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Thomas F. Kuech

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Materials Science 69 4633 4482 1229 1154 677 17388
Chemistry 67 6903 6252 2059 1703 520 15756

Thomas F. Kuech publications per year

The chart shows the history of publications by Thomas F. Kuech between 1979 and 2024, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Thomas F. Kuech published across 46 years, from 1979 to 2024, averaging 15 papers a year. Output peaked at 30 publications in 1996. 3 of the 691 publications appeared in the last two years.

No. of publications
10 20 30
Bar chart. Horizontal axis: year, 1979 to 2024. Vertical axis: number of publications, 0 to 30. Peak 30 publications in 1996. 1979: 1 publication 1980: 2 publications 1981: 6 publications 1982: 5 publications 1983: 4 publications 1984: 3 publications 1985: 9 publications 1986: 10 publications 1987: 7 publications 1988: 16 publications 1989: 13 publications 1990: 20 publications 1991: 27 publications 1992: 17 publications 1993: 15 publications 1994: 20 publications 1995: 19 publications 1996: 30 publications 1997: 27 publications 1998: 23 publications 1999: 24 publications 2000: 30 publications 2001: 29 publications 2002: 15 publications 2003: 18 publications 2004: 11 publications 2005: 10 publications 2006: 12 publications 2007: 22 publications 2008: 21 publications 2009: 26 publications 2010: 13 publications 2011: 20 publications 2012: 17 publications 2013: 17 publications 2014: 24 publications 2015: 22 publications 2016: 22 publications 2017: 17 publications 2018: 12 publications 2019: 15 publications 2020: 14 publications 2021: 2 publications 2022: 1 publication 2023: 1 publication 2024: 2 publications
1979 2024

691 publications in total across all disciplines

View publications per year as a table
Thomas F. Kuech: publications per year, 1979 to 2024
Year Publications
1979 1
1980 2
1981 6
1982 5
1983 4
1984 3
1985 9
1986 10
1987 7
1988 16
1989 13
1990 20
1991 27
1992 17
1993 15
1994 20
1995 19
1996 30
1997 27
1998 23
1999 24
2000 30
2001 29
2002 15
2003 18
2004 11
2005 10
2006 12
2007 22
2008 21
2009 26
2010 13
2011 20
2012 17
2013 17
2014 24
2015 22
2016 22
2017 17
2018 12
2019 15
2020 14
2021 2
2022 1
2023 1
2024 2
Total 691
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Thomas F. Kuech publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Thomas F. Kuech sits on this spectrum.

No. of scientists
200 400 600 800
Bar chart with 57 bars. Horizontal axis: publications, 50–69 to 1,163+. Vertical axis: number of scientists, 0 to 891. Most scientists, 891, have 190–209 publications. The last bar groups every scientist with 1,163 publications or more. The highlighted bar, 670–689 publications, is where this scientist sits. 50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50–69 publications 1,163+

This scientist: 677 publications — 95th percentile

95% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

View publications distribution as a table
Number of Materials Science scientists by publication count, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
Publications Scientists This scientist
50–69 28
70–89 152
90–109 356
110–129 487
130–149 723
150–169 835
170–189 850
190–209 891
210–229 862
230–249 766
250–269 726
270–289 665
290–309 593
310–329 537
330–349 477
350–369 440
370–389 356
390–409 321
410–429 256
430–449 246
450–469 216
470–489 212
490–509 174
510–529 194
530–549 162
550–569 131
570–589 111
590–609 103
610–629 99
630–649 77
650–669 92
670–689 56 677
690–709 53
710–729 53
730–749 38
750–769 52
770–789 43
790–809 38
810–829 34
830–849 25
850–869 18
870–889 20
890–909 24
910–929 27
930–949 20
950–969 17
970–989 10
990–1,009 16
1,010–1,029 13
1,030–1,049 12
1,050–1,069 9
1,070–1,089 8
1,090–1,109 7
1,110–1,129 9
1,130–1,149 2
1,150–1,162 5
1,163+ 100
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Thomas F. Kuech D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Thomas F. Kuech sits on this spectrum.

