World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
90
Citations
30563
World Ranking
1685
National Ranking
519

Physics

D-Index
95
Citations
33540
World Ranking
1928
National Ranking
1003

Max G. Lagally publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Max G. Lagally sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 639 publications — 93rd percentile

93% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Max G. Lagally D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Max G. Lagally sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 90 D-Index — 87th percentile

87% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2012 - Fellow, National Academy of Inventors
  • 2009 - Fellow of the Materials Research Society
  • 2001 - Member of the National Academy of Engineering For contributions to surface science, in particular in semiconductor film growth and in the development of novel analytical techniques.
  • 2000 - Fellow of the American Association for the Advancement of Science (AAAS)
  • 1999 - German National Academy of Sciences Leopoldina - Deutsche Akademie der Naturforscher Leopoldina – Nationale Akademie der Wissenschaften Physics
  • 1995 - Davisson–Germer Prize in Atomic or Surface Physics, American Physical Society
  • 1994 - David Adler Lectureship Award in the Field of Materials Physics
  • 1994 - MRS Medal, Materials Research Society For innovative development of STM as a quantitative probe of the microscopic mechanisms of crystal growth and ordering at surfaces
  • 1994 - David Adler Lectureship Award in the Field of Materials Physics, American Physical Society
  • 1980 - Fellow of American Physical Society (APS) Citation Not Provided
  • 1973 - Fellow of Alfred P. Sloan Foundation

Overview

Max G. Lagally is affiliated with the University of Wisconsin-Madison in the United States. Their research primarily spans the fields of Engineering, Materials Science, and Physics and Astronomy, with notable emphasis on Electrical and Electronic Engineering, Materials Chemistry, and Atomic and Molecular Physics, and Optics.

Their scientific work addresses a variety of topics including Semiconductor Quantum Structures and Devices, Thermal properties of materials, Graphene research and applications, Photonic and Optical Devices, Quantum and electron transport phenomena, Advancements in Semiconductor Devices and Circuit Design, and Gyrotron and Vacuum Electronics Research.

Recent publications by Max G. Lagally include:

  • SiGe quantum wells with oscillating Ge concentrations for quantum dot qubits, 2022, Nature Communications
  • Repetitive Quantum Nondemolition Measurement and Soft Decoding of a Silicon Spin Qubit, 2020, Physical Review X
  • Valley splittings in Si/SiGe quantum dots with a germanium spike in the silicon well, 2021, Physical Review B
  • Thickness-Dependent Cross-Plane Thermal Conductivity Measurements of Exfoliated Hexagonal Boron Nitride, 2023, ACS Applied Materials & Interfaces
  • Spatial noise correlations in a Si/SiGe two-qubit device from Bell state coherences, 2020, Physical Review B

Max G. Lagally frequently publishes in venues such as arXiv (Cornell University), Zenodo (CERN European Organization for Nuclear Research), Physical Review B, ACS Applied Materials & Interfaces, and ACS Nano.

The scientist collaborates often with coauthors including M. A. Eriksson, D. E. Savage, S. N. Coppersmith, Mark Friesen, and Robert Joynt.

Throughout their career, Max G. Lagally has been recognized with several awards and honors such as:

  • Fellow, National Academy of Inventors (2012)
  • Fellow of the Materials Research Society (2009)
  • Member of the National Academy of Engineering (2001) for contributions to surface science, particularly in semiconductor film growth and novel analytical techniques
  • Fellow of the American Association for the Advancement of Science (AAAS) (2000)
  • Member of the German National Academy of Sciences Leopoldina (1999) in Physics
  • Davisson-Germer Prize in Atomic or Surface Physics, American Physical Society (1995)
  • David Adler Lectureship Award in the Field of Materials Physics (1994)
  • MRS Medal, Materials Research Society (1994), for innovative development of STM as a quantitative probe of crystal growth and ordering at surfaces
  • Fellow of American Physical Society (APS) (1980)
  • Fellow of Alfred P. Sloan Foundation (1973)

Best Publications

  • Kinetic pathway in Stranski-Krastanov growth of Ge on Si(001).

