World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
40
Citations
6178
World Ranking
4527
National Ranking
1604

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Electrical engineering
  • Transistor

The scientist’s investigation covers issues in Optoelectronics, Electrical engineering, Non-volatile memory, Memory cell and Dielectric. His Optoelectronics research is mostly focused on the topic High-κ dielectric. In general Electrical engineering study, his work on Insulator, Transistor and Gate stack often relates to the realm of Polymer capacitor, thereby connecting several areas of interest.

His research in Non-volatile memory tackles topics such as Low voltage which are related to areas like EEPROM and Work function. His work in Memory cell tackles topics such as Node which are related to areas like Semiconductor memory, Volatile memory, Anode, Line and Diode. His Electronic engineering study incorporates themes from Layer and Silicon-germanium.

His most cited work include:

  • Hafnium aluminium oxynitride high-K dielectric and metal gates (239 citations)
  • Hafnium tantalum oxynitride high-k dielectric and metal gates (211 citations)
  • Scalable flash/NV structures and devices with extended endurance (183 citations)

What are the main themes of his work throughout his whole career to date?

His primary areas of study are Optoelectronics, Electrical engineering, Memory cell, Transistor and Dielectric. His Optoelectronics study combines topics from a wide range of disciplines, such as Electronic engineering and Thin-film transistor. His Electrical engineering research is multidisciplinary, incorporating perspectives in Layer and Body region.

His research investigates the connection with Memory cell and areas like Quantum tunnelling which intersect with concerns in Blocking. His Transistor research includes themes of Semiconductor and Thyristor. His research in the fields of High-κ dielectric overlaps with other disciplines such as Electronic systems and Lanthanide.

He most often published in these fields:

  • Optoelectronics (81.89%)
  • Electrical engineering (40.16%)
  • Memory cell (29.92%)

What were the highlights of his more recent work (between 2009-2017)?

  • Optoelectronics (81.89%)
  • Dielectric (24.41%)
  • Memory cell (29.92%)

In recent papers he was focusing on the following fields of study:

Arup Bhattacharyya mainly focuses on Optoelectronics, Dielectric, Memory cell, Quantum tunnelling and Non-volatile memory. His biological study spans a wide range of topics, including Layer and Semiconductor device. His work on High-κ dielectric is typically connected to Electronic systems, Oxygen and Lanthanide as part of general Dielectric study, connecting several disciplines of science.

The concepts of his Quantum tunnelling study are interwoven with issues in Blocking, Electrical engineering and Low voltage. His Electrical engineering study integrates concerns from other disciplines, such as Band gap and Charge retention. His Non-volatile memory research incorporates themes from Universal memory and Dram.

Between 2009 and 2017, his most popular works were:

  • Nanocrystal based universal memory cells, and memory cells (35 citations)
  • Lanthanide dielectric with controlled interfaces (22 citations)
  • Memory cells containing charge-trapping zones (21 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Electrical engineering
  • Integrated circuit

Optoelectronics, Dielectric, Electronic systems, Charge and Memory cell are his primary areas of study. His primary area of study in Optoelectronics is in the field of Silicon. His work deals with themes such as Dynamic random-access memory, Chemical engineering and Parallel computing, which intersect with Dielectric.

Throughout his Electronic systems studies, Arup Bhattacharyya incorporates elements of other sciences such as High-κ dielectric, Metal electrodes, Aluminum oxynitride, Monolayer and Atomic layer deposition. His Charge studies intersect with other subjects such as Nanodot, Optics, Blocking, Electrical engineering and Erasure. His research integrates issues of Dram, Nanocrystal, Non-volatile memory, Universal memory and Quantum tunnelling in his study of Memory cell.

Best Publications

  • Hafnium aluminium oxynitride high-K dielectric and metal gates

    Leonard Forbes;Kie Y. Ahn;Arup Bhattacharyya

  • Hafnium tantalum oxynitride dielectric

    Leonard Forbes;Kie Y. Ahn;Arup Bhattacharyya

  • Scalable gate and storage dielectric

    Arup Bhattacharyya

  • Scalable flash/NV structures and devices with extended endurance

    Arup Bhattacharyya

  • Tantalum lanthanide oxynitride films

    Leonard Forbes;Kie Y. Ahn;Arup Bhattacharyya

  • Methods of forming reverse mode non-volatile memory cell structures

    Arup Bhattacharyya

  • One transistor SOI non-volatile random access memory cell

    Arup Bhattacharyya

  • Asymmetric band-gap engineered nonvolatile memory device

    Arup Bhattacharyya

  • Memory cells configured to allow for erasure by enhanced f-n tunneling of holes from a control gate to a charge trapping material

    Arup Bhattacharyya;Kirk D. Prall;Luan C. Tran

  • Stable PD-SOI devices and methods

    Arup Bhattacharyya

  • Scalable integrated logic and non-volatile memory

    Arup Bhattacharyya

  • Memory devices and electronic systems comprising thyristors

    Arup Bhattacharyya

  • Methods of operating memory cell having asymmetric band-gap tunnel insulator using direct tunneling

    Arup Bhattacharyya

  • Methods of forming SRAM constructions

    Arup Bhattacharyya

  • Decoupling capacitor for high frequency noise immunity

    Arup Bhattacharyya

  • Methods of forming transistor constructions

    Arup Bhattacharyya

  • High performance three-dimensional TFT-based CMOS inverters, and computer systems utilizing such novel CMOS inverters

    Arup Bhattacharyya

  • Methods of forming and operating back-side trap non-volatile memory cells

    Arup Bhattacharyya

  • Methods of forming non-volatile memory structure with crested barrier tunnel layer

    Arup Bhattacharyya

  • Method for forming a high-performance one-transistor memory cell

    Arup Bhattacharyya

Frequent Co-Authors

Leonard Forbes
Leonard Forbes L. Forbes and Associates LLC
Kie Y. Ahn
Kie Y. Ahn Micron (United States)

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