The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Rong Zhang sits on this spectrum.
This scientist: 674 publications — 98th percentile
98% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Rong Zhang sits on this spectrum.
This scientist: 61 D-Index — 80th percentile
80% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
Rong Zhang is affiliated with Nanjing University in China and has a significant body of research focusing on materials science, engineering, and physics and astronomy. Their work spans several subfields including materials chemistry, electrical and electronic engineering, condensed matter physics, electronic, optical and magnetic materials, and atomic and molecular physics and optics. The emphasis across many publications lies in semiconductor materials and device development.
The main topics Zhang has contributed to include:
Frequent coauthors in Zhang's research network include Bin Liu, Hai Lu, Dunjun Chen, Fangfang Ren, and Youdou Zheng. These recurring collaborations indicate ongoing contributions to a range of studies within materials science and electronic device engineering.
Publishing predominantly in venues associated with applied physics and electronic materials, Zhang's frequent publication outlets are:
Zhang's recent papers highlight advances in semiconductor and material device research, including:
The scope of Zhang's work intersects with semiconductor device physics, novel materials for electronic applications, and nanotechnology. Their research includes both experimental studies and applied engineering approaches to improve device performance and functionality.
Dongyuan Zhai;Borui Liu;Yi Shi;Lijia Pan
Xin-Ran Wang;Yi Shi;Rong Zhang
Qing Cai;Haifan You;Hui Guo;Jin Wang
Xiaoqian Zhang;Qiangsheng Lu;Wenqing Liu;Wenqing Liu;Wei Niu
Yuanda Liu;Fengqiu Wang;Xiaomu Wang;Xizhang Wang
Haineng Bai;Hui Guo;Jin Wang;Yan Dong
Lijia Pan;Lin Pu;Yi Shi;Shiyan Song
G. Aad;B. Abbott;D. C. Abbott;A. Abed Abud
Shuchao Qin;Fengqiu Wang;Yujie Liu;Qing Wan
Wanqing Meng;Feifan Xu;Zhihao Yu;Zhihao Yu;Tao Tao
Chunhui Zhu;Fengqiu Wang;Yafei Meng;Xiang Yuan
Junhong Duan;Shaoguang Yang;Hongwei Liu;Jiangfeng Gong
Xuanhu Chen;Yang Xu;Dong Zhou;Sen Yang
Deyi Fu;Kai Liu;Tao Tao;Kelvin Lo
Jiandong Ye;Shulin Gu;Shunmin Zhu;Tong Chen
Yue Bian;Qianqian Du;Kun Tang;Yang Shen
Dawei Yan;Hai Lu;Dongsheng Cao;Dunjun Chen
Lijia Pan;Lin Pu;Yi Shi;Tian Sun
Qiang Wu;Zheng Hu;Xizhang Wang;Yinong Lu
R. Zhang;T. F. Kuech
Yuan Yuan;Weibing Hao;Wenxiang Mu;Zhengpeng Wang
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