Stephen M. Rossnagel mostly deals with Sputtering, Sputter deposition, Thin film, Cavity magnetron and Cathode. As part of his studies on Sputtering, he frequently links adjacent subjects like Analytical chemistry. His work in Sputter deposition is not limited to one particular discipline; it also encompasses Optoelectronics.
Stephen M. Rossnagel has included themes like Deposition, Ion plating, Pulsed laser deposition, Physical vapor deposition and Plasma processing in his Optoelectronics study. He combines subjects such as Electric discharge, Ionization and Inductively coupled plasma with his study of Cavity magnetron. His Cathode study combines topics in areas such as Torr and Photoresist.
Stephen M. Rossnagel spends much of his time researching Optoelectronics, Layer, Thin film, Analytical chemistry and Nanotechnology. His work in the fields of Optoelectronics, such as Silicon, overlaps with other areas such as Communication channel. His Thin film research is multidisciplinary, incorporating perspectives in Amorphous solid, Inorganic chemistry and Electrical resistivity and conductivity.
His study in Analytical chemistry is interdisciplinary in nature, drawing from both Hydrogen and Sputtering. His Sputtering study which covers Cathode that intersects with Ionization. His work investigates the relationship between Sputter deposition and topics such as Deposition that intersect with problems in Plasma processing.
His primary areas of study are Layer, Optoelectronics, Nanotechnology, Nanopore and Composite material. His Layer research incorporates themes from Oxide and Corrosion. His research in the fields of Silicon and Silicide overlaps with other disciplines such as Communication channel.
His Nanotechnology study also includes fields such as
The scientist’s investigation covers issues in Nanopore, Nanotechnology, Layer, Analytical chemistry and Optoelectronics. While the research belongs to areas of Nanopore, Stephen M. Rossnagel spends his time largely on the problem of Ionic bonding, intersecting his research to questions surrounding Field-effect transistor and Monolayer. His work deals with themes such as Electrolyte, Electrochemistry and Polymer, which intersect with Nanotechnology.
His Analytical chemistry research incorporates elements of Metal gate, Chemical vapor deposition and Thin film, Physical vapor deposition, Sputtering. His study in the field of Atomic layer deposition also crosses realms of Titanium isopropoxide. Within one scientific family, he focuses on topics pertaining to Voltage under Optoelectronics, and may sometimes address concerns connected to Power.
This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.
Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions
Stephen M. Rossnagel;J. J. Cuomo;William D. Westwood.
Metal ion deposition from ionized mangetron sputtering discharge
S. M. Rossnagel;J. Hopwood.
Journal of Vacuum Science & Technology B (1994)
Alteration of Cu conductivity in the size effect regime
S. M. Rossnagel;T. S. Kuan.
Journal of Vacuum Science & Technology B (2004)
Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification and Synthesis
J. J. Cuomo;S. M. Rossnagel;H. R. Haufman;Ranga Komanduri.
Magnetron sputter deposition with high levels of metal ionization
S. M. Rossnagel;J. Hopwood.
Applied Physics Letters (1993)
Gas density reduction effects in magnetrons
S. M. Rossnagel.
Journal of Vacuum Science and Technology (1988)
Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
S. M. Rossnagel;A. Sherman;F. Turner.
Journal of Vacuum Science & Technology B (2000)
Ionic field effect transistors with sub-10 nm multiple nanopores.
Sung-Wook Nam;Michael J. Rooks;Ki-Bum Kim;Stephen M. Rossnagel.
Nano Letters (2009)
Structure for confining the switching current in phase memory (PCM) cells
Geoffrey W. Burr;Chung Hon Lam;Simone Raoux;Stephen M. Rossnagel.
Directional and ionized physical vapor deposition for microelectronics applications
S. M. Rossnagel.
Journal of Vacuum Science & Technology B (1998)
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