Stephen M. Rossnagel

Overview

Best Publications

• Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions

  Stephen M. Rossnagel;J. J. Cuomo;William D. Westwood

  729
  Citations

• Alteration of Cu conductivity in the size effect regime

  S. M. Rossnagel;T. S. Kuan

  547
  Citations

• Metal ion deposition from ionized mangetron sputtering discharge

  S. M. Rossnagel;J. Hopwood

  497
  Citations

• Magnetron sputter deposition with high levels of metal ionization

  S. M. Rossnagel;J. Hopwood

  389
  Citations

• Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification and Synthesis

  J. J. Cuomo;S. M. Rossnagel;H. R. Haufman;Ranga Komanduri

  363
  Citations

• Ionic field effect transistors with sub-10 nm multiple nanopores.

  Sung-Wook Nam;Michael J. Rooks;Ki-Bum Kim;Stephen M. Rossnagel

  346
  Citations

• Gas density reduction effects in magnetrons

  S. M. Rossnagel

  337
  Citations

• Thin film deposition with physical vapor deposition and related technologies

  S. M. Rossnagel

  311
  Citations

• Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers

  S. M. Rossnagel;A. Sherman;F. Turner

  296
  Citations

• Systems and Methods for Controlling the Position of a Charged Polymer Inside a Nanopore

  Stanislav Polonsky;Stephen M. Rossnagel;Gustavo A. Stolovitzky

  276
  Citations

• Structure for confining the switching current in phase memory (PCM) cells

  Geoffrey W. Burr;Chung Hon Lam;Simone Raoux;Stephen M. Rossnagel

  269
  Citations

• Directional and ionized physical vapor deposition for microelectronics applications

  S. M. Rossnagel

  218
  Citations

• METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON POROUS LOW K SUBSTRATES

  Andrew J. Kellock;Hyungjun Kim;Dae-Gyu Park;Satyanarayana V. Nitta

  214
  Citations

• Collimated magnetron sputter deposition

  S. M. Rossnagel;D. Mikalsen;H. Kinoshita;J. J. Cuomo

  206
  Citations

• Phase transformation of thin sputter-deposited tungsten films at room temperature

  S. M. Rossnagel;I. C. Noyan;C. Cabral

  202
  Citations

• Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition

  H. Kim;C. Cabral;C. Lavoie;S. M. Rossnagel

  177
  Citations

• Evidence for segregation of Te in Ge2Sb2Te5 films: Effect on the “phase-change” stress

  L. Krusin-Elbaum;C. Cabral;Kuan-Neng Chen;M. Copel

  162
  Citations

• Current−voltage relations in magnetrons

  S. M. Rossnagel;H. R. Kaufman

  161
  Citations

• Film modification by low energy ion bombardment during deposition

  S.M. Rossnagel;J.J. Cuomo

  161
  Citations

• Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition

  H. Kim;C. Detavenier;O. van der Straten;S. M. Rossnagel

  140
  Citations