World's Best Scientists 2026 revealed!
Devendra K. Sadana

Devendra K. Sadana

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
63
Citations
13612
World Ranking
1385
National Ranking
570

Materials Science

D-Index
65
Citations
14950
World Ranking
5642
National Ranking
1463

Devendra K. Sadana publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Devendra K. Sadana sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 625 publications — 91st percentile

91% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Devendra K. Sadana D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Devendra K. Sadana sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 63 D-Index — 81st percentile

81% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Research.com Recognitions

  • 2014 - SPIE Fellow

Overview

Devendra K. Sadana is affiliated with IBM in the United States. Their research primarily spans the areas of engineering and materials science, with a focus on electrical and electronic engineering, materials chemistry, renewable energy, sustainability and the environment, biomedical engineering, and electronic, optical, and magnetic materials.

The main research topics covered by Devendra K. Sadana include:

  • Advancements in Battery Materials
  • Advanced Battery Materials and Technologies
  • Solar Cell Performance Optimization
  • Photovoltaic System Optimization Techniques
  • Nanowire Synthesis and Applications
  • Phase-Change Materials and Chalcogenides
  • Chalcogenide Semiconductor Thin Films

Notable published works by Devendra K. Sadana are:

  • "Dust-Sized High-Power-Density Photovoltaic Cells on Si and SOI Substrates for Wafer-Level-Packaged Small Edge Computers," 2020, Advanced Materials
  • "Crystallization Properties of Al-Sb Alloys for Phase Change Memory Applications," 2021, ECS Journal of Solid State Science and Technology
  • "Diffusion-Controlled Porous Crystalline Silicon Lithium Metal Batteries," 2020, iScience
  • "Fundamentals, impedance, and performance of solid-state Li-metal microbatteries," 2020, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • "Micro-Photovoltaics: Dust-Sized High-Power-Density Photovoltaic Cells on Si and SOI Substrates for Wafer-Level-Packaged Small Edge Computers (Adv. Mater. 49/2020)," 2020, Advanced Materials

Frequent coauthors collaborating with Devendra K. Sadana include:

  • Stephen W. Bedell
  • J. A. Ott
  • Marinus Hopstaken
  • Ning Li
  • Kevin Han

The primary venues for Devendra K. Sadana's publications encompass:

  • Advanced Materials
  • ECS Journal of Solid State Science and Technology
  • iScience
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • ECS Meeting Abstracts

Throughout their career, Devendra K. Sadana has been recognized as a SPIE Fellow since 2014, acknowledging their professional standing within the scientific community.

Best Publications

  • Principle of direct van der Waals epitaxy of single-crystalline films on epitaxial graphene

    Jeehwan Kim;Can Bayram;Hongsik Park;Cheng Wei Cheng

  • VERFAHREN ZUR HERSTELLUNG VON FINFET-BAUELEMENTEN AUS BULK-HALBLEITER

    Fried David M;Nowak Edward J;Rainey Beth Ann;Sadana Devendra K

  • Epitaxial lift-off process for gallium arsenide substrate reuse and flexible electronics

    Cheng-Wei Cheng;Kuen-Ting Shiu;Ning Li;Shu-Jen Han

  • SOI CMOS structure

    Wei Chen;Devendra Kumar Sadana;Yuan Taur

  • Thin substrate fabrication using stress-induced spalling

    Stephen W. Bedell;Keith E. Fogel;Paul A. Lauro;Devendra Sadana

  • Method of preventing surface roughening during hydrogen prebake of SiGe substrates

    Huajie Chen;Dan M. Mocuta;Richard J. Murphy;Stephan W. Bedell

  • Layer-Resolved Graphene Transfer via Engineered Strain Layers

    Jeehwan Kim;Hongsik Park;James B. Hannon;Stephen W. Bedell

  • Efficient and bright organic light-emitting diodes on single-layer graphene electrodes

    Ning Li;Satoshi Oida;George S. Tulevski;Shu-Jen Han

  • Spalling methods to form multi-junction photovoltaic structure and photovoltaic device

    Bedell Stephen W;Sadana Devendra K;Shahrjerdi Davood

  • Kerf-Less Removal of Si, Ge, and III–V Layers by Controlled Spalling to Enable Low-Cost PV Technologies

    S. W. Bedell;D. Shahrjerdi;B. Hekmatshoar;K. Fogel

  • Verfahren zum Stabilisieren von hydriertem, amorphem Silicium und amorphen, hydrierten Siliciumlegierungen

    Bahman Hekmatshoar-Tabari;Marinus Hopstaken;Dae-Gyu Park;Devendra K. Sadana

  • Silicon-on-insulator vertical array device trench capacitor DRAM

    Carl J. Radens;Gary B. Bronner;Tze-Chiang Chen;Bijan Davari

  • Field effect transistor with stressed channel and producing method thereof

    Doris Brews B;Zidambarao Dursedi

  • Patterned SOI regions on semiconductor chips

    Bijan Davari;Devendra Kumar Sadana;Ghavam G. Shahidi;Sandip Tiwari

  • Densely patterned silicon-on-insulator (SOI) region on a wafer

    Effendi Leobandung;Devendra K. Sadana;Dominic J. Schepis;Ghavam G. Shahidi

  • Techniques for Layer Transfer Processing

    Stephen W. Bedell;Keith Edward Fogel;Bruce Kenneth Furman;Sampath Purushothaman

  • Extremely thin SOI (ETSOI) CMOS with record low variability for low power system-on-chip applications

    K. Cheng;A. Khakifirooz;P. Kulkarni;S. Ponoth

  • Mechanisms of amorphization and recrystallization in ion implanted III–V compound semiconductors

    D.K. Sadana;D.K. Sadana

  • Interactions of thin Ti films with Si, SiO2, Si3N4, and SiOxNy under rapid thermal annealing

    A. E. Morgan;E. K. Broadbent;K. N. Ritz;D. K. Sadana

  • Residual defects following rapid thermal annealing of shallow boron and boron fluoride implants into preamorphized silicon

    C. Carter;W. Maszara;D. K. Sadana;G. A. Rozgonyi

Frequent Co-Authors

Stephen W. Bedell
Stephen W. Bedell IBM (United States)
Ghavam G. Shahidi
Ghavam G. Shahidi IBM (United States)
Davood Shahrjerdi
Davood Shahrjerdi New York University
Alexander Reznicek
Alexander Reznicek IBM (United States)
John A. Ott
John A. Ott IBM (United States)
Katherine L. Saenger
Katherine L. Saenger Auburn University
Dominic J. Schepis
Dominic J. Schepis Global Foundries
Ali Khakifirooz
Ali Khakifirooz Intel (United States)
Bruce B. Doris
Bruce B. Doris IBM (United States)

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