Stephen M. Rossnagel publications per year

The chart shows the history of publications by Stephen M. Rossnagel between 1978 and 2024, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Stephen M. Rossnagel published across 47 years, from 1978 to 2024, averaging 4.5 papers a year. Output peaked at 24 publications in 2010. 1 of the 210 publications appeared in the last two years.

No. of publications

5 10 15 20

1978 2024

210 publications in total across all disciplines

View publications per year as a table

Stephen M. Rossnagel: publications per year, 1978 to 2024
Year	Publications
1978	2
1979	4
1980	6
1981	2
1982	8
1983	2
1984	2
1985	1
1986	5
1987	6
1988	10
1989	5
1990	3
1991	7
1992	0
1993	4
1994	5
1995	7
1996	6
1997	2
1998	6
1999	9
2000	3
2001	2
2002	7
2003	7
2004	2
2005	4
2006	5
2007	5
2008	6
2009	8
2010	24
2011	10
2012	5
2013	3
2014	3
2015	3
2016	3
2017	1
2018	3
2019	1
2020	2
2021	0
2022	0
2023	0
2024	1
Total	210

Download as CSV

Stephen M. Rossnagel publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Stephen M. Rossnagel sits on this spectrum.

No. of scientists

200 400 600 800

50–69 publications 1,163+

This scientist: 184 publications — 25th percentile

25% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

View publications distribution as a table

Number of Materials Science scientists by publication count, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
Publications	Scientists	This scientist
50–69	28
70–89	152
90–109	356
110–129	487
130–149	723
150–169	835
170–189	850	184
190–209	891
210–229	862
230–249	766
250–269	726
270–289	665
290–309	593
310–329	537
330–349	477
350–369	440
370–389	356
390–409	321
410–429	256
430–449	246
450–469	216
470–489	212
490–509	174
510–529	194
530–549	162
550–569	131
570–589	111
590–609	103
610–629	99
630–649	77
650–669	92
670–689	56
690–709	53
710–729	53
730–749	38
750–769	52
770–789	43
790–809	38
810–829	34
830–849	25
850–869	18
870–889	20
890–909	24
910–929	27
930–949	20
950–969	17
970–989	10
990–1,009	16
1,010–1,029	13
1,030–1,049	12
1,050–1,069	9
1,070–1,089	8
1,090–1,109	7
1,110–1,129	9
1,130–1,149	2
1,150–1,162	5
1,163+	100

Download as CSV

Stephen M. Rossnagel D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Stephen M. Rossnagel sits on this spectrum.

No. of scientists

200 400 600

40–41 D-Index 165+

This scientist: 57 D-Index — 39th percentile

39% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

View D-Index distribution as a table

Number of Materials Science scientists by D-index, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
D-Index	Scientists	This scientist
40–41	211
42–43	450
44–45	612
46–47	612
48–49	598
50–51	657
52–53	667
54–55	621
56–57	597	57
58–59	610
60–61	587
62–63	606
64–65	533
66–67	490
68–69	469
70–71	378
72–73	421
74–75	359
76–77	323
78–79	299
80–81	230
82–83	210
84–85	195
86–87	203
88–89	175
90–91	175
92–93	142
94–95	121
96–97	117
98–99	107
100–101	88
102–103	85
104–105	68
106–107	62
108–109	57
110–111	45
112–113	49
114–115	50
116–117	34
118–119	38
120–121	37
122–123	29
124–125	28
126–127	24
128–129	33
130–131	28
132–133	21
134–135	20
136–137	23
138–139	17
140–141	12
142–143	17
144–145	21
146–147	13
148–149	11
150–151	14
152–153	13
154–155	9
156–157	10
158–159	7
160–161	4
162–163	4
164	3
165+	98

Download as CSV

Overview

Stephen M. Rossnagel is affiliated with IBM in the United States and is active in the field of engineering. Their research covers multiple subfields, including mechanics of materials, computational mechanics, and electrical and electronic engineering.

The main topics addressed in Rossnagel's work include:

Metal and thin film mechanics
Surface roughness and optical measurements
Semiconductor materials and devices

Rossnagel has contributed to scholarly publications predominantly in the Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, with two papers published in this venue.

Some of the recent papers authored or co-authored by Rossnagel are:

Magnetron sputtering, 2020, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Preface for the special topic collection celebrating the achievements and life of Joe Greene, 2024, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

The list of co-authors who have frequently collaborated with Rossnagel includes:

I. Petrov
Lars Hultman
Li-Chyong Chen
Jochen M. Schneider

Best Publications

Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions

Stephen M. Rossnagel;J. J. Cuomo;William D. Westwood

729
Citations
Alteration of Cu conductivity in the size effect regime

S. M. Rossnagel;T. S. Kuan

547
Citations
Metal ion deposition from ionized mangetron sputtering discharge

S. M. Rossnagel;J. Hopwood

497
Citations
Magnetron sputter deposition with high levels of metal ionization

S. M. Rossnagel;J. Hopwood

389
Citations
Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification and Synthesis

J. J. Cuomo;S. M. Rossnagel;H. R. Haufman;Ranga Komanduri

363
Citations
Ionic field effect transistors with sub-10 nm multiple nanopores.

Sung-Wook Nam;Michael J. Rooks;Ki-Bum Kim;Stephen M. Rossnagel

346
Citations
Gas density reduction effects in magnetrons

S. M. Rossnagel

337
Citations
Thin film deposition with physical vapor deposition and related technologies

S. M. Rossnagel

311
Citations
Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers

S. M. Rossnagel;A. Sherman;F. Turner

296
Citations
Systems and Methods for Controlling the Position of a Charged Polymer Inside a Nanopore

Stanislav Polonsky;Stephen M. Rossnagel;Gustavo A. Stolovitzky

276
Citations
Structure for confining the switching current in phase memory (PCM) cells

Geoffrey W. Burr;Chung Hon Lam;Simone Raoux;Stephen M. Rossnagel

269
Citations
Directional and ionized physical vapor deposition for microelectronics applications

S. M. Rossnagel

218
Citations
METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON POROUS LOW K SUBSTRATES

Andrew J. Kellock;Hyungjun Kim;Dae-Gyu Park;Satyanarayana V. Nitta

214
Citations
Collimated magnetron sputter deposition

S. M. Rossnagel;D. Mikalsen;H. Kinoshita;J. J. Cuomo

206
Citations
Phase transformation of thin sputter-deposited tungsten films at room temperature

S. M. Rossnagel;I. C. Noyan;C. Cabral

202
Citations
Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition

H. Kim;C. Cabral;C. Lavoie;S. M. Rossnagel

177
Citations
Evidence for segregation of Te in Ge2Sb2Te5 films: Effect on the “phase-change” stress

L. Krusin-Elbaum;C. Cabral;Kuan-Neng Chen;M. Copel

162
Citations
Current−voltage relations in magnetrons

S. M. Rossnagel;H. R. Kaufman

161
Citations
Film modification by low energy ion bombardment during deposition

S.M. Rossnagel;J.J. Cuomo

161
Citations
Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition

H. Kim;C. Detavenier;O. van der Straten;S. M. Rossnagel

140
Citations