The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Max G. Lagally sits on this spectrum.
This scientist: 639 publications — 93rd percentile
93% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Max G. Lagally sits on this spectrum.
This scientist: 90 D-Index — 87th percentile
87% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Max G. Lagally is affiliated with the University of Wisconsin-Madison in the United States. Their research primarily spans the fields of Engineering, Materials Science, and Physics and Astronomy, with notable emphasis on Electrical and Electronic Engineering, Materials Chemistry, and Atomic and Molecular Physics, and Optics.
Their scientific work addresses a variety of topics including Semiconductor Quantum Structures and Devices, Thermal properties of materials, Graphene research and applications, Photonic and Optical Devices, Quantum and electron transport phenomena, Advancements in Semiconductor Devices and Circuit Design, and Gyrotron and Vacuum Electronics Research.
Recent publications by Max G. Lagally include:
Max G. Lagally frequently publishes in venues such as arXiv (Cornell University), Zenodo (CERN European Organization for Nuclear Research), Physical Review B, ACS Applied Materials & Interfaces, and ACS Nano.
The scientist collaborates often with coauthors including M. A. Eriksson, D. E. Savage, S. N. Coppersmith, Mark Friesen, and Robert Joynt.
Throughout their career, Max G. Lagally has been recognized with several awards and honors such as:
Y.-W. Mo;D. E. Savage;B. S. Swartzentruber;M. G. Lagally
J. Tersoff;C. Teichert;M. G. Lagally
Zhenyu Zhang;Max G. Lagally
Y. W. Mo;J. Kleiner;M. B. Webb;M. G. Lagally
T. F. Watson;S. G. J. Philips;E. Kawakami;D. R. Ward
J. A. Rogers;M. G. Lagally;R. G. Nuzzo
Benjamin E. Nelms;Richard S. Maser;James F. MacKay;Max G. Lagally
E. Kawakami;P. Scarlino;D. R. Ward;F. R. Braakman;F. R. Braakman
B. S. Swartzentruber;Y.‐W. Mo;M. B. Webb;M. G. Lagally
Y.-W. Mo;B. S. Swartzentruber;R. Kariotis;M. B. Webb
B. S. Swartzentruber;Y.-W. Mo;R. Kariotis;M. G. Lagally
J. Tersoff;Y. H. Phang;Zhenyu Zhang;M. G. Lagally
D. E. Savage;J. Kleiner;N. Schimke;Y.‐H. Phang
Max G. Lagally
Growth at Surfaces;Max G. Lagally
Dohun Kim;Zhan Shi;C. B. Simmons;D. R. Ward
Y.-W. Mo;M.G. Lagally
Mark Friesen;Paul Rugheimer;Donald E. Savage;Max G. Lagally
Y.-W. Mo;J. Kleiner;M.B. Webb;M.G. Lagally
Michelle M. Roberts;Levente J. Klein;Donald E. Savage;Keith A. Slinker
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