No. of scientists
200 400 600
Bar chart with 64 bars. Horizontal axis: D-Index, 40–41 to 165+. Vertical axis: number of scientists, 0 to 667. Most scientists, 667, have 52–53 D-Index. The last bar groups every scientist with 165 D-Index or more. The highlighted bar, 68–69 D-Index, is where this scientist sits. 40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40–41 D-Index 165+

This scientist: 69 D-Index — 65th percentile

65% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

View D-Index distribution as a table
Number of Materials Science scientists by D-index, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
D-Index Scientists This scientist
40–41 211
42–43 450
44–45 612
46–47 612
48–49 598
50–51 657
52–53 667
54–55 621
56–57 597
58–59 610
60–61 587
62–63 606
64–65 533
66–67 490
68–69 469 69
70–71 378
72–73 421
74–75 359
76–77 323
78–79 299
80–81 230
82–83 210
84–85 195
86–87 203
88–89 175
90–91 175
92–93 142
94–95 121
96–97 117
98–99 107
100–101 88
102–103 85
104–105 68
106–107 62
108–109 57
110–111 45
112–113 49
114–115 50
116–117 34
118–119 38
120–121 37
122–123 29
124–125 28
126–127 24
128–129 33
130–131 28
132–133 21
134–135 20
136–137 23
138–139 17
140–141 12
142–143 17
144–145 21
146–147 13
148–149 11
150–151 14
152–153 13
154–155 9
156–157 10
158–159 7
160–161 4
162–163 4
164 3
165+ 98
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Research.com Recognitions

  • 2016 - Fellow of the Materials Research Society For development of the chemical and physical understanding enabling the chemical vapor deposition of compound semiconductors and their use in the formation of optical and electronic devices.
  • 2012 - Fellow of the American Association for the Advancement of Science (AAAS)
  • 2011 - IEEE Fellow For contributions to electronic materials growth for epitaxial devices
  • 2010 - Member of the National Academy of Engineering For contributions to chemical vapor deposition of compound semiconductors.
  • 1997 - Fellow of American Physical Society (APS) Citation For his seminal contributions to the fundamental understanding of vaporphase growth of IIIV compound semiconductors and his discovery of longrange order in compound semiconductors

Overview

Thomas F. Kuech is affiliated with the University of Wisconsin-Madison in the United States, with a primary focus on engineering and materials science. Their research encompasses a variety of subfields including electrical and electronic engineering, materials chemistry, atomic and molecular physics and optics, ceramics and composites, and biomedical engineering.

The scientist's work prominently features topics related to semiconductor quantum structures and devices, semiconductor materials and devices, ferroelectric and piezoelectric materials, diamond and carbon-based materials research, advanced ceramic materials synthesis, microwave dielectric ceramics synthesis, and magnetic field sensors techniques.

Among the frequent collaborators in their research are Yingxin Guan, S.E. Babcock, Paul G. Evans, L. J. Mawst, and Omar Elleuch. The major publication venues for their work include ACS Applied Materials & Interfaces, Journal of Crystal Growth, Crystal Growth & Design, Nature Materials, and Journal of Catalysis.

Representative recent publications include:

  • "Radiation-induced segregation in a ceramic" (2020, Nature Materials)
  • "Phase Selection and Structure of Low-Defect-Density γ-Al2O3 Created by Epitaxial Crystallization of Amorphous Al2O3" (2020, ACS Applied Materials & Interfaces)
  • "Rates of levoglucosanol hydrogenolysis over Brønsted and Lewis acid sites on platinum silica-alumina catalysts synthesized by atomic layer deposition" (2020, Journal of Catalysis)
  • "High-Ge-Content SiGe Alloy Single Crystals Using the Nanomembrane Platform" (2020, ACS Applied Materials & Interfaces)
  • "Layer-thickness dependence of the compositions in strained III-V superlattices by atom probe tomography" (2020, Journal of Crystal Growth)

Thomas F. Kuech has received multiple recognitions including Fellow of the Materials Research Society for their work on chemical vapor deposition of compound semiconductors and their applications in optical and electronic devices, Fellow of the American Association for the Advancement of Science (AAAS), IEEE Fellow for contributions to electronic materials growth for epitaxial devices, membership in the National Academy of Engineering for contributions to chemical vapor deposition of compound semiconductors, and Fellow of the American Physical Society (APS) for fundamental research in vapor-phase growth of III-V compound semiconductors and the discovery of long-range order in these materials.

Best Publications

  • Catalyst Design with Atomic Layer Deposition

    Brandon J. O'Neill;Brandon J. O'Neill;David H. K. Jackson;Jechan Lee;Christian P. Canlas

  • Long-range order in Al x Ga 1-x As

    T. S. Kuan;T. F. Kuech;W. I. Wang;E. L. Wilkie

  • Surface Chemistry of Prototypical Bulk II-VI and III-V Semiconductors and Implications for Chemical Sensing.

