Dominic J. Schepis

What is he best known for?

The fields of study he is best known for:

• Semiconductor
• Electrical engineering
• Integrated circuit

Dominic J. Schepis mainly focuses on Optoelectronics, Silicon on insulator, Electronic engineering, CMOS and Electrical engineering. His study in Optoelectronics is interdisciplinary in nature, drawing from both Layer, Nanotechnology and Field-effect transistor. His research in Layer intersects with topics in Monocrystalline silicon and Semiconductor.

His research integrates issues of Transistor and Stress in his study of Silicon on insulator. His work carried out in the field of Electronic engineering brings together such families of science as Schottky diode, Schottky barrier, Metal–semiconductor junction, Oxide and Silicide. His CMOS research incorporates elements of Dram and MOSFET.

His most cited work include:

• Epitaxial growth of silicon doped with carbon and phosphorus using hydrogen carrier gas (139 citations)
• Handbook of Thin Film Deposition (122 citations)
• SOI based field effect transistor having a compressive film in undercut area under the channel and a method of making the device (110 citations)

What are the main themes of his work throughout his whole career to date?

Dominic J. Schepis mainly investigates Optoelectronics, Silicon on insulator, Electronic engineering, Layer and Silicon. In his study, Epitaxy is inextricably linked to Substrate, which falls within the broad field of Optoelectronics. His Silicon on insulator study which covers Semiconductor that intersects with Dielectric.

As a part of the same scientific family, Dominic J. Schepis mostly works in the field of Electronic engineering, focusing on Germanium and, on occasion, Aluminium. The Layer study combines topics in areas such as Monocrystalline silicon and Dopant. His research on Silicon often connects related areas such as Etching.

He most often published in these fields:

• Optoelectronics (77.36%)
• Silicon on insulator (40.88%)
• Electronic engineering (36.48%)

What were the highlights of his more recent work (between 2012-2019)?

• Optoelectronics (77.36%)
• Electronic engineering (36.48%)
• Semiconductor (13.84%)

In recent papers he was focusing on the following fields of study:

Dominic J. Schepis focuses on Optoelectronics, Electronic engineering, Semiconductor, Semiconductor device and Substrate. His Optoelectronics study integrates concerns from other disciplines, such as Layer, Epitaxy and Oxide. Dominic J. Schepis has included themes like Field-effect transistor and Silicon in his Oxide study.

Dominic J. Schepis works on Electronic engineering which deals in particular with CMOS. He combines subjects such as Silicon on insulator and Dielectric with his study of Semiconductor. The Silicon on insulator study combines topics in areas such as Trench and Insulator.

Between 2012 and 2019, his most popular works were:

• High performance 14nm SOI FinFET CMOS technology with 0.0174µm 2 embedded DRAM and 15 levels of Cu metallization (92 citations)
• FinFET device containing a composite spacer structure (22 citations)
• Finfet having highly doped source and drain regions (19 citations)

In his most recent research, the most cited papers focused on:

• Semiconductor
• Electrical engineering
• Integrated circuit

His main research concerns Electronic engineering, Optoelectronics, Semiconductor device, Doping and Semiconductor materials. His Electronic engineering research incorporates elements of Semiconductor, Dielectric, Composite number, Composite material and Nitride. His study in Optoelectronics is interdisciplinary in nature, drawing from both Diffraction, Transistor, MOSFET, Heterostructure-emitter bipolar transistor and Electrical engineering.

His Semiconductor device study integrates concerns from other disciplines, such as Reciprocal lattice, Epitaxy, Deformation, X-ray crystallography and Electron backscatter diffraction.