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Gregory G. Freeman

Gregory G. Freeman

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Electronics and Electrical Engineering 43 3987 3828 1428 1333 169 5645

Gregory G. Freeman publications per year

The chart shows the history of publications by Gregory G. Freeman between 1996 and 2021, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Gregory G. Freeman published across 26 years, from 1996 to 2021, averaging 6.5 papers a year. Output peaked at 22 publications in 2003. 2 of the 169 publications appeared in the last two years.

No. of publications
5 10 15 20
Bar chart. Horizontal axis: year, 1996 to 2021. Vertical axis: number of publications, 0 to 22. Peak 22 publications in 2003. 1996: 2 publications 1997: 4 publications 1998: 3 publications 1999: 5 publications 2000: 7 publications 2001: 11 publications 2002: 19 publications 2003: 22 publications 2004: 22 publications 2005: 19 publications 2006: 13 publications 2007: 8 publications 2008: 5 publications 2009: 4 publications 2010: 2 publications 2011: 3 publications 2012: 2 publications 2013: 4 publications 2014: 3 publications 2015: 5 publications 2016: 0 publications 2017: 2 publications 2018: 2 publications 2019: 0 publications 2020: 1 publication 2021: 1 publication
1996 2021

169 publications in total across all disciplines

View publications per year as a table
Gregory G. Freeman: publications per year, 1996 to 2021
Year Publications
1996 2
1997 4
1998 3
1999 5
2000 7
2001 11
2002 19
2003 22
2004 22
2005 19
2006 13
2007 8
2008 5
2009 4
2010 2
2011 3
2012 2
2013 4
2014 3
2015 5
2016 0
2017 2
2018 2
2019 0
2020 1
2021 1
Total 169
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Gregory G. Freeman publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Gregory G. Freeman sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 154–173 publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 169 publications — 19th percentile

19% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203
114–133 269
134–153 355
154–173 403 169
174–193 445
194–213 430
214–233 431
234–253 399
254–273 366
274–293 335
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58
594–613 69
614–633 50
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99
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Gregory G. Freeman D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Gregory G. Freeman sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 43 D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 43 D-Index — 45th percentile

45% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262
34 244
35 236
36 211
37 220
38 214
39 214
40 205
41 187
42 194
43 201 43
44 155
45 189
46 148
47 160
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10
110 8
111+ 96
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Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Transistor
  • Electrical engineering

Optoelectronics, Electrical engineering, Heterojunction bipolar transistor, Bipolar junction transistor and Electronic engineering are his primary areas of study. His study explores the link between Optoelectronics and topics such as Transistor that cross with problems in Capacitance and AND gate. Frequency divider, Emitter-coupled logic, Ring oscillator and Integrated circuit is closely connected to Terahertz radiation in his research, which is encompassed under the umbrella topic of Heterojunction bipolar transistor.

His Bipolar junction transistor research incorporates elements of Heterojunction and Common emitter. His Electronic engineering study combines topics in areas such as Leakage, Noise, Cmos logic circuits and Rapid thermal annealing. The various areas that Gregory G. Freeman examines in his CMOS study include Silicon on insulator, Copper interconnect and Silicon-germanium.

His most cited work include:

  • Self-aligned SiGe NPN transistors with 285 GHz f/sub MAX/ and 207 GHz f/sub T/ in a manufacturable technology (249 citations)
  • SiGe HBTs with cut-off frequency of 350 GHz (167 citations)
  • Record RF performance of 45-nm SOI CMOS Technology (155 citations)

What are the main themes of his work throughout his whole career to date?

Gregory G. Freeman focuses on Optoelectronics, Electrical engineering, Heterojunction bipolar transistor, Electronic engineering and Bipolar junction transistor. His Optoelectronics research integrates issues from Layer, Capacitance and Transistor. His Heterojunction bipolar transistor study incorporates themes from Phase noise, Bandwidth, Silicon-germanium, Engineering physics and Scaling.

His work in Electronic engineering addresses issues such as Reliability, which are connected to fields such as Stress and Semiconductor materials. His study in Bipolar junction transistor is interdisciplinary in nature, drawing from both Thermal resistance, Heterojunction, Optics and Doping. His CMOS research is multidisciplinary, relying on both Application-specific integrated circuit, Copper interconnect, Radio frequency, Integrated circuit and Silicon on insulator.

He most often published in these fields:

  • Optoelectronics (55.56%)
  • Electrical engineering (46.91%)
  • Heterojunction bipolar transistor (35.80%)

What were the highlights of his more recent work (between 2007-2018)?

  • Silicon on insulator (14.81%)
  • Optoelectronics (55.56%)
  • Electronic engineering (31.48%)

In recent papers he was focusing on the following fields of study:

His scientific interests lie mostly in Silicon on insulator, Optoelectronics, Electronic engineering, Electrical engineering and CMOS. His research integrates issues of Dram, Capacitance, Logic gate, Embedded system and eDRAM in his study of Silicon on insulator. Gregory G. Freeman interconnects Layer, Epitaxy and Radio frequency in the investigation of issues within Optoelectronics.

In Electronic engineering, Gregory G. Freeman works on issues like Electromigration, which are connected to Self heating and Stress. He regularly links together related areas like Communication channel in his Electrical engineering studies. His study in the fields of Second source under the domain of Transistor overlaps with other disciplines such as Stack and Halo.

