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D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Materials Science 83 2395 2313 692 651 481 22902

Joan M. Redwing publications per year

The chart shows the history of publications by Joan M. Redwing between 1991 and 2026, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Joan M. Redwing published across 36 years, from 1991 to 2026, averaging 15.2 papers a year. Output peaked at 35 publications in 2005. 25 of the 546 publications appeared in the last two years.

No. of publications
10 20 30
Bar chart. Horizontal axis: year, 1991 to 2026. Vertical axis: number of publications, 0 to 35. Peak 35 publications in 2005. 1991: 1 publication 1992: 0 publications 1993: 4 publications 1994: 7 publications 1995: 6 publications 1996: 8 publications 1997: 16 publications 1998: 25 publications 1999: 21 publications 2000: 20 publications 2001: 14 publications 2002: 3 publications 2003: 14 publications 2004: 18 publications 2005: 35 publications 2006: 20 publications 2007: 22 publications 2008: 26 publications 2009: 12 publications 2010: 16 publications 2011: 13 publications 2012: 8 publications 2013: 12 publications 2014: 8 publications 2015: 9 publications 2016: 15 publications 2017: 8 publications 2018: 17 publications 2019: 13 publications 2020: 20 publications 2021: 16 publications 2022: 31 publications 2023: 30 publications 2024: 33 publications 2025: 24 publications 2026: 1 publication
1991 2026

546 publications in total across all disciplines

View publications per year as a table
Joan M. Redwing: publications per year, 1991 to 2026
Year Publications
1991 1
1992 0
1993 4
1994 7
1995 6
1996 8
1997 16
1998 25
1999 21
2000 20
2001 14
2002 3
2003 14
2004 18
2005 35
2006 20
2007 22
2008 26
2009 12
2010 16
2011 13
2012 8
2013 12
2014 8
2015 9
2016 15
2017 8
2018 17
2019 13
2020 20
2021 16
2022 31
2023 30
2024 33
2025 24
2026 1
Total 546
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Joan M. Redwing publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Joan M. Redwing sits on this spectrum.

No. of scientists
200 400 600 800
Bar chart with 57 bars. Horizontal axis: publications, 50–69 to 1,163+. Vertical axis: number of scientists, 0 to 891. Most scientists, 891, have 190–209 publications. The last bar groups every scientist with 1,163 publications or more. The highlighted bar, 470–489 publications, is where this scientist sits. 50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50–69 publications 1,163+

This scientist: 481 publications — 85th percentile

85% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

View publications distribution as a table
Number of Materials Science scientists by publication count, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
Publications Scientists This scientist
50–69 28
70–89 152
90–109 356
110–129 487
130–149 723
150–169 835
170–189 850
190–209 891
210–229 862
230–249 766
250–269 726
270–289 665
290–309 593
310–329 537
330–349 477
350–369 440
370–389 356
390–409 321
410–429 256
430–449 246
450–469 216
470–489 212 481
490–509 174
510–529 194
530–549 162
550–569 131
570–589 111
590–609 103
610–629 99
630–649 77
650–669 92
670–689 56
690–709 53
710–729 53
730–749 38
750–769 52
770–789 43
790–809 38
810–829 34
830–849 25
850–869 18
870–889 20
890–909 24
910–929 27
930–949 20
950–969 17
970–989 10
990–1,009 16
1,010–1,029 13
1,030–1,049 12
1,050–1,069 9
1,070–1,089 8
1,090–1,109 7
1,110–1,129 9
1,130–1,149 2
1,150–1,162 5
1,163+ 100
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Joan M. Redwing D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Joan M. Redwing sits on this spectrum.

No. of scientists
200 400 600
Bar chart with 64 bars. Horizontal axis: D-Index, 40–41 to 165+. Vertical axis: number of scientists, 0 to 667. Most scientists, 667, have 52–53 D-Index. The last bar groups every scientist with 165 D-Index or more. The highlighted bar, 82–83 D-Index, is where this scientist sits. 40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40–41 D-Index 165+

