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D-Index & Metrics

Discipline name D-Index World Ranking National Ranking Publications Citations
Electronics and Electrical Engineering 36 5411 1864 106 4412

David C. Ahlgren publications per year

The chart shows the history of publications by David C. Ahlgren between 1989 and 2009, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. David C. Ahlgren published across 21 years, from 1989 to 2009, averaging 4.9 papers a year. Output peaked at 22 publications in 2003. 2 of the 103 publications appeared in the last two years.

No. of publications
5 10 15 20
Bar chart. Horizontal axis: year, 1989 to 2009. Vertical axis: number of publications, 0 to 22. Peak 22 publications in 2003. 1989: 1 publication 1990: 0 publications 1991: 0 publications 1992: 1 publication 1993: 0 publications 1994: 0 publications 1995: 1 publication 1996: 6 publications 1997: 4 publications 1998: 5 publications 1999: 8 publications 2000: 5 publications 2001: 6 publications 2002: 8 publications 2003: 22 publications 2004: 13 publications 2005: 7 publications 2006: 9 publications 2007: 5 publications 2008: 1 publication 2009: 1 publication
1989 2009

103 publications in total across all disciplines

View publications per year as a table
David C. Ahlgren: publications per year, 1989 to 2009
Year Publications
1989 1
1990 0
1991 0
1992 1
1993 0
1994 0
1995 1
1996 6
1997 4
1998 5
1999 8
2000 5
2001 6
2002 8
2003 22
2004 13
2005 7
2006 9
2007 5
2008 1
2009 1
Total 103
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David C. Ahlgren publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where David C. Ahlgren sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 94–113 publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 106 publications — 5th percentile

5% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203 106
114–133 269
134–153 355
154–173 403
174–193 445
194–213 430
214–233 431
234–253 399
254–273 366
274–293 335
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58
594–613 69
614–633 50
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99
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David C. Ahlgren D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where David C. Ahlgren sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 36 D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 36 D-Index — 24th percentile

24% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262
34 244
35 236
36 211 36
37 220
38 214
39 214
40 205
41 187
42 194
43 201
44 155
45 189
46 148
47 160
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10
110 8
111+ 96
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Overview

What is he best known for?

The fields of study he is best known for:

  • Electrical engineering
  • Semiconductor
  • Transistor

David C. Ahlgren mostly deals with Heterojunction bipolar transistor, Electrical engineering, Optoelectronics, Bipolar junction transistor and Electronic engineering. David C. Ahlgren works mostly in the field of Heterojunction bipolar transistor, limiting it down to topics relating to Terahertz radiation and, in certain cases, Frequency divider, Multiplexer, Ring oscillator and Integrated circuit, as a part of the same area of interest. His Electrical engineering research focuses on CMOS and Wafer.

His CMOS research integrates issues from BiCMOS and Silicon-germanium. As a member of one scientific family, David C. Ahlgren mostly works in the field of Optoelectronics, focusing on Transistor and, on occasion, AND gate. His studies deal with areas such as Wireless and Design for manufacturability as well as Electronic engineering.

His most cited work include:

  • Self-aligned SiGe NPN transistors with 285 GHz f/sub MAX/ and 207 GHz f/sub T/ in a manufacturable technology (249 citations)
  • SiGe HBTs with cut-off frequency of 350 GHz (167 citations)
  • Current status and future trends of SiGe BiCMOS technology (148 citations)

What are the main themes of his work throughout his whole career to date?

David C. Ahlgren mainly focuses on Optoelectronics, Heterojunction bipolar transistor, Electrical engineering, Bipolar junction transistor and Silicon-germanium. In his research on the topic of Optoelectronics, Dram is strongly related with Transistor. His research in Heterojunction bipolar transistor intersects with topics in Bicmos technology, Electronic engineering, Breakdown voltage and Reliability.

His study connects Wireless and Electrical engineering. His Bipolar junction transistor research incorporates themes from Layer, Epitaxy, Cutoff frequency and Heterojunction. David C. Ahlgren focuses mostly in the field of Silicon-germanium, narrowing it down to matters related to Noise and, in some cases, Radio frequency.

He most often published in these fields:

  • Optoelectronics (67.96%)
  • Heterojunction bipolar transistor (51.46%)
  • Electrical engineering (43.69%)

What were the highlights of his more recent work (between 2005-2009)?

  • Optoelectronics (67.96%)
  • Heterojunction bipolar transistor (51.46%)
  • CMOS (25.24%)

In recent papers he was focusing on the following fields of study:

David C. Ahlgren mostly deals with Optoelectronics, Heterojunction bipolar transistor, CMOS, Electrical engineering and Electronic engineering. His Optoelectronics research is multidisciplinary, incorporating perspectives in Transistor and Miniaturization. His Heterojunction bipolar transistor study combines topics from a wide range of disciplines, such as Breakdown voltage, Bicmos technology, Silicon-germanium, Terahertz radiation and Extremely high frequency.

His Breakdown voltage study incorporates themes from Electric breakdown, Heterojunction and Bipolar junction transistor. As part of the same scientific family, he usually focuses on CMOS, concentrating on Current and intersecting with Doping. In general Electronic engineering, his work in Common emitter and Device simulation is often linked to Base and Vertical scaling linking many areas of study.

