D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Electronics and Electrical Engineering D-index 30 Citations 4,983 90 World Ranking 4692 National Ranking 1741

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Silicon
  • Transistor

His scientific interests lie mostly in Optoelectronics, Layer, Electron mobility, Epitaxy and CMOS. His Optoelectronics study incorporates themes from Field-effect transistor, Electronic engineering and Threshold voltage. He works mostly in the field of Layer, limiting it down to topics relating to Silicon on insulator and, in certain cases, Homogeneous distribution, Dislocation and Crystallography.

His research in Electron mobility intersects with topics in Silicon and MOSFET. His work in Epitaxy tackles topics such as Semiconductor which are related to areas like Semiconductor device, Porous silicon, Wafer and Substrate. The various areas that Jack O. Chu examines in his CMOS study include Heterojunction bipolar transistor and Silicon-germanium.

His most cited work include:

  • Strained Si/SiGe layers on insulator (274 citations)
  • Characteristics and device design of sub-100 nm strained Si N- and PMOSFETs (244 citations)
  • High speed composite p-channel Si/SiGe heterostructure for field effect devices (242 citations)

What are the main themes of his work throughout his whole career to date?

Jack O. Chu mostly deals with Optoelectronics, Layer, Electronic engineering, Epitaxy and Silicon. His work focuses on many connections between Optoelectronics and other disciplines, such as Field-effect transistor, that overlap with his field of interest in Heterojunction and Transconductance. His study in Layer is interdisciplinary in nature, drawing from both Semiconductor materials and Graphene.

His research investigates the link between Electronic engineering and topics such as Composite material that cross with problems in Capacitor. His studies in Epitaxy integrate themes in fields like Electron mobility, Single crystal, Chemical vapor deposition and Compound semiconductor. He has researched Silicon in several fields, including Inorganic chemistry, Wafer and Strained silicon.

He most often published in these fields:

  • Optoelectronics (71.67%)
  • Layer (30.00%)
  • Electronic engineering (24.17%)

What were the highlights of his more recent work (between 2009-2017)?

  • Optoelectronics (71.67%)
  • Layer (30.00%)
  • Graphene (9.17%)

In recent papers he was focusing on the following fields of study:

Jack O. Chu spends much of his time researching Optoelectronics, Layer, Graphene, Semiconductor and Wafer. The various areas that Jack O. Chu examines in his Optoelectronics study include Photovoltaic system and Epitaxy. His Layer research is multidisciplinary, incorporating perspectives in Field-effect transistor, Semiconductor materials and Electronic engineering.

His biological study deals with issues like MOSFET, which deal with fields such as Silicon, Diffusion barrier, Metal and Composite material. Jack O. Chu interconnects Alloy, Metallurgy, Forming gas and Low voltage in the investigation of issues within Semiconductor. As part of one scientific family, Jack O. Chu deals mainly with the area of Wafer, narrowing it down to issues related to the Sic substrate, and often Electronics and Thin film.

Between 2009 and 2017, his most popular works were:

  • Low resistance contacts including intermetallic alloy of nickel, platinum, titanium, aluminum and type IV semiconductor elements (47 citations)
  • Graphene formation utilizing solid phase carbon sources (31 citations)
  • Thin film wafer transfer and structure for electronic devices (25 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Silicon
  • Integrated circuit

The scientist’s investigation covers issues in Graphene, Optoelectronics, Wafer, Semiconductor and Layer. His study in Optoelectronics is interdisciplinary in nature, drawing from both Nanotechnology and Surface layer. He has included themes like Electron mobility, Chemical vapor deposition, Epitaxy, Raman spectroscopy and Vacuum deposition in his Wafer study.

His Semiconductor research includes elements of Nickel, Thin film, Sic substrate, Electronics and Electronic engineering. His work on Substrate as part of general Layer research is frequently linked to Phase, bridging the gap between disciplines. His Substrate research integrates issues from Crystalline silicon, Carbide, Graphene nanoribbons, Carbon nanofiber and Chemical engineering.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Characteristics and device design of sub-100 nm strained Si N- and PMOSFETs

K. Rim;J. Chu;H. Chen;K.A. Jenkins.
symposium on vlsi technology (2002)

390 Citations

Strained Si/SiGe layers on insulator

이스마일 칼리드 에즈엘딘.
(1997)

383 Citations

Low leakage heterojunction vertical transistors and high performance devices thereof

Qiqing Christine Ouyang;Jack Oon Chu.
(2003)

335 Citations

Strained Si NMOSFETs for high performance CMOS technology

K. Rim;S. Koester;M. Hargrove;J. Chu.
symposium on vlsi technology (2001)

329 Citations

Transferable device-containing layer for silicon-on-insulator applications

Jack Oon Chu;Alfred Grill;Dean A. Herman;Katherine L. Saenger.
(2004)

314 Citations

High speed composite p-channel Si/SiGe heterostructure for field effect devices

Chu Jack U;Harmond Richard;Yichidi Kaqiride;Yismeri.
(2001)

277 Citations

Integration of strained Ge into advanced CMOS technology

Huiling Shang;Meikei Ieong;Jack Oon Chu;Kathryn W. Guarini.
(2005)

250 Citations

High performance strained silicon finfets device and method for forming same

Stephen W. Bedell;Kevin K. Chan;Dureseti Chidambarrao;Silke H. Christiansen.
(2004)

246 Citations

Absolute rate constants for the reaction of silylene with hydrogen, silane, and disilane

Joseph M. Jasinski;Jack O. Chu.
Journal of Chemical Physics (1988)

232 Citations

Advance integrated chemical vapor deposition (AICVD) for semiconductor

Jack Oon Chu;Khalid EzzEldin Ismail.
(1999)

197 Citations

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