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Materials Science

D-Index
90
Citations
30563
World Ranking
1686
National Ranking
520

Physics

D-Index
95
Citations
33540
World Ranking
1928
National Ranking
1003

Research.com Recognitions

  • 2012 - Fellow, National Academy of Inventors
  • 2009 - Fellow of the Materials Research Society
  • 2001 - Member of the National Academy of Engineering For contributions to surface science, in particular in semiconductor film growth and in the development of novel analytical techniques.
  • 2000 - Fellow of the American Association for the Advancement of Science (AAAS)
  • 1999 - German National Academy of Sciences Leopoldina - Deutsche Akademie der Naturforscher Leopoldina – Nationale Akademie der Wissenschaften Physics
  • 1995 - Davisson–Germer Prize in Atomic or Surface Physics, American Physical Society
  • 1994 - David Adler Lectureship Award in the Field of Materials Physics
  • 1994 - MRS Medal, Materials Research Society For innovative development of STM as a quantitative probe of the microscopic mechanisms of crystal growth and ordering at surfaces
  • 1994 - David Adler Lectureship Award in the Field of Materials Physics, American Physical Society
  • 1980 - Fellow of American Physical Society (APS) Citation Not Provided
  • 1973 - Fellow of Alfred P. Sloan Foundation

Overview

Max G. Lagally is affiliated with the University of Wisconsin-Madison in the United States. Their research primarily spans the fields of Engineering, Materials Science, and Physics and Astronomy, with notable emphasis on Electrical and Electronic Engineering, Materials Chemistry, and Atomic and Molecular Physics, and Optics.

Their scientific work addresses a variety of topics including Semiconductor Quantum Structures and Devices, Thermal properties of materials, Graphene research and applications, Photonic and Optical Devices, Quantum and electron transport phenomena, Advancements in Semiconductor Devices and Circuit Design, and Gyrotron and Vacuum Electronics Research.

Recent publications by Max G. Lagally include:

  • SiGe quantum wells with oscillating Ge concentrations for quantum dot qubits, 2022, Nature Communications
  • Repetitive Quantum Nondemolition Measurement and Soft Decoding of a Silicon Spin Qubit, 2020, Physical Review X
  • Valley splittings in Si/SiGe quantum dots with a germanium spike in the silicon well, 2021, Physical Review B
  • Thickness-Dependent Cross-Plane Thermal Conductivity Measurements of Exfoliated Hexagonal Boron Nitride, 2023, ACS Applied Materials & Interfaces
  • Spatial noise correlations in a Si/SiGe two-qubit device from Bell state coherences, 2020, Physical Review B

Max G. Lagally frequently publishes in venues such as arXiv (Cornell University), Zenodo (CERN European Organization for Nuclear Research), Physical Review B, ACS Applied Materials & Interfaces, and ACS Nano.

The scientist collaborates often with coauthors including M. A. Eriksson, D. E. Savage, S. N. Coppersmith, Mark Friesen, and Robert Joynt.

Throughout their career, Max G. Lagally has been recognized with several awards and honors such as:

  • Fellow, National Academy of Inventors (2012)
  • Fellow of the Materials Research Society (2009)
  • Member of the National Academy of Engineering (2001) for contributions to surface science, particularly in semiconductor film growth and novel analytical techniques
  • Fellow of the American Association for the Advancement of Science (AAAS) (2000)
  • Member of the German National Academy of Sciences Leopoldina (1999) in Physics
  • Davisson-Germer Prize in Atomic or Surface Physics, American Physical Society (1995)
  • David Adler Lectureship Award in the Field of Materials Physics (1994)
  • MRS Medal, Materials Research Society (1994), for innovative development of STM as a quantitative probe of crystal growth and ordering at surfaces
  • Fellow of American Physical Society (APS) (1980)
  • Fellow of Alfred P. Sloan Foundation (1973)

Best Publications

  • Kinetic pathway in Stranski-Krastanov growth of Ge on Si(001).