    Fazila Seker;Kathleen Meeker;Thomas F. Kuech;Arthur B. Ellis

  • Determination of the interdiffusion of Al and Ga in undoped (Al,Ga)As/GaAs quantum wells

    T. E. Schlesinger;T. Kuech

  • Mechanism of carbon incorporation in MOCVD GaAs

    T.F. Kuech;E. Veuhoff

  • Nonalloyed ohmic contacts to n-GaAs by solid-phase epitaxy of Ge

    E. D. Marshall;B. Zhang;L. C. Wang;P. F. Jiao

  • Pressure dependence of GaAs/AlxGa1−xAs quantum‐well bound states: The determination of valence‐band offsets

    D. J. Wolford;T. F. Kuech;J. A. Bradley;M. A. Gell

  • Controlled carbon doping of GaAs by metalorganic vapor phase epitaxy

    T. F. Kuech;M. A. Tischler;P.‐J. Wang;G. Scilla

  • Stabilization of copper catalysts for liquid-phase reactions by atomic layer deposition.

    Brandon J. O'Neill;David H. K. Jackson;Anthony J. Crisci;Carrie A. Farberow

  • p-GaN surface treatments for metal contacts

    Jingxi Sun;K. A. Rickert;J. M. Redwing;A. B. Ellis

  • High temperature adduct formation of trimethylgallium and ammonia

    A. Thon;Thomas F. Kuech

  • Bulk single crystal gallium nitride and method of making same

    Michael A. Tischler;Thomas F. Kuech;Robert P. Vaudo

  • Properties of high‐purity AlxGa1−xAs grown by the metalorganic vapor‐phase‐epitaxy technique using methyl precursors

    T. F. Kuech;D. J. Wolford;E. Veuhoff;V. Deline

  • Role of the Cu-ZrO2 Interfacial Sites for Conversion of Ethanol to Ethyl Acetate and Synthesis of Methanol from CO2 and H2

    Insoo Ro;Yifei Liu;Madelyn R. Ball;David H. K. Jackson

  • Metal-organic vapor phase epitaxy of compound semiconductors

    T.F. Kuech

  • IONIC CONDUCTIVITY OF CALCIA, YTTRIA, AND RARE EARTH-DOPED CERIUM DIOXIDE

    R. T. Dirstine;R. N. Blumenthal;T. F. Kuech

  • Dependence of the AlxGa1−xAs band edge on alloy composition based on the absolute measurement of x

    T. F. Kuech;D. J. Wolford;R. Potemski;J. A. Bradley

  • Application of selective epitaxy to fabrication of nanometer scale wire and dot structures

    John A. Lebens;Charles S. Tsai;Kerry J. Vahala;T. F. Kuech

  • The influence of growth chemistry on the MOVPE growth of GaAs and AlxGa1−xAs layers and heterostructures

    T.F. Kuech;E. Veuhoff;T.S. Kuan;V. Deline

  • Non‐alloyed ohmic contact to n‐GaAs by solid phase epitaxy

    E. D. Marshall;W. X. Chen;C. S. Wu;S. S. Lau

Frequent Co-Authors

Luke J. Mawst
Luke J. Mawst University of Wisconsin–Madison
S. S. Lau
S. S. Lau University of California, San Diego
Joan M. Redwing
Joan M. Redwing Pennsylvania State University
Rong Zhang
Rong Zhang Nanjing University
Max G. Lagally
Max G. Lagally University of Wisconsin–Madison
Dane Morgan
Dane Morgan University of Wisconsin–Madison
James A. Dumesic
James A. Dumesic University of Wisconsin–Madison
Dan Botez
Dan Botez University of Wisconsin–Madison
Paul F. Nealey
Paul F. Nealey University of Chicago
F. J. Himpsel
F. J. Himpsel University of Wisconsin–Madison

External Links

Personal website of Thomas F. Kuech Google Scholar page

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Best Scientists Citing Thomas F. Kuech

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Publications: 45

Luke J. Mawst

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Publications: 43

Steven P. DenBaars

Steven P. DenBaars

University of California, Santa Barbara

Publications: 43

S. S. Lau

S. S. Lau

University of California, San Diego

Publications: 35

James S. Speck

James S. Speck

University of California, Santa Barbara

Publications: 33

Wladek Walukiewicz

Wladek Walukiewicz

Lawrence Berkeley National Laboratory

Publications: 32

Fan Ren

Fan Ren

University of Florida

Publications: 30

Klavs F. Jensen

Klavs F. Jensen

MIT

Publications: 29

Kin Man Yu

Kin Man Yu

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Publications: 28

Nelson Tansu

Nelson Tansu

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Publications: 27

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Christophe Detavernier

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Publications: 26

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Robert F. Davis

Carnegie Mellon University

Publications: 26

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Joon Seop Kwak

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Publications: 24

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