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Stephen M. Rossnagel

Stephen M. Rossnagel

D-Index & Metrics

Materials Science

D-Index
57
Citations
11210
World Ranking
7982
National Ranking
1984

Stephen M. Rossnagel publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Stephen M. Rossnagel sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 184 publications — 25th percentile

25% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Stephen M. Rossnagel D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Stephen M. Rossnagel sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 57 D-Index — 39th percentile

39% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Stephen M. Rossnagel is affiliated with IBM in the United States and is active in the field of engineering. Their research covers multiple subfields, including mechanics of materials, computational mechanics, and electrical and electronic engineering.

The main topics addressed in Rossnagel's work include:

  • Metal and thin film mechanics
  • Surface roughness and optical measurements
  • Semiconductor materials and devices

Rossnagel has contributed to scholarly publications predominantly in the Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, with two papers published in this venue.

Some of the recent papers authored or co-authored by Rossnagel are:

  • Magnetron sputtering, 2020, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • Preface for the special topic collection celebrating the achievements and life of Joe Greene, 2024, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

The list of co-authors who have frequently collaborated with Rossnagel includes:

  • I. Petrov
  • Lars Hultman
  • Li-Chyong Chen
  • Jochen M. Schneider

Best Publications

  • Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions

    Stephen M. Rossnagel;J. J. Cuomo;William D. Westwood

  • Alteration of Cu conductivity in the size effect regime

    S. M. Rossnagel;T. S. Kuan

  • Metal ion deposition from ionized mangetron sputtering discharge

    S. M. Rossnagel;J. Hopwood

  • Magnetron sputter deposition with high levels of metal ionization

    S. M. Rossnagel;J. Hopwood

  • Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification and Synthesis

    J. J. Cuomo;S. M. Rossnagel;H. R. Haufman;Ranga Komanduri

  • Ionic field effect transistors with sub-10 nm multiple nanopores.

    Sung-Wook Nam;Michael J. Rooks;Ki-Bum Kim;Stephen M. Rossnagel

  • Gas density reduction effects in magnetrons

    S. M. Rossnagel

  • Thin film deposition with physical vapor deposition and related technologies

    S. M. Rossnagel

  • Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers

    S. M. Rossnagel;A. Sherman;F. Turner

  • Systems and Methods for Controlling the Position of a Charged Polymer Inside a Nanopore

    Stanislav Polonsky;Stephen M. Rossnagel;Gustavo A. Stolovitzky

  • Structure for confining the switching current in phase memory (PCM) cells

    Geoffrey W. Burr;Chung Hon Lam;Simone Raoux;Stephen M. Rossnagel

  • Directional and ionized physical vapor deposition for microelectronics applications

    S. M. Rossnagel

  • METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON POROUS LOW K SUBSTRATES

    Andrew J. Kellock;Hyungjun Kim;Dae-Gyu Park;Satyanarayana V. Nitta

  • Collimated magnetron sputter deposition

    S. M. Rossnagel;D. Mikalsen;H. Kinoshita;J. J. Cuomo

  • Phase transformation of thin sputter-deposited tungsten films at room temperature

    S. M. Rossnagel;I. C. Noyan;C. Cabral

  • Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition

    H. Kim;C. Cabral;C. Lavoie;S. M. Rossnagel

  • Evidence for segregation of Te in Ge2Sb2Te5 films: Effect on the “phase-change” stress

    L. Krusin-Elbaum;C. Cabral;Kuan-Neng Chen;M. Copel

  • Current−voltage relations in magnetrons

    S. M. Rossnagel;H. R. Kaufman

  • Film modification by low energy ion bombardment during deposition

    S.M. Rossnagel;J.J. Cuomo

  • Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition

    H. Kim;C. Detavenier;O. van der Straten;S. M. Rossnagel

Frequent Co-Authors

Cyril Cabral
Cyril Cabral IBM (United States)
Hyungjun Kim
Hyungjun Kim Yonsei University
Jerome J. Cuomo
Jerome J. Cuomo North Carolina State University
Christian Lavoie
Christian Lavoie IBM (United States)
Simone Raoux
Simone Raoux Helmholtz-Zentrum Berlin für Materialien und Energie
Christopher V. Jahnes
Christopher V. Jahnes IBM (United States)
Andrew J. Kellock
Andrew J. Kellock IBM (United States)
Paul M. Solomon
Paul M. Solomon IBM (United States)
Matthew Copel
Matthew Copel IBM (United States)
Bruce G. Elmegreen
Bruce G. Elmegreen IBM (United States)

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