D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Electronics and Electrical Engineering D-index 39 Citations 5,003 145 World Ranking 2997 National Ranking 1170

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Transistor
  • Electrical engineering

Optoelectronics, Electrical engineering, Heterojunction bipolar transistor, Bipolar junction transistor and Electronic engineering are his primary areas of study. His study explores the link between Optoelectronics and topics such as Transistor that cross with problems in Capacitance and AND gate. Frequency divider, Emitter-coupled logic, Ring oscillator and Integrated circuit is closely connected to Terahertz radiation in his research, which is encompassed under the umbrella topic of Heterojunction bipolar transistor.

His Bipolar junction transistor research incorporates elements of Heterojunction and Common emitter. His Electronic engineering study combines topics in areas such as Leakage, Noise, Cmos logic circuits and Rapid thermal annealing. The various areas that Gregory G. Freeman examines in his CMOS study include Silicon on insulator, Copper interconnect and Silicon-germanium.

His most cited work include:

  • Self-aligned SiGe NPN transistors with 285 GHz f/sub MAX/ and 207 GHz f/sub T/ in a manufacturable technology (249 citations)
  • SiGe HBTs with cut-off frequency of 350 GHz (167 citations)
  • Record RF performance of 45-nm SOI CMOS Technology (155 citations)

What are the main themes of his work throughout his whole career to date?

Gregory G. Freeman focuses on Optoelectronics, Electrical engineering, Heterojunction bipolar transistor, Electronic engineering and Bipolar junction transistor. His Optoelectronics research integrates issues from Layer, Capacitance and Transistor. His Heterojunction bipolar transistor study incorporates themes from Phase noise, Bandwidth, Silicon-germanium, Engineering physics and Scaling.

His work in Electronic engineering addresses issues such as Reliability, which are connected to fields such as Stress and Semiconductor materials. His study in Bipolar junction transistor is interdisciplinary in nature, drawing from both Thermal resistance, Heterojunction, Optics and Doping. His CMOS research is multidisciplinary, relying on both Application-specific integrated circuit, Copper interconnect, Radio frequency, Integrated circuit and Silicon on insulator.

He most often published in these fields:

  • Optoelectronics (55.56%)
  • Electrical engineering (46.91%)
  • Heterojunction bipolar transistor (35.80%)

What were the highlights of his more recent work (between 2007-2018)?

  • Silicon on insulator (14.81%)
  • Optoelectronics (55.56%)
  • Electronic engineering (31.48%)

In recent papers he was focusing on the following fields of study:

His scientific interests lie mostly in Silicon on insulator, Optoelectronics, Electronic engineering, Electrical engineering and CMOS. His research integrates issues of Dram, Capacitance, Logic gate, Embedded system and eDRAM in his study of Silicon on insulator. Gregory G. Freeman interconnects Layer, Epitaxy and Radio frequency in the investigation of issues within Optoelectronics.

In Electronic engineering, Gregory G. Freeman works on issues like Electromigration, which are connected to Self heating and Stress. He regularly links together related areas like Communication channel in his Electrical engineering studies. His study in the fields of Second source under the domain of Transistor overlaps with other disciplines such as Stack and Halo.

Between 2007 and 2018, his most popular works were:

  • 22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL (70 citations)
  • Scaling deep trench based eDRAM on SOI to 32nm and Beyond (37 citations)
  • Experimental analysis and modeling of self heating effect in dielectric isolated planar and fin devices (25 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Transistor
  • Electrical engineering

His primary areas of investigation include Silicon on insulator, CMOS, Optoelectronics, Electrical engineering and MOSFET. His Silicon on insulator research is multidisciplinary, incorporating elements of Dram and Logic gate. His CMOS research focuses on Radio frequency and how it connects with Transconductance, Cutoff frequency and Shallow trench isolation.

Within one scientific family, Gregory G. Freeman focuses on topics pertaining to Field-effect transistor under Optoelectronics, and may sometimes address concerns connected to Capacitance. Transistor is the focus of his Electrical engineering research. His MOSFET research integrates issues from PMOS logic, Electronic circuit, Doping and Copper interconnect.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Self-aligned SiGe NPN transistors with 285 GHz f/sub MAX/ and 207 GHz f/sub T/ in a manufacturable technology

B. Jagannathan;M. Khater;F. Pagette;J.-S. Rieh.
IEEE Electron Device Letters (2002)

376 Citations

SiGe HBTs with cut-off frequency of 350 GHz

J.-S. Rieh;B. Jagannathan;H. Chen;K.T. Schonenberg.
international electron devices meeting (2002)

268 Citations

Current status and future trends of SiGe BiCMOS technology

D.L. Harame;D.C. Ahlgren;D.D. Coolbaugh;J.S. Dunn.
IEEE Transactions on Electron Devices (2001)

