D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Electronics and Electrical Engineering D-index 32 Citations 3,948 94 World Ranking 4464 National Ranking 1668

Overview

What is he best known for?

The fields of study he is best known for:

  • Electrical engineering
  • Semiconductor
  • Transistor

David C. Ahlgren mostly deals with Heterojunction bipolar transistor, Electrical engineering, Optoelectronics, Bipolar junction transistor and Electronic engineering. David C. Ahlgren works mostly in the field of Heterojunction bipolar transistor, limiting it down to topics relating to Terahertz radiation and, in certain cases, Frequency divider, Multiplexer, Ring oscillator and Integrated circuit, as a part of the same area of interest. His Electrical engineering research focuses on CMOS and Wafer.

His CMOS research integrates issues from BiCMOS and Silicon-germanium. As a member of one scientific family, David C. Ahlgren mostly works in the field of Optoelectronics, focusing on Transistor and, on occasion, AND gate. His studies deal with areas such as Wireless and Design for manufacturability as well as Electronic engineering.

His most cited work include:

  • Self-aligned SiGe NPN transistors with 285 GHz f/sub MAX/ and 207 GHz f/sub T/ in a manufacturable technology (249 citations)
  • SiGe HBTs with cut-off frequency of 350 GHz (167 citations)
  • Current status and future trends of SiGe BiCMOS technology (148 citations)

What are the main themes of his work throughout his whole career to date?

David C. Ahlgren mainly focuses on Optoelectronics, Heterojunction bipolar transistor, Electrical engineering, Bipolar junction transistor and Silicon-germanium. In his research on the topic of Optoelectronics, Dram is strongly related with Transistor. His research in Heterojunction bipolar transistor intersects with topics in Bicmos technology, Electronic engineering, Breakdown voltage and Reliability.

His study connects Wireless and Electrical engineering. His Bipolar junction transistor research incorporates themes from Layer, Epitaxy, Cutoff frequency and Heterojunction. David C. Ahlgren focuses mostly in the field of Silicon-germanium, narrowing it down to matters related to Noise and, in some cases, Radio frequency.

He most often published in these fields:

  • Optoelectronics (67.96%)
  • Heterojunction bipolar transistor (51.46%)
  • Electrical engineering (43.69%)

What were the highlights of his more recent work (between 2005-2009)?

  • Optoelectronics (67.96%)
  • Heterojunction bipolar transistor (51.46%)
  • CMOS (25.24%)

In recent papers he was focusing on the following fields of study:

David C. Ahlgren mostly deals with Optoelectronics, Heterojunction bipolar transistor, CMOS, Electrical engineering and Electronic engineering. His Optoelectronics research is multidisciplinary, incorporating perspectives in Transistor and Miniaturization. His Heterojunction bipolar transistor study combines topics from a wide range of disciplines, such as Breakdown voltage, Bicmos technology, Silicon-germanium, Terahertz radiation and Extremely high frequency.

His Breakdown voltage study incorporates themes from Electric breakdown, Heterojunction and Bipolar junction transistor. As part of the same scientific family, he usually focuses on CMOS, concentrating on Current and intersecting with Doping. In general Electronic engineering, his work in Common emitter and Device simulation is often linked to Base and Vertical scaling linking many areas of study.

Between 2005 and 2009, his most popular works were:

  • Half-terahertz operation of SiGe HBTs (92 citations)
  • On the Performance Limits of Cryogenically Operated SiGe HBTs and Its Relation to Scaling for Terahertz Speeds (42 citations)
  • Gate-Induced-Drain-Leakage Current in 45-nm CMOS Technology (30 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Electrical engineering
  • Integrated circuit

Optoelectronics, Heterojunction bipolar transistor, Terahertz radiation, Breakdown voltage and Back end of line are his primary areas of study. His Optoelectronics research incorporates elements of Electrical engineering and Noise figure. In the subject of general Electrical engineering, his work in MOSFET and Voltage is often linked to Node and Electric field, thereby combining diverse domains of study.

His Noise figure research is multidisciplinary, incorporating elements of Operating temperature, Transistor, Miniaturization and Silicon-germanium. The concepts of his Breakdown voltage study are interwoven with issues in Cutoff frequency, Electric breakdown, Frequency response and Cryogenic temperature. His Back end of line study combines topics in areas such as Schottky diode, Diode, Bicmos technology and Bicmos integrated circuits.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Self-aligned SiGe NPN transistors with 285 GHz f/sub MAX/ and 207 GHz f/sub T/ in a manufacturable technology

B. Jagannathan;M. Khater;F. Pagette;J.-S. Rieh.
IEEE Electron Device Letters (2002)

376 Citations

SiGe HBTs with cut-off frequency of 350 GHz

J.-S. Rieh;B. Jagannathan;H. Chen;K.T. Schonenberg.
international electron devices meeting (2002)