This scientist: 83 D-Index — 82nd percentile

82% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

View D-Index distribution as a table
Number of Materials Science scientists by D-index, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
D-Index Scientists This scientist
40–41 211
42–43 450
44–45 612
46–47 612
48–49 598
50–51 657
52–53 667
54–55 621
56–57 597
58–59 610
60–61 587
62–63 606
64–65 533
66–67 490
68–69 469
70–71 378
72–73 421
74–75 359
76–77 323
78–79 299
80–81 230
82–83 210 83
84–85 195
86–87 203
88–89 175
90–91 175
92–93 142
94–95 121
96–97 117
98–99 107
100–101 88
102–103 85
104–105 68
106–107 62
108–109 57
110–111 45
112–113 49
114–115 50
116–117 34
118–119 38
120–121 37
122–123 29
124–125 28
126–127 24
128–129 33
130–131 28
132–133 21
134–135 20
136–137 23
138–139 17
140–141 12
142–143 17
144–145 21
146–147 13
148–149 11
150–151 14
152–153 13
154–155 9
156–157 10
158–159 7
160–161 4
162–163 4
164 3
165+ 98
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Research.com Recognitions

  • 2016 - Fellow of the American Association for the Advancement of Science (AAAS)
  • 2015 - Fellow of the Materials Research Society For key contributions to the mechanistic understanding of materials synthesis by chemical vapor deposition, including Group III nitrides, silicon nanowires and boride-based superconductors.
  • 2012 - Fellow of American Physical Society (APS) Citation For key contributions to the mechanistic understanding of materials synthesis by vapor growth, including Si and SiGe nanowires, groupIII nitrides and boridebased superconductors

Overview

Joan M. Redwing is affiliated with Pennsylvania State University in the United States. Their research primarily focuses on materials science and engineering, with a substantial number of publications in these areas. Over the course of their career, they have contributed extensively to the understanding and development of materials chemistry and electrical and electronic engineering, alongside work in atomic and molecular physics, optics, biomedical engineering, and condensed matter physics.

The scientist's main areas of study include:

  • Materials Science
  • Engineering

Their research spans several subfields such as:

  • Materials Chemistry
  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics
  • Biomedical Engineering
  • Condensed Matter Physics

Joan M. Redwing's research topics cover:

  • 2D Materials and Applications
  • Graphene research and applications
  • MXene and MAX Phase Materials
  • Perovskite Materials and Applications
  • Advanced Memory and Neural Computing
  • Chalcogenide Semiconductor Thin Films
  • Ferroelectric and Negative Capacitance Devices

The scientist has published in a range of notable venues. Their frequent publication outlets include:

  • ACS Nano
  • Nature Communications
  • arXiv (Cornell University)
  • ECS Meeting Abstracts
  • Nano Letters

Some of their recent papers with publication year and venue are:

  • "Benchmarking monolayer MoS2 and WS2 field-effect transistors" (2021, Nature Communications)
  • "Wafer-Scale Epitaxial Growth of Unidirectional WS2 Monolayers on Sapphire" (2021, ACS Nano)
  • "Recent Advances in 2D Material Theory, Synthesis, Properties, and Applications" (2023, ACS Nano)
  • "A low-power biomimetic collision detector based on an in-memory molybdenum disulfide photodetector" (2020, Nature Electronics)
  • "Three-dimensional integration of two-dimensional field-effect transistors" (2024, Nature)

Joan M. Redwing frequently collaborates with a number of co-authors, including:

  • Nicholas Trainor
  • Saptarshi Das
  • Tanushree H. Choudhury
  • Saiphaneendra Bachu
  • Nasim Alem

The scientist has received several awards recognizing their contributions, such as:

  • Fellow of the American Association for the Advancement of Science (AAAS), 2016
  • Fellow of the Materials Research Society, 2015, for work on mechanistic understanding of materials synthesis by chemical vapor deposition including Group III nitrides, silicon nanowires, and boride-based superconductors
  • Fellow of American Physical Society (APS), 2012, with citation highlighting contributions to the mechanistic understanding of materials synthesis by vapor growth, including Si and SiGe nanowires, Group III nitrides, and boride-based superconductors

Best Publications

  • Two-dimensional gallium nitride realized via graphene encapsulation

    Zakaria Y. Al Balushi;Ke Wang;Ram Krishna Ghosh;Rafael A. Vilá

  • In situ epitaxial MgB2 thin films for superconducting electronics.

    Xianghui Zeng;Alexej V. Pogrebnyakov;Armen Kotcharov;James E. Jones

  • Benchmarking monolayer MoS2 and WS2 field-effect transistors.

