World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
40
Citations
6178
World Ranking
4527
National Ranking
1605

Arup Bhattacharyya publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Arup Bhattacharyya sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 71 publications — 1st percentile

1% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Arup Bhattacharyya D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Arup Bhattacharyya sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 40 D-Index — 36th percentile

36% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Electrical engineering
  • Transistor

The scientist’s investigation covers issues in Optoelectronics, Electrical engineering, Non-volatile memory, Memory cell and Dielectric. His Optoelectronics research is mostly focused on the topic High-κ dielectric. In general Electrical engineering study, his work on Insulator, Transistor and Gate stack often relates to the realm of Polymer capacitor, thereby connecting several areas of interest.

His research in Non-volatile memory tackles topics such as Low voltage which are related to areas like EEPROM and Work function. His work in Memory cell tackles topics such as Node which are related to areas like Semiconductor memory, Volatile memory, Anode, Line and Diode. His Electronic engineering study incorporates themes from Layer and Silicon-germanium.

His most cited work include:

  • Hafnium aluminium oxynitride high-K dielectric and metal gates (239 citations)
  • Hafnium tantalum oxynitride high-k dielectric and metal gates (211 citations)
  • Scalable flash/NV structures and devices with extended endurance (183 citations)

What are the main themes of his work throughout his whole career to date?

His primary areas of study are Optoelectronics, Electrical engineering, Memory cell, Transistor and Dielectric. His Optoelectronics study combines topics from a wide range of disciplines, such as Electronic engineering and Thin-film transistor. His Electrical engineering research is multidisciplinary, incorporating perspectives in Layer and Body region.

His research investigates the connection with Memory cell and areas like Quantum tunnelling which intersect with concerns in Blocking. His Transistor research includes themes of Semiconductor and Thyristor. His research in the fields of High-κ dielectric overlaps with other disciplines such as Electronic systems and Lanthanide.

He most often published in these fields:

  • Optoelectronics (81.89%)
  • Electrical engineering (40.16%)
  • Memory cell (29.92%)

What were the highlights of his more recent work (between 2009-2017)?

  • Optoelectronics (81.89%)
  • Dielectric (24.41%)
  • Memory cell (29.92%)

In recent papers he was focusing on the following fields of study:

Arup Bhattacharyya mainly focuses on Optoelectronics, Dielectric, Memory cell, Quantum tunnelling and Non-volatile memory. His biological study spans a wide range of topics, including Layer and Semiconductor device. His work on High-κ dielectric is typically connected to Electronic systems, Oxygen and Lanthanide as part of general Dielectric study, connecting several disciplines of science.

The concepts of his Quantum tunnelling study are interwoven with issues in Blocking, Electrical engineering and Low voltage. His Electrical engineering study integrates concerns from other disciplines, such as Band gap and Charge retention. His Non-volatile memory research incorporates themes from Universal memory and Dram.

Between 2009 and 2017, his most popular works were:

  • Nanocrystal based universal memory cells, and memory cells (35 citations)
  • Lanthanide dielectric with controlled interfaces (22 citations)
  • Memory cells containing charge-trapping zones (21 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Electrical engineering
  • Integrated circuit

Optoelectronics, Dielectric, Electronic systems, Charge and Memory cell are his primary areas of study. His primary area of study in Optoelectronics is in the field of Silicon. His work deals with themes such as Dynamic random-access memory, Chemical engineering and Parallel computing, which intersect with Dielectric.

Throughout his Electronic systems studies, Arup Bhattacharyya incorporates elements of other sciences such as High-κ dielectric, Metal electrodes, Aluminum oxynitride, Monolayer and Atomic layer deposition. His Charge studies intersect with other subjects such as Nanodot, Optics, Blocking, Electrical engineering and Erasure. His research integrates issues of Dram, Nanocrystal, Non-volatile memory, Universal memory and Quantum tunnelling in his study of Memory cell.

Best Publications

  • Hafnium aluminium oxynitride high-K dielectric and metal gates

    Leonard Forbes;Kie Y. Ahn;Arup Bhattacharyya

  • Hafnium tantalum oxynitride dielectric

    Leonard Forbes;Kie Y. Ahn;Arup Bhattacharyya

  • Scalable gate and storage dielectric

    Arup Bhattacharyya

  • Scalable flash/NV structures and devices with extended endurance

    Arup Bhattacharyya

  • Tantalum lanthanide oxynitride films

    Leonard Forbes;Kie Y. Ahn;Arup Bhattacharyya

  • Methods of forming reverse mode non-volatile memory cell structures

    Arup Bhattacharyya

  • One transistor SOI non-volatile random access memory cell

    Arup Bhattacharyya

  • Asymmetric band-gap engineered nonvolatile memory device

    Arup Bhattacharyya

  • Memory cells configured to allow for erasure by enhanced f-n tunneling of holes from a control gate to a charge trapping material

    Arup Bhattacharyya;Kirk D. Prall;Luan C. Tran

  • Stable PD-SOI devices and methods

    Arup Bhattacharyya

  • Scalable integrated logic and non-volatile memory

    Arup Bhattacharyya

  • Memory devices and electronic systems comprising thyristors

    Arup Bhattacharyya

  • Methods of operating memory cell having asymmetric band-gap tunnel insulator using direct tunneling

    Arup Bhattacharyya

  • Methods of forming SRAM constructions

    Arup Bhattacharyya

  • Decoupling capacitor for high frequency noise immunity

    Arup Bhattacharyya

  • Methods of forming transistor constructions

    Arup Bhattacharyya

  • High performance three-dimensional TFT-based CMOS inverters, and computer systems utilizing such novel CMOS inverters

    Arup Bhattacharyya

  • Methods of forming and operating back-side trap non-volatile memory cells

    Arup Bhattacharyya

  • Methods of forming non-volatile memory structure with crested barrier tunnel layer

    Arup Bhattacharyya

  • Method for forming a high-performance one-transistor memory cell

    Arup Bhattacharyya

Frequent Co-Authors

Leonard Forbes
Leonard Forbes L. Forbes and Associates LLC
Kie Y. Ahn
Kie Y. Ahn Micron (United States)
Garo J. Derderian
Garo J. Derderian Intel (United States)

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