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D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Electronics and Electrical Engineering 40 4411 4232 1575 1472 213 9152

Kevin K. Chan publications per year

The chart shows the history of publications by Kevin K. Chan between 1987 and 2020, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Kevin K. Chan published across 34 years, from 1987 to 2020, averaging 6.8 papers a year. Output peaked at 19 publications in 2003. 2 of the 232 publications appeared in the last two years.

No. of publications
5 10 15
Bar chart. Horizontal axis: year, 1987 to 2020. Vertical axis: number of publications, 0 to 19. Peak 19 publications in 2003. 1987: 2 publications 1988: 2 publications 1989: 2 publications 1990: 1 publication 1991: 0 publications 1992: 7 publications 1993: 1 publication 1994: 3 publications 1995: 10 publications 1996: 3 publications 1997: 3 publications 1998: 2 publications 1999: 3 publications 2000: 7 publications 2001: 12 publications 2002: 10 publications 2003: 19 publications 2004: 17 publications 2005: 8 publications 2006: 4 publications 2007: 3 publications 2008: 4 publications 2009: 6 publications 2010: 10 publications 2011: 17 publications 2012: 13 publications 2013: 12 publications 2014: 16 publications 2015: 11 publications 2016: 14 publications 2017: 5 publications 2018: 3 publications 2019: 0 publications 2020: 2 publications
1987 2020

232 publications in total across all disciplines

View publications per year as a table
Kevin K. Chan: publications per year, 1987 to 2020
Year Publications
1987 2
1988 2
1989 2
1990 1
1991 0
1992 7
1993 1
1994 3
1995 10
1996 3
1997 3
1998 2
1999 3
2000 7
2001 12
2002 10
2003 19
2004 17
2005 8
2006 4
2007 3
2008 4
2009 6
2010 10
2011 17
2012 13
2013 12
2014 16
2015 11
2016 14
2017 5
2018 3
2019 0
2020 2
Total 232
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Kevin K. Chan publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Kevin K. Chan sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 194–213 publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 213 publications — 33rd percentile

33% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203
114–133 269
134–153 355
154–173 403
174–193 445
194–213 430 213
214–233 431
234–253 399
254–273 366
274–293 335
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58
594–613 69
614–633 50
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99
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Kevin K. Chan D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Kevin K. Chan sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 40 D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 40 D-Index — 36th percentile

36% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262
34 244
35 236
36 211
37 220
38 214
39 214
40 205 40
41 187
42 194
43 201
44 155
45 189
46 148
47 160
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10
110 8
111+ 96
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Overview

Kevin K. Chan is affiliated with IBM in the United States. The professional profile available does not provide specific details on their research papers, co-authors, or specialized publication venues.

No records are available regarding book publications or distinct awards associated with Kevin K. Chan.

The data does not list particular fields of study, subfields, or main topics of research work, which limits further detail on their academic focus or expertise areas.

Despite limited available data, the association with IBM indicates a professional involvement potentially related to computing, technology, or related industries commonly linked with the organization.

The profile reflects an academic and research identity without detailed bibliometric metrics, making it difficult to further elaborate on research impact or collaborations.

Best Publications

  • A silicon nanocrystals based memory

    Sandip Tiwari;Farhan Rana;Hussein Hanafi;Allan Hartstein

  • Single charge and confinement effects in nano-crystal memories

    Sandip Tiwari;Farhan Rana;Kevin Chan;Leathen Shi

  • Volatile and non-volatile memories in silicon with nano-crystal storage

    S. Tiwari;F. Rana;K. Chan;H. Hanafi

  • Characteristics and device design of sub-100 nm strained Si N- and PMOSFETs

    K. Rim;J. Chu;H. Chen;K.A. Jenkins

  • Method of fabricating self-aligned nanotube field effect transistor

    Joerg Appenzeller;Phaedon Avouris;Kevin K. Chan;Philip G. Collins

  • High performance strained silicon finfets device and method for forming same

    Stephen W. Bedell;Kevin K. Chan;Dureseti Chidambarrao;Silke H. Christiansen

  • Low temperature Bi-CMOS compatible process for MEMS RF resonators and filters

    Leena Paivikki Buchwalter;Kevin Kok Chan;Timothy Joseph Dalton;Christopher Vincent Jahnes

  • Back-plane for semiconductor device

    Kevin Kok Chan;Christopher Peter D'Emic;Erin Catherine Jones;Paul Michael Solomon

  • Fully-depleted SOI MOSFETs with low source and drain resistance and minimal overlap capacitance using a recessed channel damascene gate process

    Hussein I. Hanafi;Diane C. Boyd;Kevin K. Chan;Wesley Natzle

  • Interfacial oxidation process for high-k gate dielectric process integration

    Arne W. Ballantine;Douglas A. Buchanan;Eduard A. Cartier;Kevin K. Chan

  • ECRAM as Scalable Synaptic Cell for High-Speed, Low-Power Neuromorphic Computing

    Jianshi Tang;Douglas Bishop;Seyoung Kim;Matt Copel

  • Scalable MOS field effect transistor

    Kevin Kok Chan;Jack Oon Chu;Khalid EzzEldin Ismail;Stephen Anthony Rishton

  • SOI SiGe-base lateral bipolar junction transistor

    Tak H. Ning;Kevin K. Chan;Marwan H. Khater

  • Strained Si CMOS (SS CMOS) technology: Opportunities and challenges

    K. Rim;R. Anderson;D. Boyd;F. Cardone

  • Self-aligned double-gate MOSFET by selective epitaxy and silicon wafer bonding techniques

    Kevin K. Chan;Guy M. Cohen;Yuan Taur;Hon-Sum P. Wong

  • Chemical treatment to retard diffusion in a semiconductor overlayer

    Kevin K. Chan;Huajie Chen;Michael A. Gribelyuk;Judson R. Holt

  • Method for manufacturing strain silicon mixing underlay and silicon mixing underlay

    Meikei Ieong;Shreesh Narasimha;Alexander Reznicek;Kern Rim

  • Plasma enhanced chemical vapor deposition of TiO2 in microwave‐radio frequency hybrid plasma reactor

    Young H. Lee;Kevin K. Chan;Michael J. Brady

  • Self-aligned silicide (salicide) process for low resistivity contacts to thin film silicon-on-insulator and bulk MOSFETS and for shallow Junctions

    Cyril Cabral;Kevin Kok Chan;Guy Moshe Cohen;Christian Lavoie

  • finFETs and methods of making same

    Kevin K. Chan;Thomas Safron Kanarsky;Jinghong Li;Christine Qiqing Ouyang

Frequent Co-Authors

Tak H. Ning
Tak H. Ning IBM (United States)
Paul M. Solomon
Paul M. Solomon IBM (United States)
jack o chu
jack o chu IBM (United States)
Min Yang
Min Yang Sterne, Kessler, Goldstein & Fox
Guy M. Cohen
Guy M. Cohen IBM (United States)
Richard Martel
Richard Martel University of Montreal
Joerg Appenzeller
Joerg Appenzeller Purdue University West Lafayette
Christian Lavoie
Christian Lavoie IBM (United States)
Kathryn W. Guarini
Kathryn W. Guarini IBM (United States)
Cyril Cabral
Cyril Cabral IBM (United States)

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