226 Citations

Record RF performance of 45-nm SOI CMOS Technology

Sungjae Lee;B. Jagannathan;S. Narasimha;A. Chou.
international electron devices meeting (2007)

218 Citations

A 0.18 /spl mu/m BiCMOS technology featuring 120/100 GHz (f/sub T//f/sub max/) HBT and ASIC-compatible CMOS using copper interconnect

A. Joseph;D. Coolbaugh;M. Zierak;R. Wuthrich.
bipolar/bicmos circuits and technology meeting (2001)

182 Citations

Half-terahertz operation of SiGe HBTs

R. Krithivasan;Yuan Lu;J.D. Cressler;Jae-Sung Rieh.
IEEE Electron Device Letters (2006)

146 Citations

A 210-GHz f/sub T/ SiGe HBT with a non-self-aligned structure

S.J. Jeng;B. Jagannathan;J.-S. Rieh;J. Johnson.
IEEE Electron Device Letters (2001)

129 Citations

Foundation of rf CMOS and SiGe BiCMOS technologies

J. S. Dunn;D. C. Ahlgren;D. Coolbaugh;N. B. Feilchenfeld.
Ibm Journal of Research and Development (2003)

128 Citations

SiGe HBT technology with f/sub max//f/sub T/=350/300 GHz and gate delay below 3.3 ps

M. Khater;J.-S. Rieh;T. Adam;A. Chinthakindi.
international electron devices meeting (2004)

125 Citations

Avalanche current induced hot carrier degradation in 200 GHz SiGe heterojunction bipolar transistors

Zhijian Yang;F. Guarin;E. Hostetter;G. Freeman.
international reliability physics symposium (2003)

125 Citations

If you think any of the details on this page are incorrect, let us know.

Contact us

Best Scientists Citing Gregory G. Freeman

John D. Cressler

John D. Cressler

Georgia Institute of Technology

Publications: 224

Alvin J. Joseph

Alvin J. Joseph

GlobalFoundries (United States)

Publications: 93

Guofu Niu

Guofu Niu

Auburn University

Publications: 80

David L. Harame

David L. Harame

IBM (United States)

Publications: 61

Paul W. Marshall

Paul W. Marshall

United States Naval Research Laboratory

Publications: 41

Zhenqiang Ma

Zhenqiang Ma

University of Wisconsin–Madison

Publications: 36

Bernd Heinemann

Bernd Heinemann

Innovations for High Performance Microelectronics

Publications: 28

Ullrich R. Pfeiffer

Ullrich R. Pfeiffer

University of Wuppertal

Publications: 24

Robert A. Reed

Robert A. Reed

Vanderbilt University

Publications: 24

Dureseti Chidambarrao

Dureseti Chidambarrao

IBM (United States)

Publications: 22

Sorin P. Voinigescu

Sorin P. Voinigescu

University of Toronto

Publications: 20

Brian Floyd

Brian Floyd

North Carolina State University

Publications: 19

Jean-Pierre Raskin

Jean-Pierre Raskin

Université Catholique de Louvain

Publications: 19

Ronald D. Schrimpf

Ronald D. Schrimpf

Vanderbilt University

Publications: 18

Oleg Gluschenkov

Oleg Gluschenkov

IBM (United States)

Publications: 18

Mark J. W. Rodwell

Mark J. W. Rodwell

University of California, Santa Barbara

Publications: 17

Trending Scientists

Andrew J. Steckl

Andrew J. Steckl

University of Cincinnati

Stephen J. Skinner

Stephen J. Skinner

Imperial College London

Wolfgang Brütting

Wolfgang Brütting

University of Augsburg

Byung Hee Hong

Byung Hee Hong

Seoul National University

Julio Collado-Vides

Julio Collado-Vides

National Autonomous University of Mexico

K. Ghareeb

K. Ghareeb

University of Veterinary Medicine Vienna

Jeanine J. Houwing-Duistermaat

Jeanine J. Houwing-Duistermaat

University of Leeds

Ferran Garcia-Pichel

Ferran Garcia-Pichel

Arizona State University

Takeshi Watanabe

Takeshi Watanabe

University of Tokyo

Enzo Boschi

Enzo Boschi

University of Bologna

John O. Stone

John O. Stone

University of Washington

Frederick A. Miles

Frederick A. Miles

National Institutes of Health

Urho M. Kujala

Urho M. Kujala

University of Jyväskylä

Ramon Diaz-Arrastia

Ramon Diaz-Arrastia

University of Pennsylvania

Gary F. Marcus

Gary F. Marcus

New York University

Simon Chesterman

Simon Chesterman

National University of Singapore

Something went wrong. Please try again later.