    Y.-W. Mo;D. E. Savage;B. S. Swartzentruber;M. G. Lagally

  • Self-organization in growth of quantum dot superlattices.

    J. Tersoff;C. Teichert;M. G. Lagally

  • Atomistic Processes in the Early Stages of Thin-Film Growth

    Zhenyu Zhang;Max G. Lagally

  • Activation energy for surface diffusion of Si on Si(001): A scanning-tunneling-microscopy study.

    Y. W. Mo;J. Kleiner;M. B. Webb;M. G. Lagally

  • A programmable two-qubit quantum processor in silicon

    T. F. Watson;S. G. J. Philips;E. Kawakami;D. R. Ward

  • Synthesis, assembly and applications of semiconductor nanomembranes

    J. A. Rogers;M. G. Lagally;R. G. Nuzzo

  • In Situ Visualization of DNA Double-Strand Break Repair in Human Fibroblasts

    Benjamin E. Nelms;Richard S. Maser;James F. MacKay;Max G. Lagally

  • Electrical control of a long-lived spin qubit in a Si/SiGe quantum dot.

    E. Kawakami;P. Scarlino;D. R. Ward;F. R. Braakman;F. R. Braakman

  • Scanning tunneling microscopy studies of structural disorder and steps on Si surfaces

    B. S. Swartzentruber;Y.‐W. Mo;M. B. Webb;M. G. Lagally

  • Growth and equilibrium structures in the epitaxy of Si on Si(001).

    Y.-W. Mo;B. S. Swartzentruber;R. Kariotis;M. B. Webb

  • Direct determination of step and kink energies on vicinal Si(001).

    B. S. Swartzentruber;Y.-W. Mo;R. Kariotis;M. G. Lagally

  • Step-bunching instability of vicinal surfaces under stress.

    J. Tersoff;Y. H. Phang;Zhenyu Zhang;M. G. Lagally

  • Determination of roughness correlations in multilayer films for x‐ray mirrors

    D. E. Savage;J. Kleiner;N. Schimke;Y.‐H. Phang

  • Atom Motion on Surfaces

    Max G. Lagally

  • Kinetics of ordering and growth at surfaces

    Growth at Surfaces;Max G. Lagally

  • Quantum control and process tomography of a semiconductor quantum dot hybrid qubit

    Dohun Kim;Zhan Shi;C. B. Simmons;D. R. Ward

  • Anisotropy in surface migration of Si and Ge on Si(001)

    Y.-W. Mo;M.G. Lagally

  • Practical design and simulation of silicon-based quantum-dot qubits

    Mark Friesen;Paul Rugheimer;Donald E. Savage;Max G. Lagally

  • Surface self-diffusion of Si on Si(001)

    Y.-W. Mo;J. Kleiner;M.B. Webb;M.G. Lagally

  • Elastically relaxed free-standing strained-silicon nanomembranes.

    Michelle M. Roberts;Levente J. Klein;Donald E. Savage;Keith A. Slinker

Frequent Co-Authors

Zhenqiang Ma
Zhenqiang Ma University of Wisconsin–Madison
Roberto Paiella
Roberto Paiella Boston University
Thomas F. Kuech
Thomas F. Kuech University of Wisconsin–Madison
Brian S. Swartzentruber
Brian S. Swartzentruber Sandia National Laboratories
Toh-Ming Lu
Toh-Ming Lu Rensselaer Polytechnic Institute
Gwo-Ching Wang
Gwo-Ching Wang Rensselaer Polytechnic Institute
F. J. Himpsel
F. J. Himpsel University of Wisconsin–Madison
Lloyd M. Smith
Lloyd M. Smith University of Wisconsin–Madison
Toshio Sakurai
Toshio Sakurai Tohoku University
Yoshitada Morikawa
Yoshitada Morikawa Osaka University

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