit chips

    Kerry Bernstein;Timothy Joseph Dalton;Jeffrey Peter Gambino;Mark David Jaffe

Frequent Co-Authors

Jeffrey P. Gambino
Jeffrey P. Gambino ON Semiconductor (United States)
Douglas D. Coolbaugh
Douglas D. Coolbaugh University at Albany, State University of New York
Christopher V. Jahnes
Christopher V. Jahnes IBM (United States)
Edmund J. Sprogis
Edmund J. Sprogis IBM (United States)
Alvin J. Joseph
Alvin J. Joseph GlobalFoundries (United States)
Terence B. Hook
Terence B. Hook IBM (United States)
Daniel C. Edelstein
Daniel C. Edelstein IBM (United States)
Matthew E. Colburn
Matthew E. Colburn Facebook (United States)
David L. Harame
David L. Harame IBM (United States)
Steven H. Voldman
Steven H. Voldman Independent Scientist / Consultant, US

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