Between 2007 and 2018, his most popular works were:

  • 22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL (70 citations)
  • Scaling deep trench based eDRAM on SOI to 32nm and Beyond (37 citations)
  • Experimental analysis and modeling of self heating effect in dielectric isolated planar and fin devices (25 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Transistor
  • Electrical engineering

His primary areas of investigation include Silicon on insulator, CMOS, Optoelectronics, Electrical engineering and MOSFET. His Silicon on insulator research is multidisciplinary, incorporating elements of Dram and Logic gate. His CMOS research focuses on Radio frequency and how it connects with Transconductance, Cutoff frequency and Shallow trench isolation.

Within one scientific family, Gregory G. Freeman focuses on topics pertaining to Field-effect transistor under Optoelectronics, and may sometimes address concerns connected to Capacitance. Transistor is the focus of his Electrical engineering research. His MOSFET research integrates issues from PMOS logic, Electronic circuit, Doping and Copper interconnect.

Best Publications

  • Self-aligned SiGe NPN transistors with 285 GHz f/sub MAX/ and 207 GHz f/sub T/ in a manufacturable technology

    B. Jagannathan;M. Khater;F. Pagette;J.-S. Rieh

  • SiGe HBTs with cut-off frequency of 350 GHz

    J.-S. Rieh;B. Jagannathan;H. Chen;K.T. Schonenberg

  • Record RF performance of 45-nm SOI CMOS Technology

    Sungjae Lee;B. Jagannathan;S. Narasimha;A. Chou

  • Current status and future trends of SiGe BiCMOS technology

    D.L. Harame;D.C. Ahlgren;D.D. Coolbaugh;J.S. Dunn

  • A 0.18 /spl mu/m BiCMOS technology featuring 120/100 GHz (f/sub T//f/sub max/) HBT and ASIC-compatible CMOS using copper interconnect

    A. Joseph;D. Coolbaugh;M. Zierak;R. Wuthrich

  • Half-terahertz operation of SiGe HBTs

    R. Krithivasan;Yuan Lu;J.D. Cressler;Jae-Sung Rieh

  • Foundation of rf CMOS and SiGe BiCMOS technologies

    J. S. Dunn;D. C. Ahlgren;D. Coolbaugh;N. B. Feilchenfeld

  • A 210-GHz f/sub T/ SiGe HBT with a non-self-aligned structure

    S.J. Jeng;B. Jagannathan;J.-S. Rieh;J. Johnson

  • SiGe HBT technology with f/sub max//f/sub T/=350/300 GHz and gate delay below 3.3 ps

    M. Khater;J.-S. Rieh;T. Adam;A. Chinthakindi

  • Avalanche current induced hot carrier degradation in 200 GHz SiGe heterojunction bipolar transistors

    Zhijian Yang;F. Guarin;E. Hostetter;G. Freeman

  • SiGe heterojunction bipolar transistors and circuits toward terahertz communication applications

    Jae-Sung Rieh;B. Jagannathan;D.R. Greenberg;M. Meghelli

  • Manufacturability demonstration of an integrated SiGe HBT technology for the analog and wireless marketplace

    D.C. Ahlgren;M. Gilbert;D. Greenberg;J. Jeng

  • A simple four-port parasitic deembedding methodology for high-frequency scattering parameter and noise characterization of SiGe HBTs

    Qingqing Liang;J.D. Cressler;Guofu Niu;Yuan Lu

  • 40-Gb/s circuits built from a 120-GHz f/sub T/ SiGe technology

    G. Freeman;M. Meghelli;Y. Kwark;S. Zier

  • Scaling of SiGe Heterojunction Bipolar Transistors

    Jae-Sung Rieh;D. Greenberg;A. Stricker;G. Freeman

  • 22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL

    S. Narasimha;P. Chang;C. Ortolland;D. Fried

  • A SiGe HBT BiCMOS technology for mixed signal RF applications

    D.C. Ahlgren;G. Freeman;S. Subbanna;R. Groves

  • RTA-Driven Intra-Die Variations in Stage Delay, and Parametric Sensitivities for 65nm Technology

    I. Ahsan;N. Zamdmer;O. Glushchenkov;R. Logan

  • High performance 65 nm SOI technology with dual stress liner and low capacitance SRAM cell

    E. Leobandung;H. Nayakama;D. Mocuta;K. Miyamoto

  • Transistor design and application considerations for >200-GHz SiGe HBTs

    G. Freeman;B. Jagannathan;Shwu-Jen Jeng;Jae-Sung Rieh

Frequent Co-Authors

David C. Ahlgren
David C. Ahlgren IBM (United States)
Alvin J. Joseph
Alvin J. Joseph GlobalFoundries (United States)
Robert A. Groves
Robert A. Groves IBM (United States)
John D. Cressler
John D. Cressler Georgia Institute of Technology
David L. Harame
David L. Harame IBM (United States)
Douglas D. Coolbaugh
Douglas D. Coolbaugh University at Albany, State University of New York
Bernard S. Meyerson
Bernard S. Meyerson IBM (United States)
Guofu Niu
Guofu Niu Auburn University
Alexander V. Rylyakov
Alexander V. Rylyakov Nokia (United States)
Dureseti Chidambarrao
Dureseti Chidambarrao IBM (United States)

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