    Amritanand Sebastian;Rahul Pendurthi;Tanushree H. Choudhury;Joan M. Redwing

  • Highly Scalable, Atomically Thin WSe2 Grown via Metal–Organic Chemical Vapor Deposition

    Sarah M. Eichfeld;Lorraine Hossain;Yu Chuan Lin;Aleksander F. Piasecki

  • Piezoelectric charge densities in AlGaN/GaN HFETs

    P.M. Asbeck;E.T. Yu;S.S. Lau;G.J. Sullivan

  • Bottom-up assembly of large-area nanowire resonator arrays

    Mingwei Li;Rustom B. Bhiladvala;Thomas J. Morrow;James A. Sioss

  • CRYSTALLOGRAPHIC WET CHEMICAL ETCHING OF GAN

    D. A. Stocker;E. F. Schubert;J. M. Redwing

  • High-field superconductivity in alloyed MgB 2 thin films

    V. Braccini;A. Gurevich;J. E. Giencke;M. C. Jewell

  • A roadmap for electronic grade 2D materials

    Natalie Briggs;Shruti Subramanian;Zhong Lin;Xufan Li;Xufan Li

  • Silicon Nanowire Array Photoelectrochemical Cells

    Adrian P. Goodey;Sarah M. Eichfeld;Kok Keong Lew;Joan M. Redwing

  • Diffusion-Controlled Epitaxy of Large Area Coalesced WSe2 Monolayers on Sapphire

    Xiaotian Zhang;Tanushree Holme Choudhury;Mikhail Chubarov;Yu Xiang

  • Optical properties of Si-doped GaN

    E. F. Schubert;I. D. Goepfert;W. Grieshaber;W. Grieshaber;J. M. Redwing

  • An optically pumped GaN–AlGaN vertical cavity surface emitting laser

    Joan M. Redwing;David A. S. Loeber;Neal G. Anderson;Michael A. Tischler

  • Group iii-v nitride substrate bowl, and production method and using method of group iii-v nitride substrate bowl

    Robert P Vaudo;バウド,ロバート,ピー.;Jeffrey S Flynn;フリン,ジェフリー,エス.

  • Growth characteristics of silicon nanowires synthesized by vapor–liquid–solid growth in nanoporous alumina templates

    Kok Keong Lew;Joan M. Redwing

  • Recent Advances in 2D Material Theory, Synthesis, Properties, and Applications.

    Unknown

  • Realizing Large-Scale, Electronic-Grade Two-Dimensional Semiconductors

    Yu Chuan Lin;Bhakti Jariwala;Brian M. Bersch;Ke Xu

  • Wafer-Scale Epitaxial Growth of Unidirectional WS2 Monolayers on Sapphire.

    Mikhail Chubarov;Tanushree H. Choudhury;Danielle Reifsnyder Hickey;Saiphaneendra Bachu

  • Three-dimensional integration of two-dimensional field-effect transistors.

    Unknown

  • Optical Properties of Rectangular Cross-sectional ZnS Nanowires

    Qihua Xiong;G. Chen;J. D. Acord;X. Liu

  • AlGaN/GaN HEMTs grown on SiC substrates

    S.C. Binari;J.M. Redwing;G. Kelner;W. Kruppa

  • The role of the tunneling component in the current–voltage characteristics of metal-GaN Schottky diodes

    L. S. Yu;Q. Z. Liu;Q. J. Xing;D. J. Qiao

  • High voltage (450 V) GaN Schottky rectifiers

    Z. Z. Bandić;P. M. Bridger;E. C. Piquette;T. C. McGill

  • p-GaN surface treatments for metal contacts

    Jingxi Sun;K. A. Rickert;J. M. Redwing;A. B. Ellis

Frequent Co-Authors

Xiaoxing Xi
Xiaoxing Xi Temple University
Theresa S. Mayer
Theresa S. Mayer Purdue University West Lafayette
Thomas F. Kuech
Thomas F. Kuech University of Wisconsin–Madison
Elizabeth C. Dickey
Elizabeth C. Dickey Carnegie Mellon University
Suzanne E. Mohney
Suzanne E. Mohney Pennsylvania State University
Darrell G. Schlom
Darrell G. Schlom Cornell University
Joshua A. Robinson
Joshua A. Robinson Pennsylvania State University
E. F. Schubert
E. F. Schubert Rensselaer Polytechnic Institute
S. S. Lau
S. S. Lau University of California, San Diego
Edward T. Yu
Edward T. Yu The University of Texas at Austin

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