    Y.-W. Mo;D. E. Savage;B. S. Swartzentruber;M. G. Lagally

  • Self-organization in growth of quantum dot superlattices.

    J. Tersoff;C. Teichert;M. G. Lagally

  • Atomistic Processes in the Early Stages of Thin-Film Growth

    Zhenyu Zhang;Max G. Lagally

  • Activation energy for surface diffusion of Si on Si(001): A scanning-tunneling-microscopy study.

    Y. W. Mo;J. Kleiner;M. B. Webb;M. G. Lagally

  • A programmable two-qubit quantum processor in silicon

    T. F. Watson;S. G. J. Philips;E. Kawakami;D. R. Ward

  • Synthesis, assembly and applications of semiconductor nanomembranes

    J. A. Rogers;M. G. Lagally;R. G. Nuzzo

  • In Situ Visualization of DNA Double-Strand Break Repair in Human Fibroblasts

    Benjamin E. Nelms;Richard S. Maser;James F. MacKay;Max G. Lagally

  • Electrical control of a long-lived spin qubit in a Si/SiGe quantum dot.

    E. Kawakami;P. Scarlino;D. R. Ward;F. R. Braakman;F. R. Braakman

  • Scanning tunneling microscopy studies of structural disorder and steps on Si surfaces

    B. S. Swartzentruber;Y.‐W. Mo;M. B. Webb;M. G. Lagally

  • Growth and equilibrium structures in the epitaxy of Si on Si(001).

    Y.-W. Mo;B. S. Swartzentruber;R. Kariotis;M. B. Webb

  • Direct determination of step and kink energies on vicinal Si(001).

    B. S. Swartzentruber;Y.-W. Mo;R. Kariotis;M. G. Lagally

  • Step-bunching instability of vicinal surfaces under stress.

    J. Tersoff;Y. H. Phang;Zhenyu Zhang;M. G. Lagally

  • Determination of roughness correlations in multilayer films for x‐ray mirrors

    D. E. Savage;J. Kleiner;N. Schimke;Y.‐H. Phang

  • Atom Motion on Surfaces

    Max G. Lagally

  • Kinetics of ordering and growth at surfaces

    Growth at Surfaces;Max G. Lagally

  • Quantum control and process tomography of a semiconductor quantum dot hybrid qubit

    Dohun Kim;Zhan Shi;C. B. Simmons;D. R. Ward

  • Anisotropy in surface migration of Si and Ge on Si(001)

    Y.-W. Mo;M.G. Lagally

  • Practical design and simulation of silicon-based quantum-dot qubits

    Mark Friesen;Paul Rugheimer;Donald E. Savage;Max G. Lagally

  • Surface self-diffusion of Si on Si(001)

    Y.-W. Mo;J. Kleiner;M.B. Webb;M.G. Lagally

  • Elastically relaxed free-standing strained-silicon nanomembranes.

    Michelle M. Roberts;Levente J. Klein;Donald E. Savage;Keith A. Slinker

Frequent Co-Authors

Zhenqiang Ma
Zhenqiang Ma University of Wisconsin–Madison
Roberto Paiella
Roberto Paiella Boston University
Thomas F. Kuech
Thomas F. Kuech University of Wisconsin–Madison
Brian S. Swartzentruber
Brian S. Swartzentruber Sandia National Laboratories
Toh-Ming Lu
Toh-Ming Lu Rensselaer Polytechnic Institute
Gwo-Ching Wang
Gwo-Ching Wang Rensselaer Polytechnic Institute
F. J. Himpsel
F. J. Himpsel University of Wisconsin–Madison
Lloyd M. Smith
Lloyd M. Smith University of Wisconsin–Madison
Toshio Sakurai
Toshio Sakurai Tohoku University
Yoshitada Morikawa
Yoshitada Morikawa Osaka University

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