268 Citations

Current status and future trends of SiGe BiCMOS technology

D.L. Harame;D.C. Ahlgren;D.D. Coolbaugh;J.S. Dunn.
IEEE Transactions on Electron Devices (2001)

226 Citations

Semiconductor producing method and equipment

Natzl Weisli C;Arglun David C;Babi Steven G.
(2004)

202 Citations

A 0.18 /spl mu/m BiCMOS technology featuring 120/100 GHz (f/sub T//f/sub max/) HBT and ASIC-compatible CMOS using copper interconnect

A. Joseph;D. Coolbaugh;M. Zierak;R. Wuthrich.
bipolar/bicmos circuits and technology meeting (2001)

182 Citations

Half-terahertz operation of SiGe HBTs

R. Krithivasan;Yuan Lu;J.D. Cressler;Jae-Sung Rieh.
IEEE Electron Device Letters (2006)

146 Citations

A 210-GHz f/sub T/ SiGe HBT with a non-self-aligned structure

S.J. Jeng;B. Jagannathan;J.-S. Rieh;J. Johnson.
IEEE Electron Device Letters (2001)

129 Citations

Status and Direction of Communication Technologies - SiGe BiCMOS and RFCMOS

A.J. Joseph;D.L. Harame;B. Jagannathan;D. Coolbaugh.
Proceedings of the IEEE (2005)

129 Citations

Foundation of rf CMOS and SiGe BiCMOS technologies

J. S. Dunn;D. C. Ahlgren;D. Coolbaugh;N. B. Feilchenfeld.
Ibm Journal of Research and Development (2003)

128 Citations

SiGe HBT technology with f/sub max//f/sub T/=350/300 GHz and gate delay below 3.3 ps

M. Khater;J.-S. Rieh;T. Adam;A. Chinthakindi.
international electron devices meeting (2004)

125 Citations

If you think any of the details on this page are incorrect, let us know.

Contact us

Best Scientists Citing David C. Ahlgren

John D. Cressler

John D. Cressler

Georgia Institute of Technology

Publications: 229

Alvin J. Joseph

Alvin J. Joseph

GlobalFoundries (United States)

Publications: 102

Guofu Niu

Guofu Niu

Auburn University

Publications: 89

David L. Harame

David L. Harame

IBM (United States)

Publications: 65

Nitin K. Ingle

Nitin K. Ingle

Applied Materials (United States)

Publications: 54

Paul W. Marshall

Paul W. Marshall

United States Naval Research Laboratory

Publications: 51

Gregory G. Freeman

Gregory G. Freeman

IBM (United States)

Publications: 36

Bernd Heinemann

Bernd Heinemann

Innovations for High Performance Microelectronics

Publications: 31

Robert A. Reed

Robert A. Reed

Vanderbilt University

Publications: 29

Zhenqiang Ma

Zhenqiang Ma

University of Wisconsin–Madison

Publications: 27

Ullrich R. Pfeiffer

Ullrich R. Pfeiffer

University of Wuppertal

Publications: 25

Sorin P. Voinigescu

Sorin P. Voinigescu

University of Toronto

Publications: 20

Shankar Venkataraman

Shankar Venkataraman

Applied Materials (United States)

Publications: 19

Dureseti Chidambarrao

Dureseti Chidambarrao

IBM (United States)

Publications: 19

Brian Floyd

Brian Floyd

North Carolina State University

Publications: 19

Ronald D. Schrimpf

Ronald D. Schrimpf

Vanderbilt University

Publications: 17

Trending Scientists

Gaël Varoquaux

Gaël Varoquaux

French Institute for Research in Computer Science and Automation - INRIA

Jordi Benet-Buchholz

Jordi Benet-Buchholz

University of Barcelona

Paul S. Cremer

Paul S. Cremer

Pennsylvania State University

Mikko Heino

Mikko Heino

University of Bergen

Locke Rowe

Locke Rowe

University of Toronto

Cinzia Corinaldesi

Cinzia Corinaldesi

Marche Polytechnic University

Kathleen Donohue

Kathleen Donohue

Duke University

Han Jong Rim

Han Jong Rim

Korea University

Daniel T. Walters

Daniel T. Walters

University of Nebraska–Lincoln

Jon Frampton

Jon Frampton

University of Birmingham

Peter van der Sluijs

Peter van der Sluijs

Utrecht University

C. Mark Moore

C. Mark Moore

University of Southampton

Victor P. Pasko

Victor P. Pasko

Pennsylvania State University

Manikkam Suthanthiran

Manikkam Suthanthiran

Cornell University

Eberhard Grube

Eberhard Grube

University Hospital Bonn

Hans-Helmut König

Hans-Helmut König

Universität Hamburg

Something went wrong. Please try again later.