D-Index & Metrics Best Publications

D-Index & Metrics D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines.

Discipline name D-index D-index (Discipline H-index) only includes papers and citation values for an examined discipline in contrast to General H-index which accounts for publications across all disciplines. Citations Publications World Ranking National Ranking
Materials Science D-index 40 Citations 7,634 106 World Ranking 8693 National Ranking 2291

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Oxygen
  • Organic chemistry

Stephen M. Rossnagel mostly deals with Sputtering, Sputter deposition, Thin film, Cavity magnetron and Cathode. As part of his studies on Sputtering, he frequently links adjacent subjects like Analytical chemistry. His work in Sputter deposition is not limited to one particular discipline; it also encompasses Optoelectronics.

Stephen M. Rossnagel has included themes like Deposition, Ion plating, Pulsed laser deposition, Physical vapor deposition and Plasma processing in his Optoelectronics study. He combines subjects such as Electric discharge, Ionization and Inductively coupled plasma with his study of Cavity magnetron. His Cathode study combines topics in areas such as Torr and Photoresist.

His most cited work include:

  • Metal ion deposition from ionized mangetron sputtering discharge (346 citations)
  • Alteration of Cu conductivity in the size effect regime (339 citations)
  • Magnetron sputter deposition with high levels of metal ionization (268 citations)

What are the main themes of his work throughout his whole career to date?

Stephen M. Rossnagel spends much of his time researching Optoelectronics, Layer, Thin film, Analytical chemistry and Nanotechnology. His work in the fields of Optoelectronics, such as Silicon, overlaps with other areas such as Communication channel. His Thin film research is multidisciplinary, incorporating perspectives in Amorphous solid, Inorganic chemistry and Electrical resistivity and conductivity.

His study in Analytical chemistry is interdisciplinary in nature, drawing from both Hydrogen and Sputtering. His Sputtering study which covers Cathode that intersects with Ionization. His work investigates the relationship between Sputter deposition and topics such as Deposition that intersect with problems in Plasma processing.

He most often published in these fields:

  • Optoelectronics (30.32%)
  • Layer (26.45%)
  • Thin film (22.58%)

What were the highlights of his more recent work (between 2008-2016)?

  • Layer (26.45%)
  • Optoelectronics (30.32%)
  • Nanotechnology (20.65%)

In recent papers he was focusing on the following fields of study:

His primary areas of study are Layer, Optoelectronics, Nanotechnology, Nanopore and Composite material. His Layer research incorporates themes from Oxide and Corrosion. His research in the fields of Silicon and Silicide overlaps with other disciplines such as Communication channel.

His Nanotechnology study also includes fields such as

  • Capacitor most often made with reference to Electrolyte,
  • Transistor together with Piezoresistive effect, Piezoelectricity, Insulator and Thin film. His study in Thin film focuses on Atomic layer deposition in particular. The concepts of his Nanopore study are interwoven with issues in Ionic bonding, Electrochemistry, Coating and Analytical chemistry.

Between 2008 and 2016, his most popular works were:

  • Ionic field effect transistors with sub-10 nm multiple nanopores. (223 citations)
  • Systems and Methods for Controlling the Position of a Charged Polymer Inside a Nanopore (101 citations)
  • Atomic layer deposition of Ge2Sb2Te5 thin films (58 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Oxygen
  • Organic chemistry

The scientist’s investigation covers issues in Nanopore, Nanotechnology, Layer, Analytical chemistry and Optoelectronics. While the research belongs to areas of Nanopore, Stephen M. Rossnagel spends his time largely on the problem of Ionic bonding, intersecting his research to questions surrounding Field-effect transistor and Monolayer. His work deals with themes such as Electrolyte, Electrochemistry and Polymer, which intersect with Nanotechnology.

His Analytical chemistry research incorporates elements of Metal gate, Chemical vapor deposition and Thin film, Physical vapor deposition, Sputtering. His study in the field of Atomic layer deposition also crosses realms of Titanium isopropoxide. Within one scientific family, he focuses on topics pertaining to Voltage under Optoelectronics, and may sometimes address concerns connected to Power.

This overview was generated by a machine learning system which analysed the scientist’s body of work. If you have any feedback, you can contact us here.

Best Publications

Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions

Stephen M. Rossnagel;J. J. Cuomo;William D. Westwood.
(1991)

683 Citations

Metal ion deposition from ionized mangetron sputtering discharge

S. M. Rossnagel;J. Hopwood.
Journal of Vacuum Science & Technology B (1994)

481 Citations

Alteration of Cu conductivity in the size effect regime

S. M. Rossnagel;T. S. Kuan.
Journal of Vacuum Science & Technology B (2004)

467 Citations

Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification and Synthesis

J. J. Cuomo;S. M. Rossnagel;H. R. Haufman;Ranga Komanduri.
(1990)

359 Citations

Magnetron sputter deposition with high levels of metal ionization

S. M. Rossnagel;J. Hopwood.
Applied Physics Letters (1993)

359 Citations

Gas density reduction effects in magnetrons

S. M. Rossnagel.
Journal of Vacuum Science and Technology (1988)

304 Citations

Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers

S. M. Rossnagel;A. Sherman;F. Turner.
Journal of Vacuum Science & Technology B (2000)

271 Citations

Ionic field effect transistors with sub-10 nm multiple nanopores.

Sung-Wook Nam;Michael J. Rooks;Ki-Bum Kim;Stephen M. Rossnagel.
Nano Letters (2009)

271 Citations

Structure for confining the switching current in phase memory (PCM) cells

Geoffrey W. Burr;Chung Hon Lam;Simone Raoux;Stephen M. Rossnagel.
(2005)

259 Citations

Directional and ionized physical vapor deposition for microelectronics applications

S. M. Rossnagel.
Journal of Vacuum Science & Technology B (1998)

209 Citations

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