World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
73
Citations
16000
World Ranking
3915
National Ranking
1056

S. S. Lau publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where S. S. Lau sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 351 publications — 70th percentile

70% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

S. S. Lau D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where S. S. Lau sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 73 D-Index — 71st percentile

71% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 1993 - Fellow of American Physical Society (APS) Citation For contributions to the understanding of metalsemiconductor interactions, including applications in microelectronics and optoelectronics

Overview

S. S. Lau is affiliated with the University of California, San Diego in the United States. Their research encompasses multiple disciplines, including Business, Management and Accounting, Computer Science, and Environmental Science. Within these fields, their work predominantly focuses on subfields such as Management Information Systems, Information Systems, Atomic and Molecular Physics and Optics, Management Science and Operations Research, and Water Science and Technology.

Their research output includes recent papers published in recognized venues. These include:

  • Room-temperature valley-selective emission in Si-MoSe2 heterostructures enabled by high-quality-factor chiroptical cavities, 2024, arXiv (Cornell University)
  • Impact of pharmaceutical waste (diclofenac) on consistency and particle packing of a Malaysian urban residual clay, 2025, Journal of Environmental Sciences

Lau's work addresses key topics within their main research interests. These topics are:

  • Business Process Modeling and Analysis
  • Service-Oriented Architecture and Web Services
  • Big Data and Business Intelligence
  • Data Quality and Management
  • Adsorption and biosorption for pollutant removal
  • Landfill Environmental Impact Studies
  • Clay minerals and soil interactions

Frequent co-authors collaborating with Lau include:

  • Chiao-Yun Li
  • Aparna Joshi
  • Nicholas T. L. Tam
  • Tejaswini Shinde
  • Wil M. P. van der Aalst

The primary publication venues associated with Lau are the Journal of Environmental Sciences and arXiv (Cornell University), each featuring their research contributions.

Lau received recognition in the form of the Fellow of the American Physical Society (APS) award in 1993, cited for contributions to the understanding of metal-semiconductor interactions, including applications in microelectronics and optoelectronics.

Best Publications

  • Electronic Materials Science: For Integrated Circuits in Si and GaAS

    James Walter Mayer;S. S Lau

  • Measurement of piezoelectrically induced charge in GaN/AlGaN heterostructure field-effect transistors

    Edward T Yu;G. J. Sullivan;P. M. Asbeck;C. D. Wang;C. D. Wang

  • A review of the metal–GaN contact technology

    Q.Z. Liu;S.S. Lau

  • Formation and Characterization of Transition-Metal Silicides

    Marc-A. Nicolet;S.S. Lau

  • Piezoelectric charge densities in AlGaN/GaN HFETs

    P.M. Asbeck;E.T. Yu;S.S. Lau;G.J. Sullivan

  • Spontaneous and piezoelectric polarization effects in III-V nitride heterostructures

    E. T. Yu;X. Z. Dang;P. M. Asbeck;S. S. Lau

  • Ion-beam-induced reactions in metal-semiconductor and metal-metal thin film structures

    J. W. Mayer;B. Y. Tsaur;S. S. Lau;L. S. Hung

  • Implanted noble gas atoms as diffusion markers in silicide formation

    W. K. Chu;S. S. Lau;J. W. Mayer;H. Müller

  • Structural difference rule for amorphous alloy formation by ion mixing

    Bai‐Xin Liu;W. L. Johnson;M‐A. Nicolet;S. S. Lau

  • Nonalloyed ohmic contacts to n-GaAs by solid-phase epitaxy of Ge

    E. D. Marshall;B. Zhang;L. C. Wang;P. F. Jiao

  • Interactions in the Co/Si thin‐film system. I. Kinetics

    S. S. Lau;J. W. Mayer;King-Ning Tu

  • Salicidation process using NiSi and its device application

    F. Deng;R. A. Johnson;P. M. Asbeck;S. S. Lau

  • Mechanically induced Si layer transfer in hydrogen-implanted Si wafers

    K. Henttinen;I. Suni;S. S. Lau

  • The role of the tunneling component in the current–voltage characteristics of metal-GaN Schottky diodes

    L. S. Yu;Q. Z. Liu;Q. J. Xing;D. J. Qiao

  • Dependence of Ni/AlGaN Schottky barrier height on Al mole fraction

    D. Qiao;L. S. Yu;S. S. Lau;J. M. Redwing

  • Schottky barrier engineering in III-V nitrides via the piezoelectric effect

    Edward T Yu;X. Z. Dang;L. S. Yu;D. Qiao

  • Kinetics of TiSi2 formation by thin Ti films on Si

    L. S. Hung;J. Gyulai;J. W. Mayer;S. S. Lau

  • Transfer of patterned ion-cut silicon layers

    C. H. Yun;A. B. Wengrow;N. W. Cheung;Y. Zheng

  • Microstructure of Ti/Al ohmic contacts for n-AlGaN

    S. Ruvimov;Z. Liliental-Weber;J. Washburn;D. Qiao

  • Continuous series of metastable Ag-Cu solid solutions formed by ion-beam mixing

    B. Y. Tsaur;S. S. Lau;J. W. Mayer

Frequent Co-Authors

James W. Mayer
James W. Mayer Arizona State University
Thomas F. Kuech
Thomas F. Kuech University of Wisconsin–Madison
Terry Alford
Terry Alford Arizona State University
M.-A. Nicolet
M.-A. Nicolet California Institute of Technology
Paul K. L. Yu
Paul K. L. Yu University of California, San Diego
Michael Nastasi
Michael Nastasi Texas A&M University
Joan M. Redwing
Joan M. Redwing Pennsylvania State University
Edward T. Yu
Edward T. Yu The University of Texas at Austin
Peter M. Asbeck
Peter M. Asbeck University of California, San Diego
Paul K. Chu
Paul K. Chu City University of Hong Kong

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