The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Thomas F. Kuech sits on this spectrum.
This scientist: 677 publications — 95th percentile
95% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Thomas F. Kuech sits on this spectrum.
This scientist: 69 D-Index — 65th percentile
65% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Thomas F. Kuech is affiliated with the University of Wisconsin-Madison in the United States, with a primary focus on engineering and materials science. Their research encompasses a variety of subfields including electrical and electronic engineering, materials chemistry, atomic and molecular physics and optics, ceramics and composites, and biomedical engineering.
The scientist's work prominently features topics related to semiconductor quantum structures and devices, semiconductor materials and devices, ferroelectric and piezoelectric materials, diamond and carbon-based materials research, advanced ceramic materials synthesis, microwave dielectric ceramics synthesis, and magnetic field sensors techniques.
Among the frequent collaborators in their research are Yingxin Guan, S.E. Babcock, Paul G. Evans, L. J. Mawst, and Omar Elleuch. The major publication venues for their work include ACS Applied Materials & Interfaces, Journal of Crystal Growth, Crystal Growth & Design, Nature Materials, and Journal of Catalysis.
Representative recent publications include:
Thomas F. Kuech has received multiple recognitions including Fellow of the Materials Research Society for their work on chemical vapor deposition of compound semiconductors and their applications in optical and electronic devices, Fellow of the American Association for the Advancement of Science (AAAS), IEEE Fellow for contributions to electronic materials growth for epitaxial devices, membership in the National Academy of Engineering for contributions to chemical vapor deposition of compound semiconductors, and Fellow of the American Physical Society (APS) for fundamental research in vapor-phase growth of III-V compound semiconductors and the discovery of long-range order in these materials.
Brandon J. O'Neill;Brandon J. O'Neill;David H. K. Jackson;Jechan Lee;Christian P. Canlas
T. S. Kuan;T. F. Kuech;W. I. Wang;E. L. Wilkie
Fazila Seker;Kathleen Meeker;Thomas F. Kuech;Arthur B. Ellis
T. E. Schlesinger;T. Kuech
T.F. Kuech;E. Veuhoff
E. D. Marshall;B. Zhang;L. C. Wang;P. F. Jiao
D. J. Wolford;T. F. Kuech;J. A. Bradley;M. A. Gell
T. F. Kuech;M. A. Tischler;P.‐J. Wang;G. Scilla
Brandon J. O'Neill;David H. K. Jackson;Anthony J. Crisci;Carrie A. Farberow
Jingxi Sun;K. A. Rickert;J. M. Redwing;A. B. Ellis
A. Thon;Thomas F. Kuech
Michael A. Tischler;Thomas F. Kuech;Robert P. Vaudo
T. F. Kuech;D. J. Wolford;E. Veuhoff;V. Deline
Insoo Ro;Yifei Liu;Madelyn R. Ball;David H. K. Jackson
T.F. Kuech
R. T. Dirstine;R. N. Blumenthal;T. F. Kuech
T. F. Kuech;D. J. Wolford;R. Potemski;J. A. Bradley
John A. Lebens;Charles S. Tsai;Kerry J. Vahala;T. F. Kuech
T.F. Kuech;E. Veuhoff;T.S. Kuan;V. Deline
E. D. Marshall;W. X. Chen;C. S. Wu;S. S. Lau
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