World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
65
Citations
14107
World Ranking
5666
National Ranking
1466

Gwo-Ching Wang publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Gwo-Ching Wang sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 354 publications — 70th percentile

70% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Gwo-Ching Wang D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Gwo-Ching Wang sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 65 D-Index — 57th percentile

57% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2017 - Fellow of the Materials Research Society For seminal contributions to the fundamental understanding of surface and thin-film ordering using electron diffraction and the invention of electron pole figure technique for growth front texture analysis.
  • 2006 - Fellow of the American Association for the Advancement of Science (AAAS)

Overview

Gwo-Ching Wang is affiliated with Rensselaer Polytechnic Institute in the United States. The scientist's research primarily focuses on the fields of materials science and engineering, with significant contributions to materials chemistry, electrical and electronic engineering, and atomic and molecular physics and optics.

Their work covers a range of specialized subfields including electronic, optical and magnetic materials, as well as biomedical engineering. Key research topics include:

  • 2D Materials and Applications
  • Quantum Dots Synthesis And Properties
  • Chalcogenide Semiconductor Thin Films
  • Perovskite Materials and Applications
  • Graphene research and applications
  • Advanced Semiconductor Detectors and Materials
  • Copper Interconnects and Reliability

Among the notable recent publications authored by collaborators in the scientist's research network are:

  • "Flexo-photovoltaic effect in MoS2", 2021, published in Nature Nanotechnology
  • "Giant pyroelectricity in nanomembranes", 2022, published in Nature
  • "High-Crystallinity Epitaxial Sb2Se3 Thin Films on Mica for Flexible Near-Infrared Photodetectors", 2020, published in ACS Applied Materials & Interfaces
  • "Efficient and stable flexible Sb2Se3 thin film solar cells enabled by an epitaxial CdS buffer layer", 2021, published in Nano Energy
  • "Vertically Aligned One-Dimensional Crystal-Structured Sb2Se3 for High-Efficiency Flexible Solar Cells via Regulating Selenization Kinetics", 2023, published in ACS Applied Materials & Interfaces

Frequent co-authors collaborating with Gwo-Ching Wang include Zonghuan Lu, Toh-Ming Lu, Morris Washington, Xixing Wen, and Jian Shi. These collaborations have led to a substantial body of research output across various high-impact journals.

The scientist has regularly published in notable venues such as:

  • Applied Surface Science
  • SSRN Electronic Journal
  • ACS Applied Materials & Interfaces
  • Nature
  • ACS Applied Electronic Materials

Recognition of the scientist's work includes being named a Fellow of the Materials Research Society in 2017, for contributions relating to surface and thin-film ordering techniques and growth front texture analysis. Additionally, they have been recognized as a Fellow of the American Association for the Advancement of Science (AAAS) since 2006.

Best Publications

  • The GaAs spin polarized electron source

    D. T. Pierce;R. J. Celotta;G.‐C. Wang;W. N. Unertl

  • Ultrafast optical switching properties of single-wall carbon nanotube polymer composites at 1.55 μm

    Y.-C. Chen;N. R. Raravikar;L. S. Schadler;P. M. Ajayan

  • Characterization of Amorphous and Crystalline Rough Surface: Principles and Applications

    Yiping Zhao;Gwo-Ching Wang;Toh-Ming Lu

  • Thickness dependent electrical resistivity of ultrathin (<40 nm) Cu films

    H.-D Liu;Y.-P Zhao;G Ramanath;S.P Murarka

  • Novel Nano-Column and Nano-Flower Arrays by Glancing Angle Deposition

    Y. P. Zhao;D. X. Ye;G. C. Wang;T. M. Lu

  • Diffusion-Controlled Epitaxy of Large Area Coalesced WSe2 Monolayers on Sapphire

    Xiaotian Zhang;Tanushree Holme Choudhury;Mikhail Chubarov;Yu Xiang

  • Designing nanostructures by glancing angle deposition

    Yiping Zhao;Dexian Ye;Gwo-Ching Wang;Toh-Ming Lu

  • Surface-roughness effect on capacitance and leakage current of an insulating film

    Y.P. Zhao;G.C. Wang;T.M. Lu;Georgios Palasantzas

  • Observation of dynamic scaling of magnetic hysteresis in ultrathin ferromagnetic Fe/Au(001) films.

    Y.-L. He;G.-C. Wang

  • Effect of surface roughness on magnetic domain wall thickness, domain size, and coercivity

    Y.-P. Zhao;R. M. Gamache;G.-C. Wang;T.-M. Lu

  • Flexo-photovoltaic effect in MoS 2 .

    Jie Jiang;Zhizhong Chen;Yang Hu;Yu Xiang

  • Measurements of dynamic scaling from epitaxial growth front: Fe film on Fe(001).

    Y.-L. He;H.-N. Yang;T.-M. Lu;G.-C. Wang

  • Surface Magnetization of Ferromagnetic Ni(110): A Polarized Low-Energy Electron Diffraction Experiment

    R. J. Celotta;D. T. Pierce;G. C. Wang;S. D. Bader

  • Surface roughening in shadowing growth and etching in 2 + 1 dimensions

    Jason T. Drotar;Y.-P. Zhao;T.-M. Lu;G.-C. Wang

  • Physical self-assembly and the nucleation of three-dimensional nanostructures by oblique angle deposition

    T. Karabacak;G.-C. Wang;T.-M. Lu

  • EFFECT OF SURFACE ROUGHNESS ON MAGNETIC PROPERTIES OF CO FILMS ON PLASMA-ETCHED SI(100) SUBSTRATES

    M. Li;G.-C. Wang;H.-G. Min

  • β-phase tungsten nanorod formation by oblique-angle sputter deposition

    Tansel Karabacak;Anupama Mallikarjunan;Jitendra P. Singh;Dexian Ye

  • Photon Transport in One-Dimensional Incommensurately Epitaxial CsPbX3 Arrays

    Yiping Wang;Xin Sun;Ravichandran Shivanna;Yunbo Yang

  • Growth-front roughening in amorphous silicon films by sputtering

    T. Karabacak;Y.-P. Zhao;G.-C. Wang;T.-M. Lu

  • Giant pyroelectricity in nanomembranes

    Unknown

  • Kinetic roughening in polymer film growth by vapor deposition.

    Y.-P. Zhao;J. B. Fortin;G. Bonvallet;G. Bonvallet;G.-C. Wang

  • Frequency-dependent electrical transport in carbon nanotubes

    Y.-P. Zhao;B. Q. Wei;P. M. Ajayan;G. Ramanath

Frequent Co-Authors

Toh-Ming Lu
Toh-Ming Lu Rensselaer Polytechnic Institute
Yiping Zhao
Yiping Zhao University of Georgia
Jian Shi
Jian Shi Rensselaer Polytechnic Institute
Shengbai Zhang
Shengbai Zhang Rensselaer Polytechnic Institute
Max G. Lagally
Max G. Lagally University of Wisconsin–Madison
William A. Lanford
William A. Lanford University at Albany, State University of New York
Pulickel M. Ajayan
Pulickel M. Ajayan Rice University
Amit Goyal
Amit Goyal University at Buffalo, State University of New York
Nikhil Koratkar
Nikhil Koratkar Rensselaer Polytechnic Institute
Krishna Rajan
Krishna Rajan University at Buffalo, State University of New York

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