His scientific interests lie mostly in Optoelectronics, Layer, Electron mobility, Epitaxy and CMOS. His Optoelectronics study incorporates themes from Field-effect transistor, Electronic engineering and Threshold voltage. He works mostly in the field of Layer, limiting it down to topics relating to Silicon on insulator and, in certain cases, Homogeneous distribution, Dislocation and Crystallography.
His research in Electron mobility intersects with topics in Silicon and MOSFET. His work in Epitaxy tackles topics such as Semiconductor which are related to areas like Semiconductor device, Porous silicon, Wafer and Substrate. The various areas that Jack O. Chu examines in his CMOS study include Heterojunction bipolar transistor and Silicon-germanium.
Jack O. Chu mostly deals with Optoelectronics, Layer, Electronic engineering, Epitaxy and Silicon. His work focuses on many connections between Optoelectronics and other disciplines, such as Field-effect transistor, that overlap with his field of interest in Heterojunction and Transconductance. His study in Layer is interdisciplinary in nature, drawing from both Semiconductor materials and Graphene.
His research investigates the link between Electronic engineering and topics such as Composite material that cross with problems in Capacitor. His studies in Epitaxy integrate themes in fields like Electron mobility, Single crystal, Chemical vapor deposition and Compound semiconductor. He has researched Silicon in several fields, including Inorganic chemistry, Wafer and Strained silicon.
Jack O. Chu spends much of his time researching Optoelectronics, Layer, Graphene, Semiconductor and Wafer. The various areas that Jack O. Chu examines in his Optoelectronics study include Photovoltaic system and Epitaxy. His Layer research is multidisciplinary, incorporating perspectives in Field-effect transistor, Semiconductor materials and Electronic engineering.
His biological study deals with issues like MOSFET, which deal with fields such as Silicon, Diffusion barrier, Metal and Composite material. Jack O. Chu interconnects Alloy, Metallurgy, Forming gas and Low voltage in the investigation of issues within Semiconductor. As part of one scientific family, Jack O. Chu deals mainly with the area of Wafer, narrowing it down to issues related to the Sic substrate, and often Electronics and Thin film.
The scientist’s investigation covers issues in Graphene, Optoelectronics, Wafer, Semiconductor and Layer. His study in Optoelectronics is interdisciplinary in nature, drawing from both Nanotechnology and Surface layer. He has included themes like Electron mobility, Chemical vapor deposition, Epitaxy, Raman spectroscopy and Vacuum deposition in his Wafer study.
His Semiconductor research includes elements of Nickel, Thin film, Sic substrate, Electronics and Electronic engineering. His work on Substrate as part of general Layer research is frequently linked to Phase, bridging the gap between disciplines. His Substrate research integrates issues from Crystalline silicon, Carbide, Graphene nanoribbons, Carbon nanofiber and Chemical engineering.
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Characteristics and device design of sub-100 nm strained Si N- and PMOSFETs
K. Rim;J. Chu;H. Chen;K.A. Jenkins.
symposium on vlsi technology (2002)
Strained Si/SiGe layers on insulator
이스마일 칼리드 에즈엘딘.
Low leakage heterojunction vertical transistors and high performance devices thereof
Qiqing Christine Ouyang;Jack Oon Chu.
Strained Si NMOSFETs for high performance CMOS technology
K. Rim;S. Koester;M. Hargrove;J. Chu.
symposium on vlsi technology (2001)
Transferable device-containing layer for silicon-on-insulator applications
Jack Oon Chu;Alfred Grill;Dean A. Herman;Katherine L. Saenger.
High speed composite p-channel Si/SiGe heterostructure for field effect devices
Chu Jack U;Harmond Richard;Yichidi Kaqiride;Yismeri.
Integration of strained Ge into advanced CMOS technology
Huiling Shang;Meikei Ieong;Jack Oon Chu;Kathryn W. Guarini.
High performance strained silicon finfets device and method for forming same
Stephen W. Bedell;Kevin K. Chan;Dureseti Chidambarrao;Silke H. Christiansen.
Absolute rate constants for the reaction of silylene with hydrogen, silane, and disilane
Joseph M. Jasinski;Jack O. Chu.
Journal of Chemical Physics (1988)
Advance integrated chemical vapor deposition (AICVD) for semiconductor
Jack Oon Chu;Khalid EzzEldin Ismail.
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