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D-Index & Metrics

Electronics and Electrical Engineering

D-Index
35
Citations
4838
World Ranking
5595
National Ranking
1916

Douglas D. Coolbaugh publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Douglas D. Coolbaugh sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 205 publications — 31st percentile

31% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Douglas D. Coolbaugh D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Douglas D. Coolbaugh sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 35 D-Index — 21st percentile

21% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Douglas D. Coolbaugh is affiliated with the University at Albany, State University of New York in the United States. Their academic profile reflects a focus on scientific research conducted in an institutional setting associated with higher education.

There are no recent paper titles, co-authors, publication venues, or book publications currently available in the provided data. Similarly, there are no details on specific fields of study, subfields, or main research topics listed.

Information regarding awards or distinctions received by Douglas D. Coolbaugh is also absent from the data set. There is no indication that the scientist is deceased, therefore this profile describes ongoing or current professional status.

The profile is based entirely on the available institutional affiliation without additional specifics on the scope or focus of research activities. Further details would be required to offer a more comprehensive overview of the scientist's contributions and expertise.

Best Publications

  • Large-scale silicon nitride nanophotonic phased arrays at infrared and visible wavelengths.

    Christopher V. Poulton;Matthew J. Byrd;Manan Raval;Zhan Su

  • Current status and future trends of SiGe BiCMOS technology

    D.L. Harame;D.C. Ahlgren;D.D. Coolbaugh;J.S. Dunn

  • Integrated phased array for wide-angle beam steering

    Ami Yaacobi;Jie Sun;Michele Moresco;Gerald Leake

  • A 0.18 /spl mu/m BiCMOS technology featuring 120/100 GHz (f/sub T//f/sub max/) HBT and ASIC-compatible CMOS using copper interconnect

    A. Joseph;D. Coolbaugh;M. Zierak;R. Wuthrich

  • The AIM Photonics MPW: A Highly Accessible Cutting Edge Technology for Rapid Prototyping of Photonic Integrated Circuits

    Nicholas M. Fahrenkopf;Colin McDonough;Gerald L. Leake;Zhan Su

  • Foundation of rf CMOS and SiGe BiCMOS technologies

    J. S. Dunn;D. C. Ahlgren;D. Coolbaugh;N. B. Feilchenfeld

  • A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process

    X. Chen;S. Samavedam;V. Narayanan;K. Stein

  • Status and Direction of Communication Technologies - SiGe BiCMOS and RFCMOS

    A.J. Joseph;D.L. Harame;B. Jagannathan;D. Coolbaugh

  • Two-dimensional apodized silicon photonic phased arrays

    Jie Sun;Ehsan shah Hosseini;Ami Yaacobi;David B. Cole

  • C- and L-band erbium-doped waveguide lasers with wafer-scale silicon nitride cavities

    Purnawirman;J. Sun;T. N. Adam;G. Leake

  • Monolithic erbium- and ytterbium-doped microring lasers on silicon chips.

    Jonathan D B Bradley;Ehsan Shah Hosseini;Purnawirman;Zhan Su

  • Chemically enhanced anneal for removing trench stress resulting in improved bipolar yield

    Arne Watson Ballantine;Douglas Duane Coolbaugh;Jeffrey D. Gilbert

  • The revolution in SiGe: Impact on device electronics

    D.L Harame;S.J Koester;G Freeman;P Cottrel

  • Tunable temperature coefficient of resistance resistors and method of fabricating same

    Douglas D. Coolbaugh;Ebenezer E. Eshun;Richard J. Rassel;Robert M. Rassel

  • CMOS-compatible 75 mW erbium-doped distributed feedback laser

    Ehsan Shah Hosseini;Purnawirman;Jonathan D. B. Bradley;Jie Sun

  • Passive components in the back end of integrated circuits

    Anil K. Chinthakindi;Douglas D. Coolbaugh;Ebenezer E. Eshun;Zhong-Xiang He

  • Capacitor and producing method thereof

    Cunlbao Douglas D;Coty John M;Ishuen Ebeniz E

  • Method of manufacturing silicon germanium bipolar transistor

    Jack Oon Chu;Douglas Duane Coolbaugh;James Stuart Dunn;David Greenberg

  • Advanced passive devices for enhanced integrated RF circuit performance

    D. Coolbaugh;E. Eshun;R. Groves;D. Hararnel

  • Mode-evolution-based coupler for high saturation power Ge-on-Si photodetectors.

    Matthew J. Byrd;Erman Timurdogan;Zhan Su;Christopher V. Poulton

  • Demonstration of an optical chip-to-chip link in a 3D integrated electronic-photonic platform

    Krishna T. Settaluri;Sen Lin;Sajjad Moazeni;Erman Timurdogan

  • Ultra-compact and low-threshold thulium microcavity laser monolithically integrated on silicon.

    Zhan Su;Nanxi Li;E. Salih Magden;Matthew Byrd

Frequent Co-Authors

Anthony K. Stamper
Anthony K. Stamper GlobalFoundries (United States)
Nanxi Li
Nanxi Li Institute of Microelectronics
Alvin J. Joseph
Alvin J. Joseph GlobalFoundries (United States)
David L. Harame
David L. Harame IBM (United States)
Robert A. Groves
Robert A. Groves IBM (United States)
Gregory G. Freeman
Gregory G. Freeman IBM (United States)
David C. Ahlgren
David C. Ahlgren IBM (United States)
Franz X. Kärtner
Franz X. Kärtner Universität Hamburg
Terence B. Hook
Terence B. Hook IBM (United States)

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