What is he best known for?
The fields of study he is best known for:
- Semiconductor
- Composite material
- Silicon
The scientist’s investigation covers issues in Optoelectronics, Thin film, Metallurgy, Analytical chemistry and Silicide.
The Optoelectronics study combines topics in areas such as Metal gate, Gate oxide, Electronic engineering, MOSFET and Gate dielectric.
His Thin film research is multidisciplinary, incorporating elements of Composite material, Mineralogy and Chemical vapor deposition.
Metallurgy and Chemical engineering are commonly linked in his work.
He combines subjects such as Annealing, X-ray crystallography, Electrical resistivity and conductivity, Diffusion barrier and Tantalum with his study of Analytical chemistry.
The various areas that Cyril Cabral examines in his Annealing study include Titanium and Silicon.
His most cited work include:
- Tantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of nitrogen additions (396 citations)
- Towards implementation of a nickel silicide process for CMOS technologies (347 citations)
- Mechanisms for microstructure evolution in electroplated copper thin films near room temperature (304 citations)
What are the main themes of his work throughout his whole career to date?
Cyril Cabral spends much of his time researching Optoelectronics, Metallurgy, Annealing, Silicide and Analytical chemistry.
His Optoelectronics study incorporates themes from Layer, Metal gate, Electronic engineering and Electrical engineering.
His Annealing research is multidisciplinary, relying on both Activation energy, Sheet resistance, Tin, Crystallite and Sputter deposition.
In his study, which falls under the umbrella issue of Silicide, Amorphous solid is strongly linked to Chemical engineering.
His research integrates issues of Crystallography, Thin film, X-ray crystallography, Transmission electron microscopy and Electrical resistivity and conductivity in his study of Analytical chemistry.
His studies in Thin film integrate themes in fields like Microstructure, Tantalum and Diffusion barrier.
He most often published in these fields:
- Optoelectronics (36.36%)
- Metallurgy (24.76%)
- Annealing (22.26%)
What were the highlights of his more recent work (between 2008-2021)?
- Optoelectronics (36.36%)
- Layer (19.75%)
- Metallurgy (24.76%)
In recent papers he was focusing on the following fields of study:
Optoelectronics, Layer, Metallurgy, Electronic engineering and Integrated circuit are his primary areas of study.
His Gate oxide research extends to the thematically linked field of Optoelectronics.
Cyril Cabral has researched Layer in several fields, including Electrical conductor, Metal and Semiconductor.
His work in Metallurgy covers topics such as Electroplating which are related to areas like Recrystallization.
His Copper study integrates concerns from other disciplines, such as Annealing and Microstructure, Grain boundary.
His Silicide study contributes to a more complete understanding of Silicon.
Between 2008 and 2021, his most popular works were:
- Phase transitions in Ge-Sb phase change materials (69 citations)
- Microstructure modification in copper interconnect structure (57 citations)
- Controlling fragmentation of chemically strengthened glass (42 citations)
In his most recent research, the most cited papers focused on:
- Semiconductor
- Composite material
- Aluminium
Cyril Cabral mainly investigates Layer, Optoelectronics, Metallurgy, Electronic engineering and Copper.
Layer is a primary field of his research addressed under Composite material.
His Optoelectronics research integrates issues from Dosimeter, Radiation and Node.
Cyril Cabral works mostly in the field of Node, limiting it down to topics relating to Contact resistance and, in certain cases, Silicide, as a part of the same area of interest.
In his work, Oxide is strongly intertwined with Diffusion barrier, which is a subfield of Metallurgy.
In his research on the topic of Copper, Semiconductor is strongly related with Electroplating.
This overview was generated by a machine learning system which analysed the scientist’s
body of work. If you have any feedback, you can
contact us
here.
