World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
50
Citations
6549
World Ranking
2870
National Ranking
1081

Materials Science

D-Index
51
Citations
6685
World Ranking
10051
National Ranking
2407

Overview

Guy M. Cohen is affiliated with IBM in the United States. Their primary domain of research lies within Medicine, with a focus on several subfields including Dermatology, Molecular Biology, Pharmaceutical Science, Immunology, and Health, Toxicology and Mutagenesis.

The research topics covered by Cohen include:

  • Genomics, phytochemicals, and oxidative stress
  • Dermatology and Skin Diseases
  • Advancements in Transdermal Drug Delivery
  • Skin Protection and Aging
  • Air Quality and Health Impacts
  • Psoriasis: Treatment and Pathogenesis
  • Essential Oils and Antimicrobial Activity

Cohen's work features publications in several frequent venues, such as:

  • Free Radical Biology and Medicine
  • International Journal of Environmental Research and Public Health
  • Pharmaceutics
  • International Journal of Molecular Sciences
  • Pharmacological Reports

Selected recent papers by Cohen include:

  • Protective actions of nuclear factor erythroid 2-related factor 2 (NRF2) and downstream pathways against environmental stressors (2022, Free Radical Biology and Medicine)
  • Kinetic Cytokine Secretion Profile of LPS-Induced Inflammation in the Human Skin Organ Culture (2020, Pharmaceutics)
  • Advances in Understanding the Initial Steps of Pruritoceptive Itch: How the Itch Hits the Switch (2020, International Journal of Molecular Sciences)
  • Pruritus in psoriasis and atopic dermatitis: current treatments and new perspectives (2021, Pharmacological Reports)
  • NRF2 in dermatological disorders: Pharmacological activation for protection against cutaneous photodamage and photodermatosis (2022, Free Radical Biology and Medicine)

Throughout their career, Cohen has frequently collaborated with several researchers. Notable frequent co-authors include:

  • Raanan Gvirtz
  • Navit Ogen-Shtern
  • Shirin Kahremany
  • Arie Gruzman
  • Noy Eretz-Kdosha

Best Publications

  • High performance and highly uniform gate-all-around silicon nanowire MOSFETs with wire size dependent scaling

    S. Bangsaruntip;G. M. Cohen;A. Majumdar;Y. Zhang

  • Method of forming vertical FET with nanowire channels and a silicided bottom contact

    Guy M. Cohen;Paul M. Solomon

  • Electrical integrity of state-of-the-art 0.13 /spl mu/m SOI CMOS devices and circuits transferred for three-dimensional (3D) integrated circuit (IC) fabrication

    K.W. Guarini;A.W. Topol;M. Ieong;R. Yu

  • Gate-all-around silicon nanowire 25-stage CMOS ring oscillators with diameter down to 3 nm

    S. Bangsaruntip;A. Majumdar;G. M. Cohen;S. U. Engelmann

  • Universality of Short-Channel Effects in Undoped-Body Silicon Nanowire MOSFETs

    Sarunya Bangsaruntip;Guy M Cohen;Amlan Majumdar;Jeffrey W Sleight

  • Nanowire field-effect transistors

    Sarunya Bangsaruntip;Guy M. Cohen;Shreesh Narasimha;Jeffrey W. Sleight

  • Strained-channel Fin field effect transistor (FET) with a uniform channel thickness and separate gates

    Guy Moshe Cohen

  • Self-aligned double-gate MOSFET by selective epitaxy and silicon wafer bonding techniques

    Kevin K. Chan;Guy M. Cohen;Yuan Taur;Hon-Sum P. Wong

  • Two gates are better than one [double-gate MOSFET process]

    P.M. Solomon;K.W. Guarini;Y. Zhang;K. Chan

  • Mixed orientation and mixed material semiconductor-on-insulator wafer

    Guy M. Cohen;Alexander Reznicek;Katherine L. Saenger;Min Yang

  • Process for forming a surrounding gate for a nanowire using a sacrificial patternable dielectric

    Sarunya Bangsaruntip;Guy Cohen;Michael A. Guillorn

  • Maskless process for suspending and thinning nanowires

    Sarunya Bangsaruntip;Guy Cohen;Jeffrey W. Sleight

  • Density scaling with gate-all-around silicon nanowire MOSFETs for the 10 nm node and beyond

    S. Bangsaruntip;K. Balakrishnan;S.-L Cheng;J. Chang

  • Self-aligned silicide (salicide) process for low resistivity contacts to thin film silicon-on-insulator and bulk MOSFETS and for shallow Junctions

    Cyril Cabral;Kevin Kok Chan;Guy Moshe Cohen;Christian Lavoie

  • Semiconductor-on-insulator lateral p-i-n photodetector with a reflecting mirror and backside contact and method for forming the same

    Guy Moshe Cohen;Kern Rim;Dennis L. Rogers;Jeremy Daniel Schaub

  • Triple-self-aligned, planar double-gate MOSFETs: devices and circuits

    K.W. Guarini;P.M. Solomon;Y. Zhang;K.K. Chan

  • Method and system for providing a quality metric for improved process control

    Daniel Kandel;Guy Cohen;Dana Klein;Vladimir Levinski

  • Enabling technologies for wafer-level bonding of 3D MEMS and integrated circuit structures

    A.W. Topol;B.K. Furman;K.W. Guarini;L. Shi

  • Method for fabricating SiGe-on-insulator (SGOI) and Ge-on-insulator (GOI) substrates

    Tze-Chiang Chen;Guy M. Cohen;Alexander Reznicek;Devendra K. Sadana

  • Molecular light emitting device

    Phaedon Avouris;Guy Moshe Cohen;Richard Martel;James A Misewich

Frequent Co-Authors

Jeffrey W. Sleight
Jeffrey W. Sleight IBM (United States)
Paul M. Solomon
Paul M. Solomon IBM (United States)
Christian Lavoie
Christian Lavoie IBM (United States)
Cyril Cabral
Cyril Cabral IBM (United States)
Kevin K. Chan
Kevin K. Chan IBM (United States)
Kathryn W. Guarini
Kathryn W. Guarini IBM (United States)
Patricia M. Mooney
Patricia M. Mooney Simon Fraser University
Michael A. Guillorn
Michael A. Guillorn IBM (United States)
John A. Ott
John A. Ott IBM (United States)
Christos D. Dimitrakopoulos
Christos D. Dimitrakopoulos University of Massachusetts Amherst

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