World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
35
Citations
4838
World Ranking
5595
National Ranking
1915

Overview

Douglas D. Coolbaugh is affiliated with the University at Albany, State University of New York in the United States. Their academic profile reflects a focus on scientific research conducted in an institutional setting associated with higher education.

There are no recent paper titles, co-authors, publication venues, or book publications currently available in the provided data. Similarly, there are no details on specific fields of study, subfields, or main research topics listed.

Information regarding awards or distinctions received by Douglas D. Coolbaugh is also absent from the data set. There is no indication that the scientist is deceased, therefore this profile describes ongoing or current professional status.

The profile is based entirely on the available institutional affiliation without additional specifics on the scope or focus of research activities. Further details would be required to offer a more comprehensive overview of the scientist's contributions and expertise.

Best Publications

  • Large-scale silicon nitride nanophotonic phased arrays at infrared and visible wavelengths.

    Christopher V. Poulton;Matthew J. Byrd;Manan Raval;Zhan Su

  • Current status and future trends of SiGe BiCMOS technology

    D.L. Harame;D.C. Ahlgren;D.D. Coolbaugh;J.S. Dunn

  • Integrated phased array for wide-angle beam steering

    Ami Yaacobi;Jie Sun;Michele Moresco;Gerald Leake

  • A 0.18 /spl mu/m BiCMOS technology featuring 120/100 GHz (f/sub T//f/sub max/) HBT and ASIC-compatible CMOS using copper interconnect

    A. Joseph;D. Coolbaugh;M. Zierak;R. Wuthrich

  • The AIM Photonics MPW: A Highly Accessible Cutting Edge Technology for Rapid Prototyping of Photonic Integrated Circuits

    Nicholas M. Fahrenkopf;Colin McDonough;Gerald L. Leake;Zhan Su

  • Foundation of rf CMOS and SiGe BiCMOS technologies

    J. S. Dunn;D. C. Ahlgren;D. Coolbaugh;N. B. Feilchenfeld

  • A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process

    X. Chen;S. Samavedam;V. Narayanan;K. Stein

  • Status and Direction of Communication Technologies - SiGe BiCMOS and RFCMOS

    A.J. Joseph;D.L. Harame;B. Jagannathan;D. Coolbaugh

  • Two-dimensional apodized silicon photonic phased arrays

    Jie Sun;Ehsan shah Hosseini;Ami Yaacobi;David B. Cole

  • C- and L-band erbium-doped waveguide lasers with wafer-scale silicon nitride cavities

    Purnawirman;J. Sun;T. N. Adam;G. Leake

  • Monolithic erbium- and ytterbium-doped microring lasers on silicon chips.

    Jonathan D B Bradley;Ehsan Shah Hosseini;Purnawirman;Zhan Su

  • Chemically enhanced anneal for removing trench stress resulting in improved bipolar yield

    Arne Watson Ballantine;Douglas Duane Coolbaugh;Jeffrey D. Gilbert

  • The revolution in SiGe: Impact on device electronics

    D.L Harame;S.J Koester;G Freeman;P Cottrel

  • Tunable temperature coefficient of resistance resistors and method of fabricating same

    Douglas D. Coolbaugh;Ebenezer E. Eshun;Richard J. Rassel;Robert M. Rassel

  • CMOS-compatible 75 mW erbium-doped distributed feedback laser

    Ehsan Shah Hosseini;Purnawirman;Jonathan D. B. Bradley;Jie Sun

  • Passive components in the back end of integrated circuits

    Anil K. Chinthakindi;Douglas D. Coolbaugh;Ebenezer E. Eshun;Zhong-Xiang He

  • Capacitor and producing method thereof

    Cunlbao Douglas D;Coty John M;Ishuen Ebeniz E

  • Method of manufacturing silicon germanium bipolar transistor

    Jack Oon Chu;Douglas Duane Coolbaugh;James Stuart Dunn;David Greenberg

  • Advanced passive devices for enhanced integrated RF circuit performance

    D. Coolbaugh;E. Eshun;R. Groves;D. Hararnel

  • Mode-evolution-based coupler for high saturation power Ge-on-Si photodetectors.

    Matthew J. Byrd;Erman Timurdogan;Zhan Su;Christopher V. Poulton

  • Demonstration of an optical chip-to-chip link in a 3D integrated electronic-photonic platform

    Krishna T. Settaluri;Sen Lin;Sajjad Moazeni;Erman Timurdogan

  • Ultra-compact and low-threshold thulium microcavity laser monolithically integrated on silicon.

    Zhan Su;Nanxi Li;E. Salih Magden;Matthew Byrd

Frequent Co-Authors

David L. Harame
David L. Harame IBM (United States)
Alvin J. Joseph
Alvin J. Joseph GlobalFoundries (United States)
Robert A. Groves
Robert A. Groves IBM (United States)
Gregory G. Freeman
Gregory G. Freeman IBM (United States)
David C. Ahlgren
David C. Ahlgren IBM (United States)
Terence B. Hook
Terence B. Hook IBM (United States)
Steven H. Voldman
Steven H. Voldman Independent Scientist / Consultant, US
Jeffrey P. Gambino
Jeffrey P. Gambino ON Semiconductor (United States)

If you think any of the details on this page are incorrect, let us know.

Report an issue

We appreciate your kind effort to assist us to improve this page, it would be helpful providing us with as much detail as possible in the text box below:

Related Online Degrees & Career Pathways

For students interested in Electronics and Electrical Engineering, exploring various online degree formats can enhance flexibility and skills acquisition. Many programs now embrace competency-based online colleges, allowing learners to progress based on mastery rather than time spent in class. This approach is ideal for those with prior experience who want to fast-track their education.

Military spouses and dependents often face unique challenges in continuing education. Fortunately, a growing number of online colleges for military spouses offer specialized support, flexible scheduling, and tailored resources to help them pursue degrees remotely without disrupting their family commitments.

Start dates can be another barrier for students balancing work or personal responsibilities. Online colleges with frequent start dates provide greater accessibility and convenience, enabling students to begin their studies almost any week of the year and maintain momentum toward graduation.

For those seeking quicker entry into the workforce, short certificate programs in relevant technical fields can offer valuable skills in as little as six months, opening doors to high-demand careers without the long-term commitment of a traditional degree.

Best Scientists Citing Douglas D. Coolbaugh

Trending Scientists

Recently Published Articles