Between 2005 and 2009, his most popular works were:

  • Half-terahertz operation of SiGe HBTs (92 citations)
  • On the Performance Limits of Cryogenically Operated SiGe HBTs and Its Relation to Scaling for Terahertz Speeds (42 citations)
  • Gate-Induced-Drain-Leakage Current in 45-nm CMOS Technology (30 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Electrical engineering
  • Integrated circuit

Optoelectronics, Heterojunction bipolar transistor, Terahertz radiation, Breakdown voltage and Back end of line are his primary areas of study. His Optoelectronics research incorporates elements of Electrical engineering and Noise figure. In the subject of general Electrical engineering, his work in MOSFET and Voltage is often linked to Node and Electric field, thereby combining diverse domains of study.

His Noise figure research is multidisciplinary, incorporating elements of Operating temperature, Transistor, Miniaturization and Silicon-germanium. The concepts of his Breakdown voltage study are interwoven with issues in Cutoff frequency, Electric breakdown, Frequency response and Cryogenic temperature. His Back end of line study combines topics in areas such as Schottky diode, Diode, Bicmos technology and Bicmos integrated circuits.

Best Publications

  • Self-aligned SiGe NPN transistors with 285 GHz f/sub MAX/ and 207 GHz f/sub T/ in a manufacturable technology

    B. Jagannathan;M. Khater;F. Pagette;J.-S. Rieh

  • SiGe HBTs with cut-off frequency of 350 GHz

    J.-S. Rieh;B. Jagannathan;H. Chen;K.T. Schonenberg

  • Current status and future trends of SiGe BiCMOS technology

    D.L. Harame;D.C. Ahlgren;D.D. Coolbaugh;J.S. Dunn

  • Semiconductor producing method and equipment

    Natzl Weisli C;Arglun David C;Babi Steven G

  • A 0.18 /spl mu/m BiCMOS technology featuring 120/100 GHz (f/sub T//f/sub max/) HBT and ASIC-compatible CMOS using copper interconnect

    A. Joseph;D. Coolbaugh;M. Zierak;R. Wuthrich

  • Half-terahertz operation of SiGe HBTs

    R. Krithivasan;Yuan Lu;J.D. Cressler;Jae-Sung Rieh

  • Foundation of rf CMOS and SiGe BiCMOS technologies

    J. S. Dunn;D. C. Ahlgren;D. Coolbaugh;N. B. Feilchenfeld

  • Status and Direction of Communication Technologies - SiGe BiCMOS and RFCMOS

    A.J. Joseph;D.L. Harame;B. Jagannathan;D. Coolbaugh

  • A 210-GHz f/sub T/ SiGe HBT with a non-self-aligned structure

    S.J. Jeng;B. Jagannathan;J.-S. Rieh;J. Johnson

  • SiGe HBT technology with f/sub max//f/sub T/=350/300 GHz and gate delay below 3.3 ps

    M. Khater;J.-S. Rieh;T. Adam;A. Chinthakindi

  • SiGe heterojunction bipolar transistors and circuits toward terahertz communication applications

    Jae-Sung Rieh;B. Jagannathan;D.R. Greenberg;M. Meghelli

  • Manufacturability demonstration of an integrated SiGe HBT technology for the analog and wireless marketplace

    D.C. Ahlgren;M. Gilbert;D. Greenberg;J. Jeng

  • A simple four-port parasitic deembedding methodology for high-frequency scattering parameter and noise characterization of SiGe HBTs

    Qingqing Liang;J.D. Cressler;Guofu Niu;Yuan Lu

  • A SiGe HBT BiCMOS technology for mixed signal RF applications

    D.C. Ahlgren;G. Freeman;S. Subbanna;R. Groves

  • Transistor design and application considerations for >200-GHz SiGe HBTs

    G. Freeman;B. Jagannathan;Shwu-Jen Jeng;Jae-Sung Rieh

  • SiGe HBTs for millimeter-wave applications with simultaneously optimized f/sub T/ and f/sub max/ of 300 GHz

    J.-S. Rieh;D. Greenberg;M. Khater;K.T. Schonenberg

  • The revolution in SiGe: Impact on device electronics

    D.L Harame;S.J Koester;G Freeman;P Cottrel

  • On the Performance Limits of Cryogenically Operated SiGe HBTs and Its Relation to Scaling for Terahertz Speeds

    Jiahui Yuan;J.D. Cressler;R. Krithivasan;T. Thrivikraman

  • Performance and design considerations for high speed SiGe HBTs of f/sub T//f/sub max/=375 GHz/210 GHz

    Jae-Sung Rieh;B. Jagannathan;Huajie Chen;K. Schonenberg

  • An investigation of the spatial location of proton-induced traps in SiGe HBTs

    J.M. Roldan;Guofu Niu;W.E. Ansley;J.D. Cressler

  • Structure optimization of trench-isolated SiGe HBTs for simultaneous improvements in thermal and electrical performances

    Jae-Sung Rieh;D. Greenberg;Qizhi Liu;A.J. Joseph

  • A 0.13 m BiCMOS technology featuring a 200/280 GHz (fT/fmax) SiGe HBT

    B. A. Orner;Q. Z. Liu;B. Rainey;A. Stricker

Frequent Co-Authors

Gregory G. Freeman
Gregory G. Freeman IBM (United States)
David L. Harame
David L. Harame IBM (United States)
Alvin J. Joseph
Alvin J. Joseph GlobalFoundries (United States)
John D. Cressler
John D. Cressler Georgia Institute of Technology
Robert A. Groves
Robert A. Groves IBM (United States)
Bernard S. Meyerson
Bernard S. Meyerson IBM (United States)
Guofu Niu
Guofu Niu Auburn University
Lawrence E. Larson
Lawrence E. Larson Brown University
Jean-Olivier Plouchart
Jean-Olivier Plouchart IBM (United States)
Steven H. Voldman
Steven H. Voldman Independent Scientist / Consultant, US

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